Patents Examined by Jessica Roswell
  • Patent number: 9921477
    Abstract: Compounds of the Formula (I), (II) and (III) wherein Aris is for example phenylene, biphenylene or naphthylene, all of which are unsubstituted or substituted by C1-C4-alkyl, C2-C4-alkenyl, CN, OR11, SR11, CH2OR11, COOR12, CONR12R13 or halogen; R1, R2, R7 and R8 independently of one another other are hydrogen or C1-C6-alkyl; R3 and R5 together and R4 and R6 together form a C2-C6-alkylene bridge which is unsubstituted or substituted by one or more C1-C4-alkyl; R11 is hydrogen or C1-C6-alkyl; R12 and R13 independently of one another for example are hydrogen, phenyl, C1-C18-alkyl, C1-C18-alkyl which is interrupted by one or more O; n is 1-10; X is O, S or NR10; A and A1 are suitable linking groups; are suitable as photolatent bases.
    Type: Grant
    Filed: March 25, 2008
    Date of Patent: March 20, 2018
    Assignee: BASE SE
    Inventors: Kurt Dietliker, Katharina Misteli, Katia Studer, Tunja Jung, Lothar Alexander Engelbrecht
  • Patent number: 9920169
    Abstract: According to the present invention, a curable composition can be provided, said composition being characterized by comprising: (A) an episulfide compound; and (B) a photobase generator comprising an organoboron compound represented by general formula (1) below: (In general formula (1), R1, R2, R3, R4 and R5 may be the same as or different from one another and independently represent an alkyl group having 1 to 8 carbon atoms; and Ar1, Ar2 and Ar3 may be the same as or different from one another and independently represent a group selected from the group consisting of a phenyl group, a naphthyl group, an anthracenyl group and a phenanthryl group, each of which may have a substituent selected from the group consisting of an alkyl group, an aryl group, an alkenyl group, a cycloalkyl group and a heterocyclic group.
    Type: Grant
    Filed: June 26, 2014
    Date of Patent: March 20, 2018
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Kousuke Namiki, Hitoshi Okazaki, Eiji Koshiishi, Sawako Fuse, Kikuo Furukawa
  • Patent number: 9920160
    Abstract: A method for a synthesis of a polymer containing multiple epoxy groups includes steps of: under protection of nitrogen or argon, with a photosensitive free radical initiator under an ultraviolet light irradiation, initiating a mixture of a dithiol compound and alkynyl glycidyl ether or other alkynyl-containing compounds to proceed a thiol-yne polymerization, so as to obtain the polymer. The number of the epoxy groups is able to be adjusted through changing a type of a dithiol monomer, a mixing ratio of the dithiol monomer, and a mixing ratio between the alkynyl glycidyl ether and other alkynyl compounds. The present invention has advantages of: fast reaction, convenient process, easy post-processing, a large number of the epoxy groups, and adjustable and controllable content. The obtained polymer has a wide potential application in fields of coating, adhesive, ink, encapsulating material, resin for composite material, additive, high performance material, function material, and so on.
    Type: Grant
    Filed: April 29, 2015
    Date of Patent: March 20, 2018
    Assignee: ZHEJIANG UNIVERSITY
    Inventors: Chao Gao, Yaochen Zheng, Li Peng, Shengying Cai, Zhulin Weng
  • Patent number: 9896598
    Abstract: A process of directly coating a metal substrate and curing the coating using radiation sources such as UV radiation having a wavelength of 200 nm and above. Furthermore, compositions of the invention can be used as a tie-coat for coatings that do not bond well directly to various metal substrates.
    Type: Grant
    Filed: July 23, 2013
    Date of Patent: February 20, 2018
    Inventors: Ramesh Subramanian, Kurt E. Best, Charles A. Gambino, Christine A. Mebane, Michael K. Jeffries, Myron W. Shaffer, Michael J. Dvorchak
  • Patent number: 9884969
    Abstract: The present invention relates to a novel polyrotaxane compound having a specific chemical structure, a photocurable coating composition that may provide a coating material having excellent mechanical properties such as scratch resistance, chemical resistance, abrasion resistance, and the like, and excellent self-healing capability, and a coating film obtained from the photocurable coating composition.
