Abstract: The present invention relates to a method for cleaning a pressurized container having at least one chemical contained therein. The pressurized container may be any type of container able to store chemicals under pressure. Preferably, however, the container is a rail tank car. Generally, the method includes: a step of injecting the container with an input gas to create a chemical/input gas mixture; a step of removing the chemical/input gas mixture via a vacuum pump; and a step of injecting the chemical/input gas mixture into a reaction tank to neutralize the chemical. The input gas may be heated nitrogen gas or heated, dry air. The reaction tank may contain a caustic material for reacting with the chemical.

Abstract: The present invention relates to heat curing impregnation sealant compositions, which are readily separable from water upon mixing.

Abstract: The present invention relates to a method of cleaning a container having an amount of liquefied petroleum gas contained therein. The container is first inspected thoroughly for leaks. Heated nitrogen gas is then fed into the container. The heated nitrogen gas may be transported from a nitrogen storage tank to the container via at least one pipe. Liquid nitrogen may be fed into a vaporizer for vaporizing the liquid nitrogen. The nitrogen gas may then be heated via a steamer to expand the nitrogen gas and ensure that no liquid nitrogen enters the container. The heated nitrogen gas may vaporize any liquid liquefied petroleum gas contained therein. Further, the heated nitrogen gas may transport the liquefied petroleum gas to a flare for incineration. The heated nitrogen gas may be added any number of times to reduce the concentration of the liquefied petroleum gas therein to a desired level. The container may then be steam cleaned and opened to enter and thoroughly clean or inspect the inside of the container.

Abstract: A bore cleaner including a first flexible cord having a weighted member attached to a first end, a cleaning tool which is removably attachable to a second end of the first flexible cord in a first bore cleaner assembly, and a second, thicker flexible cord which is removably attachable to the second end of the first flexible cord in a second bore cleaner assembly and removably attachable to the cleaning tool in a third bore cleaner assembly.

Abstract: There is disclosed a scrub cleaning device which can reduce cleaning time and which requires no large-scaled device for transferring a substrate to the next cleaning process.

Abstract: The present invention provides a method of removing a Cu-contamination from a wafer surface having a Cu-based metal region, comprising the step of: carrying out a cleaning process by use of a cleaning solution free of HF and capable of oxidation to the wafer surface for not only removing the Cu-contamination from the wafer surface but also oxidizing the wafer surface to cause the wafer surface to have a hydrophilicity.

Abstract: Provided is a reactive ion etching (RIE) method for use in altering the flatness of a slider, whereby a slider or row of sliders is placed within a RIE apparatus. The apparatus comprises essentially an electrode within a chamber having an inlet and an outlet. The electrode is controlled by a bias power source. A source power is provided to the chamber to generate the plasma, wherein a gas or gas mixture is first introduced to the chamber and the source power is adjusted to maximize the plasma composition of ions and reactive neutral species. The ions and reactive neutral species are generated from reactive chemical species such as CHF3 and other F-containing species. An inert gas such as Argon may also be present. Typically, TiC within the Al2O3 matrix of the slider substrate surface is etched at a faster rate than other substrate species.

Abstract: A method for cleaning a silicon-based substrate in an ammonia-containing solution without incurring any damages to the silicon surface by NH4OH vapor is described. The method can be conducted by first providing a silicon-based substrate that has a silicon surface, then forming a silicon oxide layer of very small thickness, i.e. less than 10 Å, on the silicon surface. The silicon-based substrate can then be cleaned in an ammonia-containing solution without incurring any surface damage to the silicon, i.e. such as the formation of silicon holes. The present invention novel method can be carried out by either adding an additional oxidation tank before the SC-1 cleaning tank, or adding an oxidant to a quick dump rinse tank prior to the SC-1 cleaning process.

Abstract: A method of manufacturing an array of nanostuctures, such as quantum dots, having a controlled diameter and a substrate with an ordered array of nanostructures having a controlled diameter. In a preferred embodiment of the invention, nanoscale features are produced on a substrate by using a porous crystalline protein as a template for preparing an etch/deposition mask having a regular array of nanoscale pores of a diameter different from the protein template. The mask may be used to etch a regular array of nanoscale wells and/or deposit nanoclusters of adatoms on the surface of an underlying substrate. A further embodiment of the invention is a substrate including an ordered array of nanoscale features having a controlled size.

Abstract: Toner xerographically adhered to a material, such as a sheet of paper, may be removed using a solvent-based or solventless approach. The application of ultrasonic tamping, scraping and brushing may aid in removing toner particles. In a solvent-based approach, a solvent may be applied generally or the solvent may be targeted specifically to the toner covered portions of the material to loosen the adhesive securement of the toner to the material. Thereafter, the toner is subjected to a mechanical abrasion using ultrasonic and physical agitation to cause flaking of the toner.

