Abstract: The present invention provides a control device that performs position control of a control target by giving a feedforward manipulated value to the control target, wherein the device obtains, for each of a plurality of positions at which the control target is to be arranged, a measurement result of a first output response of the control target obtained when giving a first manipulated value to the control target, determines a reference value of the first output response, based on the measurement results respectively obtained at the plurality of positions, determines a second manipulated value by arraying a plurality of first manipulated values in time-series based on a relationship between the first manipulated value and the reference value, and sets the feedforward manipulated value based on the second manipulated value.

Abstract: A lithographic apparatus applies a device pattern at multiple fields across a substrate. A height map is decomposed into a plurality of components. A first height map component represents topographical variations associated with the device pattern. One or more further height map components represent other topographical variations. Using each height map component, control set-points are calculated according to a control algorithm specific to each component. The control set-points calculated for the different height map components are then combined and used to control imaging of the device pattern to the substrate. The specific control algorithms can be different from one another, and may have differing degrees of nonlinearity. The combining of the different set-points can be linear. Focus control in the presence of device-specific topography and other local variations can be improved.

Abstract: Disclosed is a process monitoring method, and an associated metrology apparatus.

Abstract: A method of optimizing a lithographic process for semiconductor fabrication includes determining that a semiconductor wafer experienced a photoresist exposure delay. At least one operating parameter of a post exposure baking process is adjusted based on the semiconductor wafer having experienced the photoresist exposure delay. The post exposure baking process is performed on the semiconductor wafer utilizing the adjusted at least one operating parameter.

Abstract: A diagnostic system implements a network including two or more sub-domains. Each sub-domain has diagnostic information extracted by analysis of object data, the object data representing one or more parameters measured in relation to a set of product units that have been subjected nominally to the same industrial process as one another. The network further has at least one probabilistic connection from a first variable in a first diagnostic sub-domain to a second variable in a second diagnostic sub-domain. Part of the second diagnostic information is thereby influenced probabilistically by knowledge within the first diagnostic information. Diagnostic information may include, for example, a spatial fingerprint observed in the object data, or inferred. The network may include connections within sub-domains. The network may form a directed acyclic graph, and used for Bayesian inference operations.

Abstract: An analysis apparatus includes: a storage unit configured to store a learned neural network; an acquisition unit configured to acquire determination image data obtained by capturing an image of a surface in which at least a surface layer of a coating layer stacked on the coating irregularity generated in the coating surface to be determined has been abraded; a determination unit configured to input the determination image data acquired by the acquisition unit to the learned neural network read out from the storage unit and determine the cause of occurrence of the coating irregularity generated in the coating surface to be determined; and an output unit configured to output information regarding the cause of occurrence determined by the determination unit.

Abstract: The present invention provides an exposure apparatus that exposes a substrate via a projection optical system, the apparatus including a supply unit including a first channel to which a first gas containing air is supplied, a second channel to which a second gas higher in oxygen concentration than the first gas is supplied, and a third channel to which a third gas lower in oxygen concentration than the first gas is supplied, and configured to generate a mixture gas by using at least two of the first gas, the second gas, and the third gas, and supply the mixture gas to a space between the substrate and the projection optical system.

Abstract: A substrate holding apparatus that holds a substrate is provided. The apparatus comprises a rotary shaft which rotates about a vertical axis and includes a suction path leading from an upper end of the rotary shaft, and a holding unit which includes a suction hole formed in a rotation center, is fixed at the upper end of the rotary shaft such that the suction hole communicates with the suction path, and holds the substrate by sucking the substrate, wherein a plurality of vent holes for introducing an external gas into a space between the holding unit and the substrate are formed at positions rotationally symmetric with respect to the rotation center of the holding unit with an angle to face a back surface of the substrate placed on the holding unit.

Abstract: A pattern forming apparatus comprising: a rotary drum that includes a cylindrical outer circumferential surface which is curved at a predetermined radius from a predetermined center line, that rotates about the center line in a state in which a part of a sheet substrate is supported in a length direction of the sheet substrate along the outer circumferential surface; a pattern forming part that forms the pattern on the sheet substrate at a first specific position; a scale disk that is fixed to an end portion of the rotary drum in a direction in which the center line extends while being coaxial with the center line and that includes a circular scale; and a first reading mechanism that is arranged to oppose with the scale formed at the outer circumferential surface of the scale disk, that is arranged at substantially same azimuth as an azimuth.

