Abstract: A method for reducing or removing organic and/or inorganic contamination from a vacuum system of imaging and analytical devices, wherein at least a portion of the area of the inner surface of the vacuum space of the vacuum system is provided with a photocatalytic layer, at least a portion of this photocatalytic layer being cooled to a temperature in the range of 0 K to 280 K, whereby the photocatalytic layer is afterwards at least partially irradiated by electromagnetic radiation, which activates a photocatalytic reaction of the photocatalytic layer with the adsorbed gases of the atmosphere of the inner vacuum space of the vacuum system, where this reaction decomposes the contaminants, reducing their concentration and/or the concentration of water in the inner vacuum space of the vacuum system.

Abstract: The present invention relates to a wafer transport system and a method of operating the same. The wafer transport system comprises at least one semiconductor apparatus, a track, a transfer device, a positioning device, a carrier and a cleaning device. The wafer transport system transports wafers along the at least one semiconductor apparatus via the carrier riding on the track. The transfer device transfers the wafers from the carrier to the at least one semiconductor apparatus. The positioning device identifies and controls the position of the carrier on the track. The cleaning device maintains the cleanliness of the wafers. The present invention provides advantages for improving the yield rate of a wafer, shortening the fabrication time of a wafer, and offering the flexibility and the extendibility to a wafer transport system.

Abstract: The centrifugal compressor is provided with a casing, a rotating shaft which is supported inside the casing, an impeller which is arranged on the rotating shaft and rotates to compress a fluid, and a washing liquid injection device which injects a washing liquid into a flow path formed by the impeller and the casing. The washing liquid injection device is provided with a plurality of nozzles which are arranged along a circumferential direction of the rotating shaft to inject the washing liquid into the flow path and a plurality of chambers which communicate with each corresponding nozzle among the plurality of nozzles and supply the washing liquid to the corresponding nozzle.

Abstract: An adapter device for use in a reprocessing device for reprocessing surgical instruments. The adapter device including: at least one first fluid attachment, on an inlet side for connection to a coupling device of the reprocessing device; at least one second fluid attachment, on an outlet side for connection to the surgical instrument, the at least one second fluid attachment being adapted geometrically to an attachment of the surgical instrument; and an adapter identification feature that is detectable by the reprocessing device. Also provided is a reprocessing system having a reprocessing device for reprocessing surgical instruments and having the adapter device. The reprocessing device including: the coupling device for connecting to the adapter device; and a detection device which detects, with the adapter device connected to the reprocessing device, the adapter identification feature of the adapter device.

Abstract: A method of disinfecting a readout device having a reader unit that reads an imaging medium, the method comprising: identifying an absence of the imaging medium from the inside of the readout device; and emitting, from a disinfecting element, radiation capable of destroying disease carriers onto an the interior of the readout device when the imaging medium is absent from inside the readout device.

Abstract: Elemental fluorine is often manufactured electrochemically from a solution of KF in hydrogen fluoride and contains varying amounts of HF as impurity. The present invention provides a method for chamber cleaning using F2 which contains more than 0.1% by weight and equal to or less than 10% by weight of HF. Surprisingly, such an F2 is very well suited for the purpose of chamber cleaning. In a preferred embodiment, the F2 which contains more than 0.1% by weight and less than 2.5% by weight of HF is electrolytically produced, cleaned, delivered and used on site, without any pressurizing treatment. Omitting cleaning steps and process and using process conditions leaving a relatively high HF content in the F2 allows at the same time to omit pressurizing steps. The advantage is that less cleaning steps.

Abstract: A tool for scratching a lottery ticket scratch-off system includes a tool for scratching a lottery ticket scratch-off assembly having a downwardly-tapered front surface having a front top portion including an upwardly-curved lip, and at least one aperture, a front central portion having a digit-contoured indented center having at least one light, and a tapered front bottom portion having at least one front-side tapered blade; and a downwardly-tapered back surface having a back top portion, a back central portion, and a tapered back bottom portion having at least one back-side tapered blade.

Abstract: A method for cleaning piping including the steps of supplying an acid to a cleaning water to prepare a cleaning water having pH of 4 or lower, mixing ozone gas to the cleaning water, and passing the cleaning water through the piping to be cleaned, or a cleaning system for piping, the system including a reservoir which retains cleaning water, an acid providing means supplies an acid to the cleaning water, an ozone generation means which generates ozone gas, a circulation flow path including a circulation pump which connects the reservoir and the ozone generation means in the form of a closed circuit, and circulates the cleaning water between the reservoir and ozone generation means, a conduction flow path including a conveying pump which communicates the reservoir and the piping to be cleaned, and conveys the cleaning water retained in the reservoir through the piping to be cleaned.

Abstract: Apparatus and methods are provided whereby a component can be cleaned while the furnace is operational. Additionally, particulates that have accumulated on the component can be collected and retained. The apparatus may include a portable frame, a tubular lance supported by the frame and having a nozzle at a distal end thereof, and a suction generator operatively connected to a proximal end of the lance to generate a suction at the nozzle. Manipulation of the lance to move the nozzle across a component allows accumulated particulates to be removed therefrom through the lance.

