Patents Examined by Donald R. Valentine
  • Patent number: 6843896
    Abstract: The invention encompasses a method and apparatus for producing high-purity metals (such as, for example, high-purity cobalt), and also encompasses the high-purity metals so produced. The method can comprise a combination of electrolysis and ion exchange followed by melting to produce cobalt of a desired purity. The method can result in the production of high-purity cobalt comprising total metallic impurities of less than 50 ppm. Individual elemental impurities of the produced cobalt can be follows: Na and K less than 0.5 ppm each, Fe less than 10 ppm, Ni less than 5 ppm, Cr less than 1 ppm, Ti less than 3 ppm and O less than 450 ppm.
    Type: Grant
    Filed: June 14, 2002
    Date of Patent: January 18, 2005
    Assignee: Honeywell International Inc.
    Inventors: Guangxin Wang, Daniel M. Hydock, John Lehman
  • Patent number: 6843895
    Abstract: A portable device for the electrochemical processing of liquids which comprises a dielectric casing with cylindrical and coaxially aligned electrodes and an inter-electrode diaphragm partitioning the inter-electrode space into an anode and a cathode chamber, and current lead-ins. The cylindrical diaphragm made of ceramics on the basis of aluminum and zirconium oxides is installed coaxially to the electrodes. The electrodes and diaphragm are tightly fixed to make up an electrode-diaphragm unit whose anode and cathode chambers have elements for inputting and outputting liquids being processed, and the electrode-diaphragm unit itself is tightly fixed within the casing. The casing has ports in which hydraulic connector and an electric connector are tightly installed. Quick-disconnect hydraulic connections are connected on the casing's inner surface with the input and output elements of the electrode-diaphragm unit's anode and cathode chambers.
    Type: Grant
    Filed: June 21, 2002
    Date of Patent: January 18, 2005
    Assignee: Electro-Chemical Technologies Ltd.
    Inventors: Vitold M. Bakir, Svetlana A. Panicheva, Yuri G. Zadorozhni
  • Patent number: 6841046
    Abstract: A system is for supplying a generator with hydrogen, in particular a generator of a power generating plant. The system offers a high level of safety while at the same time making handling easy. The system includes a closed system cycle for carrying water and/or gas and a hydrogen feed line, branching off from the system cycle, for the generator. The system cycle includes an electrolysis unit designed as a membrane electrolyzer.
    Type: Grant
    Filed: October 15, 2002
    Date of Patent: January 11, 2005
    Assignee: Siemens Aktiengesellschaft
    Inventors: Anwer Puthawala, Peter Schönfeld
  • Patent number: 6837978
    Abstract: A method and associated apparatus for electro-chemically depositing a metal film on a substrate having a metal seed layer. The apparatus comprises a substrate holder that holds the substrate. The electrolyte cell receives the substrate in a processing position. The actuator is connected to the substrate holder and adjustably positions the substrate relative to the electrolyte cell. The method involves electro-chemically depositing a metal film on a substrate having a metal seed layer comprising disposing the substrate in an electrolyte cell that is configured to receive the substrate. The method comprises adjustably positioning the substrate relative to the electrolyte cell.
    Type: Grant
    Filed: October 12, 2000
    Date of Patent: January 4, 2005
    Assignee: Applied Materials, Inc.
    Inventors: H. Peter W. Hey, Yezdi N. Dordi, Donald J. K. Olgado, Mark Denome
  • Patent number: 6837981
    Abstract: The invention relates to a method for the electrolytic coating of materials, in particular metallic materials, whereby a chromium alloy is deposited from an electrolyte, comprising at least chromic acid, sulphuric acid, an isopolyanion-forming metal, a short-chain aliphatic sulphonic acid, the salts and/or halo-derivatives thereof and fluorides. According to the invention, an alloy can be deposited, which can comprise a high proportion of isopolyanion-forming metal as a result of the combined addition of the short-chain aliphatic sulphonic acid with the fluorides and is nevertheless smooth and lustrous. In comparison with the alloy coatings known in the state of the art, in particular chrome/molybdenum alloys the above is a definite advantage. Furthermore, the presence of fluorides in particular leads to the above deposited coatings having a significantly higher hardness.
