Patents Examined by Cynthia Kelly
  • Patent number: 9136528
    Abstract: A magnesium secondary battery includes a positive electrode, a negative electrode, a separator membrane and an electrolytic solution. The electrolytic solution includes nitrogen-containing heterocyclic magnesium halide and an organic ether solvent.
    Type: Grant
    Filed: February 23, 2012
    Date of Patent: September 15, 2015
    Inventors: Yanna Nuli, Qingsong Zhao, Jun Yang, Yongsheng Guo
  • Patent number: 8778601
    Abstract: Provided are methods of forming photolithographic patterns using a negative tone development process. Also provided are coated substrates and electronic devices formed by the methods. The methods find particular applicability in the manufacture of electronic devices.
    Type: Grant
    Filed: March 7, 2011
    Date of Patent: July 15, 2014
    Assignee: Rohm and Haas Electronic Materials
    Inventors: Seokho Kang, Charlotte Cutler
  • Patent number: 8758985
    Abstract: Provided are a method of fabricating a nanostructure array and a device including the nanostructure array. Nanoscale patterning is caused at an interface of a resist layer by light passed through a focusing layer. By such nanoscale patterning, a nanostructure array is fabricated on a substrate in various ways. As the focusing layer, an array of beads or lenses is used, and a pattern of the resist layer may include a nanoscale pore-opening and an undercut structure connected to a lower portion of the opening. The method facilitates adjustment of the size and shape of nanostructures and the interval between the nanostructures. Also, performance of the device including the nanostructure array can be improved. In particular, the method and device result in a sensor having improved sensitivity and reliability optimized for an environment and purpose to be used.
    Type: Grant
    Filed: August 5, 2011
    Date of Patent: June 24, 2014
    Assignee: Korea Institute of Science and Technology
    Inventors: Kyeong Seok Lee, Won Mok Kim, In Ho Kim
  • Patent number: 8735051
    Abstract: Exposure apparatus is equipped with an illumination optical device which illuminates a mask with an exposure beam, a mask table which holds a periphery of a pattern area of the mask from above so that a pattern surface of the mask becomes substantially parallel to an XY plane and makes a force at least parallel to an XY plane and on the mask, and a wafer stage which moves along the XY plane, holding a wafer substantially parallel to the XY plane. Therefore, an overlay with high precision of a pattern of a mask and an underlying pattern on the substrate can be realized, even though the exposure apparatus employs a proximity method, that is, the exposure apparatus does not use a projection optical system.
    Type: Grant
    Filed: February 28, 2013
    Date of Patent: May 27, 2014
    Assignee: Nikon Corporation
    Inventor: Yuichi Shibazaki
  • Patent number: 8722313
    Abstract: A method of manufacturing a touch screen panel includes a first process, a second process, and a third process. Each of a plurality of first electrode serials includes a plurality of first electrode patterns which are separated from each other, neighboring first electrode patterns are electrically connected to each other via a first connection pattern, and a first insulation pattern electrically insulates the first electrode serial from the second electrode serial at an intersection of the first electrode serial and the second electrode serial.
    Type: Grant
    Filed: December 3, 2010
    Date of Patent: May 13, 2014
    Assignee: LG Display Co., Ltd.
    Inventor: Seungmok Shin
  • Patent number: 8715911
    Abstract: Provided are a coating composition for deep ultraviolet (DUV) filtering during an extreme ultraviolet (EUV) exposure, the coating composition including about 100 parts by weight of a solvent including a first solvent (the first solvent being an alcoholic solvent); and about 0.05 parts by weight to about 5 parts by weight of a coating polymer having a degree of absorption of about 50%/?m or greater with respect to 193-nm incident light.
    Type: Grant
    Filed: July 22, 2011
    Date of Patent: May 6, 2014
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hyun-woo Kim, Hai-sub Na, Chil-hee Chung, Han-ku Cho
  • Patent number: 8709702
    Abstract: A method of fabrication and device with holes for electrical conduction made by preparing a photosensitive glass substrate comprising at least silica, lithium oxide, aluminum oxide, and cerium oxide, masking a design layout comprising one or more holes to form one or more electrical conduction paths on the photosensitive glass substrate, exposing at least one portion of the photosensitive glass substrate to an activating energy source, exposing the photosensitive glass substrate to a heating phase of at least ten minutes above its glass transition temperature, cooling the photosensitive glass substrate to transform at least part of the exposed glass to a crystalline material to form a glass-crystalline substrate and etching the glass-crystalline substrate with an etchant solution to form the one or more depressions or through holes for electrical conduction in the device.
    Type: Grant
    Filed: February 10, 2011
    Date of Patent: April 29, 2014
    Assignee: 3D Glass Solutions
    Inventors: Jeb H. Flemming, Colin T. Buckley, R. Blake Ridgeway
  • Patent number: 8709704
    Abstract: A pattern forming method, includes: (i) a step of forming a resist film from a resist composition for organic solvent-based development, the resist composition containing (A) a resin capable of increasing a polarity by an action of an acid to decrease a solubility in an organic solvent-containing developer and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) an exposure step; (iii) a development step using an organic solvent-containing developer; and (iv) a washing step using a rinsing solution, wherein in the step (iv), a rinsing solution containing at least either the solvent S1 or S2 as defined in the specification is used.
