Patents Examined by Cynthia Kelly
  • Patent number: 8313885
    Abstract: A heat-sensitive lithographic printing plate precursor comprising on a grained and anodized aluminum support a compound which is capable of converting form a hydrophobic state to a hydrophilic state or vice versa upon exposure to heat, and is represented by the following formula: A-(L)n-B wherein L represents a linking group, n represents 0 or 1 and B represents a thermo-labile group; characterized in that the compound further comprises the group A which is a functional group capable of interacting with the surface of a grained and anodized aluminum support and is selected from the list consisting of a halosilanyl group, an alkoxysilanyl group, a phosphonic acid group or a salt thereof, a phosphoric acid group or a salt thereof, a salicylic acid group or a salt thereof, a boronic acid group or an ester or a salt thereof, an optionally substituted di or tri-hydroxyaryl group, an optionally substituted salicaldoxime group, an optionally substituted salicaldimine group, an optionally substituted hydroxyheteroa
    Type: Grant
    Filed: October 12, 2006
    Date of Patent: November 20, 2012
    Assignee: AGFA Graphics NV
    Inventors: Johan Loccufier, Hieronymus Andriessen
  • Patent number: 8313888
    Abstract: The present invention provides a photosensitive flexographic printing original plate provided with a heat sensitive mask layer having high light blocking effect and durability yet prepared as a thin film. A photosensitive flexographic printing original plate including at least (A) a supporting member, (B) a photosensitive resin layer, (C) a protective layer and (D) a heat sensitive mask layer that are successively laminated, wherein the heat sensitive mask layer (D) contains carbon black and, as a dispersion binder therefor, a butyral resin as well as polyamide containing polar group selected from the group consisting of polyamide containing a tertiary amine group, polyamide containing a quaternary ammonium salt group, polyamide containing an ether group and polyamide containing a sulfonic group.
    Type: Grant
    Filed: December 5, 2008
    Date of Patent: November 20, 2012
    Assignee: Toyo Boseki Kabushiki Kaisha
    Inventors: Kazuya Yoshimoto, Tetsuma Kawakami, Yasuyuki Munekuni, Keiichi Motoi, Yukimi Yawata, Toru Wada
  • Patent number: 8309296
    Abstract: A method for processing a workpiece (10) having a photoresist layer (12) using an exposure device (30) is disclosed. A transparent sheet (20) which allows transmission of light emitted from the exposure device (30) is disposed between an object lens (35a) of the exposure device (30) and the photoresist layer (12), and the photoresist layer (12) is exposed to the light through the transparent sheet (20).
    Type: Grant
    Filed: December 15, 2008
    Date of Patent: November 13, 2012
    Assignee: FUJIFILM Corporation
    Inventor: Yoshihisa Usami
  • Patent number: 8309294
    Abstract: A lithographic printing plate precursor includes: an aluminum support; an intermediate layer; and an image-recording layer, in this order, wherein at least one of the intermediate layer and the image-recording layer contains a compound having an amino group and a functional group capable of interacting with the aluminum support in a molecule.
    Type: Grant
    Filed: June 23, 2008
    Date of Patent: November 13, 2012
    Assignee: Fujifilm Corporation
    Inventors: Shota Suzuki, Yu Iwai, Junji Kawaguchi
  • Patent number: 8304162
    Abstract: A plate carries a solvent-soluble, radiation-polymerizable, oleophilic resin coating non-ionically adhered on a hydrophilic substrate, which can be imagewise exposed to polymerizing radiation and then directly processed by the application of disruptive mechanical forces such as compression or tension to remove the unimaged areas as undissolved particles, using pressurized water and brushing pre-press, or the tack of the ink on-press.
    Type: Grant
    Filed: December 15, 2010
    Date of Patent: November 6, 2012
    Assignee: Anocoil Corporation
    Inventor: Howard A. Fromson
  • Patent number: 8304179
    Abstract: The present disclosure provides a method for manufacturing a semiconductor device. The method includes coating a photoresist on a substrate. The photoresist is exposed to radiation. The radiation exposed photoresist is baked. The radiation exposed and baked photoresist is developed to create an image pattern. The image pattern is treated with a treating material. An ion implantation process is performed to the substrate and the treated image pattern. The image pattern is stripped from the substrate. A carbon atom ratio of the treating material is less than a carbon atom ratio of the photoresist.