    Type: Grant
    Filed: September 6, 2013
    Date of Patent: February 6, 2018
    Assignee: LG CHEM, LTD.
    Inventors: Heon Kim, Yeong-Rae Chang, Hye-Min Kim
  • Patent number: 9856340
    Abstract: To provide a photocurable fluorinated polymer composition which has a high curing rate, shows little shrinkage before and after photocuring and requires no post treatment such as heat treatment after photocuring and whereby it is possible to obtain a cured resin excellent in heat resistance and weather resistance. According to the photocurable fluorinated polymer composition comprising a fluorinated polymer (A) containing polymerized units derived from a fluoroolefin and polymerized units derived from an unsaturated monomer having an oxetanyl group or a substituted oxetanyl group, and a photoreaction initiator (B), of the present invention, it is possible to provide a photocurable fluorinated polymer composition which has a high curing rate, shows little shrinkage before and after photocuring and requires no post treatment such as heat treatment after photocuring and whereby it is possible to obtain a cured resin excellent in heat resistance and weather resistance.
    Type: Grant
    Filed: February 17, 2012
    Date of Patent: January 2, 2018
    Assignee: Asahi Glass Company, Limited
    Inventors: Shun Saito, Hiroshi Nishio, Sho Masuda
  • Patent number: 9850337
    Abstract: The present invention relates to a facile process for the preparation of non-covalently cross-linked self-assembled perylene bisimide nano structures using hydrogen bonding interactions with poly-4-vinyl pyridine or oligophenylene vinylene (OPV) as structural motif.
    Type: Grant
    Filed: March 4, 2013
    Date of Patent: December 26, 2017
    Assignee: COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH
    Inventors: Asha Syamakumari, Rekha Narayan, Shekhar Shinde, Saibal Bhaumik
  • Patent number: 9828474
    Abstract: A method for producing a wear resistant polyethylene medical implant includes forming a medical implant, such as an orthopedic implant, made at least partially of ultra high molecular weight polyethylene (UHMWPE). The polyethylene may be irradiated with gamma ray or e-beam radiation to form free radicals and then crosslinked to eliminate free radicals prior to exposure to oxygen. The so treated bearing surface of the crosslinked polyethylene is then coated with a photoinitiator. Thereafter the bearing material is photocrosslinked with ultra-violet (UV) radiation. The photocrosslinking process can also be applied to non-crosslink UHMWPE.
    Type: Grant
    Filed: September 11, 2015
    Date of Patent: November 28, 2017
    Assignee: Howmedica Osteonics Corp.
    Inventors: Shulin He, Zongtao Zhang, Keenan Michael Hanson, Shi-Shen Yau
  • Patent number: 9822204
    Abstract: The present invention includes vinyl ether functional oligomers and methods for their preparation, the method including alternating free radical copolymerization of a dialkyl maleate or dialkyl fumerate monomer with a multifunctional vinyl ether monomer in the presence of a solvent with a high chain transfer constant. Also within the scope of the invention are uses for the vinyl ether functional oligomers compositions of this invention, including radiation curable coatings, adhesives, printing inks and composites.
    Type: Grant
    Filed: September 29, 2011
    Date of Patent: November 21, 2017
    Assignee: RENSSELAER POLYTECHNIC INSTITUTE
    Inventor: James V. Crivello
  • Patent number: 9777162
    Abstract: To provide a waterborne curable resin composition that is advantageous for environmental protection measures, can be applied without use of a film-forming assistant and can improve the dispersion stability of the emulsion, and also improve physical properties of the coat such as curability, durability, and stain resistance. A waterborne curable resin composition having an acrylic emulsion produced by emulsion polymerization, wherein the acrylic emulsion contains a curable monomer and/or oligomer in emulsion particles.