Abstract: A method of removing insulation from a building, comprising: providing a vacuum device, a first end of an inlet hose connected to an inlet of the device, and a first end of an exit hose connected to an outlet of the device; providing a bag comprising a sheet of non-porous plastic, heat sealed to form the bag, the bag having inlets spaced out along a top of the bag, and a filter connected to the bag for allowing air to solely escape the bag through the filter; connecting an inlet of the bag to a second end of the exit hose, and operating the vacuum device to suck insulation into the inlet hose, through the vacuum device, and propel the insulation through the exit hose and into the bag so that the insulation flows through the top of the bag in a direction towards a bottom of the bag.

Abstract: A cleaning glove is provided. The cleaning glove is made of leather and may be tanned. The cleaning glove includes an outside surface and an inside surface. The inside surface is formed to receive a hand of a user. The body portion may further include a first side forming a thumb portion and a second side opposite the first side. The present invention includes at least a first side scraper attached to the second side of the body portion. The side scraper includes a rigid material.

Abstract: An apparatus for removing sediment from a pond includes: a handle; a vacuum unit connected to the handle, said vacuum unit having a first opening adapted for receiving material sucked into said opening and a second opening for material sucked into said vacuum unit to exit at a point outside said pond, said vacuum unit being submersible, supported by at least one wheel, and having an aperture for receiving a mixture from a bottom of the pond; a hose associated with said second opening; and a storage container, said storage container having a body and a storage film cartridge adapted to be positioned in said body, said cartridge having storage film therein, said storage film being permeable to water and having a mesh, and a sealing mechanism having an actuator operably connected to said cartridge, wherein actuation of said actuator rotates said cartridge causing said storage film to seal.

Abstract: An endoscope cleaning/disinfecting apparatus includes an endoscope connection section, a liquid supply conduit, a gas feeding conduit, a first gas feeding section, a first exhaust section, and a control section that performs a step of filling the gas feeding conduit with a cleaning liquid, a step of opening the first exhaust section, a step of allowing a gas to flow from the first gas feeding section to the endoscope connection section and feeding a two-phase gas-liquid fluid with which the gas feeding conduit is filled into the conduit of the endoscope and a step of closing the first exhaust section a predetermined time after allowing the gas to flow.

Abstract: Provided is a method for cleaning an ion implanted resist layer or a substrate after an ashing process. A duty cycle for turning on and turning off flows of a treatment liquid using two or more nozzles is generated. The substrate is exposed to the treatment liquid comprising a first treatment chemical, the first treatment chemical with a first film thickness, temperature, total flow rate, and first composition. A portion of a surface of the substrate is concurrently irradiated with UV light while controlling the selected plurality of cleaning operating variables in order to achieve the two or more cleaning objectives. The cleaning operating variables comprise two or more of the first temperature, first composition, first film thickness, UV wavelength, UV power, first process time, first rotation speed, duty cycle, and percentage of residue removal are optimized to achieve the two or more cleaning objectives.

Abstract: Lithography mask repair methods are disclosed. In one embodiment, a method of repairing a lithography mask includes providing a lithography mask, exposing a back side of the lithography mask to vacuum ultraviolet (VUV) energy, and cleaning the lithography mask.

Abstract: A method for cleaning a brush includes inducing a static charge on a surface of a first plate, wherein the first plate comprises at least one of silicon nitride (SixNy) or silicon oxide (SiaOb), wherein a, b, x and y are integers. The method further includes rotating the brush in contact with the surface of the first plate.

Abstract: The present invention relates to a device for cleaning and/or disinfecting surfaces, particularly for cleaning inner surfaces of the toilet bowl. The device comprises an elongated housing connected to a bottle with the cleaning and/or a disinfecting liquid, and a pumping mechanism for pressurizing said liquid composition, and at least one nozzle for the output of said liquid composition, wherein the nozzle is in fluid communication through a conduit of the device with said pumping mechanism. The pumping mechanism is provided at one side of said housing and said at least one nozzle is provided at the opposite side of the housing.

Abstract: A steam cleaning apparatus comprising: a main body having a boiler and a pump; a main power switch; a cleaning head coupled to a main body through a joint; a yoke in the main body or the cleaning head, the yoke having an arm contacting a position sensitive switch so that when the main body is in a non-use position, the position sensitive switch prevents the main switch from supplying power, and when the main body is in an in-use position, the position sensitive switch allows the main switch to provide power.

Abstract: A method for cleaning a port reservoir, the method comprising: providing a port reservoir cleaning system, the system comprising: a trocar comprising a proximal end and distal end, the distal end terminating in a sharp tip, a cannula comprising a proximal end, a distal end and a cannula lumen extending therebetween, and a cleaning member comprising a proximal end, a distal end, a shaft and a cleaning member lumen extending therebetween, wherein a portion of the distal end of the shaft is flexible; advancing the trocar and cannula as an assembly through a septum fluidly sealing the port reservoir; withdrawing the trocar from the cannula lumen; advancing the distal end of the cleaning member through the cannula lumen and into the reservoir; rotating the cleaning member; and supplying negative pressure to a lumen of the cleaning member.

Abstract: The present invention generally provides a processing chamber having shadow frame supports that direct cleaning gas flow to the corners of the chamber. The shadow frame supports are disposed along part of the chamber walls, thus leaving the corners unoccupied. During cleaning, the shadow frame is disposed in a way that it rests on both the substrate support and the shadow frame supports. Therefore, the cleaning gas flowing along the chamber walls is blocked by the shadow frame supports and the cleaning gas is forced to the corners since the shadow frame supports do not extend to the corners.