Abstract: A charged particle beam apparatus produces little reduction in resolution when the beam is inclined with respect to a sample. The trajectory of a primary beam 4 is deflected by a deflector or changed by a movable aperture such that the beam is incident on a plurality of lenses 6 and 7 off the axes thereof. A means is provided to control the off-axis trajectory of the beam such than an aberration produced by the objective lens 7 when the beam is inclined can be canceled by an aberration produced by the other lens 6.

Abstract: An emitter for emitting radiation in a first range of frequencies comprising: a photoconductive material (11); and first and second contact elements (12, 13, 14) separated by a photoconducting gap provided by said photoconducting material (11), for applying a bias across said photoconducting gap, wherein at least one of said first and second contact elements (12, 13, 14) comprises a resistive element (14) for restricting current flow between said first and second contact elements in a second range of frequencies lower than the first range of frequencies.

Abstract: In one embodiment, a sample of an integrated circuit device is prepared for observation in a transmission electron microscope (TEM). The sample may be placed on a surface formed by vertical edges of several TEM grids. The sample may be affixed to a vertical edge of one of the TEM grids. The TEM grid supporting the sample may be separated from the other TEM grids, and then placed in the TEM so that the sample may be observed.

Abstract: A semi-closed observational environment for an electron microscope includes a housing having at least two spacers for partitioning itself into a receiving chamber, a gas chamber below the receiving chamber, a buffer chamber below the gas chamber, at least one gas inlet formed at the gas chamber, and at least one pumping port formed at the buffer chamber. The receiving chamber has at least two view holes formed at top and bottom sides thereof respectively, wherein the latter communicates with the gas chamber. The gas chamber has at least one gas aperture formed at a bottom side thereof for communication with the buffer chamber. The buffer chamber has at least one outer aperture formed at a bottom side thereof for communication with outside. The two view holes of the receiving chamber are coaxially aligned with the gas and outer apertures. A film is mounted to and seals the upper view hole.

Abstract: The present invention provides an apparatus and method for use with a mass spectrometry system. The invention provides an ion source for providing radiative heating to an ionization region. The ion source includes a nanospray ionization device for producing ions and a conduit adjacent to the ionization device for receiving ions from the ionization device. The conduit includes a conductive material for providing indirect radiative heating to the ionization region. Direct radiative heating may also be provided using a heater in the conduit. The ion source may be used separately or in conjunction with the mass spectrometry system. When used in conjunction with a mass spectrometry system a detector may also be employed down stream from the device. A method for desolvating an analyte using the device is also disclosed.

Abstract: In various embodiments, provided are methods for focusing ions for an ion fragmentor, and methods for operating an ion optics assembly. In various embodiments, the present teachings provide methods that substantially maintain the position of the focal point of the an incoming ion beam over a wide range of collision energies, and thereby provide a collimated ion beam for a collision cell over a wide range of energies. In various embodiments, the present teachings provide methods that facilitate decreasing ion transmission losses over a wide range of collision energies.

Abstract: An immersion lithography apparatus and method, and a lithographic optical column structure are disclosed for conducting immersion lithography with at least the projection optics of the optical system and the wafer in different fluids at the same pressure. In particular, an immersion lithography apparatus is provided in which a supercritical fluid is introduced about the wafer, and another fluid, e.g., an inert gas, is introduced to at least the projection optics of the optical system at the same pressure to alleviate the need for a special lens. In addition, the invention includes an immersion lithography apparatus including a chamber filled with a supercritical immersion fluid and enclosing a wafer to be exposed and at least a projection optic component of the optical system.

Abstract: A pulse jitter reduction circuit employs a low jitter system clock coupled to synchronize a pulse generating device and an ultra low jitter flip-flop to generate substantially jitter-free trigger signals employed to generate high voltage pulses for a flight tube of a time-of-flight mass spectrometer. By eliminating time fluctuations due to jitter in the triggering signal, the predictability of the arrival time of ions along a flight tube of a time-of-flight mass spectrometer is greatly improved, thereby improving the resolution of the mass spectrometer.

Abstract: A method and apparatus for conducting mass spectrometry. The mass spectrometry may be accomplished by ion drift-chemical ionization mass spectrometry. One embodiment includes a chemical ionization mass spectrometer comprising an ion drift zone having an ion conductor that transports positive or negative ions. The chemical ionization mass spectrometer further comprises an ion source that produces the positive or negative ions and a mass spectrometer.

Abstract: An ion focusing and conveying device 10 comprises a plurality of electrodes 12 in series. Means is provided to apply a first alternating voltage waveform to each electrode 12, the phase of the alternating voltage in the first waveform is applied to each electrode 12 in the series being ahead of the phase of the first alternating voltage waveform applied to the preceding electrode 12 in the series by less than 180°, preferably by 90° or less, such that ions are focused onto an axis of travel and impelled along the series of electrodes 12.

Abstract: A wafer chuck is designed to allow the substrate to thermally deform during charged particle beam lithography. The wafer chuck includes a compliant layer disposed over an chuck body. During lithography processing the wafer is electrostatically held in contact with a flexible compliant layer and the wafer is exposed to the charged particle beam resulting in thermal deformation of the wafer. The compliant layer deforms with the substrate and allows the wafer to deform in a predictable manner.

