Abstract: A ternary copolymer of hydroxystyrene, tertiary alkyl (meth)acrylate and substitutable phenoxyalkyl (meth)acrylate having a Mw of 1,000-500,000 is blended as a base resin to formulate a chemically amplified, positive resist composition which has advantages including a significantly enhanced contrast of alkali dissolution rate before and after exposure, high sensitivity, high resolution, a satisfactory pattern profile after exposure, high etching resistance, and process adaptability.

Abstract: The Silver halide grains in the silver halide emulsion is disclosed, comprising silver halide grains containing three or more kinds of transition metal complexes each having a different electron-releasing time respectively classified into any of Class A (100 seconds or more), Class B (more than 1/10 seconds and less than 100 seconds), Class C (more than 1/1000 seconds and 1/10 seconds or less) and Class D (1/1000 seconds or less).

Abstract: Disclosed is a phase-shifting mask having a pattern comprising a plurality of substantially transparent regions and a plurality of substantially opaque regions wherein the mask pattern phase-shifts at least a portion of incident radiation and wherein the phases are substantially equally spaced, thereby increasing resolution of a given lithographic system. Further disclosed is a semiconductor device fabricated utilizing the phase-shifting mask.

Abstract: A method for preparing a lithographic printing plate involving the steps of subjecting, to imagewise exposure, a presensitized plate for use in making a lithographic printing plate comprising an aluminum substrate provided thereon with a light-sensitive layer formed from a photopolymerizable light-sensitive composition, which comprises a compound having an ethylenically unsaturated double bond, a photopolymerization initiator and a polyurethane resin binder and then developing the imagewise exposed plate with a developer containing an inorganic alkaline agent and a nonionic surfactant, carrying a polyoxyalkylene ether group, having a pH value ranging from 10.0 to 12.5 and an electrical conductivity ranging from 3 to 30 mS/cm.

Abstract: A chemically amplified photo-resist contains a photoacid generator for changing the solubility of resin after exposure to 130-220 nanometer wavelength light, and the photoacid generator contains two kinds of sulfonium salt compound expressed by general formulae [1] and [2] so that the chemically amplified photo-resist is improved in resolution, sensitivity and smoothness on side surfaces of a transferred pattern.

Abstract: A positive photoresist composition comprises the combination of (a) Resin A obtained from an alkali-soluble resin containing phenolic hydroxyl groups by replacing from 10 to 80% of the phenolic hydroxyl groups each with a group represented by formula (I) and (b) Resin B obtained from an alkali-soluble resin containing phenolic hydroxyl groups by replacing from 10 to 80% of the phenolic hydroxyl groups each with a group represented by formula (II) or (III) or a nonpolymeric dissolution inhibitive compound which has at least one kind of group selected from tertiary alkyl ester groups and tertiary alkyl carbonate groups; wherein R1, W, n, and R4 are as defined in the specification.

Abstract: Acid-catalyzed positive resist compositions which are imageable with 193 nm radiation and/or possibly other radiation and are developable to form resist structures of improved development characteristics and improved etch resistance are enabled by the use of resist compositions containing imaging polymer having a 2-cyano acrylic monomer.

Abstract: A process for producing a lightsensitive silver halide emulsion comprising silver halide grains, wherein the emulsion contains tabular silver halide grains in an amount of at least 50% of the total projected area of all the silver halide grains, the average iodine content of all the silver halide grains is at least 2 mol %, and the tabular silver halide grains have at least 10 dislocation lines per grain, wherein the process comprises (step 1) set fourth below, and the process comprises a step of performing chemical sensitization so that a selenium sensitizer is added in an amount of 2.

Abstract: A method of fabricating a resist pattern for a gamma gate of high electron mobility transistors of gallium arsenide (GaAs) elements for high-speed data communication with low noise is disclosed. The method of fabricating the gamma gate according to the present invention includes the steps of forming a first resist pattern by coating a first resist on a GaAs substrate, and exposing, developing and baking the coated first resist, sequentially; and forming a second resist pattern by coating a second resist on the GaAs substrate and the first resist pattern. and exposing, developing and baking the coated second resist, sequentially. A portion of the GaAs substrate covered by the first and the second resist patterns defines a region that a footprint of the gamma gate is formed, and a portion of the GaAs substrate which is covered by the first resist pattern, but not covered by the second resist pattern defines a region that a head of the gamma gate is formed.

Abstract: A self-contained photosensitive material comprising: a support; an imaging layer on the support, the imaging layer comprising a developer material and a plurality of photosensitive microcapsules encapsulating a photosensitive composition and a color precursor; and a protective coating on the imaging layer, the protective coating comprising a cured film of a water-soluble or water-dispersible resin, wherein upon image-wise exposing the imaging layer to actinic radiation and rupturing the microcapsules, the color precursor is released from the microcapsules and reacts with the developer material to form a color image is disclosed.

Abstract: A thermosensitive composition consisting of a mixture of polyacrylic acid, a salt of a long chain fatty acid such as silver behenate, an infra-red absorbent and modifiers such as additional polymers and fillers. Both the water solubility and affinity to water and oil changed when composition is heated.

Abstract: A pattern formation material contains a base polymer including a siloxane compound represented by Chemical Formula 1: wherein R1 are the same or different compounds selected from the group consisting of an alkyl compound, an ester compound, an ether compound, a sulfone compound, a sulfonyl compound and an aromatic compound.

