Abstract: An enclosure for using a tile saw is described. The enclosure comprises a rectangular tray having a front, a rear, and two side walls and a bottom surface wherein the bottom surface is inclined from a first height adjacent to the front wall to a second height adjacent to the rear wall wherein the second height is lower with respect to top surfaces of the front, rear, and side walls than the first height wherein the tray is configured to have a tile saw used therein. Two side panels, a rear panel, and a top panel are configured to be joined together to form a waterproof box on three sides and top of the tray so that water used to cool a tile saw blade is not sprayed outside of the waterproof box.

Abstract: A CMP polishing pad for polishing a semiconductor substrate is provided containing a polishing layer that comprises a polyurethane reaction product of a reaction mixture comprising a (i) curative of from 15 to 30 wt. % of an amine initiated polyol having an average of from 3 to less than 5 hydroxyl groups and a number average molecular weight of 150 to 400, and from 70 to 85 wt. % of an aromatic diamine and a (ii) polyisocyanate prepolymer having a number average molecular weight of from 600 to 5,000 and having an unreacted isocyanate content ranging from 6.5 to 11%. The CMP polishing pad has a tunable tan-delta peak temperature at from 50 to 80° C. which has a value of from 0.2 to 0.8 at the tan-delta peak temperature and is useful for polishing a variety of substrates.

Abstract: A method and a grinding machine to implement the method includes, in a single clamping, a machine part is ground. The part is clamped on its ends and has an internal recess for grinding. The internal recess is ground with an internal grinding wheel, wherein the part is rotated between a workpiece headstock and a tailstock, and an external contour is ground by means of a grinding wheel. The part is held on the tailstock by a hollow tailstock sleeve, on the end region of the internal recess, and the internal grinding wheel passes through the hollow tailstock sleeve during grinding. In the grinding machine, a separate grinding spindle head carrying the internal grinding wheel can be included in the region of the tailstock, and can be advanced against the peripheral surface of the internal recess by passing through the hollow tailstock sleeve and the hollow center.

Abstract: A liner system for installation in a rotatable mill shell having an inner side and an opposed outer side, the liner system including one or more lifter bars. The lifter bar includes a body, a channel plate secured to the body and defining a channel axis, including one or more lateral extensions extending transversely from the central portion in relation to the channel axis, and one or more insert elements positioned between the lateral extension and the inner side of the mill shell, for resisting outward movement of the lateral extension toward the inner side. The liner system also includes one or more attachment assemblies, each including a bolt, for securing the lifter bar to the mill shell. The insert elements are configured to maintain the bolt in a predetermined position in which an axis of the bolt is aligned with the channel axis.

Abstract: An abrasive segment can include an inner segment portion, an outer segment portion, and a central segment portion connected thereto. The inner segment portion can include an inner circumferential wall and an outer circumferential wall. Leading and trailing radial sidewalls can extend between the inner circumferential wall and the outer circumferential wall opposite each other. The outer segment portion can include an inner circumferential wall and an outer circumferential wall. Leading and trailing radial sidewalls can extend between the inner circumferential wall and the outer circumferential wall opposite each other. The central segment portion can include a leading radial sidewall and a trailing radial sidewall. The leading radial sidewall of the central segment portion can establish an acute angle, ?, with respect to the outer circumferential wall of the inner segment portion and an obtuse angle, ?, with respect the inner circumferential wall of the outer segment portion.

Abstract: A tank assembly. Said tank assembly comprises a one or more blister assemblies, a shell assembly, a one or more air inlet hoses, a one or more spray equipment and a slurry mixture. Said one or more blister assemblies comprises a first blister assembly and a second blister assembly. Said one or more blister assemblies comprise a one or more draw tubes, a one or more cone flanges, a one or more head assemblies, a one or more shells, a one or more cone assemblies, an air line assembly, a one or more snorkel assemblies, and a separation distance. Said one or more draw tubes comprise a first draw tube and a second draw tube. Said separation distance between said one or more draw tubes is configured to allow said one or more spray equipment to rotate freely on said one or more draw tubes without interfering with one another.

Abstract: The polishing apparatus comprises: a dressing section for dressing a polishing pad; a measuring section for measuring a surface property of the polishing pad; a polishing result measuring section for measuring a polishing result of a work; a storing section for storing correlation data between dressing condition data for dressing the polishing pad, surface property of the polishing pad and polishing results, which are learned by an artificial intelligence; and an input section for inputting an object polishing result. The artificial intelligence performs a first arithmetic process, in which the surface property of the polishing pad corresponding to the object polishing result is inversely estimated on the basis of the correlation data, and a second arithmetic process, in which the corresponding dressing condition is derived on the basis of the surface property of the polishing pad inversely estimated.

Abstract: Embodiments of an auxiliary woodworking component may comprise a board having a first side and a second side and a peripheral side edge defining a shape of the board. At least one dovetail shaped first groove is in the first side of the board and having an opening at the peripheral side edge of the board and the at least one first groove extends in a first direction. At least one dovetail shaped second groove is in the first side of the board and having an opening at the peripheral side edge of the board and the at least one second groove extends in a second direction that is different than the first direction. Each of the first and second dovetail shaped grooves is trackless.

Abstract: A grinding stroke control device for a valve stem grinding apparatus is fixed to a processing machine and provided for gripping a valve stem or a test bar. Using the hand wheel, the dial gauge and the positioning seat can obtain an initial position, then moving the measuring meter of the positioning mechanism along the transverse direction to make sure the valve stem has the right length with a standard valve clearance. By such arrangements, the grinding stroke control device for a stem valve grinding apparatus of the invention can have a less complicated structure and therefore is more convenient to operate.