Abstract: A container (10) for fissile material comprises an inner annular shaped receptacle (12) contained within an outer annular enclosure (14). The receptacle (12) and the enclosure (14) define an inner chamber (16) surrounded by an outer chamber (18). A closure mechanism (20) fastens the receptacle (12) to the enclosure (14) and seals there between. Two opposing openings (22) are provided in the top of the container (10) to allow fissile material to be introduced into and removed from the inner chamber (16). The openings (22) are shielded by flanges (24) and vented caps (23) seal the openings (22). The annular container (10) is impact resistance. The outer chamber (18) acts as a buffer to protect the inner chamber (16). If the outer chamber (18) ruptures the fissile contents of the inner chamber (16) are contained. The outer chamber (18) also acts to contain any spillage of the fissile material in the event that the inner receptacle (12) fails.

Abstract: A rotating gantry includes a link frame for supporting a plurality of rollers which rotatably support the rotating gantry, a brake for releasing a braking force applied to at least one of the rollers upon supply of air and applying the braking force to the one roller upon discharge of air, and a solenoid valve for sealing the supplied air in the brake when closed, and discharging the air from the brake when opened. The solenoid valve is supported by a solenoid valve support member mounted to the link frame such that the solenoid valve is positioned just near the brake. The rotating gantry can be more quickly braked and stopped while maintaining high irradiation accuracy.

Abstract: The present invention provides a method of sample preparation for use in obtaining elemental isotope ratios of a material by accelerator mass spectrometry. The method comprises forming the material into a sample without any substantial chemical alteration of the material. The invention also provides a sample for use in obtaining elemental isotope ratios of a material.

Abstract: A method and system for separating and preparing a sample for analysis from a wafer without contaminating the wafer with an element such as Ga. A first ion beam is irradiated on a sample and scanned to fabricate a micro sample from a part of the sample. A probe for separating the micro sample from the sample and a micro-sample stage on which the micro sample is to be placed and held are provided. The first ion beam contains at least one of an inert gas, oxygen and nitrogen as an element. A second ion beam contains an element different from the element of the first ion beam. The separated micro sample is fed to the second ion beam from the apparatus of the first ion beam while being held on the micro-sample stage, and is processed by using the second ion beam.

Abstract: An ion-implanting apparatus and method can dynamically control a beam current value with time and does not change energy. This ion-implanting apparatus controls a dynamic change in beam current value with time by giving feedback on the beam current value measured with a beam current measuring device.

Abstract: An apparatus and method for cleaning a plasma source material compound from a plasma produced EUV light source collector optic which may comprise reacting the plasma source material compound with hydrogen to form a hydride of the plasma source material from the plasma source material contained in the plasma source material compound on the collector optic. The method may further comprise initiating the reacting by introducing hydrogen into a plasma formation chamber containing the collector optic, and may further comprise removing the hydride from the collector optic, e.g., by cleaning plasma action and/or plasma source material sputtering, or other means as may be determined to be effective. An apparatus and method of extending the useful life of a plasma produced EUV light source collector coating layer may comprise in situ replacement of the material of the coating layer by deposition of the coating layer material onto the coating layer.

Abstract: The present invention comprehends a compact and economical apparatus for producing high intensities of a wide variety of wanted positive and negative molecular and atomic ion beams that have been previously impossible to previously produce at useful intensities. In addition, the invention provides a substantial rejection of companion background ions that are frequently simultaneously emitted with the wanted ions. The principle underlying the present invention is resonance ionization-transfer where energy differences between resonant and non-resonant processes are exploited to enhance or attenuate particular charge-changing processes. This new source technique is relevant to the fields of Accelerator Mass Spectroscopy; Molecular Ion Implantation; Generation of Directed Neutral Beams; and Production of Electrons required for Ion Beam Neutralization within magnetic fields.

Abstract: In an environmental scanning electron microscope in which differential pumping for maintaining the pressure ratio between an electron optical system and a specimen chamber at a predetermined value is effected and a probe electric current is conditioned to meet a predetermined or more value so as to permit observation of uncooked food and moist specimens in low vacuum, there are provided three stages of objective apertures used as apertures for an objective lens for an electron beam in the electron optical system and used also as orifices for differential pumping for maintaining the pressure ratio between the electron optical system and the specimen chamber at a predetermined value. Then, a deflection fulcrum of the electron beam in the electron optical system is set at a mid stage of the three-stage objective aperture.

Abstract: An adjusting device of an apparatus for generating a beam of charged particles, wherein said beam is for interacting with a target and wherein said adjusting device comprises interface means for receiving, from a user of the apparatus, a set of desired values of characteristics of the beam of charged particles; means for determining a set of nominal values of adjusting parameters of the apparatus, corresponding to said characteristics and for passing them to the apparatus; means for measuring said adjusting parameters of the apparatus, and for computing corresponding values of said characteristics of the beam; and means for determining whether a correction of said values of adjusting parameters is necessary.