Patents Examined by Henry Hu
  • Low equivalent weight polymers
    Patent number: 9711816
    Abstract: Described herein is a composition comprising: a polymer derived from (a) a fluorinated olefin monomer; (b) a highly fluorinated sulfur-containing monomer of the formula: CX1X2?CX3[(CX4X5)w—O—R1—SO2Y] where X1, X2, X3, X4, and X5 are independently selected from H, Cl, or F; w is 0 or 1; R1 is a non-fluorinated or fluorinated alkylene group; and Y is selected from F, Cl, Br, I, or OM, where M is a cation; and (c) a polyfunctional monomer comprising at least two functional groups, wherein the functional groups are selected from the group consisting of: (i) a fluorovinyl ether group, (ii) a fluoroallyl ether group, (iii) a fluorinated olefinic group, and (iv) combinations thereof; articles thereof; and a method of making such polymers.
    Type: Grant
    Filed: July 27, 2012
    Date of Patent: July 18, 2017
    Assignee: 3M Innovative Properties Company
    Inventors: Kai H. Lochhaas, Steven J. Hamrock, Klaus Hintzer
  • Phenol crosslink for sensor membrane
    Patent number: 9700851
    Abstract: Embodiments herein provide a membrane that is a product of a phenol crosslinked with one or more compounds containing an allyl group. The phenol may be electropolymerized with the allyl-containing compounds to form the crosslinked polymer. Suitable allyl-containing compounds include allylphenol, allylalcohol, allylamine, and allylcarbamide. A membrane may have one type of allyl-containing compound, or, alternatively, two or more types of compounds. As used in an analyte sensing device, a membrane formed from a crosslinked phenol may provide improved interference exclusion, peroxide response, stability, and/or solvent resistance.
    Type: Grant
    Filed: May 13, 2011
    Date of Patent: July 11, 2017
    Assignee: Waveform Technologies, Inc.
    Inventors: Yuan Wang, Raeanne Gifford
  • Hydrophobic nanostructured thin films
    Patent number: 9701865
    Abstract: Provided herein are the polymers shown below. The value n is a positive integer. R1 is an organic group, and each R2 is H or a chemisorbed group, with at least one R2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties.
    Type: Grant
    Filed: July 26, 2016
    Date of Patent: July 11, 2017
    Assignee: The United States of America, as represented by the Secretary of the Navy
    Inventors: Walter J. Dressick, Melik C. Demirel
  • High melting PTFE polymers for melt-processing
    Patent number: 9688796
    Abstract: Provided are a tetrafluoroethylene copolymers having a melting point of at least 317° C., a melt flow index (MFI) at 372° C. and a 5 kg load (MFI 372/5) of from about 0.60 g/10 min up to about 15 g/10 min. Also provided are methods of forming a shaped article using the copolymers described above, shaped articles made with those copolymers and compositions containing such copolymers.
    Type: Grant
    Filed: October 20, 2015
    Date of Patent: June 27, 2017
    Assignee: 3M INNOVATIVE PROPERTIES COMPANY
    Inventors: Klaus Hintzer, Harald Kaspar, Ludwig Mayer, Tilman C. Zipplies
  • Amide-linked perfluoropolyether thiol compounds and processes for their preparation and use
    Patent number: 9688649
    Abstract: A perfluoropolyether thiol compound comprises a perfluoropolyether segment, at least one mercapto group (—SH), and at least one intervening divalent carbonylimino moiety (—C(?O)—NR—, wherein R is hydrogen or alkyl). The compound can be produced, for example, by a ring-opening reaction of thiolactones with perfluoropolyether-substituted, primary or secondary amines. The compound can be used, for example, as a polymerization chain transfer agent, as an intermediate for the preparation of functional group-containing fluorochemical derivatives such as disulfides, and as a fluorinated surface treatment.