Abstract: A method for determining one or more optimized values of an operational parameter of a sensor system configured to measure a property of a substrate is disclosed. The method includes: determining a quality parameter for a plurality of substrates; determining measurement parameter values for the plurality of substrates using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameter values; and determining the one or more optimized values of the operational parameter based on the comparing.

Abstract: A patterning apparatus, including: a substrate holder constructed to support a substrate; a particle generator configured to generate particles in the patterning apparatus, the particle generator configured to deposit the particles onto the substrate to form a layer of particles on the substrate; and a pattern generator in the patterning apparatus, the pattern generator configured to applying a pattern in the patterning apparatus to the deposited layer of particles.

Abstract: A droplet collection bucket includes a droplet collection tube, a level sensor positioned on the droplet collection tube, a gate valve configured to close a rear portion of the droplet collection tube, a gas supply configured to supply a gas into the rear portion of the droplet collection tube, a heating element wrapping around the droplet collection tube, and a drain tube connecting an interior of the droplet collection tube with an outside of the droplet collection tube.

Abstract: An exposure apparatus including: a substrate holder constructed to support a substrate; a patterning device configured to provide radiation modulated according to a desired pattern, the patterning device including an array of radiation source modules configured to project the modulated radiation onto a respective array of exposure regions on the substrate; and a distributed processing system configured to process projection related data to enable the projection of the desired pattern onto the substrate, the distributed processing system including at least one central processing unit and a plurality of module processing units each associated with a respective radiation source module.

Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.

Abstract: A liquid immersion exposure apparatus includes a liquid immersion member which forms a liquid immersion space under an emitting surface of an optical member. The liquid immersion member includes a first member disposed in a periphery of the optical member, and a second member which is movable relative to the first member and includes a liquid recovery port that recovers at least a portion of liquid in the liquid immersion space. The second member is moved in a direction perpendicular to an optical axis of the optical member so that a relative speed between the second member and an object below the liquid immersion member is smaller than a relative speed between the first member and the object. The second member has an outer surface facing radially outward relative to the optical axis of the optical member, the outer surface does not face toward any surface of the first member.

Abstract: A connection arrangement for connecting an optical component of an optical imaging arrangement to a support unit of a support structure includes: a connecting element unit having a support interface end with support interface section; and a component interface end with a component interface section.

Abstract: An optical element for transmitting radiation includes: a first surface region surrounding an optically used area of the optical element; and a second surface region that adjoins the first surface region. A circumferential edge is formed between the first and second surface regions. The optical element further includes a one-piece film which covers the first surface region, the edge and the second surface region. The film includes a hydrophobic material at least on its side facing away from the first and the second surface regions. An optical assembly includes at least one such optical element. A method produces such an optical element.

Abstract: Embodiments described herein provide a lithographic system having two or more lithographic tools connected to a radiation source using two or more variable attenuation units. In some embodiments, the variable attenuation unit reflects a portion of the received light beam to the lithographic tool attached thereto and transmits a remaining portion of the received light beam to the lithographic tools downstream. In some embodiments, the radiation source includes two or more laser sources to provide laser beams with an enhanced power level and which can prevent operation interruption due to laser source maintenances and repair.

Abstract: An exposure apparatus has a substrate holding member, a first supporting member, a second supporting member, and a driving system. The first supporting member supports the substrate holding member from below. The second supporting member supports the first supporting member from below such that the first supporting member and the second supporting member are capable of moving relative to each other. The driving system moves the substrate holding member, the first supporting member and the second supporting member. The driving system includes a first driving device and a second driving device, the first driving device moving the substrate holding member and the first supporting member in a direction along a predetermined axis, and the second driving device moving the second supporting member in the direction along the predetermined axis.

Abstract: A conveying apparatus for conveying a holding portion that includes a holding surface where the holding portion holds a substrate, the conveying apparatus including a conveying portion configured to convey the holding portion, and a cover member that covers a first surface on an opposite side of the holding surface of the holding portion, and an attaching and detaching portion configured to attach and detach the holding portion to and from the cover member, wherein the cover member comprises a first removing member configured to remove a foreign substance attached to the first surface, wherein the cover member is configured to be fixed to the holding portion while the first surface and the first removing member are in contact with each other, wherein the conveying portion conveys the holding portion and the cover member to a movable moving unit configured to hold the holding portion while having the first surface and the first removing member of the cover member be in contact with each other, wherein the conv