Abstract: A shutter device for use in exposure by a photolithography machine and a method of using the shutter device are disclosed. The device includes a shutter blade (1); a rotating motor (2) for driving the shutter blade (1) to rotate; a controller in electric connection with the rotating motor (2); and a supporter (3) for supporting the rotating motor (2). The shutter blade (1) includes a rotation center (11) and, disposed in correspondence with the rotation center (11), at least one open portion (12) and at least one shielding portion (13). The rotation center (11) is coupled to the rotating motor (2) which drives the shutter blade (1) to rotate so that the shutter device opening and closure are accomplished to enable and disable exposure. The shielding portion (13) includes a hollow portion (131) which significantly reduces the mass of the shutter blade (1), thereby facilitating the control over the rotation of the shutter blade (1).

Abstract: A method and apparatus to provide a plurality of radiation beams modulated according to at least two sub patterns of a pattern using radiation sources, the radiation sources producing radiation beams of at least two spot sizes such that each of the radiation beams having a same spot size of the at least two spot sizes is used to produce one of the at least two sub patterns, project the plurality of beams onto a substrate, and provide relative motion between the substrate and the plurality of radiation sources, in a scanning direction to expose the substrate. A method and apparatus to provide radiation modulated according to a desired pattern using a plurality of rows of two-dimensional arrays of radiation sources, project the modulated radiation onto a substrate using a projection system, and remove fluid from between the projection system and the substrate using one or more fluid removal units.

Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

Abstract: A detection device includes: a crack detection unit to detect a deformation on a surface of a structure from image information on the structure; a step detection unit to detect a step on the surface of the structure from three-dimensional point group information on the structure measured with a laser; and a determination unit to determine a state of the deformation using information on the deformation generated by the crack detection unit and information on the step generated by the step detection unit.

Abstract: According to an embodiment, a method of determining tool mark identity using machine learning may include: obtaining surface height data of at least two tool strip marks by photographing tool strip marks generated using at least two tools with a three-dimensional (3D) microscope; generating a data set by calculating a cross-correlation coefficient for the surface height data of the tool strip marks; separating the data set into a training set for machine learning training and a test set for verifying a machine learning result; performing the machine learning training to determine whether the tool strip marks are identical using the training set; and verifying a result of the machine learning training using the test set.

Abstract: A pattern forming apparatus comprising: a rotary drum that includes a cylindrical outer circumferential surface which is curved at a predetermined radius from a predetermined center line, that rotates about the center line in a state in which a part of a sheet substrate is supported in a length direction of the sheet substrate along the outer circumferential surface; a pattern forming part that forms the pattern on the sheet substrate at a first specific position; a scale disk that is fixed to an end portion of the rotary drum in a direction in which the center line extends while being coaxial with the center line and that includes a circular scale; and a first reading mechanism that is arranged to oppose with the scale formed at the outer circumferential surface of the scale disk, that is arranged at substantially same azimuth as an azimuth.

Abstract: An apparatus for analyzing technological surfaces is provided. The apparatus has a laser scanner, an electronic control and data processing system and a transport system for setting the scanner and analyzed surfaces in a slow relative motion. The scanner is implemented in a compact form and includes a spinning hollow shaft that carries a laser module and a collector of laser radiation scattered on analyzed surfaces. The collected radiation is transmitted to a photodetector through the bore in the hollow shaft. The design of the scanner enables cost effective characterization of analyzed surfaces with high throughput and precision. The portability of the analyzer allows its integration into production equipment for in-situ product inspection or equipment self-diagnostics.

Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.

Abstract: A method includes the following operations. A reference image of a mask having a plurality of mapping marks is acquired. A lithography exposing process is performed by a scanner with the mask to a photoresist layer which is formed on a substrate. Performing the lithography exposing process includes mapping a real-time image of the mask with the reference image of the mask.