    Type: Grant
    Filed: November 3, 2001
    Date of Patent: January 4, 2005
    Assignee: Enthone Inc.
    Inventor: Helmut Horsthemke
  • Patent number: 6835297
    Abstract: The method for electrolytically refining copper makes use of crude copper as an anode and is characterized in that the temperature of the electrolyte in an electrolytic cell is maintained at a level of not less than 55° C.; that the electrolyte is continuously introduced into the electrolytic cell from the top of the cell, continuously discharged from the bottom of the cell along with slime, the slime is removed from the electrolyte discharged from the electrolytic cell and the electrolyte free of any slime is recirculated in the cell; and that the electrolyte is passed through the space between the electrodes at an average electrolyte velocity sufficient for allowing the electrolyte to flow on the whole surface of the cathode downward or in the direction opposite to that of the upward stream of the electrolyte generated on the cathode surface when the electrolysis is initiated while the electrolyte is in the stationary state.
    Type: Grant
    Filed: June 24, 2002
    Date of Patent: December 28, 2004
    Assignee: Mitsui Mining and Smelting Co., Ltd.
    Inventors: Toshiko Yokota, Susumu Takahashi, Makoto Dobashi, Yoshiaki Kinoshita
  • Patent number: 6835295
    Abstract: An apparatus and method for electrowinning metal from ionic solutions is provided wherein ionic solution is subject to nanofiltration. An electrowinning cell (10) includes a reservoir (12) adapted to receive an ionic solution (14). During operation, metal ions in solution (14) electroplate onto cathode (18). Nanofilter (20) is in fluid communication with the reservoir and receives solution (14) from a location (22) proximate to the cathode (18). Retentate (52) is formed as a first portion (26) of the solution (14) which passes through the membrane (21) of the filter (20). Permeate (54) is formed as a second portion (28) of the solution (14) which passes through the membrane (21) of the filter (20) to a second region (29) on the opposite side of membrane (21) from the first region (27). Permeate (54) has a second concentration of metal ions lower than the first concentration in first portion (26). Retentate (52) is returned to the reservoir (12) to intermix with solution (14).
    Type: Grant
    Filed: November 28, 2001
    Date of Patent: December 28, 2004
    Assignee: Hydromatix, Inc.
    Inventor: Juzer Jangbarwala
  • Patent number: 6835292
    Abstract: A polishing method able to easily flatten unevenness formed on the surface of a film to be polished and able to efficiently polish the film flat while suppressing damage to an interlayer insulating film below the film, comprising, when polishing an object having a film such as an interconnection layer formed burying interconnection grooves formed in an insulating film of a substrate, supplying a polishing solution over the surface to be polished at least substantially parallel to the surface to preferentially remove by polishing the projecting portions of the film and flatten the surface by the shear stress of the processing solution or arranging a cathode member facing the surface and supplying an electrolytic solution containing a chelating agent between the surface and cathode member while supplying voltage between the film and the cathode member to preferentially remove by polishing the projecting portions of the film and flatten the surface by the shear stress of the electrolytic solution, and a polishin
    Type: Grant
    Filed: October 29, 2003
    Date of Patent: December 28, 2004
    Assignee: Sony Corporation
    Inventors: Shuzo Sato, Yuji Segawa, Akira Yoshiq, Takeshi Nogami
  • Patent number: 6835299
    Abstract: An electrochemical machining technique involves moving a cathode (2) towards an anodic workpiece (1). A current is passed through an electrolyte which flows between the cathode (2) and workpiece (1) so as to cause material to be removed electrolytically from the workpiece (1). A vibratory movement is imposed on the cathode (2) and the current passed between the cathode (2) and workpiece (1) is also varied. The vibratory movement may consist of a main sinusoidal oscillation and a secondary ultrasonic vibration, and the current variation is synchronized with the main vibration so that current pulses, and ultrasonic vibration pulses, coincide, with a predetermined small phase shift, with peaks of the main vibration corresponding to the smallest gap between the cathode (2) and workpiece (1).