    Type: Grant
    Filed: October 30, 2014
    Date of Patent: June 27, 2017
    Assignee: 3M Innovative Properties Company
    Inventors: Suresh S. Iyer, Mark J. Pellerite, Chetan P. Jariwala
  • Devices having dielectric layers with thiosulfate-containing polymers
    Patent number: 9691997
    Abstract: A semiconductor device can be prepared with a gate dielectric layer that comprises: (1) a photochemically or thermally crosslinked product of a photocurable or thermally curable thiosulfate-containing polymer that has a Tg of at least 50° C. and that comprises: an organic polymer backbone comprising (a) recurring units comprising pendant thiosulfate groups; and further comprises charge balancing cations, and (2) optionally, an electron-accepting photosensitizer component.
    Type: Grant
    Filed: June 11, 2014
    Date of Patent: June 27, 2017
    Assignee: EASTMAN KODAK COMPANY
    Inventors: Deepak Shukla, Kevin M. Donovan
  • Hyperbranched fluoroelastomer additive
    Patent number: 9688786
    Abstract: The invention pertains to a hyperbranched (per)fluoroelastomer [fluoroelastomer (B)] comprising recurring units derived from a bis-olefin [bis-olefin (OF)] having general formula (I): wherein R1, R2, R3, R4, R5 and R6, equal or different from each other, are H or C1-C5 alkyl; Z is a linear or branched C1-C18 alkylene or cycloalkylene radical, optionally containing oxygen atoms, preferably at least partially fluorinated, or a (per)fluoropolyoxyalkylene radical, said fluoroelastomer (B) having a slope in G? curve such that the ratio: G?100/G?0.01 is of less than 10, when determined at 260° C. according to ASTM D4440 standard, wherein G?100 is the storage modulus at a shear rate of 100 rad/sec and G?0.01 is the storage modulus at a shear rate of 0.01 rad/sec, to compositions comprising the same, and to a process for their manufacture.
    Type: Grant
    Filed: June 7, 2012
    Date of Patent: June 27, 2017
    Assignee: SOLVAY SPECIALTY POLYMERS ITALY S.P.A.
    Inventors: Matteo Fantoni, Giovanni Comino, Marco Apostolo
  • Thermally conductive resin composition and thermally conductive sheet including the same
    Patent number: 9688896
    Abstract: A thermally conductive resin composition containing (A1) a fluorine-based compound having one to two terminal SiH group(s), in which a content of molecules having two such groups is 60 to 100 mole %, (B1) a fluorine-based compound having one to two terminal alkenyl group(s), in which a content of molecules having two such groups is 60 to 100 mole %, (A2) a fluorine-based compound in which a content of molecules having two terminal SiH groups is 0 to 40 mole %, (B2) a fluorine-based compound in which a content of molecules having two terminal alkenyl groups is 0 to 40 mole %, and (C) a thermally conductive filler, and satisfying, in connection with the content of the fluorine-based compounds, relation of [(A1)+(B1)]/[(A2)+(B2)]=20/80 to 80/20, (A1)/(B1)=20/80 to 80/20, and (A2)/(B2)=20/80 to 80/20, as well as a thermally conductive sheet including the same are provided.
    Type: Grant
    Filed: September 30, 2014
    Date of Patent: June 27, 2017
    Assignee: NIPPON VALQUA INDUSTRIES, LTD.
    Inventor: Hirohisa Imada
  • Process for producing fluorinated copolymer
    Patent number: 9682370
    Abstract: Provided is a process for producing a fluorinated copolymer which is capable of providing an ion exchange membrane which can suppress a decrease in current efficiency by impurities in an aqueous alkali chloride solution as a raw material on electrolysis of the alkali chloride aqueous solution. Also provided is a process for producing a fluorinated copolymer that comprises washing a fluorinated copolymer comprising a fluorinated monomer having a carboxylic acid type functional group and a fluorinated olefin, with a washing solvent containing a fluorinated solvent at a temperature of at least 40° C. and at most a boiling point of the washing solvent.
