Patents Examined by Johnnie L Smith
  • Patent number: 8274045
    Abstract: A method of imaging mass spectroscopy and a corresponding apparatus are provided, wherein the m/z-ratio of ions as well as the location of said ions on a sample surface are detected simultaneously in a time of flight mass spectrometer. The detector is a semiconductor array detector comprising pixels, that each can be arranged to measure a signal intensity of a signal induced by the ions or their time of arrival. A four-dimensional image consisting of the two lateral dimensions on the sample surface, the m/z-ratio representing the ion type and the abundance of an ion type on the surface can be reconstructed from repeated measurements for which a correspondingly adapted computer program product can be involved.
    Type: Grant
    Filed: April 16, 2009
    Date of Patent: September 25, 2012
    Inventors: Casimir Bamberger, Andreas Bamberger
  • Patent number: 8269194
    Abstract: A composite focused ion beam device has a sample stage for supporting a sample, a first ion beam irradiation system that irradiates a first ion beam for processing the sample, and a second ion beam irradiation system that irradiates a second ion beam for processing or observing the sample. The first ion beam irradiation system has a liquid metal ion source that generates first ions for forming the first ion beam. The second ion beam irradiation system has a gas field ion source that generates second ions for forming the second ion beam. The first ion beam irradiated by the first ion beam irradiation system has a first beam diameter and the second ion beam irradiated by the second ion beam irradiation system has a second beam diameter smaller than the first beam diameter. The first and second ion beam irradiation systems are disposed relative to the sample stage so that axes of the first and second ion beams are orthogonal to a tilt axis of the sample stage.
    Type: Grant
    Filed: August 6, 2008
    Date of Patent: September 18, 2012
    Assignee: SII NanoTechnology Inc.
    Inventors: Takashi Kaito, Junichi Tashiro, Yasuhiko Sugiyama, Kouji Iwasaki, Toshiaki Fujii, Kazuo Aita, Takashi Ogawa
  • Patent number: 8258468
    Abstract: An ion mobility spectrometer includes a protective housing. A drift tube having at least one inlet and at least one outlet confines a drift gas. An ion gate is positioned in the drift tube. The ion gate defines a reaction region and a drift region in the drift tube. An ion detector is positioned in the drift tube downstream of the ion gate at an end of the drift region. A helical resistive wire coil is positioned around the drift tube. A power supply generates an electric field in the helical resistive wire coil that rapidly controls the temperature of the drift gas.
    Type: Grant
    Filed: March 12, 2010
    Date of Patent: September 4, 2012
    Assignee: Excellims Corporation
    Inventor: Ching Wu
  • Patent number: 8258489
    Abstract: An energy contamination detection apparatus includes a membrane and a charge collection plate disposed at a distance from the membrane. The membrane is configured to receive an ion beam and allow a portion of the ion beam having energy levels above a desired energy level to pass therethrough toward the charge collection plate and absorb or reflect portions of the ion beam having energy levels at or below the desired energy level. A voltage source is electrically coupled to the charge collection plate for providing a bias voltage to the charge collection plate. A detection circuit is coupled to the charge collection plate and is configured to detect energy contamination based on an amount of charge collected on the charge collection plate.
    Type: Grant
    Filed: March 31, 2010
    Date of Patent: September 4, 2012
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventor: Frank Sinclair
  • Patent number: 8237111
    Abstract: A multi-reflecting ion optical device includes electrostatic field generating means configured to generate electrostatic field defined by a superposition of first and second distributions of electrostatic potential ?EF, ?LS. The first distribution ?EF subjects ions to energy focusing in a flight direction and the second distribution ?LS subjects ions to stability in one lateral direction, to stability in another lateral direction for the duration of at least a finite number of oscillations in the one lateral direction and to subject ions to energy focusing in the one lateral direction for a predetermined energy range.
    Type: Grant
    Filed: June 20, 2008
    Date of Patent: August 7, 2012
    Assignee: Shimadzu Corporation
    Inventors: Uriy Golikov, Konstantin Solovyev, Mikhail Sudakov, Sumio Kumashiro
  • Patent number: 8228602
    Abstract: A scanning system that provides for detection based on supercritical angle fluorescence (SAF) is described. The system provides for the optical coupling of a sample to the scanner in a sandwich structure that uses first and second refractive index matching materials to provide optical coupling through the sandwich arrangement.
    Type: Grant
    Filed: March 25, 2010
    Date of Patent: July 24, 2012
    Assignee: Dublin City University of Collins Avenue
    Inventors: Dirk Kurzbuch, Jim Writser Peter Bakker, Thomas Ruckstuhl, Jonas Melin
  • Patent number: 8198612
    Abstract: As disclosed herein, a device may comprise a substrate made of a material comprising silicon, the substrate having a first side and an opposed second side; an EUV reflective multi-layer coating overlaying at least a portion of the first side; an infrared absorbing coating overlaying at least a portion of the second side; and a system generating infrared radiation to heat the absorbing coating and the substrate.
