Abstract: The present invention discloses a packaging box of a covering film and a film applicator. By structural designs of the packaging box and the covering film, the packaging box is provided with an internal cavity matching an outer shape of an electronic device and the covering film includes a release film having an extension portion, enabling the packaging box to provide the covering film with storage, dustproof and shock-absorbing functions and to further serve as a film application auxiliary tool when a film application process is performed. Thus, a user is allowed to accurately, quickly and efficiently form a layer providing protection on a surface of the electronic device directly by using the packaging box.

Abstract: In a substrate processing apparatus, a cup part is moved in an up-down direction to cause a cup exhaust port to selectively overlap a first chamber exhaust port or a second chamber exhaust port. In the state in which the cup exhaust port overlaps the first chamber exhaust port, gas in the cup part is discharged through the cup exhaust port and the first chamber exhaust port by a first exhaust mechanism. In the state in which the cup exhaust port overlaps the second chamber exhaust port, the gas in the cup part is discharged through the cup exhaust port and the second chamber exhaust port by a second exhaust mechanism. In this way, an exhaust mechanism for exhausting gas from the cup part can be easily switched between the first exhaust mechanism and the second exhaust mechanism.

Abstract: The present invention relates to a metering robot for dispensing liquid and/or pasty media having three degrees of freedom of movement oriented perpendicular to one another, having a base having two first linear guides spaced apart in parallel from one another; a portal bridge that is supported in a travelable manner on the two linear guides and that has a second linear guide oriented perpendicular to the two first linear guides; and a third linear guide for the movable guiding of a cart for receiving a metering unit that is oriented perpendicular to the first and second linear guides and that is travelable along the second linear guide. The metering robot has a work space that extends in a region that is located in the longitudinal direction of the two first linear guides in a prolongation of the region that extends directly between the two first linear guides.

Abstract: A machine for manufacturing artificial turf includes a fiber inserter configured to incorporate artificial turf fiber into an artificial turf backing to form the artificial turf. The artificial turf includes an underside and an artificial turf surface. The machine further includes a coater configured to coat the underside with a colloidal latex coating. The colloidal latex coating has an exposed surface. The machine further includes an applicator configured to wett an exposed surface of the colloidal latex coating with an anti-blistering agent. The machine further includes a heater configured to heat the underside to cure the colloidal latex coating into a solid latex coating.

Abstract: A plating apparatus, a plating method and a recording medium can allow a temperature of a wafer to be uniform within a surface thereof. A plating apparatus 1 includes a substrate holding unit 52 configured to hold a substrate W; a plating liquid supply unit 53 configured to supply a plating liquid M1 to the substrate W; and a solvent supply unit 55a configured to supply a solvent N1 having a different temperature from a temperature of the plating liquid M1 to the substrate W. The solvent N1 is supplied to a preset position on the substrate W from the solvent supply unit 55a after the plating liquid M1 is supplied to the substrate W from the plating liquid supply unit 53.

Abstract: A system for forming a bulk material having insulated boundaries from a metal material and a source of an insulating material is provided. The system includes a heating device, a deposition device, a coating device, and a support configured to support the bulk material. The heating device heats the metal material to form particles having a softened or molten state and the coating device coats the metal material with the insulating material from the source and the deposition device deposits particles of the metal material in the softened or molten state on the support to form the bulk material having insulated boundaries.

Abstract: According to the present invention, a plasma processing apparatus includes an analysis unit that obtains wavelengths of the light correlated with a plasma processing result, selects, from the obtained wavelengths, a wavelength having a first factor that represents a deviation in an intensity distribution of the light and is larger than a first predetermined value, and predicts the plasma processing result using the selected wavelength, or an analysis unit that obtains values computed using each of light intensities of a plurality of wavelengths and correlated with the plasma processing result, selects, from the obtained values, a value having a second factor that represents a deviation in a distribution of the obtained values and is larger than a second predetermined value, and predicts the plasma processing result using the selected value.

Abstract: A printing device for dispending material on a heated substrate is provided. The device may include a printing head having one or more nozzles and a heat shield that partially masks a side of the printing head that faces the heated substrate when printing so as to reduce heat transfer from the substrate to the printing head. The shield includes a slot aligned with the one or more nozzles to enable passage of material from the one or more nozzles to the heated substrate.

Abstract: A display panel manufacturing device including a stage slider, a first stage configured to slide on the stage slider and to receive a test substrate, a second stage on the stage slider and configured to receive a main substrate, and a patterning unit located at a distance from the stage slider and configured to discharge organic drops onto the test substrate, configured to analyze patterns of the organic drops, configured to modify the patterns of the discharged organic drops according to an analysis of the patterns of the organic drops, and configured to discharge the organic drops onto the main substrate.

Abstract: A reactor for continuously coating tow fibers has an outer tubular member, an inner support member spaced from the outer tubular member, a reactant flowing through a space defined by the outer tubular member and the inner support member, and at least one flow promotor located on an outer surface of the inner support member for directing the reactant towards an inner surface of the outer tubular member. A system and a method for coating tow fibers are also described.

