Patents Examined by Joseph Miller, Jr.
  • Patent number: 11001006
    Abstract: An additive manufacturing apparatus in which a streak in a manufacturing direction is difficult to be made on the surface of a product manufactured object in a boundary region of projection regions of exposure images is provided. In this apparatus, a vessel holds a photosetting liquid resin material, a first projector makes a first exposure image incident from an incident surface and projects it into the resin material, a second projector makes a second exposure image, continuous with the first exposure image, incident from the incident surface and projects it into the resin material, and a controlling unit adjusts on a projection surface a boundary region between a first projection image obtained by projecting the first exposure image by the first projector and a second projection image obtained by projecting the second exposure image by the second projector.
    Type: Grant
    Filed: September 4, 2018
    Date of Patent: May 11, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Yasuhiro Sekine, Toshiki Ito, Yukio Hanyu
  • Patent number: 11000908
    Abstract: Electrodes for and methods of electrical discharge machining are provided. For example, a method for forming a feature in a ceramic matrix composite (CMC) component comprises repeatedly advancing an electrode into and retracting the electrode from the CMC component until a desired depth is reached, where the electrode has a head end, a tip end, and a shaft extending from the head end to the tip end. The shaft has a first side and a second side each recessed inward such that the head end and the tip end are wider than the shaft. A method for forming a feature in a CMC component also may include feeding a dielectric fluid into the feature utilizing the recessed sides. In some embodiments, electrodes may include a shaft extending from a head end to a tip end and a central plane, where the shaft is recessed widthwise toward the central plane.
    Type: Grant
    Filed: November 27, 2018
    Date of Patent: May 11, 2021
    Assignee: General Electric Company
    Inventors: Yuefeng Luo, Allan R. Bridges, Christopher Alan Panczyk, Jason Crumb, Christopher Mark Andrew Philp
  • Patent number: 10975466
    Abstract: There is provision of a method of cleaning an exhaust pipe of a film forming apparatus for removing a component adhering to the exhaust pipe which is generated from a source gas for forming film supplied from a gas supply part to a processing chamber of the film forming apparatus. The method includes a step of supplying a cleaning gas directly, from a cleaning gas supply part disposed near a joint between the processing chamber and the exhaust pipe, to the exhaust pipe without passing through the processing chamber, in order to remove the component by causing the component to vaporize upon reacting with the cleaning gas. The cleaning gas to be supplied is capable of causing the component adhering to the exhaust pipe to change into an evaporable substance by chemical reaction in an atmosphere inside the exhaust pipe.
    Type: Grant
    Filed: September 4, 2018
    Date of Patent: April 13, 2021
    Assignee: Tokyo Electron Limited
    Inventors: Takahito Umehara, Masato Koakutsu, Tsubasa Watanabe
  • Patent number: 10961616
    Abstract: This disclosure relates to the field of display fabrication technologies, and discloses a fine mask support frame, a fine mask, and a method for fabricating the same. The fine mask support frame includes: a plurality of bezels surrounding a mask area, wherein adjustment openings are arranged on at least one pair of bezels arranged opposite to each other, and at least one adjustment piece is arranged on each of the adjustment openings, wherein the adjustment piece is configured to adjust a shape of a corresponding adjustment opening to thereby adjust deformation of the mask area.
    Type: Grant
    Filed: January 5, 2018
    Date of Patent: March 30, 2021
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
    Inventors: Zhiming Lin, Baojun Li, Jian Zhang, Pu Sun, Chun Chieh Huang
  • Patent number: 10937635
    Abstract: In a vacuum processing apparatus including: a vacuum container including a processing chamber therein; a plasma formation chamber; plate members being arranged between the processing chamber and the plasma formation chamber; and a lamp and a window member being arranged around the plate members, in order that a wafer and the plate members are heated by electromagnetic waves from the lamp, a bottom surface and a side surface of the window member is formed of a member transmitting the electromagnetic waves therethrough.
    Type: Grant
    Filed: April 9, 2019
    Date of Patent: March 2, 2021
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Hiroyuki Kobayashi, Nobuya Miyoshi, Kazunori Shinoda, Kenji Maeda, Yutaka Kouzuma, Satoshi Sakai, Masaru Izawa
  • Patent number: 10934169
    Abstract: A drawing apparatus includes a support for supporting a part of a grown form and a drive unit for causing a relative movement of the support and the grown form to draw an extended form from the grown form. The support performs a double support in which, after a predetermined length of the extended form is drawn, at least one of a predetermined position of the extended form or a part of the grown form continuous with the extended form is again supported.
    Type: Grant
    Filed: December 22, 2016
    Date of Patent: March 2, 2021
    Assignee: LINTEC CORPORATION
    Inventors: Kazuhisa Yamaguchi, Kei Hatori
  • Patent number: 10927460
    Abstract: A raw material for forming a thin film that includes a compound represented by General Formula (1) below. In the formula, R1 represents a linear or branched alkyl group having 2 to 4 carbon atoms; R2 to R5 each independently represent a linear or branched alkyl group having 1 to 4 carbon atoms; A represents an alkanediyl group having 1 to 4 carbon atoms; and M represents titanium, zirconium or hafnium. Provided that when M represents zirconium, A represents an alkanediyl group having 3 or 4 carbon atoms. When M represents titanium or hafnium, it is preferred that A represents an alkanediyl group having 2 or 3 carbon atoms. When M represents zirconium, it is preferred that A represent an alkanediyl group having 3 carbon atoms.