    Type: Grant
    Filed: May 11, 2009
    Date of Patent: November 6, 2012
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chien-Wei Wang, Ching-Yu Chang
  • Patent number: 8304171
    Abstract: A plate making method of a lithographic printing plate precursor includes: exposing imagewise a lithographic printing plate precursor including a support and an image-forming layer and containing (A) a compound generating an acid with light or heat, (B) an aromatic hydrocarbon compound or heterocyclic compound substituted with a functional group containing a nitrogen atom and (C) an aromatic aldehyde protected with an acid-decomposable group; and removing an unexposed area of the image-forming layer of the lithographic printing plate precursor by supplying at least one of dampening water and ink on a cylinder of a printing machine.
    Type: Grant
    Filed: September 21, 2009
    Date of Patent: November 6, 2012
    Assignee: Fujifilm Corporation
    Inventor: Tomoya Sasaki
  • Patent number: 8304170
    Abstract: Negative-working imageable elements can be imaged and processed to provide lithographic printing plates, especially with sulfuric acid-anodized aluminum substrates. These elements have an imageable outermost layer that contains two different polymeric binders, a primary polymeric binder is optionally present a discrete particles, and a secondary polymeric binder comprising a poly(vinyl acetate) that has a degree of hydrolysis of less than 60 mol %. These imageable elements can be designed for either off-press or on-press development.
    Type: Grant
    Filed: September 4, 2008
    Date of Patent: November 6, 2012
    Assignee: Eastman Kodak Company
    Inventors: Ting Tao, Eric E. Clark
  • Patent number: 8304175
    Abstract: A patterning method is provided. First, a material layer is formed on a substrate. Thereafter, an ashable layer is formed on the material layer. Afterwards, a patterned transfer layer is formed on the ashable layer, wherein the patterned transfer layer has a critical dimension less than the exposure limit dimension. Further, the ashable layer is patterned using the patterned transfer layer or a complementary layer of the patterned transfer layer as a mask, so as to form a patterned ashable layer. The material layer is then patterned using the patterned ashable layer as a mask.
    Type: Grant
    Filed: March 25, 2009
    Date of Patent: November 6, 2012
    Assignee: MACRONIX International Co., Ltd.
    Inventor: Hong-Ji Lee
  • Patent number: 8298744
    Abstract: A coating material for a photoresist pattern includes a water-soluble polymer and an additive mixed with the water-soluble polymer. The additive may be at least one selected from the group represented by Formulas 1 and 2: wherein X and Y respectively represent one selected from a heteroatom group consisting of N, O and S, and R1 to R8 respectively represent one selected from an electron donating group consisting of an alkyl group and —H, and wherein X and Y respectively represent one selected from a heteroatom group consisting of N, O and S, and R1 to R7 respectively represent one selected from an electron donating group consisting of an alkyl group and —H.
    Type: Grant
    Filed: April 28, 2008
    Date of Patent: October 30, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Joon-Seok Oh, Ju-Young Kim
  • Patent number: 8298750
    Abstract: Positive-working imageable elements having improved sensitivity, high resolution, and solvent resistance are prepared using a water-insoluble polymeric binder comprising vinyl acetal recurring units that have pendant hydroxyaryl groups, and recurring units comprising carboxylic acid aryl ester groups that are substituted with a cyclic imide group. These imageable elements can be imaged and developed to provide various types of elements including lithographic printing plates.
    Type: Grant
    Filed: September 8, 2009
    Date of Patent: October 30, 2012
    Assignee: Eastman Kodak Company
    Inventors: Moshe Levanon, Georgy Bylina, Vladimir Kampel, Marina Rubin, Larisa Postel, Tanya Kurtser, Moshe Nakash
  • Patent number: 8298755
    Abstract: Methods for producing small crystals on islands formed on specialized substrates by, inter alia, subjecting the substrate to a hydrophilic SAMs solution for self-assembling hydrophilic SAMs on certain portions of the substrate surface and subjecting the substrate to a hydrophobic SAMs solution for self-assembling hydrophobic SAMs on certain other portions of the substrate surface.
    Type: Grant
    Filed: July 28, 2008
    Date of Patent: October 30, 2012
    Assignee: Illinois Institute of Technology
    Inventors: Allan S. Myerson, In Sung Lee
  • Patent number: 8293450
    Abstract: Briefly described, embodiments of this disclosure include, coating layers image recording media, and methods for forming an image.