    Type: Grant
    Filed: July 31, 2008
    Date of Patent: June 12, 2012
    Assignee: Cymer, Inc.
    Inventors: Juan Armando Chavez, Norbert R. Bowering
  • Patent number: 8188427
    Abstract: A method and apparatus for alignment and astigmatism correction for a scanning electron microscope can prevent an alignment or correction error attributable to the conditions of a particular specimen. First, a difference is determined between optimal values acquired from an automatic axis alignment result on a standard sample, and those obtained from each of a plurality automatic axis alignment results on a observation target sample. An optimal value is then adjusted using the standard sample, by use of the difference thus obtained. Correspondingly, an optimal stigmator value (astigmatism correction signal) is acquired by using the standard sample, and storing the optimal stigmator value as a default value. The optimal stigmator value and the default value depending on the height of an observation target sample pattern are added, and an astigmatism correction is performed on the basis of the resultant stigmator value.
    Type: Grant
    Filed: July 30, 2008
    Date of Patent: May 29, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Junichi Kakuta, Kazuhiro Ueda, Tatsuya Maeda, Hiroyuki Saito, Katsuhiro Sasada
  • Patent number: 8188448
    Abstract: An ion source is provided that utilizes the same dopant gas supplied to the chamber to generate the desired process plasma to also provide temperature control of the chamber walls during high throughput operations. The ion source includes a chamber having a wall that defines an interior surface. A liner is disposed within the chamber and has at least one orifice to supply the dopant gas to an inside of the chamber. A gap is defined between at least a portion of the interior surface of the chamber wall and the liner. A first conduit is configured to supply dopant gas to the gap where the dopant gas has a flow rate within the gap. A second conduit is configured to remove the dopant gas from the gap, wherein the flow rate of the dopant gas within the gap acts as a heat transfer media to regulate the temperature of the interior of the chamber.
    Type: Grant
    Filed: April 5, 2010
    Date of Patent: May 29, 2012
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Victor Benveniste, Bon-Woong Koo, Shardul Patel, Frank Sinclair
  • Patent number: 8183542
    Abstract: An ion source is provided that utilizes a cooling plate and a gap interface to control the temperature of an ion source chamber. The gap interface is defined between the cooling plate and a wall of the chamber. A coolant gas is supplied to the interface at a given pressure where the pressure determines thermal conductivity from the cooling plate to the chamber to control the temperature of the interior of the chamber.
    Type: Grant
    Filed: April 5, 2010
    Date of Patent: May 22, 2012
    Assignee: Varion Semiconductor Equipment Associates, Inc.
    Inventors: Victor Benveniste, Bon-Woong Koo, Shardul Patel, Frank Sinclair
  • Patent number: 8183544
    Abstract: A correcting substrate for a charged particle beam lithography apparatus includes a substrate body using a low thermal expansion material having a thermal expansion lower than that of a silicon oxide (SiO2) material; a first conductive film arranged above the substrate; and a second conductive film selectively arranged on the first conductive film and having a reflectance higher than the first conductive film, wherein the low thermal expansion material is exposed on a rear surface of the correcting substrate.
    Type: Grant
    Filed: March 20, 2009
    Date of Patent: May 22, 2012
    Assignee: NuFlare Technology, Inc.
    Inventors: Kaoru Tsuruta, Takashi Kamikubo, Rieko Nishimura, Shusuke Yoshitake, Shuichi Tamamushi
  • Patent number: 8183801
    Abstract: Multi-energy radiation sources comprising charged particle accelerators driven by power generators providing different RF powers to the accelerator, capable of interlaced operation, are disclosed. Automatic frequency control techniques are provided to match the frequency of RF power provided to the accelerator with the accelerator resonance frequency. In one example where the power generator is a mechanically tunable magnetron, an automatic frequency controller is provided to match the frequency of RF power pulses at one power to the accelerator resonance frequency when those RF power pulses are provided, and the magnetron is operated such that frequency shift in the magnetron at the other power at least partially matches the resonance frequency shift in the accelerator when those RF power pulses are provided. In other examples, when the power generator is a klystron or electrically tunable magnetron, separate automatic frequency controllers are provided for each RF power pulse.
    Type: Grant
    Filed: August 12, 2008
    Date of Patent: May 22, 2012
    Assignee: Varian Medical Systems, Inc.
    Inventors: Gongyin Chen, John Turner, Douglas W. Eaton
  • Patent number: 8168956
    Abstract: A scanning transmission electron microscope (STEM) and method of aberration correction have autocorrelation function calculation means, aberration coefficient calculation means, and feedback control. At least two images are obtained by varying a value at which one of the electron optical means is set. The at least two images are autocorrelated. Iso-intensity lines are fit to aberration functions. Aberration coefficients are obtained based on aberration functions. The feedback controls the electron optical column.
    Type: Grant
    Filed: March 10, 2009
    Date of Patent: May 1, 2012
    Assignee: JEOL Ltd.