Abstract: A system for coating a component is provided. The system includes a feedstock supply, a carrier fluid supply, and a thermal spray gun coupled in flow communication with the feedstock supply and the carrier fluid supply. The feedstock supply contains a substantially homogeneous powder mixture of a first powder and a second powder. The second powder is softer than the first powder and has a percentage by mass of the powder mixture of between about 0.1% and about 3.0%.

Abstract: A vapor deposition mask including a metallic substrate provided with a plurality of openings for passing vapor deposition particles, wherein at least a portion of the plurality of openings are structured by one or more opening groups in which the plurality of openings are repeatedly arranged in accordance with a constant rule, and a plurality of protrusions of identical height are arranged to support the entire substrate from one side, and are provided only outside the opening group formation region.

Abstract: The present disclosure relates, in various embodiments, to methods and systems for masking and de-masking a portion of an interior surface of a structure, such as may be useful in the selective coating of an interior surface of a structure. The method comprises providing a masking device comprising a magnetically active material and a seal-forming material and inserting the masking device into an interior of the structure. A magnetic force is activated in order to bring the masking device into sealable contact with a portion of an interior surface of the structure, thereby producing a masked portion of the interior surface. While maintaining the sealable contact, the unmasked portion of the interior surface of the structure is coated with a coating material. After the coating, the magnetic force is deactivated in order to bring the masking device out of sealable contact with the interior surface of the structure.

Abstract: An apparatus configured to coat pipelines, in particular a cutback along a pipeline, having: a frame, which extends along a designated axis and is fixable with respect to the pipeline so as to arrange the designated axis parallel to the longitudinal axis of the pipeline; a carriage, which is supported by the frame, is movable along the designated axis with respect to the frame, and is configured to designated a heater and an applicator; an actuator configured to advance the carriage along the designated axis; and a control unit configured to select a travel distance for the carriage from a plurality of travel distances.

Abstract: To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter. The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).

Abstract: A mask and a fabrication method thereof are provided. The mask includes: a frame, which includes a hollow portion and a border surrounding the hollow portion; an opening plate, which is provided on the frame and includes an opening and a body surrounding the opening, the opening corresponding to the hollow portion, and the body being connected with the border; and a pattern plate, which is provided on the opening plate and includes a pattern portion and a non-pattern portion positioned in a periphery of the pattern portion, the pattern portion corresponding to the opening, the non-pattern portion being connected with the body of the opening plate, and the non-pattern portion and the frame being separated from each other at a position of the border.

Abstract: The transfer chamber transfers a wafer (W) as a transferred object to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) as a chemical filter provided in the midstream of the circulation path (CL), a humidity detector (HG2) as a humidity detection means which detects internal humidity, a gas supply means (NS) which supplies gas to the inside of the transfer chamber (1), and a moisture supply means (HS) which supplies moisture content to the inside of the transfer chamber (1). The moisture supply means (HS) is made to operate in accordance with a humidity detection value by the humidity detection means.

Abstract: The present teachings relate to various embodiments of a gas enclosure system that can have various components comprising a particle control system that can provide a low-particle zone proximal to a substrate. Various components of a particle control system can include a gas circulation and filtration system, a low-particle-generating motion system for moving a printhead assembly relative to a substrate, a service bundle housing exhaust system, and a printhead assembly exhaust system. In addition to maintaining substantially low levels for each species of various reactive species, including various reactive atmospheric gases, such as water vapor and oxygen, for various embodiments of a gas enclosure system that have a particle control system, an on-substrate particle specification can be readily met. Accordingly, processing of various substrates in an inert, low-particle gas environment according to systems and methods of the present teachings can have substantially lower manufacturing defects.

Abstract: The present invention is directed to a squeegee apparatus which includes a main housing including an inlet end and an outlet end, the outlet end including an extrusion face and a protruding lip member, the inlet end including an inlet opening and the extrusion face including at least one outlet opening, wherein the inlet opening and the at least one outlet opening are in fluid communication with each other within the main housing. The present invention is also directed to a method for repairing a thermal barrier coating with a squeegee apparatus including supplying a repair composition into the inlet opening of the squeegee apparatus and depositing the repair composition from the at least one outlet opening onto the damaged region and concurrently traversing the squeegee apparatus over the damaged region while contacting a thermal barrier coating adjacent to the damaged region with the lip member.

Abstract: A device for treating or acting on workpiece surfaces by means of an actuator, such as a cutting or engraving laser or a nozzle for applying oils, paints, adhesives, dyes, or etchants is disclosed. An ultrasonic levitation force field is generated by means of a sonotrode, which is coupled to the actuator into a working unit, such that the movably suspended working unit is supported on the workpiece surface in a hovering manner. The ultrasonic levitation force field allows a highly precise positioning of the working unit relative to the workpiece surface so as to allow a precise treatment or machining of the workpiece surface.