Patents Examined by Gordon Baldwin
  • Patent number: 11680313
    Abstract: Methods for selectively depositing on non-metallic surfaces are disclosed. Some embodiments of the disclosure utilize an unsaturated hydrocarbon to form a blocking layer on metallic surfaces. Deposition is performed to selectively deposit on the unblocked non-metallic surfaces. Some embodiments of the disclosure relate to methods of forming metallic vias with decreased resistance.
    Type: Grant
    Filed: May 5, 2020
    Date of Patent: June 20, 2023
    Inventors: Sang Ho Yu, Lu Chen, Seshadri Ganguli
  • Patent number: 11670522
    Abstract: According to one embodiment, a processing liquid generator capable of improving the reliability of the concentration of generated processing liquid is provided.
    Type: Grant
    Filed: July 27, 2017
    Date of Patent: June 6, 2023
    Inventors: Konosuke Hayashi, Kunihiro Miyazaki
  • Patent number: 11621150
    Abstract: A system includes an electrode. The electrode includes a showerhead having a first stem portion and a head portion. A plurality of dielectric layers is vertically stacked between the electrode and a first surface of a conducting structure. The plurality of dielectric layers includes M dielectric layers arranged adjacent to the head portion and P dielectric portions arranged around the first stem portion. The plurality of dielectric layers defines a first gap between the electrode and one of the plurality of dielectric layers, a second gap between adjacent ones of the plurality of dielectric layers, and a third gap between a last one of the plurality of dielectric layers and the first surface. A number of the plurality of dielectric layers and sizes of the first gap, the second gap, and the third gap are selected to prevent parasitic plasma between the first surface and the electrode.
    Type: Grant
    Filed: February 5, 2019
    Date of Patent: April 4, 2023
    Assignee: Lam Research Corporation
    Inventors: Douglas Keil, Edward J. Augustyniak, Karl Frederick Leeser, Mohamed Sabri
  • Patent number: 11615944
    Abstract: Embodiments of the present disclosure generally relate to a process chamber for conformal oxidation of high aspect ratio structures. The process chamber includes a liner assembly located in a first side of a chamber body and two pumping ports located in a substrate support portion adjacent a second side of the chamber body opposite the first side. The liner assembly includes a flow divider to direct fluid flow away from a center of a substrate disposed in a processing region of the process chamber. The liner assembly may be fabricated from quartz minimize interaction with process gases, such as radicals. The liner assembly is designed to reduce flow constriction of the radicals, leading to increased radical concentration and flux. The two pumping ports can be individually controlled to tune the flow of the radicals through the processing region of the process chamber.
    Type: Grant
    Filed: March 27, 2018
    Date of Patent: March 28, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Christopher S. Olsen, Eric Kihara Shono, Lara Hawrylchak, Agus Sofian Tjandra, Chaitanya A. Prasad, Sairaju Tallavarjula
  • Patent number: 11551930
    Abstract: Embodiments are described herein to reshape spacer profiles to improve spacer uniformity and thereby improve etch uniformity during pattern transfer associated with self-aligned multiple-patterning (SAMP) processes. For disclosed embodiments, cores are formed on a material layer for a substrate of a microelectronic workpiece. A spacer material layer is then formed over the cores. Symmetric spacers are then formed adjacent the cores by reshaping the spacer material layer using one or more directional deposition processes to deposit additional spacer material and using one or more etch process steps. For one example embodiment, one or more oblique physical vapor deposition (PVD) processes are used to deposit the additional spacer material for the spacer profile reshaping. This reshaping of the spacer profiles allows for symmetric spacers to be formed thereby improving etch uniformity during subsequent pattern transfer processes.
