Patents Examined by Gentle Winter
  • Methods for evaluating advanced wafer drying techniques
    Patent number: 6521050
    Abstract: Methods for evaluating advanced wafer drying techniques are provided. An exemplary method includes applying a solution containing an analytically detectable compound to a substrate prior to a desired drying operation. The method then provides for the inspection and analysis of the substrate for any residue of the analytically detectable compound, the presence of which identifies any regions of the substrate where the drying operation is ineffective. The drying operation is selected, changed, or modified according to the results of the evaluation.
    Type: Grant
    Filed: December 27, 2000
    Date of Patent: February 18, 2003
    Assignee: Lam Research Corporation
    Inventors: Katrina Mikhaylichenko, Vladislav Yakovlev, Mike Ravkin, John M. de Larios
  • Manufacturing method of thin-film magnetic head
    Patent number: 6497825
    Abstract: A method of manufacturing a thin-film magnetic head, includes a first step of forming a second magnetic pole layer (an upper magnetic pole layer) on a magnetic gap layer formed on a first magnetic pole layer (a lower magnetic pole layer) so that the second magnetic pole layer opposes to the first magnetic pole layer via the magnetic gap layer, and a second step of dry etching a part of an upper surface of the first magnetic pole layer surrounding the second magnetic pole layer used as an etching mask to make a width of the dry-etched part of the first magnetic pole layer equal to a width of the second magnetic pole layer. The first step includes shaping at least part of the second magnetic pole layer so that the width of the second magnetic pole layer increases as a throat height becomes large.
    Type: Grant
    Filed: August 14, 2000
    Date of Patent: December 24, 2002
    Assignee: TDK Corporation
    Inventor: Akifumi Kamijima
  • Method for removing an aluminide coating from a substrate
    Patent number: 6494960
    Abstract: A method for removing an aluminide coating from a substrate includes the steps of contacting the surface of the substrate with at least one stripping composition to degrade the coating. The stripping composition includes an aliphatic or aromatic sulfonic acid, and at least one additive. The coating is then removed.
    Type: Grant
    Filed: May 3, 1999
    Date of Patent: December 17, 2002
    Assignee: General Electric Company
    Inventors: Leo Spitz Macdonald, D. Sangeeta, Mark Alan Rosenzweig
  • Method removing residual photoresist
    Patent number: 6422246
    Abstract: A method for removing residual color photoresist material from a substrate after photoresist development. The method washes the substrate with a high-pressure jet of de-ionized water that contains an activated interface agent. A second method of removing the residual photoresist material bombards the substrate with oxygen plasma for a brief period so that the residual photoresist material is polarized and then rinses the substrate with de-ionized water.
    Type: Grant
    Filed: February 29, 2000
    Date of Patent: July 23, 2002
    Assignee: United Microelectronics Corp.
    Inventors: Chi-Fa Ku, Hsiao-Pang Chou