Abstract: A robot cleaner includes a main body that defines an external appearance of the robot cleaner. The robot cleaner further includes a plurality of dust sensors that are located at different positions on the main body and that are configured to sense dust that is located in a traveling route of the robot cleaner. The robot cleaner further includes a control unit that is configured to control movement and a cleaning operation of the robot cleaner based on sensing data from the plurality of dust sensors.

Abstract: A method for processing a substrate includes arranging the substrate on which a photoresist layer is formed and providing a treatment liquid for removing the photoresist layer on the substrate. The method also includes providing a mist including deionized water or hydrogen peroxide on the substrate to make contact with the treatment liquid so as to increase a temperature of the treatment liquid. Therefore, efficiency of removing the photoresist layer may be improved.

Abstract: A system for processing a solar substrate is provided. The system includes a support structure for supporting a solar substrate. The system also includes a brushing system for selectively removing an interaction layer from an electrode region of the solar substrate.

Abstract: A method of fabricating a cleaning solvent for removing a residue, the method comprising: compiling a database that includes solvents and a set of solvent solubility parameters for a large plurality of perspective solvents; selecting from the large plurality of perspective solvents a small plurality of test solvents; measuring an amount of the residue dissolved by each member of the small plurality of test solvents; calculating a set of solute solubility parameters for the residue by combining solvent solubility parameters of the small plurality of test solvents in proportion to an amount of residue dissolved by each member of the small plurality of test solvents; and mixing at least two solvents from the large plurality of perspective solvents to form a mixture so that a set of solvent solubility parameters for the mixture approximates the set of solute solubility parameters for the residue.

Abstract: The present invention provides a cleaning apparatus for cleaning at least one soiled substrate with a multiplicity of solid particles, the apparatus comprising: an external casing defining the external perimeter of the apparatus, said external casing defining at least an upper internal volume and a lower internal volume; a perforate drum arranged in the upper internal volume and configured for rotation about a horizontal axis, for agitation of the at least one soiled substrate during a cleaning process; a partition sealingly dividing the upper internal volume from the lower internal volume, the partition including a collecting region configured to collect and retain wash liquor and solid particles of said multiplicity of solid particles released from the drum during a cleaning process; a recirculating arrangement configured to transfer particles of said multiplicity of solid particles from said collecting region to said drum.

Abstract: There are described methods and apparatus for operating and/or cleaning a compressor. In an embodiment, a first fluid comprising gas may be passed through the compressor, while the compressor operates to compress the first fluid. A second fluid may be passed through the compressor, the second fluid comprising gas and liquid from at least one well. The second fluid may be passed through the compressor for a limited time period to clean a surface inside the compressor, while the compressor operates to compress the second fluid.

Abstract: A method for cleaning photomasks includes the following steps: provided a cleansing device having a scrubbing unit. The scrubbing unit having a saturated scrubbing surface is use to clean photomasks with the obliquely dispensed fluids. In such a fashion, loosened contaminants are removed. As least one oblique surface is formed on the peripheries of the scrubbing surface to form a channeling region such that fluids can instantly flow away from photomasks after cleaning to prevent re-contamination. The instant disclosure also provides a system for cleaning photomasks.

Abstract: A method of manufacturing a semiconductor device is disclosed. The method includes (a) loading a substrate into a process chamber; (b) processing the substrate by supplying a process gas into the process chamber via a shower head disposed above the process chamber and including a buffer chamber; (c) unloading the substrate from the process chamber; and (d) cleaning the buffer chamber and the process chamber after performing the step (c), wherein the step (d) comprises: (d-1) cleaning the buffer chamber by a plasma generation from a cleaning gas in the buffer chamber by a plasma generation unit including a plasma generation region switching unit; and (d-2) cleaning the process chamber by switching the plasma generation from the cleaning gas in the buffer chamber to a plasma generation from the cleaning gas in the process chamber by the plasma generation region switching unit.

Abstract: Provided is a substrate treatment apparatus. The substrate treatment apparatus includes a load port on which a carrier accommodating a plurality of substrates to which a back-ground wafer is attached to a mounting tape fixed to a frame ring is placed, a plasma treatment unit supplying plasma to treat a top surface of the wafer, and a substrate transfer unit transferring the substrate between the carrier and the plasma treatment unit.

Abstract: A conveyor conveys electrodes edgewise along a path, and may include a conveyor belt for supporting a bottom peripheral edge of each electrode. The conveyor belt may include support cleats and safety stops. A plurality of wash nozzles are positioned adjacent to the path on opposing sides thereof. Wash spray from the nozzles is directed to impinge sides of the electrode. An enclosure for enclosing a washing section associated with the wash nozzles includes an entrance and an exit. An exhaust system may maintain the space within the enclosure at negative pressure. A drying system may be located at the exit of the enclosure and may include a pair of plenums. The plenums may include vertically extending longitudinal slots for drawing air along side surfaces of the electrode, and the plenums may be connected to the exhaust system for venting the air.

Abstract: A special mode has a second rinsing process which supplies a rinsing liquid to a substrate while holding and rotating the substrate with a spin chuck under operating conditions different from those in a first rinsing process in a normal mode. In the second rinsing process, a processing cup is cleaned with the rinsing liquid flown off from the rotating substrate. In the second rinsing process in which the substrate is held by the spin chuck, the rinsing liquid flown off from the substrate is less prone to collide with chuck members. The provision of a mechanism designed specifically for the cleaning of the cup is not required in the special mode. The special mode is a mode executable when a substrate is present inside a chamber, and can be executed in the middle of lot processing.

