Abstract: It is an object of the present invention to provide a laser irradiation apparatus, a laser irradiation method, and a method for manufacturing a semiconductor device using the laser irradiation method that can suppress the energy distribution of the laser beam. The present invention provides a laser irradiation apparatus including a laser oscillator oscillating a pulsed laser beam, a lens assembly having a plurality of optical systems, position control means for controlling the position of the lens assembly to select at least two from the plurality of optical systems in synchronization with oscillations of a plurality of pulses of the pulsed laser beam, wherein the selected plurality of optical systems forms a plurality of pulses with spatial energy distribution inverted or rotated each other.

Abstract: Charged droplet spray is formed from a solution with all or a portion of the charged droplet spray current generated from reduction or oxidation (redox) reactions occurring on surfaces removed from the first or sample solution flow path. In one embodiment of the invention, two solution flow channels are separated by a semipermeable membrane. A first or sample solution flowing through the first solution flow channel exchanges cation or anion charged species through the semipermeable membrane with a second solution or gas flowing through the second flow channel. Charge exchange is driven by the electric field applied at the charged droplet sprayer sample solution outlet. Redox reactions occur at an electrode surface in contact with the second solution. The second solution or gas phase composition can be changed as a step function or as a gradient to run pH or conductivity scans in the first solution to optimize or modify Electrospray performance in Electrospray mass spectrometry applications.

Abstract: The invention relates to scanning magnetic microscope which has a photoluminescent nanoprobe implanted in the tip apex of an atomic force microscope (AFM), a scanning tunneling microscope (STM) or a near-field scanning optical microscope (NSOM) and exhibits optically detected magnetic resonance (ODMR) in the vicinity of impaired electron spins or nuclear magnetic moments in the sample material. The described spin microscope has demonstrated nanoscale lateral resolution and single spin sensitivity for the AFM and STM embodiments.

Abstract: A charged beam processing apparatus for processing an object to form structures on the object includes a processing chamber, a multi-charged beam optical system configured to generate a plurality of charged beams, and to converge and to deflect the plurality of charged beams to irradiate the object in the processing chamber with the plurality of charged beams, and a supply port configured to supply a gas into the processing chamber. The multi-charged beam optical system includes (i) a lens array, and (ii) a pattern forming plate configured to select a portion of the lens array to be used to form the structures. The charged beam processing apparatus includes a controller configured to control an exchange of the pattern forming plate in accordance with an arrangement pattern of the structures to be formed on the object.

Abstract: A substrate cover includes a frame-like member configured to be placed on a substrate which is to be written using a charged particle beam, and to have an outer perimeter dimension larger than a perimeter end of the substrate and an inner perimeter dimension, being a border between the frame-like member and an inner opening portion, smaller than the perimeter end of the substrate, and a contact point part configured to be provided on an undersurface of the frame-like member, in order to be electrically connected to the substrate.

Abstract: There is disclosed a charged-particle beam system equipped with a higher-order aberration corrector capable of correcting fifth-order spherical aberration and third-order chromatic aberration such that the primary trajectory of an electron beam is not affected by the strength of a transfer lens. The corrector is so adjusted that the image point of the corrector is located at a position shifted a distance of L0 from the principal plane of an objective lens toward the electron source. The transfer lens is so disposed that the position of the principal plane is coincident with the image point of the corrector. Therefore, the primary trajectory of the electron beam passes through the center of the transfer lens. Consequently, the primary trajectory is not affected by the strength of the transfer lens.

Abstract: A device and method which enable a transmission electron microscope to measure electron diffraction patterns of a sample very precisely are disclosed. The patterns are suitable for structure determination. The electron beam is precessed by means of deflector coils (6) in the transmission electron microscope before the sample (4), in combination with a similar precession of the electron diffraction pattern by means of deflector coils (9) situated after the sample. The electron diffraction pattern is scanned by means of deflector coils (9) situated after the sample.

Abstract: An illumination condenser for a particle optics projection system is disclosed. The illumination condenser is formed of a magnetic lens comprising a plurality of gaps. The magnetic lens is formed of a sequence of a plurality of partial lenses.

Abstract: A focusing particle trap system for ion implantation comprising an ion beam source that generates an ion beam, a beam line assembly that receives the ion beam from the ion beam source comprising a mass analyzer that selectively passes selected ions, a focusing electrostatic particle trap that receives the ion beam and removes particles from the ion beam comprising an entrance electrode comprising an entrance aperture and biased to a first base voltage, wherein the first surface of the entrance electrode is facing away from a center electrode and is approximately flat, wherein the second surface of the entrance electrode is facing toward the center electrode and is concave, wherein the center electrode is positioned a distance downstream from the entrance electrode comprising a center aperture and biased to a center voltage, wherein the center voltage is less than the first base voltage, wherein the first surface of the center electrode is facing toward the entrance electrode and is convex, wherein the second

Abstract: The present invention relates to high-speed acquisition of both a perpendicular observation image and a tilt observation image, in observation using a scanning electron microscope. An electron-beam observation apparatus includes: a first electro-optical system which scans a converged electron beam from a substantially perpendicular direction to a defect on a target wafer to be observed, and acquires a defect image signal with perpendicular observation by detecting a secondary electron image or a reflected electron image generated from the defect; and a second electro-optical system which scans a converged electron beam from a tilt direction to the defect, and acquires a defect image signal with tilt observation by detecting a secondary electron image or a reflected electron image generated from the defect.

