Patents Examined by Chanceity N Robinson
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Patent number: 11891558Abstract: Solid foam structures having multiple compartments comprising mesogenic ligand-functionalized nanoparticles are provided. Compositions that include these structures, as well as methods of making the structures are also provided. The structures, compositions and methods find use in a variety of applications, such as, photonics, luminescent coatings and multi-compartment encapsulation technologies.Type: GrantFiled: October 17, 2018Date of Patent: February 6, 2024Assignee: The Regents of the University of CaliforniaInventors: Linda Hirst, Tayebeh Riahinasab, Benjamin J. Stokes
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Patent number: 11884865Abstract: A liquid crystal emulsification method that can reduce formulation restriction and adjust the size of a dispersed phase with small variation in size of the dispersed phase, and a liquid crystal emulsion are provided. The liquid crystal emulsification method includes: adding a moisture content and/or an oil content at a predetermined ratio to a surfactant having an HLB falling within a predetermined range; and setting a temperature during formation of a dispersion or an emulsion to a predetermined temperature, to adjust a lamellar liquid crystal having a regular molecular arrangement in which the oil content and/or the moisture content are alternately arranged in a bilayer membrane formed from the surfactant.Type: GrantFiled: December 10, 2020Date of Patent: January 30, 2024Assignee: Wacker Chemie AGInventors: Kenji Igarashi, Shinichi Araki, Yoko Hori
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Patent number: 11884862Abstract: Compounds of the formula I in which R1 is alkyl or alkoxy in which CH2 groups are optionally replaced, and X1 is alkyl OCF3, CF3, CHF2, OCF2CF3, CCF2CHFCF3, OCF?CF2, OCH?CF2 or F, a liquid-crystalline medium containing a compound of formula I, and use thereof in electro-optical liquid-crystal displays, in particular in TN, STN, TN-TFT, OCB, IPS, PS-IPS, FFS, HB-FFS or PS-FFS-, positive VA displays and in shutter spectacles for 3D effects and LC lenses.Type: GrantFiled: August 4, 2016Date of Patent: January 30, 2024Assignee: MERCK PATENT GMBHInventors: Achim Goetz, Christian Hock, Lars Lietzau, Mark Goebel
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Patent number: 11884863Abstract: A liquid-crystalline medium having least one compound of the formula I, and at least one compound of the formulae ST-1 to ST-17, in which R1 and R1*, A1 and A1*, Z1 and Z1*, X, L1 and L2, RST, ring A, ZST, p and q have the meanings indicated in claim 1, and the use thereof for an active-matrix display, in particular based on the VA, PSA, PA-VA, SS-VA, SA-VA, PS-VA, PALC, IPS, PS-IPS, UB-FFS, U-IPS, FFS or PS-FFS effect.Type: GrantFiled: July 22, 2019Date of Patent: January 30, 2024Assignee: MERCK PATENT GMBHInventors: Harald Hirschmann, Sabine Schoen
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Patent number: 11878503Abstract: Systems and processes for making a flexo plate, and plates made thereby. Non-printing indicia defined by areas of presence and absence of polymer in the plate floor are readable downstream of the washing or other non-cured-polymer-removal step but do not print in the printing step. The non-printing indicia may define a repeating pattern of alphanumeric characters, non-text graphics, or a combination thereof.Type: GrantFiled: October 7, 2020Date of Patent: January 23, 2024Assignee: Esko Graphics Imaging GmbHInventors: Wolfgang Sievers, Pascal Thomas, Thomas Klein
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Patent number: 11880134Abstract: New Te-salt compounds, including photoactive tellurium compounds useful for Extreme Ultraviolet Lithography.Type: GrantFiled: November 29, 2018Date of Patent: January 23, 2024Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLCInventors: Emad Aqad, James F. Cameron, James W. Thackeray
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Patent number: 11873438Abstract: A liquid-crystalline medium with one or more compounds of the formula IA and, one or more compounds of formula BS and the use thereof in an active-matrix display, in particular in a VA, IPS, U-IPS, FFS, UB-FFS, SA-VA, SA-FFS, PS-VA, PS-OCB, PS-IPS, PS-FFS, PS-UB-FFS, PS-poli-VA, PS-TN, polymer stabilized SA-VA or polymer stabilized SA-FFS display.Type: GrantFiled: December 18, 2019Date of Patent: January 16, 2024Assignee: MERCK PATENT GMBHInventors: Rachel Tuffin, Matthias Bremer, Marcus Reuter
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Patent number: 11858252Abstract: The invention pertains to a photosensitive element, particularly a photopolymerizable printing form precursor; a method of preparing the photosensitive element to form a printing form for use in relief printing; and, a process of making the photosensitive element. The printing form precursor includes a layer of a photosensitive composition, a digital layer that is adjacent to a side of the photosensitive layer, and a cell pattern layer that is disposed between the photosensitive layer and the digital layer. The cell pattern layer includes a plurality of features in which each feature an area between 5 to 750 square microns and is composed of an ink that is opaque to actinic radiation and transparent to infrared radiation. Since the cell pattern layer is integral with the printing form precursor, digital imaging can occur rapidly with relatively low resolution optics to form a mask without needing to also form a microcell pattern of the digital layer.Type: GrantFiled: September 7, 2022Date of Patent: January 2, 2024Assignee: DUPONT ELECTRONICS, INC.Inventors: Robert M Blomquist, Bradley K Taylor, John Stephen Locke, Mark A Hackler