    Type: Grant
    Filed: October 2, 2006
    Date of Patent: October 3, 2017
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Yoshiyuki Yokota, Masaya Uchida
  • Patent number: 9777078
    Abstract: A process for producing water-absorbing polymer particles by polymerizing droplets of a monomer solution, where the monomer solution comprises at least two initiators, one of the initiators is a peroxide with the exception of persulfate, and the molar ratio of peroxide to further initiator is at least 1:8, the water-absorbing polymer particles themselves, and hygiene articles comprising these water-absorbing polymer particles.
    Type: Grant
    Filed: July 12, 2007
    Date of Patent: October 3, 2017
    Assignee: BASF SE
    Inventors: Dennis Loesch, Volker Seidl, Matthias Weismantel
  • Patent number: 9708425
    Abstract: A polyacrylate is obtained by radical polymerization of at least one acrylate monomer (Ac) in the presence of a polymeric photoinitiator. The polymeric photoinitiator is a co-polymer of at least one photoinitiator monomer (A) with at least one monomer (B), and optional additional monomers (C). Rapid polymerization of the acrylate monomer is provided. A method produces a polyacrylate using the polymeric photoinitiator as described, and a polymeric photoinitiator is used as the photoinitiator of radical polymerization of acrylate monomers.
    Type: Grant
    Filed: November 11, 2011
    Date of Patent: July 18, 2017
    Assignee: Coloplast A/S
    Inventors: Niels Joergen Madsen, Christian B. Nielsen, Petr Sehnel, David George Anderson
  • Patent number: 9676899
    Abstract: The invention relates to a radiation curable resin composition comprising a cationically polymerizable component, a cationic photoinitiator, a hydroxy component, an impact modifier and wherein the resin composition after full cure has a modulus of >2 GPa; a yield stress <70 MPa; and a K1c value >1.3 MPa·(m)1/2 or an Izod value >0.45 J/cm. The resin composition can preferably be used in the preparation of three dimensional objects.
    Type: Grant
    Filed: April 26, 2007
    Date of Patent: June 13, 2017
    Assignee: DSM IP ASSETS B.V.
    Inventors: Paulus Antonius Maria Steeman, Beert Jacobus Keestra, Marco Marcus Matheus Driessen, Debra Lynn Fish Repko, Melvin Zussman
  • Patent number: 9624318
    Abstract: The invention relates to matted UV varnishes comprising silicon dioxide, the surface thereof having been modified by means of treatment with a multiple bond organopolysiloxane so as to be particularly well-suited for use as a matting material for UV varnishes, and to a method for producing same.
    Type: Grant
    Filed: August 20, 2010
    Date of Patent: April 18, 2017
    Assignee: Evonik Degussa GmbH
    Inventors: Klaus Benner, Hans-Dieter Christian, Gottlieb Lindner, Karl Meier
  • Patent number: 9624171
    Abstract: Photoinitiator mixture comprising at least one alpha-amino ketone compound; and at least one compound of the Formula (I) or (I?) wherein R1 and R?1 for example are hydrogen, C3-C8cycloalkyl or C1-C12alkyl R2 and R2? for example are hydrogen; unsubstituted C1-C20alkyl or substituted C1-C20alkyl; and R8 and R9 for example are hydrogen, C1-C12alkyl which optionally is substituted, or phenyl which optionally is substituted; exhibit an unexpectedly good performance in photopolymerization reactions.
    Type: Grant
    Filed: May 27, 2009
    Date of Patent: April 18, 2017
    Assignee: BASF SE
    Inventors: Akira Matsumoto, Hisatoshi Kura, Katia Studer, Sébastien Villeneuve
  • Patent number: 9580571
    Abstract: Provided is a process for making non-phthalate plasticizers, by acylating an aromatic compound with a succinic anhydride to form a keto-acid, and then esterifying the keto-acid with C4-C13 OXO-alcohols to form a plasticizer compound. The aromatic rings of the aromatic compound may also be optionally hydrogenated.