    Type: Grant
    Filed: September 3, 2002
    Date of Patent: December 28, 2004
    Assignee: Ultra Systems Limited
    Inventor: Boris Tchugunov
  • Patent number: 6821407
    Abstract: An electroplating system includes (a) a phosphorized anode having an average grain size of at least about 50 micrometers and (b) plating apparatus that separates the anode from the cathode and prevents most particles generated at the anode from passing to the cathode. The separation may be accomplished by interposing a microporous chemical transport barrier between the anode and cathode. The relatively few particles that are generated at the large grain phosphorized copper anode are prevented from passing into the cathode (wafer) chamber area and thereby causing a defect in the part.
    Type: Grant
    Filed: August 27, 2002
    Date of Patent: November 23, 2004
    Assignee: Novellus Systems, Inc.
    Inventors: Jonathan D. Reid, Timothy Mark Archer, Thomas Tan Vu, Seshasayee Varadarajan, Jon Henri, Steven T. Mayer, David Sauer, Anita Kang, Gerald Feldewerth
  • Patent number: 6818105
    Abstract: A fluorine gas generating apparatus for generating fluorine gas of high purity by electrolysis of a mixed molten-salt comprising hydrogen fluoride, the fluorine gas generating apparatus comprising an electrolytic cell which is separated into an anode chamber 5 and a cathode chamber 7 by a partition wall 28, and pressure keeping means 50 for supplying gas to the anode chamber 5 and the cathode chamber 7, respectively, to keep an interior of the anode chamber 5 and an interior of the cathode chamber 7 at a certain pressure.
    Type: Grant
    Filed: October 7, 2002
    Date of Patent: November 16, 2004
    Assignee: Toyo Tanso Co., Ltd.
    Inventors: Tetsuro Tojo, Jiro Hiraiwa, Hitoshi Takebayashi, Yoshitomi Tada
  • Patent number: 6818106
    Abstract: A solid material (12′) circumscribing an anode system (10) in an electrolysis apparatus is made from a mixture of cryolite and/or alumina (Al2O3), where the solid material (12′) contacts and surrounds the anodes (14, 14′).
    Type: Grant
    Filed: November 13, 2003
    Date of Patent: November 16, 2004
    Assignee: Alcoa Inc.
    Inventors: LeRoy E. D'Astolfo, Calvin Bates
  • Patent number: 6818119
    Abstract: The invention encompasses a method and apparatus for producing high-purity metals (such as, for example, high-purity cobalt), and also encompasses the high-purity metals so produced. The method can comprise a combination of electrolysis and ion exchange followed by melting to produce cobalt of a desired purity. The method can result in the production of high-purity cobalt comprising total metallic impurities of less than 50 ppm. Individual elemental impurities of the produced cobalt can be follows: Na and K less than 0.5 ppm each, Fe less than 10 ppm, Ni less than 5 ppm, Cr less than 1 ppm, Ti less than 3 ppm and 0 less than 450 ppm.
    Type: Grant
    Filed: June 14, 2002
    Date of Patent: November 16, 2004
    Assignee: Honeywell International Inc.
    Inventors: Guangxin Wang, Daniel M. Hydock, John Lehman
  • Patent number: 6814841
    Abstract: A gas/liquid phase separator includes a fluid inlet, a vapor outlet, a liquid outlet, and first and second valves disposed in fluid communication with the liquid outlet. Both valves are controllable in response to a system pressure and a fluid level in the gas/liquid phase separator. Both valves are further disposed in parallel fluid communication with each other. A method of controlling a liquid level in the phase separator includes sensing an amount of liquid in the phase separator, sensing a system pressure, and selectively opening a valve disposed in fluid communication with the phase separator to drain the liquid.
    Type: Grant
    Filed: April 24, 2002
    Date of Patent: November 9, 2004
    Assignee: Proton Energy Systems, Inc.
    Inventors: A. John Speranza, Andrzej E. Stanek, Angelo A. Morson, Justin D. Baltrucki
  • Patent number: 6811658
    Abstract: A method and apparatus for forming interconnects embedding a metal such as copper (Cu) into recesses for interconnects formed on the surface of a substrate such as a semiconductor substrate. The method includes providing a substrate having fine recesses formed in the surface, subjecting the surface of the substrate to plating in a plating liquid, and subjecting the plated film formed on the surface of the substrate to electrolytic etching in an etching liquid.
