Patents Examined by John E. Kittle
  • Patent number: 4741964
    Abstract: A structure containing a substrate having a first hydrogenated amorphous silicon layer thereon and a second hydrogenated amorphous silicon layer located above the first layer. The two hydrogenated amorphous silicon layers differ from each other in the concentration of hydrogen contained therein. In addition, a process for fabricating such a structure is provided.
    Type: Grant
    Filed: July 17, 1986
    Date of Patent: May 3, 1988
    Assignee: International Business Machines Corporation
    Inventor: Ivan Haller
  • Patent number: 4741947
    Abstract: An adhesive solid emulsion, containing both high and low epoxy equivalent weight epoxy solids, a curing agent and an optional emulsifying agent, in a carrier containing at least about 55 weight percent water is continuously coated on at least one side of a moving, porous, flexible sheet as discrete resin pattern areas, which resin coated sheet is heated to dry the adhesive emulsion to the B-stage.
    Type: Grant
    Filed: April 24, 1986
    Date of Patent: May 3, 1988
    Assignee: Westinghouse Electric Corp.
    Inventor: William S. Pataki
  • Patent number: 4741965
    Abstract: A soft substance gasket material preferably made of a metal reinforced fiber mat is impregnated with a silicone impregnating agent comprising a mixture of a polysiloxane having reactive hydrogen groups such as a polyhydrogen siloxane, an addition cross-linking polysiloxane such as a methyl vinyl siloxane, and cross-linking catalysts, preferably in the form of only one organic metal compound. In spite of having small quantities of addition cross-linking polysiloxane and cross-linking catalysts, the impregnated seals are not tacky after cross-linking, they are easy and inexpensive to manufacture, and they evidence improved functional characteristics such as improved resistance to hot media, temperature and aging when compared with seals impregnated with only one type of polysiloxane.
    Type: Grant
    Filed: December 11, 1986
    Date of Patent: May 3, 1988
    Assignee: Goetze AG
    Inventors: Hans-Rainer Zerfass, Franz-Josef Giesen
  • Patent number: 4740414
    Abstract: A multilayer board comprising a novel construction of ceramic and organic layers to reduce difficulties commonly encountered by board materials and components attached thereto having differing thermal coefficients of expansion. The multilayer board comprises an inorganic ceramic surface which is affixedly attached via a compliant adhesive to a conventional plated up post or plated thru hole organic multilayer board.
    Type: Grant
    Filed: November 17, 1986
    Date of Patent: April 26, 1988
    Assignee: Rockwell International Corporation
    Inventor: Joseph M. Shaheen
  • Patent number: 4740411
    Abstract: An end portion of an elongate member of generally cylindrical form, such as an optical fiber, is placed in a predetermined position utilizing a substrate having a surface that is defined by a generatrix that is a straight line, e.g. a flat surface. A foil of flexible material is secured to the surface of the substrate and defines with the substrate a generally straight, elongate passageway that is parallel to the generatrix of the surface and has a first portion of substantially uniform cross-section adapted to receive an end of the elongate member in closely fitting relationship and also has a second portion that tapers towards the first portion. The end portion of the elongate member is inserted into the first portion of the passageway by way of the second portion thereof.
    Type: Grant
    Filed: April 22, 1986
    Date of Patent: April 26, 1988
    Assignee: Tektronix, Inc.
    Inventor: John H. Mitch
  • Patent number: 4738907
    Abstract: A photomask manufacturing process including step of forming on a transparent silica glass substrate a silicide film in which an alloy comprising two or more metal elements is silicidized. A resist is applied onto the silicide film and then a patterning mask is provided by light or electron beam, followed by developing step. Exposed portion of the silicide film is etched away using a dry etching process.
    Type: Grant
    Filed: March 20, 1986
    Date of Patent: April 19, 1988
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Akira Shigetomi, Shuichi Matsuda
  • Patent number: 4737425
    Abstract: A patterned image including on a substrate, a patterned image of a first resist polymeric material and patterned image of a second and different resist material on the first resist polymeric material. The polymeric material contains reactive hydrogen functional groups and/or reactive hydrogen precursor groups. At least the surface layer of the delineated and uncovered first resist polymer material is reacted with a multifunctional organometallic material containing at least two functional groups that are reactive with the functional groups of the polymeric material.
    Type: Grant
    Filed: June 10, 1986
    Date of Patent: April 12, 1988
    Assignee: International Business Machines Corporation
    Inventors: Burn J. Lin, Bea-Jane L. Yang, Jer-Mind Yang
  • Patent number: 4737427
    Abstract: A optical recording medium which comprises a substrate and a recording layer of at least two J-aggregates of dyes formed on the substrate is described. The dyes may be photochromic dyes or other types of dyes capable of forming the aggregates which have narrower absorption spectral ranges than original dyes. A plurality of information bits can be written in the recording layer by irradiation of one laser beam spot. The recording layer is formed by an LB film method or a method capable of fluidizing a dye solution in a direction horizontal to the substrate surface. A recording method using the medium is also described.