    Type: Grant
    Filed: December 9, 2013
    Date of Patent: February 28, 2017
    Assignee: EXXONMOBIL RESEARCH AND ENGINEERING COMPANY
    Inventors: Jihad Mohammed Dakka, Edmund John Mozeleski, Lisa Saunders Baugh, Colle Karla Schall, Allen David Godwin, Diana S. Smirnova, Jorg Friedrich Wilhelm Weber, Stephen Zushma
  • Patent number: 9539763
    Abstract: The present invention pertains to a process for producing three-dimensional, self-supporting and/or substrate-supported formed pieces or structures on surfaces by means of site-selective solidification of a liquid to pasty, organic or organically modified material within a bath consisting of this material by means of two- or multiphoton polymerization, whereby the material has at least one compound that has both an organic radical polymerizable via two-photon or multiphoton polymerization and a biocompatible, biodegradable or bioresorbable group, and/or wherein the bath material additionally contains groups or radicals, which are available for an inorganic crosslinking or which are already inorganically crosslinked, providing that both an organic radical polymerizable via two-photon or multiphoton polymerization and a biocompatible, biodegradable or bioresorbable group must be contained in the material.
    Type: Grant
    Filed: February 8, 2011
    Date of Patent: January 10, 2017
    Assignee: Fraunhofer-Gesellschaft zur Foerderung der angewandten Forschung e.V.
    Inventors: Ruth Houbertz-Krauss, Matthias Beyer, Joern Probst, Thomas Stichel
  • Patent number: 9527992
    Abstract: The present invention relates to polymer compositions suitable for 3D printing. The composition comprises 60 to 80 mass % of oligoester acrylate; 10 to 30 mass % of a liquid polyethylene glycol; 7 to 9 mass % of a non-liquid polyethylene glycol; and 0.1 to 1 mass % of a system of photopolymerization initiators. A distinguishing feature of the composition is that after being extruded at an environment temperature of 22° C. with the extrusion rate of 2.5 to 3.5 cm/sec through a nozzle of a hand-held 3D printing device having an output orifice with a diameter in the range of 0.6 to 1.5 mm and after being irradiated after extrusion with a light having a wavelength in the range of 390 to 410 nm by LEDs having a total power of 2 Wt, the composition maintained its shape without a support.
    Type: Grant
    Filed: November 10, 2014
    Date of Patent: December 27, 2016
    Assignee: CREOPOP PTE. LTD.
    Inventors: Anna Shulga, Igor Kovalev, Dmitry Starodubtsev
  • Patent number: 9522967
    Abstract: A photopolymerization accelerator composition improving color stability and controlling polymerization shrinkage stress of cured resin and/or the resulting composite paste thereby feature by tertiary twisted biphenyldiamine with the general formula I: R2 and R3 are each independently alkyl having from 1 to 5 carbon atoms; R and R1 are each independently hydrogen or halogen; alkyl alkoxy, or alkylthio having from 1 to 18 carbon atoms; or phenyl and/or substituted phenyl alkoxy, or alkylthio having from 1 to 18 carbon atoms. It can be used in part with conventional photosensitizers and radically polymerizable monomers.
    Type: Grant
    Filed: June 8, 2007
    Date of Patent: December 20, 2016
    Assignee: DENTSPLY International Inc.
    Inventors: Xiaoming Jin, Paul D. Hammesfahr
  • Patent number: 9512296
    Abstract: Provided is a process for making non-phthalate plasticizers, by acylating an aromatic compound with a succinic anhydride to form a keto-acid, and then esterifying the keto-acid with C4-C13 OXO-alcohols to form a plasticizer compound. The aromatic rings of the aromatic compound may also be optionally hydrogenated.
    Type: Grant
    Filed: December 9, 2013
    Date of Patent: December 6, 2016
    Assignee: ExxonMobil Research and Engineering Company
    Inventors: Jihad Mohammed Dakka, Edmund John Mozeleski, Lisa Saunders Baugh, Karla Schall Colle, Allen David Godwin, Diana S. Smirnova, Jorg Friedrich Wilhelm Weber, Stephen Zushma