Abstract: Photoresist compositions for a Top-surface Imaging Process by Silylation (TIPS), and a process for forming a positive pattern according to the TIPS using the same. The photoresist composition for the TIPS comprises a cross-linker of following Formula 1 or 2. A protecting group of the cross-linker and a hydroxyl group of the photoresist polymer are selectively crosslinked in the exposed region, and the residual hydroxyl group reacts to a silylating agent in the non-exposed region by silylation. Thus, the non-exposed region only remains after the dry-development, thereby forming a positive pattern. In addition, the photoresist composition of the present invention is suitable for the TIPS lithography using light sources such as ArF (193 nm), VUV (157 nm) and EUV (13 nm). wherein, R1, R2, R3, R4, R5, R6 and R7 are as defined in the specification.

Abstract: A positive photoresist composition comprising: (a) a resin having structural units represented by the following formulae (X) and being capable of decomposing by, the action of an acid to increase the solubility in an alkali developer, and (b) a compound capable of generating an acid with irradiation of actinic ray or radiation: wherein R1 and R2, which may be the same or different, each represents a hydrogen atom or an alkyl group having from 1 to 4 carbon atoms, R3 and R4, which may be the same or different, each represents a hydrogen atom or a linear, branched or cyclic alkyl group which may have a substituent, R5 represents a linear, branched or cyclic alkyl group which may have a substituent, an aryl group which may have a substituent or an aralkyl group which may have a substituent, m represents an integer of from 1 to 20, and n represents an integer of from 0 to 5.

Abstract: The present invention relates to a lithographic printing plate in which images can be inscribed by laser beams, and which has high resolving power, high sensitivity, and the improved reservation stability, and relates to its image-producing method, and a photosenstitive composition which can preferably be used as an original plate for lithographic printing. The photosenstitive composition includes an aqueous resin composition including fine particles (a) of a resin having at least one neutralized anionic group and having a heat fusion property, and a water soluble resin (b) having at least one neutralized anionic group, wherein the water soluble resin (b) is included in a range of 1 to 30% by weight, relative to the total weight of the aqueous resin composition; and a substance (c) which absorbs light and generates heat.

Abstract: A chemical amplification type positive resist composition comprising: a resin which has a hydroxystyrene-based polymerization unit, a 3-hydroxy-1-adamantyl methacrylate-based polymerization unit and a polymerization unit having a group unstable toward an acid, and, though insoluble or hardly soluble in an alkali in itself, becomes alkali-soluble after the acid-unstable group has been cleaved by the action of an acid; and an acid generating agent is provided. This resist composition is improved in exposure latitude and resolution. Moreover, such properties as sensitivity, heat resistance, the ratio of residual thickness, coatability, and dry etching resistance are also maintained good. Thus, through the use of this composition, a fine resist pattern can be formed with high precision.

Abstract: Graft copolymers are used for the production of laser-engravable relief printing plates, the graft copolymers being obtained by free radical polymerization of vinyl esters in the presence of polyalkylene oxides and subsequent hydrolysis of the ester function. Processes for the production of transparent flexographic printing plates by means of laser engraving using said graft copolymers are described.

Abstract: The present invention provides photoresist compositions for a Top-surface Imaging Process by Silylation (TIPS) and processes for using the same. The photoresist composition comprising a photoresist resin, a photoacid generator, an organic compound, and an amphoteric compound. The amphoteric compound prevents or reduces the amount of acid diffusion into the unexposed area and improves the contrast between the exposed and the unexposed areas. This reduction or prevention of acid diffusion into the unexposed areas reduces line edge roughness (LER).

Abstract: An image forming method for developing a negative type image forming material after image exposure by an infrared laser. The negative type image forming material is provided with a photosensitive layer, which has sensitivity to an infrared laser. The negative type image forming material is developed with a weak alkaline aqueous solution having a pH in a range from 7 to 12 and containing a carbonate and a surfactant.

Abstract: A method for forming a plated layer. There is first provided a substrate. There is then formed over the substrate a masking frame employed for masking frame plating a masking frame plated layer within the masking frame, where the masking frame is fabricated to provide an overhang of an upper portion of the masking frame spaced further from the substrate with respect to a lower portion of the masking frame spaced closer to the substrate. Finally, there is then plated the masking frame plated layer within the masking frame. The method is useful for forming masking frame plated magnetic pole tip stack layers with enhanced planarity dimensional control within magnetic transducer elements.

Abstract: In stereolithographic apparatus and method, a mask is formed on a light-transmissible member (glass plate) on the basis of stereolithographic data for one layer of photohardenable resin; photohardenable resin of one layer is successively supplied to form an unhardened resin layer of photohardenable resin; if necessary, a film having light transmission is attached onto the unhardened resin layer so as to cover the unhardened resin layer in close contact with the unhardened resin layer; the light-transmissible member having the mask on or above the film; the unhardened resin layer is plane-exposed to light through the mask to harden the photohardenable resin of the unhardened resin layer; and the light-transmissible member and the film are evacuated from the hardened photohardenable resin layer after the exposure by the exposure means, thereby obtaining a desired three-dimensional object through stereolithography. As the photohardenable resin may be used having a melting temperature ranging from 5 to 90° C.

