Patents Examined by Janet Baxter
  • Patent number: 6740459
    Abstract: A method of designing a chemical amplification type photosensitive composition containing an acid generating agent, wherein the average distance between exposure particles in an exposure area of the photosensitive composition upon pattern exposure of the photosensitive composition or the average distance between the acids generated by the pattern exposure is calculated based on the sensitivity required of the photosensitive composition, and the composition of the photosensitive composition is set so that the diffusion length of the acid generated from the acid generating agent by the pattern exposure is greater than the calculated average distance.
    Type: Grant
    Filed: March 20, 2002
    Date of Patent: May 25, 2004
    Assignee: Sony Corporation
    Inventor: Masaki Yoshizawa
  • Patent number: 6740465
    Abstract: Photothermally sensitive recording sheets for color imaging are disclosed comprising a transparent support sheet having a thermal slip layer disposed on one surface of the support and a heat sensitive image layer on the opposite surface of the support. A second opaque (paper) or transparent (plastic) sheet is laminated to the color-producing layer. The image layer comprises photohardenable microcapsules containing a photopolymerizable or photocrosslinkable compound, a photoinitiator and a dye precursor and a developer material external to the microcapsules. Image-wise exposure of the recording sheet to actinic radiation causes selective photohardening of microcapsules sensitive to that radiation. Heating the resultant exposed recording sheet to a temperature well above the developer melting point by for example a thermal head allows the developer to selectively permeate the non-photohardened capsules resulting in the development of an image, including full color images.
    Type: Grant
    Filed: May 31, 2001
    Date of Patent: May 25, 2004
    Assignee: SiPix Imaging, Inc.
    Inventors: Rong-Chang Liang, Tienteh Chen, Xuan T. Phan, Hsiu-Pin Chang
  • Patent number: 6737228
    Abstract: A black-and-white silver halide photographic film material has been provided, wherein said material has first and second major surfaces, at least one of which is coated with at least one light-sensitive silver halide emulsion layer, overcoated with a protective antistress layer, wherein said emulsion layer(s) have chemically and spectrally sensitized {111} tabular hexagonal emulsion grains or crystals rich in silver bromide in an amount covering at least 50% of the total projective grain surface of all grains, wherein said grains further have an average equivalent volume diameter in the range from 0.3 &mgr;m up to 1.5 &mgr;m and an average grain thickness of less than 0.30 &mgr;m, and an average amount of iodide from 0.05 mole % up to 0.5 mole % based on silver over the whole grain volume, characterized in that said material comprises, in an amount of at least 0.
    Type: Grant
    Filed: May 16, 2002
    Date of Patent: May 18, 2004
    Assignee: AGFA-Gevaert
    Inventors: Kathy Elst, Johan Loccufier
  • Patent number: 6737199
    Abstract: This invention describes methods of using pattern fracture rules to form mask pattern segments and the mask for the mask pattern segments. The mask pattern segments have optical proximity correction and are separated into regular pattern elements and optical proximity correction elements. Regular fracture elements and special fracture elements are used. The special fracture elements are parallel to the regular fracture elements, perpendicular to the regular fracture elements, or both parallel to and perpendicular to the regular fracture elements. The special fracture elements are used to define the regular pattern elements and prevent the formation of resist residue in the completed mask. The optical proximity correction elements are formed using the regular fracture elements.
    Type: Grant
    Filed: January 31, 2000
    Date of Patent: May 18, 2004
    Assignee: Taiwan Semiconductor Manufacturing Company
    Inventor: Ren-Guey Hsieh
  • Patent number: 6727044
    Abstract: A method for producing a lithographic printing plate is disclosed, comprising performing the plate-making by scan exposing a lithographic printing original plate comprising a hydrophilic support having thereon a photosensitive layer containing i) at least one polyurethane resin binder, ii) at least one compound having an addition polymerizable ethylenically unsaturated bond, and iii) at least one photopolymerization initiation system. Also disclosed are a photosensitive composition for use in the photosensitive layer of the lithographic printing original plate.