    Type: Grant
    Filed: November 27, 2009
    Date of Patent: April 29, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Sou Kamimura, Shinji Tarutani
  • Patent number: 8703404
    Abstract: A negative pattern is formed by coating a resist composition onto a substrate, exposure, bake, and development in alkaline water. The resist composition comprises a polymer comprising acid labile group-containing recurring units, adapted to turn soluble in alkaline developer under the action of acid, an acid generator and/or an acid, a photobase generator capable of generating an amino-containing compound, a quencher for neutralizing acid for inactivation, and an organic solvent.
    Type: Grant
    Filed: February 8, 2012
    Date of Patent: April 22, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masashi Iio
  • Patent number: 8702370
    Abstract: A substrate transfer method for transferring target substrates proceeds in a substrate processing system for performing processes including a photolithography sequence on the target substrates. The system includes a first automated substrate transfer line configured to transfer the target substrates among a plurality of process sections for respectively performing processes on the target substrates, and a second automated substrate transfer line of a cyclical type dedicated to a plurality of process apparatuses of a photolithography process section, which are configured to perform a series of processes in the photolithography sequence, the second automated substrate transfer line being located relative to the first automated substrate transfer line so as for the target substrates to be transferred therebetween.
    Type: Grant
    Filed: June 13, 2012
    Date of Patent: April 22, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Yuichi Yamamoto, Tadayuki Yamaguchi, Yasuhito Saiga, Yoshiaki Yamada
  • Patent number: 8703403
    Abstract: The present disclosure provides a method of fabricating a semiconductor device. The method includes dispensing a liquid on a wafer. The method includes raising the wafer. The method includes lowering the wafer after the raising. The wafer is spun as it is lowered, thereby removing at least a portion of the liquid from the wafer. The present disclosure also provides an apparatus for fabricating a semiconductor device. The apparatus includes a wafer chuck that is operable to hold a semiconductor wafer and secure the wafer thereto. The wafer has a front surface and a back surface. The apparatus includes a dispenser that is operable to dispense a liquid to the front surface of the wafer. The apparatus includes a mechanical structure that is operable to: spin the wafer chuck in a horizontal direction; and move the wafer chuck downwards in a vertical direction while the wafer chuck is being rotated.
    Type: Grant
    Filed: December 22, 2011
    Date of Patent: April 22, 2014
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Wei-Chieh Huang, Hung Chang Hsieh
  • Patent number: 8703407
    Abstract: According to one embodiment, a pattern formation method contains: forming first guides by changing a surface energy of an underlayer material by transferring a pattern of a photomask onto the underlayer material by exposure, and forming second guides by changing the surface energy of the underlayer material between the first guides by diffraction of exposure light generated from the exposure; applying a block copolymer containing a plurality of types of polymer block chains onto the underlayer material; and causing any one of the polymer block chains to form a pattern in accordance with the first and second guides by microphase separation of the block copolymer by a heat treatment.
    Type: Grant
    Filed: July 21, 2011
    Date of Patent: April 22, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yuriko Seino, Yukiko Kikuchi
  • Patent number: 8703400
    Abstract: In the coating treatment apparatus, in a first treatment chamber, the front and rear surfaces of the substrate held by a transfer arm are inverted by a turning mechanism, and a coating solution is applied from a coating nozzle to the rear surface of the substrate. The substrate is transferred into a second treatment chamber, in which the coating solution on the rear surface is heated by a heating unit to cure, thereby forming a coating film on the rear surface of the substrate. The formation of the coating film by the coating treatment apparatus is performed before exposure processing, whereby the rear surface of the substrate can be flat for the exposure processing.
    Type: Grant
    Filed: March 7, 2011
    Date of Patent: April 22, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Kenji Tsutsumi, Junichi Kitano, Osamu Miyahara, Hideharu Kyouda
  • Patent number: 8703409
    Abstract: A method for forming a microstructure includes: (a) forming a photocurable layer on a substrate, the photocurable layer including at least one photocurable compound that has a photocurable functional group equivalent weight ranging from 70 to 700 g/mol; (b) covering partially the photocurable layer using a patterned mask; (c) exposing the photocurable layer through the patterned mask using a first light source so that the photocurable layer is cured at first regions which are exposed; (d) removing the patterned mask; and (e) illuminating the photocurable layer using a second light source to cure second regions of the photocurable layer which have not been cured. The first and second regions have different surface heights and provide a surface roughness for the microstructure.
