Patents Examined by David A Hopkins
  • Patent number: 10467363
    Abstract: A fault simulation system that has a simulation unit comprising an ECU model including an element fault model made to have a fault by a time setting or external command and all or a portion of a sensor model, actuator model, vehicle model, and driver model and can evaluate vehicle behavior at the time of an element fault according to driving operation based on a set travel scenario, wherein the passage time, vehicle behavior, driving operation, and the like, at each point on a course are determined through non-fault simulation and on the basis of that information, an element fault is inserted according to a fault time setting or fault command for the element fault model.
    Type: Grant
    Filed: October 5, 2015
    Date of Patent: November 5, 2019
    Assignee: HITACHI AUTOMOTIVE SYSTEMS, LTD.
    Inventors: Akihiko Hyodo, Yasuo Sugure, Shogo Nakao, Yoshinobu Fukano
  • Patent number: 10402919
    Abstract: A method for estimating growth stage threshold values for a specific hybrid seed at a specific geo-location using historical growth stage data and observed growth stage data comprises using a server computer system, storing a historical crop growth model of one or more hybrid seeds measured from one or more fields over a particular period of time. The historical crop growth model includes growth stage threshold estimates for one or more hybrid seeds. The server computer system receives, via a network, one or more digital measurement values specifying one or more observed growth stage values for a particular hybrid seed at a particular field over a particular period of time. The server computer system transforms the growth stage thresholds into growth stage duration values for the historical crop data and the observed crop data.
    Type: Grant
    Filed: November 10, 2016
    Date of Patent: September 3, 2019
    Assignee: The Climate Corporation
    Inventors: Marian Farah, Jeffrey Gerard
  • Patent number: 10318657
    Abstract: A system and method is provided that facilitates miter and notch identification for pattern sew line generation. A processor of the system may be configured to access a pattern data that defines a flat shape with cut lines corresponding to locations at which the shape is cut out of a material. Based on the pattern data, the processor may generate a computer-aided-design (CAD) model that includes a plurality of curves that define boundary edges of an object that corresponds to the shape defined by the pattern data. In addition, the processor may automatically identify portions of the boundary edges that correspond to alignment guides including at least one miter alignment guide, notch recess alignment guide, notch projection alignment guide, or combination thereof.
    Type: Grant
    Filed: September 30, 2016
    Date of Patent: June 11, 2019
    Assignee: Siemens Product Lifecycle Management Software Inc.
    Inventors: Aarcus Kang, Marc Attar, Fredrick Pennachi