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Patent number: 11851601Abstract: A polymerisable LC material containing one or more di- or multireactive mesogenic compounds, and one or more compounds of formula TRI, and one or more compounds of formula ND Furthermore, a method for preparing the polymerisable LC material, and a polymer film with improved thermal durability and UV stability obtainable from the polymerisable LC material, and a method of preparing such polymer film, and using such polymer film and the polymerisable LC material for optical, electro-optical, decorative or security devices.Type: GrantFiled: August 9, 2019Date of Patent: December 26, 2023Assignee: Merck Patent GmbHInventors: Yong-Hyun Choi, Jae-Hyun Kang, Hyun-Jin Yoon
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Patent number: 11845259Abstract: A lithographic printing plate precursor is disclosed including a support and a coating comprising (i) a photopolymerisable layer including a polymerisable compound and an optionally substituted trihaloalkyl sulfone photoinitiator, and (ii) a toplayer provided above the photopolymerisable layer; characterized in that the toplayer includes an infrared absorbing dye capable of forming a print-out image upon exposure to heat and/or IR radiation.Type: GrantFiled: May 13, 2019Date of Patent: December 19, 2023Assignee: Agfa Offset BVInventors: Thomas Billiet, Kristof Heylen
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Patent number: 11834598Abstract: The present invention relates to a polymerizable mixture which can be used to form a dielectric material for the preparation of passivation layers in electronic devices. The polymerizable mixture comprises a first monomer and a second monomer which may react to form a copolymer providing excellent film forming capability, excellent thermal properties and excellent mechanical properties. There is further provided a method for forming said copolymers and an electronic device containing said copolymers as dielectric material. Beyond that, the present invention relates to a manufacturing method for preparing a packaged microelectronic structure and to a microelectronic device comprising said packaged microelectronic structure formed by said manufacturing method.Type: GrantFiled: October 15, 2019Date of Patent: December 5, 2023Assignee: Merck Patent GmbHInventors: Gregor Larbig, Pawel Miskiewicz, Frank Meyer, Joerg Pahnke, Karsten Koppe
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Patent number: 11827829Abstract: A liquid crystal composition containing a dibenzo derivative comprising a compound of general formula I and a compound of general formula II, and a liquid crystal display device containing the same, are disclosed. The liquid crystal composition is characterized by its excellent physical properties with respect to a liquid crystal display. The liquid crystal display device containing the liquid crystal composition has a good transmittance and a high contrast.Type: GrantFiled: June 25, 2021Date of Patent: November 28, 2023Assignee: JIANGSU HECHENG DISPLAY TECHNOLOGY CO., LTD.Inventors: Lifang Yao, Di He, Haibin Xu, Wenquan Ding, Shuang Xu
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Patent number: 11831037Abstract: A manufacturing method for a battery including a cell array and a case is provided. The cell array includes a plurality of single cells arranged in a certain direction. The case includes a pair of compartment members of which a longitudinal direction is a direction in which the single cells are arranged, and a first end member provided at a first end in the longitudinal direction. In the manufacturing method, in space surrounded by the compartment members and the first end member, the cell array and a second end member facing the first end member across the cell array are placed. In a direction to compress the cell array from an outside part of the second end member, each compartment member is joined with the second end member at a second end in the longitudinal direction while a predetermined load is applied to bind the cell array.Type: GrantFiled: March 16, 2021Date of Patent: November 28, 2023Assignees: TOYOTA JIDOSHA KABUSHIKI KAISHA, KOJIMA PRESS INDUSTRY CO., LTD.Inventors: Nobuyoshi Fujiwara, Taichi Egawa, Tomotaka Osakabe
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Patent number: 11822240Abstract: A resist composition that generates an acid upon exposure and whose solubility in a developing solution is changed by action of an acid, the resist composition containing a base material component whose solubility in a developing solution is changed by action of an acid, and a compound represented by General Formula (e1) in which Rd01 represents a monovalent organic group and Rd02 represents a single bond or a divalent linking groupType: GrantFiled: December 14, 2020Date of Patent: November 21, 2023Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Yasuhiro Yoshii, Yosuke Suzuki, Yoichi Hori, Takahiro Kojima, Mari Murata