    Type: Grant
    Filed: November 15, 2013
    Date of Patent: June 20, 2017
    Assignee: Asahi Glass Company, Limited
    Inventors: Shintaro Fukunaga, Yukiko Hattori, Kazuo Umemura, Shigeru Aida, Atsushi Tsuji, Toshinori Tomita
  • Composition, polymer thereof, electrode and electrolyte membrane for fuel cell, and fuel cell including the same
    Patent number: 9680156
    Abstract: A composition including a compound having a fluorine functional group, a polymer as a polymerization product of the composition, an electrode and an electrolyte membrane for a fuel cell, which include the composition or the polymer thereof, and a fuel cell including at least one of the electrode and the electrolyte membrane.
    Type: Grant
    Filed: July 6, 2015
    Date of Patent: June 13, 2017
    Assignee: SAMSUNG ELECTRONICS CO., LTD
    Inventors: Seong-woo Choi, Jung-ock Park
  • Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation
    Patent number: 9678425
    Abstract: Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, R1 represents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). R2 and R3 each independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure.
    Type: Grant
    Filed: April 7, 2014
    Date of Patent: June 13, 2017
    Assignee: Central Glass Company, Limited
    Inventors: Haruhiko Komoriya, Shinichi Sumida, Kenjin Inomiya, Takashi Mori, Takamasa Kitamoto, Yusuke Kanto
  • Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation
    Patent number: 9678426
    Abstract: Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, R1 represents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). R2 and R3 each independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure.
    Type: Grant
    Filed: April 7, 2014
    Date of Patent: June 13, 2017
    Assignee: Central Glass Company, Limited
    Inventors: Haruhiko Komoriya, Shinichi Sumida, Kenjin Inomiya, Takashi Mori, Takamasa Kitamoto, Yusuke Kanto
  • Acrylamide-based crosslinking monomers, their preparation, and uses thereof
    Patent number: 9662647
    Abstract: A process for preparing an acrylamide-based crosslinking monomer including reacting in the presence of a catalyst an isocyanate compound containing at least two isocyanate groups with one of acrylic acid and methacrylic acid.
    Type: Grant
    Filed: July 7, 2016
    Date of Patent: May 30, 2017
    Assignee: SALTWORKS TECHNOLOGIES INC.
    Inventors: Xiangchun Yin, Zhongyuan Zhou, Benjamin Sparrow
  • Halogen copolymers comprising at least one repetitive vinyl ether unit having one carbonate pendant group
    Patent number: 9657124
    Abstract: This invention concerns copolymers that may be used for incorporation into electrolytic membranes for lithium generators, comprising at least one vinyl ether repetitive unit comprising a pendant cyclic carbonate group.
    Type: Grant
    Filed: October 6, 2011
    Date of Patent: May 23, 2017
    Assignees: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES, CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE
    Inventors: Hervé Galiano, Bruno Ameduri, Bernard Boutevin, Ali Alaaeddine
  • Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions
    Patent number: 9650451
    Abstract: A fluorine-containing compound represented by the formula 1, where R1 is a methyl group or trifluoromethyl group, each of R2 and R3 is independently a hydrogen atom or a group containing (a) a hydrocarbon group having a straight-chain, branched or ring form and having a carbon atom number of 1-25 or (b) an aromatic hydrocarbon group, the group optionally containing at least one of a fluorine atom, an oxygen atom and a carbonyl bond, l is an integer of from 0 to 2, each of m and n is independently an integer of 1-5 to satisfy an expression of m+n?6, and when at least one of R1, R2 and R3 is in a plural number, the at least one of R1, R2 and R3 may be identical with or different from each other.
