Abstract: Provided is a fabrication method for a functional surface that has self-cleaning ability and superhydrophilic anti-reflective property, which includes a) arranging a plurality of beads having a sphere shape on a surface of a transparent substrate; b) forming a predetermined inter-bead gap by etching the plurality of beads; c) forming a surface unevenness on the surface of the substrate by etching the substrate using the plurality of the beads having the predetermined gap as an etching mask; d) removing the plurality of the beads from the surface of the substrate; and e) forming a photocatalytic layer or a compound layer having a surface tension of 18 to 28 N/m on the surface of the substrate formed with the surface unevenness.

Abstract: A method of treating a surface of at least one part by individual sources of an electron cyclotron resonance plasma is characterized by subjecting the part(s) to at least one movement of revolution with regard to at least one fixed linear row of elementary sources. The linear row or rows of elementary sources are disposed parallel to the axis or axes of revolution of the part or parts.

Abstract: A method of forming carbon nanotubes by plasma enhanced chemical vapor deposition using a carbon containing gas plasma, wherein the carbon nanotubes are not formed on a substrate at a temperature 300° C. or above.

Abstract: A method and apparatus for plasma enhanced chemical vapor deposition to an interior region of a hollow, tubular, high aspect ratio workpiece are disclosed. A plurality of anodes are disposed in axially spaced apart arrangement, to the interior of the workpiece. A process gas is introduced into the region. A respective individualized DC or pulsed DC bias is applied to each of the anodes. The bias excites the process gas into a plasma. The workpiece is biased in a hollow cathode arrangement. Pressure is controlled in the interior region to maintain the plasma. An elongated support tube arranges the anodes, and receives a process gas tube. A current splitter provides a respective selected proportion of a total current to each anode. One or more notch diffusers or chamber diffusers may diffuse the process gas or a plasma moderating gas. Plasma impedance and distribution may be controlled using various means.

Abstract: Methods and hardware for depositing ultra-smooth silicon-containing films and film stacks are described. In one example, an embodiment of a method for forming a silicon-containing film on a substrate in a plasma-enhanced chemical vapor deposition apparatus is disclosed, the method including supplying a silicon-containing reactant to the plasma-enhanced chemical vapor deposition apparatus; supplying a co-reactant to the plasma-enhanced chemical vapor deposition apparatus; supplying a capacitively-coupled plasma to a process station of the plasma-enhanced chemical vapor deposition apparatus, the plasma including silicon radicals generated from the silicon-containing reactant and co-reactant radicals generated from the co-reactant; and depositing the silicon-containing film on the substrate, the silicon-containing film having a refractive index of between 1.4 and 2.1, the silicon-containing film further having an absolute roughness of less than or equal to 4.5 ? as measured on a silicon substrate.

Abstract: A clamping ring configured to be coupled to a chamber structure of a plasma processing chamber is disclosed. The clamping ring has a plurality of holes for accommodating a plurality of fasteners. The clamping ring includes a plurality of flanges disposed around an outer periphery of the clamping ring, adjacent flanges of the plurality of flanges being disposed such that a hole of the plurality of holes that is disposed in between the adjacent flanges is about equidistant from the adjacent flanges. The plurality of flanges are configured to mate with the chamber structure. The clamping ring and the flanges are dimensioned such that when the plurality of flanges mate with the chamber structure, recesses between adjacent ones of the plurality of flanges form gaps between the clamping ring and the chamber structure.

Abstract: The invention relates to a method for hot-dip coating hot-rolled steel strip, during which the steel strip passes through a pickling station, a rinsing station, a drying station, a heating furnace and then through a molten bath. The final thickness and the thickness tolerance of the hot-dip coated steel strip are achieved by a controlled thickness reduction in a roll stand in the process line. The achievement of the finished thickness is controlled by at least one thickness measuring unit at the outlet of the roll stand, and deviations upward or downward therefrom are fed back in the form of an actuating signal for actuating the roll stand in order to appropriately increase or decrease the thickness reduction. The invention also relates to an installation for producing a steel strip of the aforementioned type.

Abstract: An engagement head for engaging a porous substrate includes at least two pin sets, each pin set including a plurality of pins arranged in a plurality of parallel pin rows at a predetermined pin angle, wherein pins of immediately neighboring pin rows are arranged such that pin angles for the pins in a pin row are inversely symmetrical to pin angles for the pins in a neighboring pin row. The pins of a pin row move collectively in the same direction when a pin set is extended, which direction is determined by the pin angle of the pin row, whereby neighboring pin rows move in opposite longitudinal directions from one another when the pin set is extended. The pin sets may be extended and retracted in unison by a single actuation source.

Abstract: The present invention relates to a method for improving the corrosion-protecting pre-treatment of metal surfaces and using rinse water in a manner to conserve resources in such a corrosion-protecting pre-treatment, comprising a conversion treatment step using an aqueous composition comprising at least 50 ppm of the elements B, Si, Ti, Zr and/or Hf in the form of water-soluble compounds at a pH value of 3 to 5.5, wherein a minimum fraction of 10 ppm of the elements B, Si, Ti, Zr and/or Hf in the form of water-soluble compounds is present in the last pre-rinse step and a portion of the aqueous composition of the conversion treatment step is contained in the first post-rinse step. The resource-conserving use of the rinse water is accomplished according to the invention by way of a cascaded return of rinse water from the last rinse step to the first rinse step.