Abstract: A negative planographic printing plate precursor for heat-mode exposure systems, which has, on a support, a photosensitive layer containing: (A) a light-to-heat conversion agent; (B) a polymerizable unsaturated group-having compound; and (C) an onium salt having a counter anion with a valency of at least 2. The precursor is capable of being exposed with an IR laser for image formation thereon. The onium salt may be, for example, a diazonium salt, iodonium salt or sulfonium salt. The counter anion has at least two anionic sites which may be the same or different, and the anionic structure is preferably divalent to hexavalent.

Abstract: A positive-tone radiation-sensitive resin composition comprising: (A) a low molecular weight compound having at least one amino group in which the nitrogen atom has at least one hydrogen atom bonded thereto and at least one of the hydrogen atoms is replaced by a t-butoxycarbonyl group, (B) a photoacid generator, and (C-1) a resin insoluble or scarcely soluble in alkali which is protected by an acid-dissociable group and becomes soluble in alkali when the acid-dissociable group dissociates or (C-2) an alkali-soluble resin and an alkali solubility control agent is disclosed. Also disclosed is a negative-tone radiation-sensitive resin composition comprising the low molecular weight compound (A), the photoacid generator (B), an alkali-soluble resin (D), and a compound capable of crosslinking with the alkali-soluble resin in the presence of an acid(E).

Abstract: An imaging member, such as a negative-working printing plate or on-press cylinder, has an imaging layer comprised of a thermally sensitive ionomer (charged polymer) and a photothermal conversion material that is a bis(aminoaryl)polymethine dye that is soluble in water or a water-miscible organic solvent, and that has a &lgr;max greater than 700 nm as measured in water or the water-miscible organic solvent.

Abstract: A tabular silver chloride iodide or silver chloride-bromide-iodide emulsion with a chloride content of at least 90 mol %, an iodide content of 0.01 to 5 mol % and a cubic habit, which is characterized in that with respect to the projected area of all the crystals at least 80% of the crystals have an average aspect ratio of at least 8, a maximum crystal thickness distribution width of 15% and a maximum particle size distribution width of 25%, and which can be produced by a new process, wherein the supersaturation during crystal growth is adjusted within a defined range, is distinguished by high spectral sensitivity and by good stability on storage at elevated temperatures and particularly at high atmospheric humidities.

Abstract: A photosensitive glass paste containing: an inorganic component containing a glass powder and a photosensitive organic component is provided. The glass powder contains about 1 to 30 percent by weight of a low melting point glass powder having a glass softening point in a range of about 400° C. to 600° C. and about 70 to 99 percent by weight of a high melting point glass powder having a glass softening point about 300° C. or more higher than the glass softening point of the low melting point glass. As the high melting point glass, a borosilicate glass which inhibits diffusion of a conductive component such as Ag is employed. The content of the inorganic component in the photosensitive glass paste is in a range of about 40 to 70 percent by weight. A method of manufacturing a multilayered interconnected circuit board using the above-described photosensitive glass paste is also provided.

Abstract: Polymers comprising recurring units of formula (1) are provided wherein R1 is a straight, branched or cyclic divalent C1-20 hydrocarbon group or a bridged cyclic hydrocarbon group, R is hydrogen atom or an acid labile group, 0≦m≦3, 0≦n≦3 and 0≦m+n≦6. Using the polymers, chemical amplification positive resist compositions featuring low absorption of F2 excimer laser light are obtained.

Abstract: A negative-working heat-sensitive material for making a lithographic printing plate by direct-to-plate recording is disclosed which comprises in the order given a lithographic base having a hydrophilic surface, an oleophilic imaging layer and a cross-linked hydrophilic upper layer, characterize in that the oleophilic imaging layer comprises at least one transition metal complex of an organic acid. Materials according to the invention are characterized by an increased run length and can be used as a printing plate immediately after exposure.

Abstract: A process for forming microcapsules having substantially impermeable microcapsule walls comprising the steps of: forming an emulsion of an internal phase in a continuous aqueous phase, the internal phase including a photosensitive composition and a polyvalent isocyanate, the continuous aqueous phase including a sulfonated polystyrene, at least one of the internal phase or the continuous aqueous phase further including a hydrophilic polymer; and enwrapping particles of the internal phase in an amine-formaldehyde condensation product produced by in situ condensation of an amine and formaldehyde is disclosed.

Abstract: A heat-sensitive composition of the positive type comprising a polymeric binder and a solubility inhibitor, wherein the said solubility inhibitor consists of an organometallic compound, with the exclusion of the metallocenes, an organic salt or an organic complex of an inorganic salt of a metal belonging to the group IIIA or transition group of the periodic system of the elements.

Abstract: A merged-mask micro-machining process is provided that includes the application of a plurality of layers of masking material that are patterned to provide a plurality of etching masks.

Abstract: A photosensitive polymer having a phenyl ring and a lactone group, and a resist composition, wherein the resist composition contains a photosensitive polymer including a monomer unit having at least one group selected from the groups indicated by the following formulas, and a photoacid generator (PAG).