Abstract: A chemically amplified positive resist composition is provided which is excellent in sensitivity and resolution; and comprises a resin (X) which, per se, is insoluble or slightly soluble in alkali but becomes soluble in alkali by the action of acid, and has a polymeric unit (a) derived from an alicyclic unsaturated carboxylic acid ester in which a carboxylic acid ester group represented by the formula (I): wherein R1 represents an alkyl having 1 to 4 carbon atoms, R represents an alicyclic hydrocarbon residue which may be optionally substituted with a group selected from hydroxyl and oxo, and R2 represents an alkyl having 1 to 4 carbon atoms, or R and R2, together with carbon atoms to which R2 and R are bonded, form a ring, is bonded to an alicyclic hydrocarbon having a polymerizable carbon-carbon double bond in its ring; and a polymeric unit (b) derived from maleic anhydride; and an acid-generating agent (Y).

Abstract: A positive resist composition which comprises (A) a compound which generates an acid upon irradiation with an actinic ray or radiation, and (B) a resin which is decomposed by the action of an acid to increase solubility in an alkaline developing solution and contains repeating units represented by formulae (I) and (V):

Abstract: To provide a light transmitting material which has high transmission at wavelength ranges used for communication and excellent characteristic properties such as heat resistance, water resistance and chemical resistance, and makes it possible to produce a grating and incorporate it in a mounting module with ease. A photosensitive composition for forming a light transmitting material comprising a silane compound or hydrolysis/dehydration condensation reaction product thereof, a photoinitiator and water, the silane compound being represented by the following formula (1): R1SiX13  (1) wherein R1 is an organic group having a polymerizable carbon-carbon double bond, and X1 is a hydrolyzable group or atom, with the proviso that at least 40% of the total number of hydrogen atoms of the organic group R1 are substituted by at least one substituent atom selected from the group consisting of deuterium, fluorine, chlorine and bromine.

Abstract: A silver halide emulsion is disclosed, comprising silver halide grains having a chloride content of not less than 90 mol % and internally doped with an iridium compound (A) and a compound (B) forming a stronger electron trap than said iridium compound (A), the silver halide grains meeting the following requirement: 10<X<1000 and 0<Y≦X wherein X represents an average number of molecules of said iridium compound (A) contained per grain and Y represents an average number of molecules of said compound (B) contained per grain.

Abstract: A hydrophilic layer and an overcoat layer are provided in this order on a heat-sensitive layer having an ink receiving surface, so as to form an original (plate) for a lithographic printing plate. The overcoat layer can be removed during printing. A system capable of forming an inorganic hydrophilic matrix by sol-gel conversion is provided in the hydrophilic layer. Adhesion between the heat-sensitive layer and the hydrophilic layer decreases in a heated region through image processing. Emulsion ink is supplied to the plate surface during printing, whereby the overcoat layer and the hydrophilic layer at an image portion are removed with a hydrophilic component of the emulsion ink. Thus, with a heat-sensitive original that can be subjected to heat-mode prepress using laser exposure, good printed matter can be stably obtained, irrespective of balance between image and non-image portions, without using wetting water.

Abstract: The invention discloses a chemical-amplification positive-working photoresist composition of the crosslinked type used for photolithographic patterning works in the manufacture of electronic devices. While the composition comprises a film-forming resinous ingredient capable of being imparted with increased alkali-solubility in the presence of an acid and a radiation-sensitive acid-generating compound, optionally, with further admixture of an aliphatic amine compound and an acid compound, the inventive photoresist composition is characterized by the unique resinous ingredient which consists of four types of monomeric units including hydroxystyrene units, styrene units, monomeric units having acid-dissociable solubility-reducing groups and crosslinking units. The acid-dissociable solubility-reducing group is not conventional tert-butoxycarbonyloxy group but characteristically a 1-alkylcyclohexyl group or a polycyclic saturated aliphatic hydrocarbon group.

Abstract: The invention is directed to a method for producing a silver halide photographic emulsion comprising the step of reacting a water-soluble silver salt and at least one water-soluble halide salt containing chloride or bromide in aqueous solution in the presence of an organic Grain Growth Modifier (GGM) compound, containing a halide X, which halide is not released in the form of an ion, to form light-sensitive silver halide grains having a silver halide content of a least 50 mole %, said grain growth modifier compound being water-soluble with a solubility>4 mmole per liter, and being selected from the group of compounds with an aliphatic or cyclo-aliphatic backbone R to which is attached one or more halide groups and at least one polar group.

Abstract: A system has been disclosed for use in radiographic industrial non-destructive testing materials and personal monitoring, making use therefor, of tabular silver brom(oiod)ide emulsion grains having {111} major faces, an average equivalent circular diameter of at least 0.5 &mgr;m and an average thickness of less than 0.30 &mgr;m, having been chemically sensitized by the steps of adding at least a gold salt in order to provide the surface of said tabular grains with at least 6000 atoms of gold per &mgr;m2 of its grain surface and per (0.1 &mgr;m of thickness)2; and at least a sulfite salt in such an amount that the ratio of the number of gold atoms per &mgr;m2 and (concentration of said sulfite salt, expressed in mmole per mole of silver)2 is at least 200000.