Abstract: A low voltage power distribution system that provides low voltage DC power to LED light fixtures and provides for backup or redundant power in the event of a failure of the one of the primary power supplies feeding the output channels to the respective LED light fixtures. The system allows for the automatic switching out of a failed power supply and the switching in of a spare power supply to minimize any down time for a output channel in the event of a primary power supply failure.

Abstract: In light source device 60, which is disposed in a component mounter for holding a component by using mounting head 24 and mounting a held component that is the component that has been held on a board, and used when the held component is imaged by imaging device 50, and includes multiple light sources 62; and controller 64 configured to control the multiple light sources, when one or more of the multiple light sources do not emit light, the controller executes light intensity enhancement processing of enhancing an intensity of light emitted by any of the other light sources among the multiple light sources. By executing the light intensity enhancement processing, in a case where any of the multiple light sources fails, it is possible to reduce a possibility that a component mounting operation by the component mounter is stopped.

Abstract: A plasma processing apparatus includes a process container, an electrode arranged inside the process container and applied with desired high frequency power, a member having the electrode, and an embedded member arranged in the member. The embedded member is composed of a first member formed with one or more outer flow paths on an outer periphery of the embedded member, and a second member formed with one or more inner flow paths connected to the one or more outer flow paths by joining with the first member. The one or more outer flow paths and the one or more inner flow paths communicate with each other.

Abstract: To more appropriately adjust the brightness inside a vehicle. Provided is a system including: a first vehicle configured to output, to a server, information regarding illuminance of light incident on a vehicle by associating with information regarding a traveling environment; a second vehicle configured to output information regarding a traveling environment to the server; and the server including a controller configured to generate, based on the information regarding the illuminance of the light incident on the first vehicle, information regarding a sudden-change point that is a point at which a change amount of the illuminance of the light incident on the first vehicle exceeds a prescribed value, and configured to output, based on the information regarding the traveling environment of the second vehicle acquired from the second vehicle, information regarding the sudden-change point to the second vehicle.

Abstract: An impedance matching network including a mixing module. The mixing module receives a plurality admittances based upon at least one parameter sensed from an output which generated by an RF generator. The output signal is a pulsed RF signal having a plurality of states for each pulse and the plurality of admittances correspond to the plurality states. The mixing module generates a virtual admittance determined in accordance with the plurality of admittances adjusted by a gain. The impedance matching module receives the virtual admittance and generates a command to adjust a capacitance of the impedance matching network or a command to adjust a frequency of the output signal in accordance with the virtual admittance.

Abstract: Embodiments provided herein generally include apparatus, e.g., plasma processing systems, and methods for the plasma processing of a substrate in a processing chamber. Some embodiments are directed to a radio-frequency (RF) generation system. The RF generation system generally includes an RF generator, and a vacuum interrupter configured to selectively decouple the RF generator from a bias electrode of a plasma chamber based on detection of a fault condition associated with operation of the plasma chamber.

Abstract: An electronic device including an isolated conductor is provided. The electronic device includes a display panel including a first surface facing a first direction and a second surface facing a second direction, a first printed circuit board which is positioned in the second direction of the display panel and includes a first ground unit, a bracket including a first structure which forms a side surface of the electronic device and a second structure which forms a space in which electronic components are mounted, a wireless communication circuit which is electrically connected to the first metal region, and a second printed circuit board including a second ground unit, wherein the first structure of the bracket includes a first metal region, the second structure of the bracket includes a second metal region, a first non-metal region, and a third metal region extending through one region of the first non-metal region.

Abstract: A semiconductor structure comprises a substrate, a patch of optically tunable material disposed over the substrate, a first electrode coupled to the patch of optically tunable material and a switch providing a current source, and a second electrode coupled to the patch of optically tunable material and a ground voltage. The first electrode and the second electrode are configured to modify a state of the patch of optically tunable material to adjust a reflectivity of the patch of optically tunable material.

Abstract: Remote control devices may control electrical loads and/or load control devices of a load control system without accessing electrical wiring. The remote control device may be mounted over a mechanical switch that is installed in a wallbox. The remote control device may include a control unit and a faceplate assembly. The faceplate assembly may include a mounting frame, an adapter plate, and a faceplate. The mounting frame may be configured to abut a bezel of the mechanical switch such that that the faceplate is spaced away from the bezel of the mechanical switch to enable the mounting ring to extend through respective openings in the adapter plate and the faceplate.

Abstract: A substrate processing apparatus capable of locally controlling a plasma intensity and improving thin film properties and thickness uniformity includes: a power supply unit, a processing unit electrically connected to the power supply unit, and a substrate support unit below the processing unit, wherein the substrate support unit includes a first ground electrode and a second ground electrode.

Abstract: A plasma processing apparatus includes a chamber, substrate support, radio-frequency (RF) power supply, bias power supply, measuring device, and controller. The RF power supply provides RF power to a lower electrode included in the substrate support in the chamber or to an upper electrode. The bias power supply provides RF bias power to the lower electrode. The measuring device measures a frequency of a reflected wave of the RF power returned toward the RF power supply. The controller controls the bias power supply to adjust a power level of the RF bias power to a peak value of absolute values of negative shifts in frequency of the reflected wave from a frequency of the RF power, or controls the RF power supply to modulate the RF power in a cycle obtained based on an occurrence time of the peak of absolute values.

