Patents Examined by Joel Horning
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Patent number: 9862148Abstract: A composition and method of infiltrating an article of manufacture prepared by a laser sintering process is disclosed. The infiltration process maintains the dimensions and flexibility of the article, increases the strength of the article, and improves the physical and esthetic properties of the article.Type: GrantFiled: November 10, 2014Date of Patent: January 9, 2018Assignee: 3D Systems, Inc.Inventors: Raffaele Martinoni, Paul Boehler
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Patent number: 9856556Abstract: The present invention relates to a wear resistant coating suitable to be deposited on cutting tool inserts for chip forming metal machining. The coating comprises at least two layers with different grain size, but with essentially the same composition. The coating is deposited by Physical Vapor Deposition (PVD).Type: GrantFiled: March 30, 2011Date of Patent: January 2, 2018Assignee: OERLIKON SURFACE SOLUTIONS AG, PFAEFFIKONInventors: Jacob Sjölén, Jon Andersson, Jörg Vetter, Jürgen Müller
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Patent number: 9802220Abstract: Molybdenum (IV) amide complexes are disclosed herein corresponding in structure to Formula (I): wherein: L is —NR1R2; R1 and R2 are C1-C6-alkyl or hydrogen; R is C1-C6-alkyl; and n is zero, 1, 2 or 3. Further, methods of forming MoO2 films by atomic layer deposition (ALD) using Formula (I) complexes and Mo[N(Me)(Et)]4 are disclosed herein.Type: GrantFiled: August 25, 2011Date of Patent: October 31, 2017Assignee: Merck Patent GmbHInventors: Peter Nicholas Heys, Rajesh Odedra, Sarah Louise Hindley
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Patent number: 9789557Abstract: A method of providing an oxidation resistant coating is disclosed. The method includes providing a substrate having a first surface and cooling holes. A portable coating device includes electro-spark deposition (ESD) equipment and an ESD torch connected with the ESD equipment. The ESD torch has an inert gas source and a rotary electrode conductive material. The rotary electrode is positioned within the ESD torch, and is shielded by an inert gas. The rotary electrode applies a compositionally controlled protective coating to the first surface of the substrate. Then the rotary electrode is inserted into the cooling hole and generates an electrospark between rotary ESD electrode and the substrate to form a rounded edge and deposit a coating of electrode material alloy at a cooling hole edge.Type: GrantFiled: August 3, 2015Date of Patent: October 17, 2017Assignee: General Electric CompanyInventors: Dechao Lin, Ibrahim Ucok, Kivilcim Onal
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Patent number: 9758866Abstract: A compound that is useful for forming a metal by reaction with a reducing agent is described by formula (I): wherein M is a metal selected from Groups 2 through 12 of the Periodic Table; and R1, R2, R3, and R4 are each independently H or C1-C8 alkyl.Type: GrantFiled: February 13, 2013Date of Patent: September 12, 2017Assignee: Wayne State UniversityInventors: Charles H. Winter, Lakmal C. Kalutarage
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Patent number: 9738530Abstract: The deposition of polycrystalline silicon onto heated filament rods in a Siemens process is improved by supplying reaction gas at least partially through nozzles in the vertical wall of the deposition reactor, at an angle of 0° to 45° to the reactor wall, towards the base plate of the reactor.Type: GrantFiled: February 26, 2014Date of Patent: August 22, 2017Assignee: WACKER CHEMIE AGInventors: Goeran Klose, Heinz Kraus, Tobias Weiss
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Patent number: 9721754Abstract: The invention relates to a method for processing a substrate with a focussed particle beam which incidents on the substrate, the method comprising the steps of: (a) generating at least one reference mark on the substrate using the focused particle beam and at least one processing gas, (b) determining a reference position of the at least one reference mark, (c) processing the substrate using the reference position of the reference mark, and (d) removing the at least one reference mark from the substrate.Type: GrantFiled: May 9, 2011Date of Patent: August 1, 2017Assignee: Carl Zeiss SMT GmbHInventors: Tristan Bret, Petra Spies, Thorsten Hofmann
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Patent number: 9708706Abstract: A thin film deposition system and method provide for multiple target assemblies that may be separately powered. Each target assembly includes a target and associated magnet or set of magnets. The disclosure provides a tunable film profile produced by multiple power sources that separately power the target arrangements. The relative amounts of power supplied to the target arrangements may be customized to provide a desired film and may be varied in time to produce a film with varied characteristics.Type: GrantFiled: November 30, 2011Date of Patent: July 18, 2017Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chung-En Kao, Ming-Chin Tsai, You-Hua Chou, Chen-Chia Chiang, Chih-Tsung Lee, Ming-Shiou Kuo