    Type: Grant
    Filed: April 9, 1999
    Date of Patent: April 27, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kazuhiro Fujimaki, Yasuo Okamoto, Tatsuji Higashi, Tadahiro Sorori
  • Patent number: 6723474
    Abstract: A method of fabricating a diffraction grating by utilizing a single substrate comprises the steps of forming a photosensitive material layer and a light transmission reducing film having a predetermined pattern integrally with each other on the substrate, exposing the photosensitive material layer by exposure irradiation light via the light transmission reducing film, and developing the photosensitive material layer after exposure. It is composed so that the direction of exposure and the direction of development are opposite to each other. It is possible to fabricate a diffraction grating in which each grating is formed on a predetermined substrate at a predetermined pitch and a root portion in a cross-section of each diffraction grating is constricted. In this way, it is possible to reduce or eliminate interfaces, so that the generation of noise light can be effectively suppressed and a diffraction grating having a high diffraction efficiency can be made.
    Type: Grant
    Filed: March 1, 2001
    Date of Patent: April 20, 2004
    Assignee: Fujitsu Limited
    Inventors: Junji Tomita, Fumio Yamagishi
  • Patent number: 6723496
    Abstract: A silver halide photographic material comprising a support having thereon at least one silver halide emulsion layer, wherein the material is contained at least one complex selected from complexes having a compound represented by the following formula (I) as at least one of their respective ligands or complexes having a diketone compound as at least one of their respective ligands: wherein X represents an atom or atomic group bridging two pyridine rings, each of R1 to R4 represents a hydrogen atom or a substituent group, and each of R1′ to R2′ represents a hydrogen atom or a substituent group.
    Type: Grant
    Filed: February 22, 2001
    Date of Patent: April 20, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Tadanobu Sato, Takahiro Matsuno, Tadashi Inaba
  • Patent number: 6723492
    Abstract: A lithographic printing plate precursor comprising a water-resistant support having provided thereon a light-sensitive layer containing fine titanium oxide grains doped with a metallic ion which absorb a visible ray and a complex composed of an organo-metallic polymer which is formed by a hydrolysis polymerization condensation reaction of a compound represented by formula (I) shown below and an organic polymer which has a group capable of forming a hydrogen bond with the organo-metallic polymer: (R0)nM(Y)x−n  (I) wherein R0 represents a hydrogen atom, a hydrocarbon group or a heterocyclic group; Y represents a reactive group; M represents a metallic atom having from 3 to 6 valences; x represents a valence of the metallic atom M; and n represents 0, 1, 2, 3, 4, 5 or 6, provided that the balance of x−n is not less than 2. A method for the preparation of a lithographic printing plate using the lithographic printing plate precursor is also disclosed.
    Type: Grant
    Filed: June 9, 2000
    Date of Patent: April 20, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Seishi Kasai
  • Patent number: 6713228
    Abstract: Provided are alkenyl ether-based monomers having multi-ring structure, and photosensitive polymers and resist compositions obtained from the same. The photosensitive polymer includes a monomer unit represented by the following formula: wherein R4 and R5 are independently -H or -CH3, and R4 are independently -H, -OH or a alkyl group having 1-20 carbon atoms.
    Type: Grant
    Filed: April 24, 2002
    Date of Patent: March 30, 2004
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hyun-Woo Kim, Sang-Gyun Woo, Sung-Ho Lee
  • Patent number: 6713227
    Abstract: A color filter array having a green filter layer on a substrate wherein the green filter layer comprises a copper phthalocyanine dye having its absorption maximum at a wavelength of 600 to 700 nm, and a pyridone azo dye having its absorption maximum at a wavelength of 400 to 500 nm; and has a transmittance at a wavelength of 450 nm of 5% or less and that at 535 nm of 62% or more is provided; and the color filter array shows excellent spectroscopic characteristics with respect to green light and has a green filter layer excellent in light fastness.