Abstract: In a system for analyzing samples by mass spectrometry, analyte ions are analyzed first by field asymmetric ion mobility spectrometry (FAIMS) before being analyzed by a mass analyzer. The analyte ions are produced in an ion source operating at near atmospheric pressure and transferred via a dielectric capillary into the vacuum system of the mass analyzer. While passing through the capillary, the ions are analyzed by FAIMS via electrodes on the interior wall of the capillary.

Abstract: The invention is directed to an arrangement for generating extreme ultraviolet radiation from a plasma generated by an energy beam with high conversion efficiency, particularly for application in radiation sources for EUV lithography. It is the object of the invention to find a novel possibility for generating EUV radiation by means of a plasma induced by an energy beam that permits a more efficient conversion of the energy radiation into EUV radiation in the wavelength region of 13.5 nm and ensures a long lifetime of the optical components and the injection device.

Abstract: An EUV light source is disclosed that may include a laser source, e.g. CO2 laser, a plasma chamber, and a beam delivery system for passing a laser beam from the laser source into the plasma chamber. Embodiments are disclosed which may include one or more of the following; a bypass line may be provided to establish fluid communication between the plasma chamber and the auxiliary chamber, a focusing optic, e.g. mirror, for focusing the laser beam to a focal spot in the plasma chamber, a steering optic for steering the laser beam focal spot in the plasma chamber, and an optical arrangement for adjusting focal power.

Abstract: An electric field lens includes an entrance electrode, an intermediate electrode, and an exit electrode that are arranged in a traveling direction of ion beams. The intermediate electrode is maintained in a positive potential, and the entrance electrode and the exit electrode are maintained in a ground potential. In addition, the electric field lens includes a first control electrode and a second control electrode that are disposed between the entrance electrode and the intermediate electrode and between the intermediate electrode and the exit electrode, respectively and maintained in a negative potential.

Abstract: An apparatus for checking the alignment of laser beams for indicating a position in relation to a diagnostic and/or therapeutic machine, which has a isocentre, wherein the machine has a patient support movable in its position, laser beams and isocentre being aligned in relation to each other such that the laser beams intersect with each other in the isocentre of the machine, wherein the machine has the following a carrier element, which is provided with means for being arranged in a predetermined position on the patient support of the machine, a first and a second measuring device, each one at a time being equipped with connection means for the carrier element, wherein the first measuring device measures the position of the impingent laser beams with respect to a predetermined position in relation to the patient support, the second measuring device records the position of the isocentre in relation to the predetermined position of the first measuring device.

Abstract: Many applications in the study of metabolics and proteomics require measurements on peptides and small molecules with high resolving power and mass accuracy. These are often present in complex mixtures and sensitivity over a relatively broad mass range, speed of analysis, reliability, and ease of use are very important. The present invention is a time-of-flight mass spectrometer providing optimum performance for these and similar applications.

Abstract: An apparatus and method for regenerating ion samples for a mass spectrometer are provided. Source samples are loaded on a support which is heated by a laser beam, desorbing the sample without ionization. The desorbed sample is carried by a carrier gas flow through a transfer tube, at the output of which it is ionized by corona discharge or photo-ionization. The obtained ionized sample may be analyzed in a mass spectrometer or used to serve any other appropriate purpose.

Abstract: Multi-purpose electrostatic lens for an ion implanter. The electrostatic lens allows an ion implanter to scan, accelerate, decelerate, expand, compress, focus and parallelize an ion beam. This capability enables the ion implanter to function as either a high precision medium-current ion implanter or as a high-current ion implanter.

Abstract: Ion detection methods are provided that can include applying a first voltage between a power source and a dynode, and contacting the dynode with first ions to create a first charged species. After applying the first voltage, a second voltage can be applied between the power source and the dynode, and the dynode can be contacted with second ions to create a second charged species. Mass spectrometry instrument circuitry is also provided that can include a power source coupled to a dynode via at least one switch with the switch being operatively configured in one position to apply a first voltage between the dynode and the power source, and, in another position, configured to apply a second voltage between the dynode and the power source. Mass spectrometry analysis methods are also provided that can include detecting sorted ions using a dynode configured according to an ion detection parameter with the ion detection parameter including first and second dynode values associated with first and second time values.

Abstract: Column for simultaneously producing a focused particle beam and a focused light beam and method for treating a sample using the column. The column has lateral walls, an input electrode having a particle aperture for emitting a particle beam, an electrostatic lens, an optical focusing device within the lens, and a deflection optical mirror. The method comprises locating the sample below the column, passing the particle beam through entry aperture and exit aperture of the lens to be focused on a selected location on the sample, and injecting an optical beam into the lens through the entry aperture. The lens incorporates convex and concave optical mirrors. The optical beam is injected into the lens to reflect from the convex optical mirror towards the concave optical mirror and then reflect from the concave optical mirror to exit from the exit aperture to be focused on the selected location on the sample.