    Type: Grant
    Filed: February 24, 2014
    Date of Patent: May 16, 2017
    Assignee: Central Glass Company, Limited
    Inventors: Shinichi Sumida, Haruhiko Komoriya, Kazuhiko Maeda
  • Gate insulator layer for organic electronic devices
    Patent number: 9647222
    Abstract: Embodiments in accordance with the present invention provide for the use of polycycloolefins in electronic devices and more specifically to the use of such polycycloolefins as gate insulator layers used in the fabrication of electronic devices, the electronic devices that encompass such polycycloolefin gate insulator and processes for preparing such polycycloolefin gate insulator layers and electronic devices encompassing such layers.
    Type: Grant
    Filed: August 11, 2015
    Date of Patent: May 9, 2017
    Assignees: Merck Patent GmbH, Promerus LLC
    Inventors: David Christoph Müller, Toby Cull, Pawel Miskiewicz, Miguel Carrasco-Orozco, Andrew Bell, Edmund Elce, Larry F. Rhodes, Kazuyoshi Fujita, Hendra Ng, Pramod Kandanarachchi, Steven Smith
  • Temperature responsive adsorbent having a strong cation exchange group and method for producing the same
    Patent number: 9643173
    Abstract: Provided is a temperature responsive adsorbent prepared by immobilizing a copolymer containing at least N-isopropylacrylamide to a base material surface. The copolymer has at least a strong cation exchange group. In addition, the copolymer contains the strong cation exchange group in an amount of 0.01 to 5 mol % relative to N-isopropylacrylamide in terms of monomer.
    Type: Grant
    Filed: December 19, 2011
    Date of Patent: May 9, 2017
    Assignee: ASAHI KASEI MEDICAL CO., LTD.
    Inventors: Ichiro Koguma, Hiroki Shigematsu, Kazuo Okuyama, Teruo Okano, Yoshikatsu Akiyama, Kenichi Nagase
  • Temperature responsive adsorbent having a strong cation exchange group and method for producing the same
    Patent number: 9643174
    Abstract: Provided is a temperature responsive adsorbent prepared by immobilizing a copolymer containing at least N-isopropylacrylamide to a base material surface. The copolymer has at least a strong cation exchange group. In addition, the copolymer contains the strong cation exchange group in an amount of 0.01 to 5 mol % relative to N-isopropylacrylamide in terms of monomer.
    Type: Grant
    Filed: November 17, 2014
    Date of Patent: May 9, 2017
    Assignee: ASAHI KASEI MEDICAL CO., LTD.
    Inventors: Ichiro Koguma, Hiroki Shigematsu, Kazuo Okuyama, Teruo Okano, Yoshikatsu Akiyama, Kenichi Nagase
  • Interlayer for electronic devices
    Patent number: 9647213
    Abstract: Embodiments in accordance with the present invention provide for the use of polycycloolefins in electronic devices and more specifically to the use of such polycycloolefins as interlayers applied to fluoropolymer layers used in the fabrication of electronic devices, the electronic devices that encompass such polycycloolefin interlayers and processes for preparing such polycycloolefin interlayers and electronic devices.
    Type: Grant
    Filed: August 11, 2015
    Date of Patent: May 9, 2017
    Assignees: Merck Patent GmbH, Promerus LLC
    Inventors: David Christoph Müller, Pawel Miskiewicz, Toby Cull, Piotr Wierzchowiec, Andrew Bell, Edmund Elce, Larry F. Rhodes, Kazuyoshi Fujita, Hendra Ng, Pramod Kandanarachchi, Steven Smith
  • Resilient anion exchange membranes prepared by polymerizing a composition
    Patent number: 9636642
    Abstract: A resilient anion exchange membrane including a homogeneous cross-linked ion-transferring polymer substantially filling pores and substantially covering surfaces of a porous substrate, wherein the resilient anion exchange membrane is prepared by polymerizing a composition including a quaternary ammonium cationic surfactant monomer, a crosslinking monomer including two or more ethylenic groups, a free radical initiator, and a solvent.
    Type: Grant
    Filed: October 16, 2015
    Date of Patent: May 2, 2017
    Assignee: SALTWORKS TECHNOLOGIES INC.
    Inventor: Xiangchun Yin