    Type: Grant
    Filed: June 29, 2001
    Date of Patent: March 30, 2004
    Assignees: Sumitomo Chemical Company, Limited, Sony Corporation
    Inventors: Kazuhiro Machiguchi, Yuuji Ueda, Hiroki Endo, Taichi Natori, Toyomi Jinwaki
  • Patent number: 6713243
    Abstract: A silver halide photosensitive material in which a noncoloring compound is used as a high-boiling-point organic solvent for dissolving components of the silver halide photosensitive material that have low solubility in water. Preferably, the silver halide photosensitive material has a hydrophilic colloid layer containing a hydrophilic polymer and the noncoloring compound is contained in the hydrophilic colloid layer. The silver halide photosensitive material produces durable colored images, reduces the formation of stains, improves storability, alleviates fogging and soft-toning of emulsion during storage, inhibits migration of a dispersion medium, is inexpensive, and is produced from materials that cause little damage to the environment.
    Type: Grant
    Filed: March 22, 2001
    Date of Patent: March 30, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hisashi Mikoshiba, Hiroyuki Yoneyama, Naoto Matsuda
  • Patent number: 6709804
    Abstract: A printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device prepared by coating a substrate with a photosensitive resin composition comprising an oxygen sensitizer and a cis-diene-substituted polyamic acid or polyimide and forming fine patterns by exposure to radiation. Processes for producing a printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device, which comprises coating a substrate with the photosensitive resin composition and forming fine patterns by crosslinking cis-diene by oxidation polycondensation with singlet oxygen generated by exposure of the oxygen sensitizer to radiation. The photosensitive resin composition is of the negative type and exhibits high sensitivity and high resolution. The photosensitive resin composition forms a resin layer having excellent heat resistance.
    Type: Grant
    Filed: February 19, 2003
    Date of Patent: March 23, 2004
    Assignees: Riken, Sumitomo Bakelite Company, Ltd.
    Inventors: Yusuke Tajima, Kazuo Takeuchi, Yasuo Shigemitsu, Etsu Takeuchi
  • Patent number: 6709799
    Abstract: There is provided a resist composition containing a photosensitive resin and used in photolithography, said photosensitive resin having a transmittance of 40% or more for a light having a wavelength of 157 nm in applying to a thickness of 0.1 &mgr;m. The composition has a characteristic that it allows easy formation of a fine pattern having a good profile, particularly at a wavelength for exposure with an F2 excimer laser.
    Type: Grant
    Filed: December 22, 2000
    Date of Patent: March 23, 2004
    Assignee: Sumitomo Chemical Company, Limited
    Inventor: Kazuhiko Hashimoto
  • Patent number: 6709794
    Abstract: An exposure method for printing, upon a photosensitive material, a pattern having fine lines of an odd number extending about a certain point. The method includes a multiple exposure process using a phase shift mask having an even number of boundaries defined with a phase difference of 180 degrees between adjacent regions about the point, wherein the number of the boundaries is larger than the number of fine lines.
    Type: Grant
    Filed: May 14, 2003
    Date of Patent: March 23, 2004
    Assignee: Canon Kabushiki Kaisha
    Inventor: Yumiko Ohsaki
  • Patent number: 6706466
    Abstract: Imageable articles comprising positive working polymeric coatings on substrates are given a heat treatment as part of their manufacture, notably at a moderate temperature for an extended period. This heat treatment improves the development characteristics of the coatings in use. It has been found that by carrying out the heat treatment on articles wrapped in a water-impermeable material or in a humidity-enhanced oven, development characteristics may be further improved, especially adjacent to the edges of articles. The imageable articles include precursors for lithographic printing plates and for printed circuits.