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

Abstract: To enable short-time measurement of a displacement at a predetermined position of a measurement object even when the position or the posture of the measurement object is changed. During operation of a displacement measuring apparatus, the position and the posture of a measurement object are determined by using position correction information, and a measurement position is corrected. The corrected measurement position is irradiated with measurement light. The measurement light that is emitted to and is reflected back from the measurement position is received by a light receiver. The light receiver outputs a received-light quantity distribution for displacement measurement, and a displacement at the measurement position is measured on the basis of the received-light quantity distribution.

Abstract: A photolithography method includes dispensing a first liquid onto a first target layer formed over a first wafer through a nozzle at a first distance from the first target layer; capturing an image of the first liquid on the first target layer; patterning the first target layer after capturing the image of the first liquid; comparing the captured image of the first liquid to a first reference image to generate a first comparison result; responsive to the first comparison result, positioning the nozzle and a second wafer such that the nozzle is at a second distance from a second target layer on the second wafer; dispensing a second liquid onto the second target layer formed over the second wafer through the nozzle at the second distance from the second target layer; and patterning the second target layer after dispensing the second liquid.

Abstract: A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the structure having diffractive properties, the apparatus comprising: focusing optics configured to focus illumination radiation comprising a plurality of wavelengths onto the structure; a first detector configured to detect at least part of the illumination radiation which has been diffracted from the structure; and additional optics configured to produce, on at least a portion of the first detector, a wavelength-dependent spatial distribution of different wavelengths of the illumination radiation which has been diffracted from the structure, wherein the first detector is arranged to detect at least a non-zero diffraction order of the illumination radiation which has been diffracted from the structure.

Abstract: A method for discovering the topology of a connected lighting system. The method comprises: receiving a first measurement of a first light source in relation to a first sensor; receiving a second measurement of the first light source in relation to a second sensor; generating a first estimate of the position of the first light source, based on a first angle at the first sensor between (i) a first direction toward a current light source position and (ii) a second direction defined by the first measurement; generating a second estimate of the position of the first light source, based on a second angle at the second sensor between (i) a third direction toward the current light source position and (ii) a fourth direction defined by the second measurement; and generating an updated light source position of the first light source based on the first and second estimates.

Abstract: An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.

Abstract: A control system, of a plurality of heads, acquires grating correction information related to at least two of scales in a first grating group and scales in a second grating group, based on position information of a movable body measured using at least four heads irradiating measurement beams on at least two of the scales and scales. The grating correction information is used to control movement of the movable body using at least three heads irradiating at least two of the scales and scales.

Abstract: The invention relates to a method for detecting the position of a mask holder for photolithographic masks, said method including the following steps: positioning the mask holder with the mask on a measuring table of a measurement apparatus, measuring the mask holder by use of an algorithm, storing the absolute position of the mask holder on the measuring table, and recording and storing at least one reference image.

Abstract: According to one embodiment of the present invention, a terahertz wave concentrating module can comprise: a first lens for changing a terahertz wave, which is emitted while a terahertz Bessel beam penetrates an object to be inspected, so as to have a small angle; and a second lens for concentrating, on a detector, the terahertz wave having passed through the first lens.

Abstract: A system and method for controlling an exposure dose of a light source are disclosed. The system includes an LED light source, a light homogenizer, an energy detection unit and an exposure dose control unit coupled to both the LED light source and the energy detection unit. The energy detection unit includes an energy detector corresponding to the LED light source or the light homogenizer and an energy spot sensor corresponding to a wafer. By using the LED light source capable of producing UV light in lieu of an existing mercury lamp, the system is less hazardous and safer by eliminating the risk of discharging hazardous mercury vapor into the environment when the mercury lamp is broken. Moreover, exposure illuminance of the LED light source can be adjusted and the LED light source can be turned on/off under the control of exposure dose control unit to expose the wafer with high dose control accuracy, without needing to use a variable attenuator or an exposure shutter.

Abstract: An exposure apparatus that exposes a substrate is provided. The apparatus includes a stage configured to hold and move the substrate, and a controller configured to control focus driving of the stage based on a measurement value and a correction value obtained for the focus driving of the stage for a shot region on the substrate. The controller is configured to determine the correction value in accordance with an angle of view at a time of exposure.