    Inventor: Hidetaka Sawada
  • Patent number: 8163632
    Abstract: A method for processing the surface of a component, or the processing of an optical element through an ion beam, directed onto the surface to be processed, so that the surface is lowered and/or removed at least partially, wherein the ions have a kinetic energy of 100 keV or more, as well as optical elements processed by the method.
    Type: Grant
    Filed: December 4, 2007
    Date of Patent: April 24, 2012
    Assignee: CARL ZEISS SMT GmbH
    Inventors: Martin Weiser, Stefan Burkart, Holger Maltor
  • Patent number: 8134135
    Abstract: The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.
    Type: Grant
    Filed: July 23, 2007
    Date of Patent: March 13, 2012
    Assignee: Mapper Lithography IP B.V.
    Inventors: Pieter Kruit, Yanxia Zhang, Martijn J. Van Bruggen, Stijn Willem Herman Karel Steenbrink
  • Patent number: 8003937
    Abstract: An electrospray ion (ESI) source and method capable of ionizing an analyte molecule without oxidizing or reducing the analyte of interest. The ESI source can include an emitter having a liquid conduit, a working electrode having a liquid contacting surface, a spray tip, a secondary working electrode, and a charge storage coating covering partially or fully the liquid contacting surface of the working electrode. The liquid conduit, the working electrode and the secondary working electrode can be in liquid communication. The electrospray ion source can also include a counter electrode proximate to, but separated from, said spray tip. The electrospray ion source can also include a power system for applying a voltage difference between the working electrodes and a counter-electrode. The power system can deliver pulsed voltage changes to the working electrodes during operation of said electrospray ion source to minimize the surface potential of the charge storage coating.
    Type: Grant
    Filed: September 25, 2008
    Date of Patent: August 23, 2011
    Assignee: UT-Battelle
    Inventors: Vilmos Kertesz, Gary Van Berkel
  • Patent number: 8003966
    Abstract: Embodiments of the present disclosure relate generally to transportation containers and assemblies, such as transportation containers and assemblies for containing and transporting radioactive material. A transportation assembly for transporting radioactive material generally includes an outer container defining an inner cavity, the outer container having an inner shell, wherein at least a portion of the inner shell includes a plurality of layers including at least one layer of chopped fiberglass mat and at least one layer of aramid fabric. The transportation assembly may further include an inner container disposed within the inner cavity of the outer container.
    Type: Grant
    Filed: August 24, 2007
    Date of Patent: August 23, 2011
    Assignee: AREVA Federal Services LLC
    Inventors: Charles Joseph Temus, Bryan Flanagan
  • Patent number: 7993546
    Abstract: An apparatus for forming nano-structures of carbon solids includes a reactor chamber into which extends a plasma torch configured to generate a plasma plume that extends into the interior of the reactor chamber. CO2 from is applied to the plasma plume where the CO2 is dissociated into carbon and oxygen. A plurality of nozzles also extends into the reactor chamber, which sprays liquid water on the plume, cooling at least a portion of the carbon causing it to form solid carbon nano-structures in a mixture of liquid water. The mixture is conveyed to a flocculation tank.
    Type: Grant
    Filed: September 23, 2008
    Date of Patent: August 9, 2011
    Assignee: Plasma Waste Recycling, Inc.
    Inventors: Rodrigo B. Vera, Alexander P. Rutberg
  • Patent number: 7989765
    Abstract: An ion trap comprising elongate rods, electrodes, a first circuit, and a second circuit. The rods are for defining the radial extent of a trapping volume. The first circuit is connected to the rods for applying thereto a first RF signal that generates adjacent the trapping volume a radial RF containment field that radially contains ions of different polarities within the trapping volume. The electrodes define the axial extent of the trapping volume. The second circuit is connected to the electrodes for applying thereto a second RF signal that generates adjacent the trapping volume an axial RF containment field that axially contains the ions of different polarities within the trapping volume. The axial RF containment field is independent of the radial RF containment field.
    Type: Grant
    Filed: November 30, 2007
    Date of Patent: August 2, 2011
    Assignee: Agilent Technologies, Inc.
    Inventor: Stuart Carl Hansen
  • Patent number: 7989764
    Abstract: According to an aspect of the present invention, there are provided an ion trap mass spectrometry method and an ion trap mass spectrometry device using a mass spectrometer, the mass spectrometer including: an ion source part for ionizing a sample; an ion trap part for trapping ions generated in the ion source; a main high frequency power source for applying a main high frequency voltage to the ion trap part, and an auxiliary high frequency power source for applying an auxiliary high frequency voltage thereto; and a detector for detecting the ions ejected from the ion trap. The ion trap mass spectrometry method and the ion trap mass spectrometry device includes the steps of: accumulating desired ions into the ion trap part by ejecting undesired ions while accumulating ions into the ion trap part; and ejecting undesired ions that remain in the ion trap part and leaving the desired ions in the ion trap part are repeated alternately.
    Type: Grant
    Filed: August 10, 2007
    Date of Patent: August 2, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hiroyuki Yasuda, Shinji Nagai, Tetsuya Nishida