    Type: Grant
    Filed: March 5, 1986
    Date of Patent: April 12, 1988
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Jinsei Miyazaki, Eiji Ando, Kimiaki Yoshino, Kazuhisa Morimoto
  • Patent number: 4737411
    Abstract: The present invention provides a ceramic composite having an open porous network and a controlled pore size comprising a plurality of ceramic particles having a fused glass coating and a method for producing the same. The ceramic particles are enveloped by and bonded to adjacent ceramic particles at their interfaces by the glass coating.
    Type: Grant
    Filed: November 25, 1986
    Date of Patent: April 12, 1988
    Assignee: University of Dayton
    Inventors: George A. Graves, Jr., Dale E. McCullum, Steven M. Goodrich
  • Patent number: 4737392
    Abstract: Bending and torsional ductility of high tensile reinforcement steel wire or cord, especially for rubber products, such as tires, is improved by taking care that the steel compositions that are currently used for such application, have an extra low sulphur content, i.e. below 0.015%, preferably below 0.010%.
    Type: Grant
    Filed: July 17, 1986
    Date of Patent: April 12, 1988
    Assignee: N.V. Bekaert S.A.
    Inventor: Paul Dambre
  • Patent number: 4735835
    Abstract: Disclosed is a welded can having at least the inner face side of a weld seam covered with a composite film of a thermoplastic resin, wherein the thermoplastic resin composite film comprises (I) an innermost layer, located on the inner face side of the can, of a thermoplastic polyester having a molecularly oriented crystal and comprising a dibasic acid component content of at least 90 mole % of terephthalic acid and a diol component containing at least 90 mole % of ethylene glycol, said innermost layer (I) overlayer (II) a seam-contacting layer, located on the seam side, of a thermoplastic copolyester containing in the chain molecule a dibasic acid component containing 40 to 95 mole % of terephthalic acid and 0 to 40 mole % of isophthalic acid and a diol component containing ethylene glycol and butane diol in a total amount of 65 to 100 mole % at a molar ratio of from 5/95 and 80/20 or a blend of such copolyesters, and the composite film comprising the layers (I) and (II) has an elasticity modulus of 5 to 220
    Type: Grant
    Filed: September 2, 1986
    Date of Patent: April 5, 1988
    Assignee: Toyo Seikan Kaisha, Ltd.
    Inventors: Kazuo Taira, Sachiko Ishikawa, Hisakazu Yasumuro, Kenji Matsuno, Hiroshi Matsubayashi
  • Patent number: 4735877
    Abstract: There is disclosed a lithographic mask structure which comprises a masking material support film and an annular support substrate for supporting the masking material support film at the periphery, the masking material support film containing a fluorescent substance. Also disclosed is a lithographic process for exposing a photosensitive material to irradiation with a radiation beam through a masking material support film provided with a masking material pattern-wise.
    Type: Grant
    Filed: October 6, 1986
    Date of Patent: April 5, 1988
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hideo Kato, Yoshie Izawa, Keiko Chiba
  • Patent number: 4735878
    Abstract: An information recording medium includes a substrate having first and second sides. A layer of photoresist is deposited on the first side of the substrate. This layer of photoresist has a selected thickness and defines an area of openings therein such that the first side of the substrate is exposed at the openings, the openings being distributed in a pattern indicative of selected stored information. A reflecting layer is deposited on the photoresist layer and on the first side of the substrate at the openings. Both the substrate and the layer of photoresist are adapted to transmit the reading beam such that a portion of the reading beam incident on the second side of the substrate is reflected out of the substrate by the reflecting layer, both in a first region comprising the openings and in a second region between the openings.
    Type: Grant
    Filed: August 28, 1986
    Date of Patent: April 5, 1988
    Assignee: Quixote Corporation
    Inventors: Alan B. Hamersley, Michael W. Goff, Vinai K. Thummalapally, Thomas M. Whitworth, Ramchandra R. Nomula
  • Patent number: 4735839
    Abstract: An optical information recording medium comprises a plastic substrate and a recording layer containing an indole type polymethine compound wherein the substituents attached to N atoms in the indole and indolene rings must be different from each other. The compound provides high solubility in alcoholic solvents, high storage stability (light resistance, heat resistance, etc.) and the like.
    Type: Grant
    Filed: June 26, 1986
    Date of Patent: April 5, 1988
    Assignee: Ricoh Co., Ltd.