    Type: Grant
    Filed: June 6, 2000
    Date of Patent: March 16, 2004
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Martyn Lott, Colin Shoesmith, John David Riches, Gareth Rhodri Parsons
  • Patent number: 6706463
    Abstract: A method for making a lithographic printing plate comprises the steps of imagewise exposing, to a laser beam, a PS plate comprising a substrate, a heat-sensitive layer containing at least one light-heat conversion agent and a binder polymer formed on the substrate and a hydrophilic or lipophobic layer applied onto the heat-sensitive layer; and then removing the hydrophilic or lipophobic layer on the laser-exposed area by developing the imagewise exposed printing plate within 120 seconds from the completion of the laser-exposure to thus give a lithographic printing plate, wherein the developing treatment comprises the step of rubbing the exposed printing plate surface with an abrasion means in the absence of any liquid. This method permits the production of a lithographic printing plate without causing any deterioration of the developing properties of the PS plate even when the imagewise exposed PS plate is developed within a short period of time after the completion of the laser-exposure.
    Type: Grant
    Filed: May 16, 2002
    Date of Patent: March 16, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Toshifumi Inno, Tsumoru Hirano
  • Patent number: 6703182
    Abstract: Compounds of formulae I, II or III wherein m is zero or 1; n is 1, 2 or 3; R1 inter alia is unsubstituted or substituted phenyl, or naphthyl, anthracyl, phenanthryl, a heteroaryl radical, or C2-C12alkenyl; R′1 inter alia is vinylene, phenylene, naphthylene, diphenylene or oxydiphenylene; R2 inter alia is CN, C1-C4haloalkyl, C2-C6alkoxycarbonyl, phenoxycarbonyl, or benzoyl; R3 inter alia is C1-C18alkylsulfonyl, phenyl-C1-C3alkylsulfonyl, camphorylsulfonyl, or phenylsulfonyl; R′3 inter alia is C2-C12alkylenedisulfonyl, phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl; R4 and R5 inter alia are hydrogen, halogen, C1-C8alkyl, C1-C6alkoxy, C1-C4haloalkyl, CN, NO2, C2-C6alkanoyl, benzoyl, phenyl, —S-phenyl, OR6, SR9, NR7R8, C2-C6alkoxycarbonyl or phenoxycarbonyl; R6 inter alia is hydrogen, phenyl or C1-C12alkyl; R7 and R8 inter alia are hydrogen or C1-C12alkyl; R9 inter alia is C1-C12 alkyl; R10, R11 and
    Type: Grant
    Filed: February 15, 2001
    Date of Patent: March 9, 2004
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Jean-Luc Birbaum, Toshikage Asakura, Hitoshi Yamato
  • Patent number: 6699638
    Abstract: A negative-working heat-sensitive lithographic printing plate precursor, comprising a substrate having a water-receptive surface which has provided thereon sequentially: (1) a thermal cross-linking layer comprising an aqueous alkali-soluble resin having aromatic hydroxyl groups, a cross-linking agent capable of cross-linking the resin by heating in the presence of an acid catalyst and an acid generator; and (2) a water-soluble overcoat layer; wherein at least one layer of the overcoat layer and the thermal cross-linking layer comprise a compound capable of converting light into heat.
    Type: Grant
    Filed: December 22, 2000
    Date of Patent: March 2, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Nobuyuki Kita
  • Patent number: 6699646
    Abstract: A liquid or a solid positive type photosensitive resin composition is herein disclosed which is used under the irradiation circumstance of a safelight having a maximum wavelength within the range of 500 to 620 nm, wherein an absorbancy of an unexposed film formed from this composition is 0.
    Type: Grant
    Filed: September 13, 2001
    Date of Patent: March 2, 2004
    Inventors: Genji Imai, Hideo Kogure
  • Patent number: 6699640
    Abstract: A direct-to-plate method for obtaining a high quality lithographic printing plate is disclosed. The method comprises the application of a continuous layer of a radiation sensitive solution onto a lithographic substrate by means of an ink-jet printhead. Hereby waste of coating solution and contamination of the environment are avoided.
    Type: Grant
    Filed: July 24, 2001
    Date of Patent: March 2, 2004
    Assignee: AGFA-Gevaert
    Inventors: Eric Verschueren, Luc Leenders, Joan Vermeersch, Ludo Joly