Abstract: A coupling mechanism which enables a rotating body to follow an undulation of a polishing surface without generating flutter or vibration of the rotating body, and can finely control a load on the rotating body on a polishing surface in a load range which is smaller than the gravity of rotating body is disclosed. The coupling mechanism includes an upper spherical bearing and a lower spherical bearing disposed between a drive shaft and the rotating body. The upper spherical bearing has a first concave contact surface and a second convex contact surface which are in contact with each other, and the lower spherical bearing has a third concave contact surface and a fourth convex contact surface which are in contact with each other. The first concave contact surface and the second convex contact surface are located above the third concave contact surface and the fourth convex contact surface.

Abstract: A method of collectively producing display panels each having an outline a part of which is curved includes a bonded substrate forming process of bonding substrates in a pair one of which has thin film patterns and forming a bonded substrate 50, a layering process of layering multiple bonded substrates 50 via curing resin 60 and curing the curing resin 60, a grinding process of collectively grinding the substrates in a pair and the curing resin 60 that are outside the thin film pattern on each of the bonded substrates 50B that are layered on each other along the outline and collectively forming edge surfaces of the display panels each having the curved outline, and a separation process of separating each of the bonded substrates 50B that are layered on each other from the curing resin 60.

Abstract: The present disclosure generally relates to a substrate support for use in a substrate processing chamber. A roughened substrate support reduces arcing within the chamber and also contributes to uniform deposition on the substrate. A substrate support may have a substrate support body having a surface roughness of between about 707 micro-inches and about 834 micro-inches. The substrate support may have an anodized coating on the substrate support.

Abstract: A method of polishing includes polishing a layer of a substrate, monitoring the layer of the substrate with an in-situ monitoring system to generate signal that depends on a thickness of the layer, filtering the signal to generate a filtered signal, determining an adjusted threshold value from an original threshold value and a time delay value representative of time required for filtering the signal, and triggering a polishing endpoint when the filtered signal crosses the adjusted threshold value.

Abstract: The continuous cutting apparatus includes a guide rail (5), an extruder (3) for extruding and moving forward a series of sintered magnet blocks (1) on the guide rail (5), a holder plate (6) for holding the magnet blocks in place, and a plurality of OD blades (2) for cutoff machining the magnet blocks into magnet pieces. The cutting apparatus is capable of continuously cutoff machining magnet blocks each into a multiplicity of magnet pieces of desired shape and/or size, achieving a significant increase in productivity and ensuring efficient production of magnet pieces.

Abstract: A gripper apparatus for loading workpieces to a grinding system includes a mount, a gas-supply coupler, a gas manifold, pneumatic cylinders, and grippers. The gas-supply coupler is supported by the mount and has a first end that detachably mates with a corresponding coupler attached to an external gas-supply conduit. The gas manifold is supported by the mount and is coupled to a second end of the gas-supply coupler. The pneumatic cylinders are supported by the mount, with each pneumatic cylinder being arranged to receive a supply of gas via the gas manifold. The grippers are respectively attached to the pneumatic cylinders. Each gripper has an opened state and a closed state brought about by controlled actuation of a corresponding pneumatic cylinder. The mount includes openings, with each of the openings being structured to receive a corresponding shaft for attaching the mount to a gantry assembly of the grinding system.

Abstract: There is disclosed an apparatus which can maintain a surface temperature of a polishing pad at a desired target temperature. The apparatus for regulating a surface temperature of a polishing pad, includes: a pad contact member which is contactable with a surface of the polishing pad and which has a heating flow passage and a cooling flow passage formed therein; a heating-liquid supply pipe coupled to the heating flow passage; a cooling-liquid supply pipe coupled to the cooling flow passage; a first flow control valve attached to the heating-liquid supply pipe; a second flow control valve attached to the cooling-liquid supply pipe; a pad-temperature measuring device configured to measure a surface temperature of the polishing pad; and a valve controller configured to operate the first flow control valve and the second flow control valve based on the surface temperature of the polishing pad.

Abstract: An apparatus and a method for cleaning a partial area of a substrate, in particular a photomask, are described.

Abstract: Nonwoven abrasive articles comprise a nonwoven abrasive member having an overlayer composition comprising a fatty acid metal salt disposed thereon adjacent to a working surface. The nonwoven abrasive member comprises abrasive particles adhered to a fiber web by a binder. The abrasive particles may be exposed and/or the nonwoven abrasive member may have suitable frictional properties. Methods of making the same are also disclosed.

Abstract: A handheld multifunction power tool includes a driveshaft, a hub assembly, and a stem. The hub assembly includes an outer hub and an inner hub that is rotatably coupled with the inner hub and rotatable with respect to the outer hub. Rotation of the inner hub relative to the outer hub facilitates selection from among a rotary mode and a random orbital mode.

Abstract: A precision hearts and arrows gemstone cut having an AGS light performance grade of ideal 0 and having an ASET image free or essentially free of green hemisphere light in the peripheral regions of the table facet; and methods for shaping the gemstone to eliminate the green table effect. The green table effect is avoided by using specific ranges of crown mains angles, pavilion mains angles, lower halves lengths, and/or lower halves angles, in accordance with specific values and/or mathematical formulae.