    Type: Grant
    Filed: March 12, 2019
    Date of Patent: January 10, 2023
    Assignee: Tokyo Electron Limited
    Inventors: Akiteru Ko, Kazuya Okubo, Hiroyuki Toshima
  • Patent number: 11549177
    Abstract: Methods are disclosed herein for depositing a passivation layer comprising fluorine over a dielectric material that is sensitive to chlorine, bromine, and iodine. The passivation layer can protect the sensitive dielectric layer thereby enabling deposition using precursors comprising chlorine, bromine, and iodine over the passivation layer.
    Type: Grant
    Filed: December 10, 2019
    Date of Patent: January 10, 2023
    Inventors: Tom E. Blomberg, Eva E. Tois, Robert Huggare, Jan Willem Maes, Vladimir Machkaoutsan, Dieter Pierreux
  • Patent number: 11501958
    Abstract: A plasma processing apparatus includes a stage for supporting a target object in a chamber defined by a chamber body. The stage includes a lower electrode, an electrostatic chuck provided on the lower electrode, heaters provided in the electrostatic chuck, and terminals electrically connected to the heaters. A conductor pipe electrically connects a high frequency power supply and the lower electrode and extends from the lower electrode to the outside of the chamber body. Power supply lines supply power from a heater controller to the heaters. Filters partially forming the power supply lines prevent the inflow of high frequency power from the heaters to the heater controller. The power supply lines include wirings which respectively connect the terminals and the filters and extend to the outside of the chamber body through an inner bore of the conductor pipe.
    Type: Grant
    Filed: July 17, 2018
    Date of Patent: November 15, 2022
    Inventors: Naohiko Okunishi, Nozomu Nagashima, Tomoyuki Takahashi
  • Patent number: 11495443
    Abstract: Provided is a filter device including a plurality of coils, a plural of capacitors, and a frame. The coils constitute a plurality of coil groups. Each coil group includes two or more coils. The two or more coils in each coil group are provided such that respective windings of the two or more coils extend spirally about a central axis and respective turns of the two or more coils are sequentially and repeatedly arranged in an axial direction in which the central axis extends. The coil groups are provided coaxially with the central axis. A pitch between the respective turns of the two or more coils of any one coil group among the coil groups is larger than a pitch between the respective turns of the two or more coils of the coil group provided inside the one coil group among the coil groups.
    Type: Grant
    Filed: April 24, 2018
    Date of Patent: November 8, 2022
    Inventors: Naohiko Okunishi, Nozomu Nagashima
  • Patent number: 11488845
    Abstract: In accordance with an exemplary embodiment, a substrate processing apparatus includes: a tube assembly having an inner space in which substrates are processed and assembled by laminating a plurality of laminates, each of which includes an injection part and an exhaust hole; a substrate holder configured to support the plurality of substrates in a multistage manner in the inner space; a supply line connected to one injection part of the plurality of laminates to supply a process gas; and an exhaust line connected to one of a plurality of exhaust holes to exhaust the process gas, and the substrate processing apparatus that has a simple structure and induces a laminar flow of the process gas to uniformly supply the process gas to a top surface of the substrate.
    Type: Grant
    Filed: September 5, 2016
    Date of Patent: November 1, 2022
    Inventors: Cha Young Yoo, Sung Tae Je, Kyu Jin Choi, Ja Dae Ku, Jun Kim, Bong Ju Jung, Kyung Seok Park, Yong Ki Kim, Jae Woo Kim
  • Patent number: 11220742
    Abstract: A method of fabricating a glassy carbon film is described. The method includes forming a soluble layer on a substrate, forming a lift-off stack that includes a lift-off mask layer and a hard-mask layer, and forming a pattern in the lift-off stack to expose a portion of the soluble layer. The exposed portions of the soluble layer are removed to expose a portion of the substrate. A carbon material is over the exposed portion of the substrate. The soluble layer is dissolved in a solvent, and the lift-off stack is lifted-off.