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Patent number: 11814562Abstract: An ionic liquid crystal elastomer composition includes a liquid crystal elastomer; and an ionic liquid.Type: GrantFiled: January 11, 2021Date of Patent: November 14, 2023Assignees: KENT STATE UNIVERSITY, THE UNIVERSITY OF AKRONInventors: Antal Jákli, Chenrun Feng, Chathuranga Prageeth Hemantha Rajapaksha, Vikash Kaphle, Thein Kyu
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Patent number: 11813838Abstract: A lithographic printing plate precursor is disclosed including a support and a coating comprising (i) a photopolymerisable layer including a polymerisable compound and a photoinitiator, and a toplayer provided above the photopolymerisable layer; characterized in that the toplayer has a thickness comprised between 0.1 g/m2 and 1.75 g/m2 and includes an infrared absorbing compound which includes a thermocleavable group which transforms into a group which is a stronger electrondonor upon exposure to heat and/or IR radiation, and is capable of forming a printout image upon exposure to heat and/or IR radiation.Type: GrantFiled: May 13, 2019Date of Patent: November 14, 2023Assignee: Agfa Offset BVInventors: Thomas Billiet, Eva Vermeiren
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Patent number: 11813884Abstract: Lithographic printing plate precursors have an aluminum-containing substrate prepared using two anodizing processes to provide an inner aluminum oxide layer of average dry thickness of 300-3,000 nm and a multiplicity of inner micropores of average inner micropore diameter of ?100 nm. An outer aluminum oxide layer is provided with a multiplicity of outer micropores of average outer micropore diameter of 15-30 nm and a dry thickness of 30-650 nm. A hydrophilic layer is disposed on the outer aluminum oxide layer at 0.0002-0.1 g/m2 and has a (1) compound having an ethylenically unsaturated polymerizable groups; a —OM group connected directly to a phosphorus atom, wherein M represents hydrogen, sodium, potassium, or aluminum; and (2) one or more hydrophilic polymers having (a) recurring units comprising an amide group, and (b) recurring units having an —OM? group that is directly connected to a phosphorus atom, wherein M? represents hydrogen, sodium, potassium, or aluminum.Type: GrantFiled: March 2, 2021Date of Patent: November 14, 2023Assignee: EASTMAN KODAK COMPANYInventors: Johannes Obenauf, Domenico Balbinot
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Patent number: 11814563Abstract: The disclosure discusses chiral dopants for liquid-crystalline materials. Chiral dopants can be bioreachable compounds, i.e. compounds produced from microbes through fermentation. Chiral dopants can also include bioreachable materials that are further modified by chemical synthetic steps. Chiral dopants as discussed herein can include biomolecules such as glycyrrhetinic acid (1), S-naringenin (2), shikimic acid (3), alpha-phellandrene (4), betulin (5), malic acid (6), valencene (7), or nootkatone (8), and any stereoisomers or chemically modified derivatives thereof. The disclosure further shows optical properties of such compounds in a liquid-crystalline material.Type: GrantFiled: December 6, 2019Date of Patent: November 14, 2023Assignees: Zymergen Inc., Kent State UniversityInventors: Adam Safir, Shilpa Naresh Raja, Arjan Zoombelt, Robert J. Twieg, Pawan Nepal, Ashani Wedige-Fernando, Peter Palffy-Muhoray
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Patent number: 11796914Abstract: A photosensitive resin structure for a printing plate, containing: a support (A); a photosensitive resin composition layer (B) comprising a thermoplastic elastomer (B-1) comprising a monovinyl-substituted aromatic hydrocarbon and a conjugated diene, an ethylenically unsaturated compound (B-2), and a photopolymerization initiator (B-3); and a non-infrared ray-shielding layer (C) ablatable with an infrared ray, wherein the non-infrared ray-shielding layer (C) comprises a polymer (C-2) having a carboxylate group and an ester bond group in a molecule thereof and an infrared ray absorber (C-3), and a proportion of an ester bond group such that carbon bonded to the ester bond group and carbon bonded to the carboxylate group are adjacent to each other in all the ester bond groups contained in the polymer (C-2) is 15% or more.Type: GrantFiled: July 20, 2018Date of Patent: October 24, 2023Assignee: ASAHI KASEI KABUSHIKI KAISHAInventors: Shusaku Tabata, Masaki Matsumoto, Ryo Ichihashi
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Patent number: 11789361Abstract: A semiconductor resist composition includes an organometallic compound represented by Chemical Formula 1 and a solvent: wherein, in Chemical Formula 1, R1 is an aliphatic hydrocarbon group, an aromatic hydrocarbon group, or an -alkyl-O-alkyl group, and R2 to R4 are each independently selected from —ORa and —OC(?O)Rb. The semiconductor resist composition may have excellent solubility and storage stability.Type: GrantFiled: June 28, 2021Date of Patent: October 17, 2023Assignee: Samsung SDI Co., Ltd.Inventors: Kyung Soo Moon, Jaehyun Kim, Yoong Hee Na, Ran Namgung, Hwansung Cheon, Seungyong Chae