Abstract: The invention includes the structure of a multilayer protective coating, which may have, among other properties, scratch resistance, UV absorption, and an effective refractive index matched to a polymer substrate such as polycarbonate. Each layer may contain multiple components consisting of organic and inorganic materials. The multilayer protective coating includes interleaved organic layers and inorganic layers. The organic layers may have 20% or more organic compounds such as SiOxCyHz. The inorganic layers may have 80% or more inorganic materials, such as SiO2, SiOxNy, and ZnO, or mixtures thereof. Each layer of the multilayer protective coating is a micro layer and may have a thickness of 5 angstroms or less in various embodiments. The multilayer protective coating may contain in the order of hundreds or thousands of micro layers, depending upon the design requirement of applications. In each micro layer, the components may have substantially continuous variations in concentration.

Abstract: A method of continuously forming a thin film includes the step of: moving a glass substrate with a thin strip shape having a constant db/2(d+b), where d is a thickness thereof and b is a width thereof in a cross section thereof, within a range from 0.015 to 0.15 through a film depositing region in which a reaction gas is supplied and a temperature is controlled to be high so that the glass substrate is rapidly heated; and moving continuously the glass substrate, immediately after the film depositing region, to pass through a cooling region in which a temperature is lower than that of the film depositing region, so that the glass substrate is rapidly cooled and the thin film formed of a component of the reaction gas is formed on the glass substrate.

Abstract: New and improved microwave plasma assisted reactors, for example chemical vapor deposition (MPCVD) reactors, are disclosed. The disclosed microwave plasma assisted reactors operate at pressures ranging from about 10 Torr to about 760 Torr. The disclosed microwave plasma assisted reactors include a movable lower sliding short and/or a reduced diameter conductive stage in a coaxial cavity of a plasma chamber. For a particular application, the lower sliding short position and/or the conductive stage diameter can be variably selected such that, relative to conventional reactors, the reactors can be tuned to operate over larger substrate areas, operate at higher pressures, and discharge absorbed power densities with increased diamond synthesis rates (carats per hour) and increased deposition uniformity.

Abstract: The invention relates to a method and apparatus for the application of a thin film coating of material onto a surface of an article which is to be exposed to aqueous conditions such as when in the sea or rivers. The invention allows for the formation of a coating which is resistant to fouling and which coating can be formed of materials which have significantly less adverse effect on the quality of the water in which the article is placed in comparison to conventional coating types.

Abstract: A method for production of a substrate having a patterned optical coating on a curved surface is provided. The method includes applying a masking to a sub-area of the curved surface applying an optical coating using a vacuum deposition method, and removing the masking. A coated substrate, which can be produced in particular by the method described above, is also provided. The coated substrate includes a curved surface that is provided with at least one patterned optical coating. The at least one patterned optical coating is provided on at least one sub-area of the curved surface and is missing on at least one adjacent sub-area.

Abstract: A method of producing an organic friction lining includes the steps of producing a liquid friction material pulp placing a fabric into the friction material pulp drying and saturating the friction material pulp together with the fabric placed therein and removing the fabric from the dried friction material.

Abstract: A coating membrane forming method for forming a coating membrane on an object to be coated, the method comprising the steps of: setting the object to be coated for forming a coating membrane thereon in a dipping tank; sending an application liquid for forming the coating membrane into the dipping tank to raise a liquid level of the application liquid till the top of a region for forming the coating membrane thereon in the object to be coated is immersed in the application liquid; and thereafter discharging the application liquid outside the dipping tank to lower the liquid level of the application liquid.

Abstract: The demulsifying cleaning of metallic surfaces which may be contaminated with oil(s) with at least one further nonpolar organic compound, with fat(s), with soap(s), with particulate dirt or with at least one anionic organic compound using an aqueous, alkaline, surfactant-containing bath solutions.

Abstract: A three-dimensionally embossed inscription containing a plurality of interconnected letters is connected, for dimensional stability, to a holding frame during a manufacturing process via supporting elements. After the end of the machining and manufacturing processes, the inscription is separated from the holding frame and has a shape which corresponds to the connected shape on the holding frame.

Abstract: The present invention relates to a device and a method for coating a microstructured and/or nanostructured structured substrate. According to the present invention, the coating is performed in a vacuum chamber. The pressure level in the vacuum chamber is elevated during or after the charging of the vacuum chamber with coating substance.

Abstract: A method of the present invention for producing a calcium phosphate complex including a substrate and calcium phosphate bonded to a surface of the substrate, the method includes the steps of: (a) treating the surface of the substrate; and (b) bonding the calcium phosphate onto the surface of the substrate after the step (a), the step (a) being the step of placing the surface of the substrate in contact with ozone water. Therefore, the method of the present invention makes it possible to bond calcium phosphate and the substrate at a high bonding strength and at a high coverage. In addition, the method of the present invention provides an easy method for producing a calcium phosphate complex.