    Type: Grant
    Filed: November 28, 2006
    Date of Patent: October 23, 2012
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Vladek Kasperchik, Susan E. Bailey
  • Patent number: 8283111
    Abstract: A method of patterning a substrate using a dual-tone development process is described. The patterning method comprises forming a layer of radiation-sensitive material on a substrate, wherein the layer of radiation-sensitive material comprises a dual tone resist. Thereafter, the patterning method comprises performing one or more exposures of the layer of radiation-sensitive material to one or more patterns of radiation, wherein at least one of the one or more exposures comprises using a mask having a dual-tone mask pattern region configured for printing dual tone features and a half-tone mask pattern region configured for printing half-tone features. Furthermore, the half-tone mask pattern region is optimized for use with the dual tone resist.
    Type: Grant
    Filed: December 15, 2008
    Date of Patent: October 9, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Carlos A. Fonseca, Mark Somervell, Steven Scheer
  • Patent number: 8283107
    Abstract: An imageable element can be imaged using non-ablative processes. This element has a non-silicone, non-crosslinked layer contiguous to and under an ink-repelling crosslinked silicone rubber layer. These elements can be used for providing lithographic printing plates useful for waterless printing (no fountain solution). Processing after imaging is relatively simple with either water or an aqueous solution consisting essentially of a surfactant or mechanical means to remove the crosslinked silicone rubber layer and a minor portion of the non-silicone, non-crosslinked layer in the imaged regions.
    Type: Grant
    Filed: June 5, 2008
    Date of Patent: October 9, 2012
    Assignee: Eastman Kodak Company
    Inventors: Ophira Melamed, Jianbing Huang, Efrat Konstantini
  • Patent number: 8283101
    Abstract: Single- and multi-layer positive-working imageable elements include an ink receptive outer layer that includes inorganic, non-metallic, inert discrete particles, such as nano-sized silica, aluminum oxide, or titanium dioxide particles. The presence of these particles in the outermost layer improves the abrasion and scratch resistance of the elements.
    Type: Grant
    Filed: August 30, 2007
    Date of Patent: October 9, 2012
    Assignee: Eastman Kodak Company
    Inventors: Gerhard Hauck, Celin Savariar-Hauck
  • Patent number: 8278022
    Abstract: Provided are a novel positive resist composition that includes a low molecular weight material as a base material component, and a method of forming a resist pattern using the positive resist composition. A positive resist composition including: a base material component (A) that exhibits increased solubility in an alkali developing solution under the action of acid; and an acid generator component (B) that generates acid upon exposure, wherein the base material component (A) comprises a compound (A1) in which either a portion of, or all of, the hydrogen atoms of hydroxyl groups (—OH) within a phenolic compound (I) described below have been substituted with a group containing an acid dissociable, dissolution inhibiting group: the phenolic compound (I) including 4 triphenylmethane structures, and a tetravalent linking moiety that links the 4 triphenylmethane structures, wherein at least one of the 4 triphenylmethane structures has at least one phenolic hydroxyl group.
    Type: Grant
    Filed: June 18, 2009
    Date of Patent: October 2, 2012
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Takeyoshi Mimura, Makiko Irie
  • Patent number: 8278029
    Abstract: A stamper production method includes: a stamper forming step of producing, by electroplating processing using a matrix in which a pit string constituted of a concave pit is formed on an inorganic resist layer based on recording information, a stamper on which a convex pit corresponding to the concave pit is formed; and an etching step of carrying out etching processing on the stamper so that a reduction ratio of a pit height of a short pit becomes larger than that of a long pit regarding the convex pit of the stamper.
    Type: Grant
    Filed: January 19, 2010
    Date of Patent: October 2, 2012
    Assignee: Sony Corporation
    Inventor: Kensaku Takahashi
  • Patent number: 8273520
    Abstract: The present invention provides a resin composition for laser engraving containing at least an acetylene compound and a binder polymer, a relief printing plate precursor for laser engraving using the same, a relief printing plate, and a method for producing a relief printing plate.
    Type: Grant
    Filed: January 28, 2009
    Date of Patent: September 25, 2012
    Assignee: FUJIFILM Corporation
    Inventor: Atsushi Sugasaki
  • Patent number: 8268530
    Abstract: A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under the action of acid and an acid generator component (B) which generates acid upon exposure, wherein the base component (A) includes a polymeric compound (A1) having a structural unit (a0) containing an acid-dissociable, dissolution-inhibiting group, and the acid-dissociable, dissolution-inhibiting group has a 1,3-dioxole skeleton.
    Type: Grant
    Filed: April 19, 2010
    Date of Patent: September 18, 2012
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Yoshiyuki Utsumi, Jun Iwashita