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Patent number: 9708707Abstract: A hybrid deposition process of CVD and ALD, called NanoLayer Deposition (NLD) is provided. The NLD process is a cyclic sequential deposition process, comprising introducing a first plurality of precursors to deposit a thin layer with the deposition process not self limiting, followed by introducing a second plurality of precursors for plasma treating the thin deposited layer. The plasma can be isotropic, anisotropic, or a combination of isotropic and anisotropic to optimize the effectiveness of the treatment of the thin deposited layers.Type: GrantFiled: May 19, 2010Date of Patent: July 18, 2017Assignee: ASM INTERNATIONAL N.V.Inventors: Robert Anthony Ditizio, Tue Nguyen, Tai Dung Nguyen
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Patent number: 9703199Abstract: A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes first, second and third processing units, includes forming a photosensitive film on the substrate by said first processing unit before exposure processing by said exposure device and applying washing processing to the substrate by supplying a washing liquid to the substrate in said second processing unit after the formation of said photosensitive film and before the exposure processing. The method also includes applying drying processing to the substrate in said second processing unit after the washing processing by said second processing unit and before the exposure processing and applying development processing to the substrate by said third processing unit after the exposure processing. Applying the drying processing to the substrate includes the step of supplying an inert gas onto the substrate, to which the washing liquid is supplied.Type: GrantFiled: January 7, 2014Date of Patent: July 11, 2017Assignee: SCREEN Semiconductor Solutions Co., Ltd.Inventors: Toru Asano, Yukio Toriyama, Takashi Taguchi, Tsuyoshi Mitsuhashi
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Patent number: 9683299Abstract: Internally reinforced structural composites, suitable uses for such composites, and associated methods of manufacturing are disclosed herein. In one embodiment, a method of making a reinforced structural component includes forming a precursor having a crystal structure with a plurality of lattice layers and exfoliating the precursor. As a result, a distance between adjacent pairs of the plurality of lattice layers is expanded. The method also includes wrapping the exfoliated precursor with a surface support material around at least a portion of a circumference of the individual lattice layers in the exfoliated precursor.Type: GrantFiled: August 16, 2010Date of Patent: June 20, 2017Assignee: McAlister Technologies, LLCInventor: Roy E. McAlister
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Patent number: 9644264Abstract: Because an evaporating apparatus for use in an MOCVD film deposition system has a structure in which a plurality of gas passages brings in a gas from the upper direction, the apparatus has a difficulty to position a jet nozzle, and the apparatus is incapable of accurately controlling the pressure and flow rate of a carrier gas mixed with a raw material solution to be issued into an evaporating unit, and it is thus difficult to highly accurately control the composition of MOCVD films. A plurality of gas passages is arranged on a flat, disk-shaped plate. With this configuration, the accurate positioning of the jet nozzle can be made easier, and the composition of MOCVD films can be controlled highly accurately.Type: GrantFiled: June 10, 2013Date of Patent: May 9, 2017Assignees: KABUSHIKI KAISHA WATANABE SHOKOInventors: Masayuki Toda, Masaki Kusuhara, Masaru Umeda, Mitsuru Fukagawa
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Patent number: 9617641Abstract: The invention provides a method for providing an Au-containing layer onto a surface of a work piece, which method comprises: providing 510 a deposition fluid comprising Au(CO)Cl; depositing 520 the fluid on at least part of the surface of the work piece; and directing 530 a charged particle beam toward the surface of the work piece onto which at least part of the fluid is deposited to decompose Au(CO)Cl thereby forming the Au-containing layer on the surface of the work piece. By using Au(CO)Cl as a precursor for charged particle induced deposition, a gold Au layer may be deposited with a very high purity compared to methods known in the art.Type: GrantFiled: June 11, 2010Date of Patent: April 11, 2017Assignee: FEI CompanyInventor: Johannes Jacobus Lambertus Mulders
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Patent number: 9616458Abstract: A device for producing or building up a metal part by sintering and laser fusion, the device including a laser beam generator, a mechanism for deflecting the beam to scan a surface of the part to be produced, a sintering pan including a metal powder used to cover the surface of the part and to be melted by the laser beam to thicken the part, and at least one mechanism for heating powder contained in an area of the sintering pan by induction.Type: GrantFiled: January 30, 2012Date of Patent: April 11, 2017Assignee: SNECMAInventors: Thierry Flesch, Jean-Baptiste Mottin