    Type: Grant
    Filed: September 13, 2011
    Date of Patent: April 22, 2014
    Assignee: Far Eastern New Century Corporation
    Inventors: Da-Ren Chiou, Wei-Che Hung, Shoh-Yue Lin, Chiu-Fang Chen, Tzu-Ying Chen
  • Patent number: 8703397
    Abstract: A method for fabricating a side shield for a magnetic transducer is described. The magnetic transducer has a nonmagnetic layer and a pole on the nonmagnetic layer. The pole has sidewalls and an air-bearing surface location (ABS location) corresponding to an air-bearing surface (ABS). A developable bottom antireflective coating (D-BARC) layer covering the pole and at least a portion of the nonmagnetic layer is provided. The D-BARC layer is photosensitive. A photosensitive mask layer is provided on the D-BARC layer. A first portion of the mask layer and a first portion of the D-BARC layer are removed to form a bi-layer mask. The bi-layer mask has an aperture in the mask layer and the D-BARC layer. At least one side shield layer is deposited. At least a portion of the at least one side shield layer resides in the aperture. The bi-layer mask is also removed.
    Type: Grant
    Filed: March 29, 2012
    Date of Patent: April 22, 2014
    Assignee: Western Digital (Fremont), LLC
    Inventors: Xianzhong Zeng, Hai Sun
  • Patent number: 8703405
    Abstract: In a method of generating a three-dimensional process window qualification, a photoresist layer is coated on a substrate including an underlying structure. A plurality of circular-shaped regions of the substrate are distinguished into 1 to n regions to partition the substrate into a center portion and an edge portion, n being a natural number greater than 2. 1 to n exposing ranges are set, including a common exposing condition for the 1 to n regions. A photoresist pattern is fox led by exposing each shot portion in the 1 to n regions using a split exposing condition in the 1 to n exposing ranges. The photoresist pattern is detected, and a normal photoresist pattern with respect to each of the 1 to n regions is selected to generate the three-dimensional process window qualification.
    Type: Grant
    Filed: May 2, 2012
    Date of Patent: April 22, 2014
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Young-Hoon Sohn, Sang-Kil Lee, Yu-Sin Yang
  • Patent number: 8703391
    Abstract: A polymeric matrix material exhibits low loss at optical frequencies and facilitates the fabrication of all-dielectric metamaterials. The low-loss polymeric matrix material can be synthesized by providing an unsaturated polymer, comprising double or triple bonds; partially hydrogenating the unsaturated polymer; depositing a film of the partially hydrogenated polymer and a crosslinker on a substrate; and photopatterning the film by exposing the film to ultraviolet light through a patterning mask, thereby cross-linking at least some of the remaining unsaturated groups of the partially hydrogenated polymer in the exposed portions.
    Type: Grant
    Filed: November 29, 2011
    Date of Patent: April 22, 2014
    Assignee: Sandia Corporation
    Inventors: Shawn M. Dirk, Roger D. Rasberry, Kamyar Rahimian
  • Patent number: 8703393
    Abstract: A method for fabricating a circuit, by defining a first set of resist features on a substrate and corresponding to a first mask layout, followed by defining a second set of resist features on the substrate corresponding to a second mask layout, wherein the second set adds to the first set for rectifying an error in either mask layout. In another aspect, the method is by defining a first set of resist features on a substrate and corresponding to a first mask layout that has an error, etching the substrate while the first set protects selected regions, defining a second set of resist features on the substrate and corresponding to a second mask layout, followed by etching the substrate to selectively remove portions of the selected regions for rectifying the error.
    Type: Grant
    Filed: June 7, 2011
    Date of Patent: April 22, 2014
    Assignee: MagSil Corporation
    Inventor: Krishnakumar Mani
  • Patent number: 8703406
    Abstract: A method of forming a master from smaller originals is provided for use in replicating molecular transfer lithography (M×L) templates, cured polymer films for imprinting molds or cured polymer films for photonic applications. A coating layer on a base substrate is successively patterned in two or more areas using dissoluble conformal templates created from original master patterns, wherein areas not being patterned with a template at any given stage of the process are protected with photoresist and templates applied to open areas also partially overlap the resist-protected areas. Overlapping minimizes seam formation in the overall pattern. Templates have etch-resistant functional material that adheres to the coating layer on the base substrate. After dissolving the template to leave only the functional material in the pattern of the original master, etching of the coating layer transfers the pattern to the etched coating layer of the base substrate.
    Type: Grant
    Filed: July 12, 2012
    Date of Patent: April 22, 2014
    Assignee: Transfer Devices Inc.
    Inventor: Charles D. Schaper
  • Patent number: 8703401
    Abstract: A pattern-forming method includes forming a resist film on a substrate using a photoresist composition, exposing the resist film, and developing the exposed resist film using a negative developer that includes an organic solvent. The photoresist composition includes (A) a polymer that includes a structural unit (I) including an acid-labile group that dissociates due to an acid, the solubility of the polymer in the developer decreasing upon dissociation of the acid-labile group, and (B) a photoacid generator. The developer includes a nitrogen-containing compound.
    Type: Grant
    Filed: July 6, 2011
    Date of Patent: April 22, 2014
    Assignee: JSR Corporation
    Inventors: Taiichi Furukawa, Hirokazu Sakakibara