    Type: Grant
    Filed: June 27, 2001
    Date of Patent: November 2, 2004
    Assignee: Ebara Corporation
    Inventors: Akihisa Hongo, Naoki Matsuda, Kanji Ohno, Ryoichi Kimizuka
  • Patent number: 6811669
    Abstract: Apparatus and methods are disclosed for electroplating conductive films on semiconductor wafers, wherein field adjustment apparatus is located in a reservoir between a cathode and an anode to influence the electric field used in the plating process. Field adjustment apparatus is presented having one or more apertures, which may be selectively plugged to adjust the electrical fields during plating.
    Type: Grant
    Filed: August 8, 2002
    Date of Patent: November 2, 2004
    Assignee: Texas Instruments Incorporated
    Inventors: David Gonzalez, Jr., Matthew W. Losey
  • Patent number: 6811591
    Abstract: An autonomous pushed liquid recirculation system (APLRS) is installed in a vessel, such as an electroplating tank. It situates around the interior perimeter and adjusts to changes in the level of liquid, maintaining the same location and orientation respective to the liquid's surface. It establishes a current near the surface that pushes liquid across the narrow horizontal dimension of the tank from a front wall to a rear wall. The current serves to push any bubbles resultant from operations within the tank to the rear wall. Over the rear wall is mounted an abbreviated exhaust hood covering only a short width of the surface of the tank along the rear wall. Because the exhaust system has to scavenge only a portion of the surface since all bubbles now burst along the rear wall, a much smaller air handling apparatus may be specified with an attendant savings in energy costs.
    Type: Grant
    Filed: August 20, 2002
    Date of Patent: November 2, 2004
    Assignee: The United States of America as represented by the Secretary of the Army
    Inventors: Kent James Hay, Shaoying Qi
  • Patent number: 6811677
    Abstract: The present invention relates to an electrolytic cell for the production of aluminum comprising an anode and an electrolytic tank where the electrolytic tank comprises an outer shell made from steel and carbon blocks in the bottom of the tank forming the cathode of the electrolytic cells. At least a part of the sidewall of the electrolytic tank consists of one or more evaporation cooled panels, and wherein high temperature, heat resistant and heat insulating material is arranged between the evaporation cooled panels and the steel shell. The invention also includes a method for maintaining a crust on the sidewall of the tank and for recovering heat from the cooling medium inside the panel for transformation into electrical energy.
    Type: Grant
    Filed: May 16, 2003
    Date of Patent: November 2, 2004
    Assignee: Elkem ASA
    Inventors: Jan Arthur Aune, Kai Johansen, Per Olav Nos
  • Patent number: 6811676
    Abstract: An electrolytic cell for producing aluminum from alumina having a reservoir for collecting molten aluminum remote from the electrolysis.
    Type: Grant
    Filed: July 16, 2002
    Date of Patent: November 2, 2004
    Assignee: Northwest Aluminum Technologies
    Inventors: Donald R Bradford, Robert J. Barnett, Michael B. Mezner
  • Patent number: 6802947
    Abstract: An apparatus and method for securing and electrically contacting a substrate on a non-production surface of the substrate. The apparatus includes a substrate holder assembly having a substrate engaging surface formed thereon, the substrate engaging surface being configured to engage a substrate on the non-production surface. The apparatus further includes an electrical contact device positioned on the substrate engaging surface, the electrical contact device including a plurality of radially spaced electrically conductive members configured to electrically communicate with the non-production surface of the substrate positioned on the substrate engaging surface. The method includes depositing a conductive seed layer on a production surface of the substrate, and depositing a backside conductive layer on a portion of the non-production side of the substrate, the backside conductive layer extending around a bevel of the substrate to electrically communicate with the seed layer.
    Type: Grant
    Filed: October 16, 2001
    Date of Patent: October 12, 2004
    Assignee: Applied Materials, Inc.
    Inventors: Donald J. K. Olgado, Michael Wood, Dmitry Lubomirsky