    Inventors: Tsutomu Sato, Tatsuya Eida, Keiko Ichinose
  • Patent number: 4735890
    Abstract: A photomask, used for the photolithographic fine patterning of a photoresist film in the preparation of semiconductors, is provided with a thin film of a polymeric material having resilient elasticity to cover the patterned masking layer and the surface of the substrate plate altogether so that very intimate contact is obtained between the photomask and the photoresist film contributing to a great increase in the resolving power in addition to the advantages of decreased stain and scratch formation on the surface of the photomask resulting in an increased productivity of semiconductor devices.
    Type: Grant
    Filed: May 16, 1986
    Date of Patent: April 5, 1988
    Assignee: Tokyo Ohka Kogyo Kabushiki Kaisha
    Inventor: Hisashi Nakane
  • Patent number: 4735832
    Abstract: A container made of synthetic resin and provided at one portion thereof with at least one tightly closable opening, which container has on a surface thereof a continuous coating having a gas barrier characteristic comprising low permeability to oxygen and carbon dioxide by the plasma treatment reaction of a mixture of a silicon compound having the general formula I with a silicon compound having the general formula II: ##STR1## wherein m=1-5, n=1-5, R.sup.1 and R.sup.2 are C.sub.1 -C.sub.5 alkyl, C.sub.1 -C.sub.5 alkoxy or phenyl or OH.
    Type: Grant
    Filed: February 24, 1987
    Date of Patent: April 5, 1988
    Assignee: Terumo Kabushiki Kaisha
    Inventors: Toshiji Ichikawa, Yoshimitsu Asada, Ken Tatebe, Tooru Takahashi, Juuro Aoyagi, Takeshi Shimomura
  • Patent number: 4735170
    Abstract: A spray shield for a faceplate panel having a viewing widow and an integral peripheral panel sidewall which terminates in a seal land includes a gasket of a low durometer high temperature elastomer which envelopes the seal land for preventing pull-through of a spray coating. The shield and the gasket prevent the spray coating from being deposited on a predetermined portion of an interior sidewall portion of the panel and on the seal land. Since the gasket prevents pull-through of the spray coating, none of the spray coating is deposited on the exterior surface of the panel.
    Type: Grant
    Filed: December 1, 1986
    Date of Patent: April 5, 1988
    Assignee: RCA Corporation
    Inventor: Samuel B. Deal
  • Patent number: 4735837
    Abstract: A removable adhesive sheet comprising a substrate (A) and an adhesive composition layer which comprises elastic micro-balls (B) and an adhesive (C), the adhesive composition layer being formed on an adhesive layer forming surface of the substrate, wherein the mixing proportion of the elastic micro-balls (B) to the adhesive (C) in the adhesive composition layer is 1:10 to 10:1 in terms of weight ratio, and the protrusive areas of the elastic micro-balls (B) partially protruding from the surface of the adhesive composition layer is entirely covered with the adhesive (C) has an adhesion capability that is not lowered through a frequent repetition of bonding to and removing from an adherend.
    Type: Grant
    Filed: August 8, 1985
    Date of Patent: April 5, 1988
    Assignee: Nichiban Company Limited
    Inventors: Hiroyasu Miyasaka, Yasuaki Kitazaki, Tetsuaki Matsuda, Junichi Kobayashi
  • Patent number: 4735881
    Abstract: A method incorporated in a high throughput EB lithography suitable to the fabrication of VLSI semiconductor circuit. The method comprises a step of providing patterns which are delineated to join together with an overlap determined in accordance with the time interval between the respective delineations thereof by using an electron beam having a high current density and/or high energy. When a first and a second patterns having respective edge portions contacting with each other are delineated in the order of the first pattern and the second pattern by respective exposures thereof to corresponding at least single shots of an electron beam, at least one of the first and second patterns is extended in the direction perpendicular to the edge portions so that the patterns are provided with an overlap with the amount determined in accordance with the time interval between the respective shots of the electron beam to said edge portions.
    Type: Grant
    Filed: July 8, 1986
    Date of Patent: April 5, 1988
    Assignee: Fujitsu Limited
    Inventors: Koichi Kobayashi, Hiroshi Yasuda
  • Patent number: 4734329
    Abstract: Shock absorbing missile launch pad for Mx type missiles having molded ethylene propylene diene terpolymer composition. Pad has curved resilient rubber pad with a Teflon-fiberglass laminate bonded to outer convex surface thereof, and has a support plate bonded to the inner concave surface thereof. Springs are provided to urge pad away from missile at launch to prevent damage to missile.
    Type: Grant
    Filed: May 29, 1984
    Date of Patent: March 29, 1988
    Assignee: The United States of America as represented by the Secretary of the Air Force
    Inventors: George E. Rudd, Joseph F. Meier, John T. Siemon, James O. Bowden, David F. Weir