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Patent number: 9593434Abstract: In a rotating disk reactor (1) for growing epitaxial layers on substrate (3), gas directed toward the substrates at different radial distances from the axis of rotation of the disk has substantially the same velocity. The gas directed toward portions of the disk remote from the axis (10a) may include a higher concentration of a reactant gas (4) than the gas directed toward portions of the disk close to the axis (10d), so that portions of the substrate surfaces at different distances from the axis (14) receive substantially the same amount of reactant gas (4) per unit area. A desirable flow pattern is achieved within the reactor while permitting uniform deposition and growth of epitaxial layers on the substrate.Type: GrantFiled: April 17, 2014Date of Patent: March 14, 2017Assignee: Veeco Instruments Inc.Inventors: Michael Murphy, Richard Hoffman, Jonathan Cruel, Lev Kadinski, Jeffrey C. Ramer, Eric A. Armour
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Patent number: 9523147Abstract: A method of continuously subjecting an elongated substrate to vacuum film formation is disclosed. The method comprises the steps of: feeding a first substrate from a first roll chamber in a first direction from the first roll chamber toward a second roll chamber; degassing the first substrate; forming a film of a second material on the first substrate, in a second film formation chamber; and rolling up the first substrate in the second roll chamber, thereby producing the first substrate, and comprises similar steps to produce a second substrate. In advance of producing the first substrate with the second material film, the first cathode electrode of the first film formation chamber is removed from the first film formation chamber, and, in advance of producing the second substrate with the first material film, the second cathode electrode of the second film formation chamber is removed from the second film formation chamber.Type: GrantFiled: April 27, 2012Date of Patent: December 20, 2016Assignee: NITTO DENKO CORPORATIONInventors: Tomotake Nashiki, Yoshimasa Sakata, Hideo Sugawara, Kenkichi Yagura, Akira Hamada, Yoshihisa Ito, Kuniaki Ishibashi
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Patent number: 9487660Abstract: A wire-like spray material (4) based on an iron for electric arc wire spraying and also a functional layer (2) which can be produced therewith on a substrate (1). The functional layer (2) has good corrosion resistance towards diesel fuel having a high sulphur content.Type: GrantFiled: May 3, 2011Date of Patent: November 8, 2016Assignee: Daimler AGInventors: Patrick Izquierdo, Rainer Joos, Tobias Lux, Eyuep Akin Oezdeniz
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Patent number: 9382625Abstract: Methods for making a nanocrystalline diamond layer are disclosed herein. A method of forming a layer can include activating a deposition gas comprising an alkane and a hydrogen containing gas at a first pressure, delivering the activated deposition gas to the substrate at a second pressure which is less than the first pressure, forming a nanocrystalline diamond layer, treating the layer with an activated hydrogen containing gas to remove one or more polymers from the surface and repeating the cycle to achieve a desired thickness.Type: GrantFiled: May 1, 2014Date of Patent: July 5, 2016Assignee: APPLIED MATERIALS, INC.Inventors: Jun Xue, Jingjing Liu, Yongmei Chen, Ludovic Godet, Chentsau Ying, Shambhu N. Roy
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Patent number: 9359211Abstract: Methods of fabricating graphene using an alloy catalyst may include forming an alloy catalyst layer including nickel on a substrate and forming a graphene layer by supplying hydrocarbon gas onto the alloy catalyst layer. The alloy catalyst layer may include nickel and at least one selected from the group consisting of copper, platinum, iron and gold. When the graphene is fabricated, a catalyst metal that reduces solubility of carbon in Ni may be used together with Ni in the alloy catalyst layer. An amount of carbon that is dissolved may be adjusted and a uniform graphene monolayer may be fabricated.Type: GrantFiled: July 12, 2010Date of Patent: June 7, 2016Assignee: Samsung Electronics Co., Ltd.Inventors: Yun-sung Woo, David Seo, Sun-ae Seo, Hyun-jong Chung, Sae-ra Kang, Jin-seong Heo
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Patent number: 9334607Abstract: A device for producing a composite fiber material in the form of a fiber band impregnated with a polymer includes a transport device for supplying and for transporting a fiber band along a processing path. To preheat the raw fiber band to a processing temperature a preheating device is used. An application device is used for applying the melted polymer on the whole width onto the surface of the raw fiber band. At least one pressure shearing vibration application device is used to apply pressure to the raw fiber band perpendicular to the band plane after the application of the polymer, where the application of pressure is performed by at least one pressure stamp with the simultaneous shearing vibration of the pressure stamp by a vibration movement component (y) in the band plane and transversely to a band running direction. At least one tempering device is used to keep the raw fiber band within a processing temperature range.Type: GrantFiled: March 7, 2012Date of Patent: May 10, 2016Assignee: Thermoplast Composite GmbHInventor: Herbert Börger