    Type: Grant
    Filed: March 22, 2019
    Date of Patent: January 11, 2022
    Inventors: Steven J. Holmes, Deborah A. Neumayer, Stephen Bedell, Devendra K. Sadana, Damon Farmer, Nathan P. Marchack
  • Patent number: 11177117
    Abstract: The invention relates to a method for pulsed laser deposition including the steps of: providing a target and a substrate facing the target; irradiating a spot on the target with a pulsed laser beam to generate a plasma plume of target material and depositing the plasma plume on the substrate; and smoothing the surface structure of the spot on the target prior to irradiating the spot with a pulsed laser beam.
    Type: Grant
    Filed: March 11, 2019
    Date of Patent: November 16, 2021
    Assignee: Solmates B.V.
    Inventors: Jan Arnaud Janssens, Jan Matthijn Dekkers, Kristiaan Hendrikus Aloysius Böhm, Jeroen Aaldert Heuver
  • Patent number: 11127606
    Abstract: An apparatus comprises a chamber configured to receive a medium. The chamber comprises a first cooled structure having a first surface and a second cooled structure having a first surface. The first surface of the first cooled structure faces the first surface of the second cooled structure and is positioned a predetermined distance therefrom to form a gap, and the gap is configured to receive the medium. The chamber further includes a first gas inlet positioned proximate the center of the first cooled structure, a first slidable structure configured to seal a first side of the chamber when in a closed position, and a second slidable structure, positioned opposite the first slidable structure, and configured to seal a second side of the chamber when in a closed position.
    Type: Grant
    Filed: July 26, 2018
    Date of Patent: September 21, 2021
    Assignee: Seagate Technology LLC
    Inventor: Samuel Lewis Tanaka
  • Patent number: 11120942
    Abstract: A process for production of a multilayer electronic component having an element body wherein a functional part and a conductor part are laminated, using an ejection device wherein ink is electrically charged at an ejection part by applying a voltage and the electrically charged ink is ejected from the ejection part by an electrostatic attraction force, and including a first step of forming a green functional part by using a first ink including a functional particle as the ink, a second step of forming a green conductor part by using a second ink including a conductive particle as the ink, a step of forming a green multilayer body by repeating the first step and the second step, and a step of treating the green multilayer body to obtain the element body.
    Type: Grant
    Filed: July 11, 2017
    Date of Patent: September 14, 2021
    Inventors: Jun Sato, Yukari Wada
  • Patent number: 11059128
    Abstract: The present disclosure generally relates to a system and method for multiple beam laser deposition of thin films wherein separate laser beams are used to ablate material from separate targets for concurrent deposition on a common substrate. The targets may include, but not limited to polymers, organics, inorganics, nanocrystals, solutions, or mixtures of materials. A target may be disposed on a tiltable mount to adjust the direction of the ablation plumes. Multiple ablation modes may be concurrently employed at the various targets, including, but not limited to pulsed laser, MAPLE, IR-MAPLE and other modes. The system may include a camera and processor for plume axis determination and feedback control of the plume axis by controlling a tilt of a target holder. Maple target loading sequences and liquid states are described. Fluorescent image monitoring is described.
    Type: Grant
    Filed: October 14, 2019
    Date of Patent: July 13, 2021
    Assignee: Dillard University
    Inventors: Abdalla Darwish, Sergey Sarkisov
  • Patent number: 11028476
    Abstract: A method and system for coating metallic powder particles is provided. The method includes: disposing an amount of metallic powder particulates within a fluidizing reactor; removing moisture adhered to the powder particles disposed within the reactor using a working gas; coating the powder particles disposed within the reactor using a precursor gas; and purging the precursor gas from the reactor using the working gas.
    Type: Grant
    Filed: July 13, 2017
    Date of Patent: June 8, 2021
    Assignee: Raytheon Technologies Corporation
    Inventors: Ying She, James T. Beals
  • Patent number: 11006529
    Abstract: A circuit forming method where a metal ink is ejected to a planned formation position of a first wiring at an upper face of a base material. Then, the metal ink is baked, and first wiring is formed. Further, a planned connection section of the first wiring and a second wiring is unbaked. The metal-ink is ejected over an upper face of the unbaked metal ink and a planned formation position of the second wiring at the upper face of the base material. Since the wettability of the upper face of the unbaked metal ink and the wettability of the upper face of the base material are equal to each other, the ejected metal ink ejected and the unbaked metal ink are not separated from each other, so that it is possible to properly connect the first wiring and the second wiring to each other.