Abstract: System and method for controlling one or more light emitting diodes. For example, the system for controlling one or more light emitting diodes includes a current generator configured to generate a first current flowing through one or more light emitting diodes. The one or more light emitting diodes are configured to receive a rectified voltage generated by a rectifying bridge coupled to a TRIAC dimmer. Additionally, the system includes a bleeder configured to receive the rectified voltage, and a controller configured to receive a sensing voltage from the current generator and output a control signal to the bleeder. The sensing voltage indicates a magnitude of the first current.

Abstract: A control method includes determining a first control signal of a first control unit, determining a second control signal of a second control unit, and controlling a light effect of the illumination device according to a control rule, the first control signal, and the second control signal. The first control signal is used to control an illumination device to generate a first light effect. The second control signal is used to control the illumination device to generate a second light effect.

Abstract: A system for powering an excimer bulb includes a first inductor configured to be coupled to a first terminal of the excimer bulb. The system further includes a first transistor coupled to the first inductor and having an on state configured to allow current to flow through the first inductor and an off state. The system further includes a second transistor configured to be coupled to the first terminal of the excimer bulb and having an on state configured to allow current to flow through the excimer bulb and an off state. The system further includes a controller coupled to the first transistor and the second transistor, and to control operation of the first transistor and the second transistor to power the excimer bulb.

Abstract: A plasma processing apparatus includes: a chamber; first and second matching circuits; a first RF generator generating a first RF pulsed signal including a plurality of first pulse cycles in which each cycle includes first, second, and third periods, and the first RF pulsed signal has first, second, and third power levels in first, second, and third periods, respectively; a second RF generator generating a second RF pulsed signal including a plurality of second pulse cycles in which each cycle includes fourth and fifth periods, and the second RF pulsed signal has fourth and fifth power levels in fourth and fifth periods, respectively; and a third RF generator generating a third RF pulsed signal including a plurality of third pulse cycles in which each cycle includes sixth and seventh periods, and the third RF pulsed signal has sixth and seventh power levels in sixth and seventh periods, respectively.

Abstract: Proposed are techniques for simplifying the process of suppressing an increase in a reflected wave Pr due to IMD. A high-frequency power supply system for providing high-frequency power to a load includes: a bias power supply for supplying a bias power having a first frequency; a source power supply for supplying a high-frequency output having a second frequency higher than the first frequency and being frequency modulated with the first frequency; and a matching device including an impedance matching circuit for acquiring the bias power and the frequency modulated high-frequency output and achieving impedance matching between the source power supply and the load. The source power supply, in response to a trigger signal for timing having the first frequency, detects a reflected wave while causing a modulation start phase and a modulation amount gain to be varied, and determines an optimum modulation start phase and modulation amount gain that minimize the reflected wave.

Abstract: An antenna structure includes a feeding radiation element, a first radiation element, a second radiation element, a shorting element, a first tuner, and a second tuner. The feeding radiation element has a feeding point. The first radiation element is coupled to the feeding radiation element. The first radiation element is coupled through the first tuner to a ground voltage. The feeding radiation element is coupled through the shorting element to the ground voltage. The second radiation element is adjacent to the first radiation element, and is separated from the first radiation element. The second radiation element is coupled through the second tuner to the ground voltage. The feeding radiation element is disposed between the first tuner and the shorting element.

Abstract: The present disclosure is directed to systems and method for adaptive fusion of sensor data from multiple sensors. The method comprises: collecting sensor data generated by a plurality of sensors in an environment; determining the quality of the sensor data generated by each sensor of the plurality of sensors, the quality metric corresponding to a suitability of the sensor data for performing a given task; selecting, via an assessment artificial intelligence program, one or more sensors from the plurality of sensors based on the determined quality metric of the sensor data that yields a desired accuracy for performing the given task; and selecting for each sensor of the plurality of sensors selected, via the assessment artificial intelligence program, a machine learning algorithm from a predetermined set of machine learning algorithms based on the determined quality metric of the sensor data that yields the desired accuracy for performing the given task.

Abstract: An arbitrary current waveform generator operates by oversampling an input clock signal, and decimating the oversampled clock signal to a decimated clock signal. The oversampled clock signal can be provided as a clock signal to a shift register preloaded with digital values corresponding to samples of a selected waveform to provide as output, and the decimated clock signal can be used to maintain phase synchronization with the input clock signal. Digital output of the shift register is provided to a digital to analog converter, output from which may be used to drive a current-controlled electronic circuit element.

Abstract: A drive circuit for providing RF power to a component of a substrate processing system includes a plasma source operating at a first frequency. A load includes the component of the substrate processing system. An impedance network connects the plasma source to the load. A current sensor senses current at an output of the plasma source. A voltage sensor senses voltage at the output of the plasma source. A controller includes a tuned frequency calculator configured to calculate a tuned frequency for the plasma source based on the voltage, the current, and a configuration of the impedance network and to adjust the first frequency based on the tuned frequency.