Abstract: An apparatus is provided that performs continuous cleaning of a surface of a grounded material which is coated with an organic substance. The apparatus includes a plurality of electrodes covered with a dielectric and disposed along the surface of the material. The electrodes are connected to a high-voltage generator using a MOS power transistor connected to a step up transformer to convert low-voltage pulses generated from a low-voltage power supply into high-voltage pulses. The apparatus is configured to provide a pulsed electric field wherein the maximum voltage of the positive pulses U+ is greater than the arc-striking voltage Ua, and the maximum absolute value of the voltage of the negative pulses U? is less than the striking voltage Ua.

Abstract: Method for calibrating a device for measuring back pressure in open-ended chemical reactor tubes, comprising the steps of: providing a device for measuring back pressure in open-ended chemical reactor tubes, including a frame member and a plurality of injector tubes mounted on the frame member with a spacing between the injector tubes; providing a test stand, comprising a frame member; a base supporting said frame member; and a plurality of calibration tubes mounted on the frame member, each of said calibration tubes having an open top and a dosed bottom, with a precision orifice in the dosed bottom to simulate the chemical reactor tubes to be tested; inserting the plurality of injector tubes into the respective calibration tubes; sealing between the injector tubes and the calibration tubes; sending gas through the injector tubes and taking a back pressure reading for each of the injector tubes; and generating correction factors for each injector tube to correct for variations in the back pressure readings.

Abstract: An aqueous cleaning solution that has been previously used to remove deposits from a nuclear steam generator (or other vessel) is reused after being transferred from the steam generator into an external vessel. The spent cleaning solution may be reconditioned and reused in a further cleaning of the same steam generator or a different steam generator. The different cleanings being accomplished by the cleaning solution may be of the same type or different types (e.g., iron oxide removal and/or copper removal).

Abstract: There is provided a system for removing a glued-on label from a wine bottle or other container, comprising in spatial sequence a brushing station for dry-brushing the container surface, a solvent station for applying a liquid solvent for removal of adhesive from the container surface, a container support, a drive for imparting relative motion between the brush and a containers when aligned with the brushing station, and a indexing system for imparting relative motion between the container support and stations whereby each of said containers on said support is brought into alignment and contact with the respective stations for sequential mechanical and solvent-based label removing steps.

Abstract: Method and cleaning device for cleaning a seismic streamer. The cleaning device includes a flexible body having a shape that wraps around a longitudinal axis; a movement-generating device attached to an end portion of the flexible body; and first cleaning elements provided on a first portion of the flexible body and configured to clean the seismic streamer. The flexible body is configured to wrap around the seismic streamer.

Abstract: Techniques are disclosed relating to an apparatus with scraping members for cleaning a geophysical equipment (e.g., a streamer) being towed behind a survey vessel. The apparatus may, in one embodiment, include a housing and a plurality of scraping members that are disposed at least partially outside of the housing. In another embodiment, when the geophysical equipment is being towed behind a survey vessel, portions of the geophysical equipment may be flattened or compressed due to the towing force exerted on the geophysical equipment, and the apparatus of this disclosure may still be used to clean the geophysical equipment. A method is disclosed related to operating an apparatus with a plurality of scraping members and removing debris from a geophysical equipment.

Abstract: A cleaning device for cleaning an interior wall of a container includes a rotatable driveshaft which is supported in a nozzle head mounted for rotation about an axis extending transversely to the driveshaft. A nozzle holder is mounted on the driveshaft has an arm for holding a nozzle for ejecting a liquid under pressure. The driveshaft and/or the nozzle head are reversibly pivotable via a gear mechanism, with an auxiliary drive connected to the gear mechanism for driving the nozzle holder.

Abstract: A device for applying a cleaning fluid to a wheel of a vehicle in a vehicle washing installation using a spray nozzle and a wheel washing brush that is driven in rotation and can be moved by a guide between a rest position remote from a wheel and a cleaning position on the wheel. The device, an associated vehicle washing installation and method each permit economical application of the cleaning fluid matched to the size of the wheels to be cleaned. The method includes the steps of: a) determining the position of the wheel in the washing direction, b) determining the distance of the wheel from the device, c) moving the spray nozzle to the spraying position at the spraying distance from the wheel, d) spraying cleaning fluid onto the wheel using the spray nozzle (4) and moving the spray nozzle along the wheel in the washing direction and e) terminating the spraying operation when the front end of the wheel in the washing direction has been reached.

Abstract: An apparatus and method for recovery and cleaning of broken substrates, especially beneficial for fabrication systems using silicon wafer carried on trays. Removal of broken wafers and particles from within the fabrication system is enabled without requiring disassembly of the system and without requiring manual labor. A placing mechanism moves a suction head to location of the broken substrate and a suction pump coupled to a flexible hose is used to remove the broken pieces. A hood is positioned at the inlet of the suction head, and setback extensions are provided at the bottom of the hood to allow air flow into the inlet and prevent thermal conductance from the tray to the hood. Pins are extendable about the inlet of the suction head to enable breakage of the wafer to smaller pieces for easy removal.