Abstract: A vibrating wafer particle cleaner for cleaning a semiconductor wafer. The cleaner removes particles from the surfaces of the wafer by vibrating the wafer inside an enclosure and passing a filtered air stream at the wafer to flush the particles out of the enclosure.

Abstract: A process and a device for producing a printing tool in which a mask for sectional chemical passivation is applied to the surface of a workpiece that is to be subjected to a chemical surface working. In accordance with one embodiment, the process for producing a printing tool includes the steps of providing a workpiece having a surface which is subjected to a chemical surface working and spot spraying the surface of the workpiece section-by-section with a mask for sectional chemical passivation where the mask is essentially a wax and is sprayed onto the surface of the workpiece by a plurality of nozzles that are controlled with EDP support.

Abstract: A method for etching a pattern within a silicon containing dielectric layer upon a substrate employed within a microelectronics fabrication, employing a plasma activated reactive gas mixture, with layer material etch rate, etch rate ratio and pattern aspect ratio controlled by controlling the gas composition. There is provided a silicon substrate formed upon it a patterned microelectronics layer over which is formed a silicon containing dielectric layer. There is placed the silicon substrate within a reactor chamber equipped with electrodes which is evacuated. There is then filled the reactor chamber with a reactive gas mixture consisting of an oxidizing gas and two reactive gases. There may be optionally included in the reactive gas mixture nitrogen and inert gases for control purposes, but excluded from the reactive gas mixture are oxidizing gases containing carbon and oxygen.

Abstract: A megasonic tank system is provided that employs a monitoring system adapted to monitor power signals reflected from a transducer and to determine cleaning information based on the reflected power signals. The megasonic tank system includes a tank adapted to contain a fluid, a transducer coupled to the tank so as to transmit energy to the fluid, and a power supply coupled to the transducer and adapted to deliver energy thereto.

Abstract: Methods and apparatus are provided for cleaning a thin disc. In accordance with a first aspect, an apparatus is provided that includes a tank adapted to contain a fluid, and at least one support mechanism adapted to support a thin disc such that the thin disc is at least partially submerged in the fluid. The apparatus further includes a plurality of transducers each adapted to produce energy waves in the fluid, and a controller adapted to adjust the energy waves produced by each transducer so as to scan an energy wave maximum along a surface of a thin disc supported by the at least one support mechanism.

Abstract: A method for en masse cleaning of thin polarizing glass devices involving the steps of using a cleaning vessel possessing a vertical side wall, and a porous shelf attached to the vertical side wall to form an annular cavity for receiving a plurality of the thin polarizing glass devices and, exposing the cleaning vessel containing the thin polarizing glass devices to washing, rinsing, drying steps to remove organic and inorganic matter from the surfaces of the polarizing glass devices.

Abstract: The invention provides a method of cleaning probes, capable of simplifying a cleaning process without causing a damage to the probes, and a cleaning system for use in carrying out the method. A cylindrical body supported so as to be opposed to a probe card with probes formed thereon is provided with an ultrasonic vibrator and an ultrasonic wave generation device for causing the ultrasonic vibrator to undergo ultrasonic vibration. By causing the ultrasonic vibrator to undergo ultrasonic vibration by the agency of the ultrasonic wave generation device, a standing wave comprising nodes and antinodes occurring in concentric circles is generated inside the cylindrical body.

Abstract: An efficient residential dishwasher is disclosed. The residential dishwasher comprises a washing chamber, a rack within the washing chamber for holding dishes, a water tank for holding hot water to be used to clean dishes located on the rack, and at least one spray head within the washing chamber for cleaning dishes on the rack. After hot water has been delivered from the water tank to the washing chamber, the spray head sprays hot water to the dishes on the rack for the purpose of cleaning. The water tank will be filled with water from a fresh water line in response to a cooking apparatus being turned on.

Abstract: Multilayer PSA label constructions that achieve a good balance of properties, namely, adhesive performance, convertibility, and laser printer performance, and, optionally, good wet-out on plastic substrates and low haze. The multilayer PSA construction comprising a facestock, a multilayer adhesive coating, and a release liner. The adhesive coating is made of a face side adhesive (FSA) layer comprising a first emulsion acrylic PSA, which is in contact with the inner surface of the facestock, and a liner side adhesive (LSA) layer, comprising a second emulsion acrylic PSA different from the first acrylic PSA, which is in contact with the FSA. The adhesive coating has a coat weight of less than about 26 g/m2 and a flow of less than about 50 &mgr;m at room temperature. The construction exhibits a loop tack value of at least about 3.5 N/25 mm at 5° C. on a polyethylene substrate.

Abstract: An apparatus for identifying and clearing blockages in cooling orifices of an airfoil is described. The apparatus includes a processor for controlling the various functions of the apparatus. Light is directed into a cavity of the airfoil and a detector is used for detecting light passing through the orifices. The processor determines blockages of the orifices by comparing detected light pattern with a predetermined pattern. The apparatus further includes a nozzle controlled by the processor for directing pressurized water to open the blocked orifices.