    Type: Grant
    Filed: June 28, 2016
    Date of Patent: May 11, 2021
    Inventors: Kenji Tsukada, Masatoshi Fujita, Yoshitaka Hashimoto, Tasuku Takeuchi, Akihiro Kawajiri, Masato Suzuki, Katsuaki Makihara
  • Patent number: 10981402
    Abstract: A method for forming a Data Matrix Code or like two dimensional code on a beverage can tab uses a laser having a focal ratio of between 40 and 70 to produce spots having an average diameter of between 200 and 400 microns. The code is smaller than 6 mm by 6 mm, at least 12 modules by 12 modules, and smaller than 21 modules by 21 modules, thereby providing sufficient quantity of unique codes for use with commercial beverage can quantities. Preferably each module is formed by one laser spot. Alternatively, nine spots may be used to form a module.
    Type: Grant
    Filed: May 13, 2016
    Date of Patent: April 20, 2021
    Assignee: Crown Packaging Technology, Inc.
    Inventor: Christopher Paul Ramsey
  • Patent number: 10980136
    Abstract: A method of forming a multi-layered printed circuit board (PCB) may include, with a printing device, delivering a flexible medium to at least one fluid jet printhead. Printing an electrically conductive fluid on the flexible medium may be performed with at least one fluid jet printhead, to form a first conductive layer on the flexible medium. With the at least one fluid jet printhead, an electrically insulating fluid may be printed on the first conductive layer to form at least one insulating layer on the first conductive layer. With the at least one fluid jet printhead, the electrically conductive fluid may be printed on the at least one insulating layer to form a second conductive layer.
    Type: Grant
    Filed: January 17, 2017
    Date of Patent: April 13, 2021
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Adilson Arthur Mohr, Roberto Pereira Silveira
  • Patent number: 10954591
    Abstract: The invention relates to a method for producing a structured coating on a substrate, wherein the method comprises the following steps: providing a substrate having a surface to be coated and producing a structured coating on the surface of the substrate to be coated by depositing at least one evaporation coating material, namely aluminium oxide, silicon dioxide, silicon nitride, or titanium dioxide, on the surface of the substrate to be coated by means of thermal evaporation of the at least one evaporation coating material and using additive structuring. The invention further relates to a coated substrate and a semi-finished product having a coated substrate.
    Type: Grant
    Filed: July 22, 2010
    Date of Patent: March 23, 2021
    Assignee: MSG LITHOGLAS AG
    Inventors: Jürgen Leib, Ulli Hansen, Simon Maus
  • Patent number: 10940809
    Abstract: A process for producing an interior trim part (1) with a decorative layer situated on a first side (S1) thereof and forming a decorative pattern (M) for the interior of a motor vehicle, the process comprising the following steps: (a) formation of at least one cutout configuration (R), defined by a predetermined decorative pattern (M), in a protective layer (120) situated on a first side (S1), which is situated on a first surface (110a) of the shell-shaped base body (110) made of a metallic material, (b) deposition of sinterable decorative material on the first side (S1) in such a way that the decorative material, as an intermediate layer (150), covers at least the area in which the cutout configuration (R) defined by the decorative pattern (M) is formed in the protective layer (120), (c) laser-sintering of the intermediate layer (150) inside the at least one cutout configuration defined by the decorative pattern (M), (d) removal of the sinterable decorative material that is situated outside the at least one
    Type: Grant
    Filed: January 11, 2017
    Date of Patent: March 9, 2021
    Inventors: Maxime Musy, Valentin Geoffroy