    Type: Grant
    Filed: February 27, 2017
    Date of Patent: February 23, 2021
    Assignee: ADEKA CORPORATION
    Inventors: Hiroki Sato, Naoki Yamada, Tsubasa Shiratori, Haruyoshi Sato
  • Patent number: 10919213
    Abstract: A method for fabricating a colored 3D object is provided. The method includes: forming, based on layer-structure data of a target object, a layer-structure product by printing of a molding material; forming a layer-print product by printing color inks on the layer-structure product based on layer-color data; and repeatedly forming the layer-print product to provide a plurality of the layer-print products, and fabricating a colored 3D object from the plurality of the layer-print products, stacked one over another. The color inks are printed synchronously or following the formation of the layer-structure product. A system for fabricating a colored 3D object includes a processing terminal, a print head, and a drive controller. The method and system improve a dimensional accuracy and printing efficiency of the colored 3D object.
    Type: Grant
    Filed: August 21, 2018
    Date of Patent: February 16, 2021
    Assignee: ZHUHAI SAILNER 3D TECHNOLOGY CO., LTD.
    Inventors: Wei Jiang, Wei Chen, Jia Li, Xiaokun Chen, Yi Zhou
  • Patent number: 10923330
    Abstract: A plasma chamber (11?) for coating a substrate with a polymer layer, the plasma chamber includes a first electrode set (14?) and a second electrode set (14?), the first and second electrode sets are arranged either side of a sample chamber for receiving a substrate, wherein the first and second electrode sets include plural electrode layers (141?, 142?) and wherein each electrode set includes plural radiofrequency electrode layers or plural ground electrode layers for coating polymer to each surface of a substrate.
    Type: Grant
    Filed: July 19, 2019
    Date of Patent: February 16, 2021
    Assignee: Europlasma NV
    Inventors: Filip Legein, Frank Ferdinandi
  • Patent number: 10906241
    Abstract: The present disclosure relates to a bioprinter spray head assembly, comprising a mounting block having a passage and a spray head mounted in the passage, wherein a first flow channel is provided in the mounting block, one end of the first flow channel is provided with a port communicating with the passage; the spray head comprises an equal diameter portion away from an outlet of the passage and a reduced diameter portion close to the outlet of the passage, wherein a second flow channel is formed between the reduced diameter portion and the passage, an opening is formed between the reduced diameter portion and the port to communicate the first flow channel and the second flow channel, and the equal diameter portion is configured to occlude the port. The adjustment of the circulation area of the spray head assembly may be achieved by changing the relative positions of the reduced diameter portion and the port, so that the adjustment is convenient and easy to carry out, and there is a favorable implementability.
    Type: Grant
    Filed: December 30, 2015
    Date of Patent: February 2, 2021
    Assignee: Revotek Co., Ltd
    Inventors: Yijun Li, Deming Wang, Leqing Zhang, Xuemin Wen
  • Patent number: 10900125
    Abstract: Apparatus and methods for processing a semiconductor wafer in which a sensor (e.g., a contact thermocouple) is positioned in the gas distribution assembly measures temperature and/or a film parameter before, during and/or after deposition are described.
    Type: Grant
    Filed: September 7, 2017
    Date of Patent: January 26, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Joseph Yudovsky, Kevin Griffin
  • Patent number: 10900117
    Abstract: A coating system includes a coating chamber having a peripheral chamber wall, a top wall, and a bottom wall. The peripheral chamber wall defines a chamber center. A plasma source is positioned at the chamber center. The coating system also includes a sample holder that holds a plurality of substrates to be coated which is rotatable about the chamber center at a first distance from the chamber center. A first isolation shield is positioned about the chamber center at a second distance from the chamber center, the first isolation shield being negatively charged.
    Type: Grant
    Filed: October 24, 2018
    Date of Patent: January 26, 2021
    Assignee: VAPOR TECHNOLOGIES, INC.
    Inventors: Vladimir Gorokhovsky, Ganesh Kamath, Bryce Anton, Rudi Koetter
  • Patent number: 10900116
    Abstract: An arc coating system includes a coating chamber having a peripheral chamber wall, a top wall, and a bottom wall. The peripheral chamber wall, the top wall, and the bottom wall define a coating cavity and a chamber center. A plasma source is positioned at the chamber center wherein the plasma source comprises a central cathode rod and a plurality of cathode rods surrounding the central cathode rod. The coating system also includes a sample holder that holds a plurality of substrates to be coated. Characteristically, the sample holder rotatable about the chamber center at a first distance from the chamber center.
    Type: Grant
    Filed: October 24, 2018
    Date of Patent: January 26, 2021
    Assignee: VAPOR TECHNOLOGIES, INC.
    Inventors: Bryce Anton, Vladimir Gorokhovsky
  • Patent number: 10896835
    Abstract: A system includes a transfer device for transferring workpieces in an atmospheric atmosphere, a transfer unit for transferring the workpieces in a vacuum atmosphere, and a vacuum processing unit including vacuum process chambers connected to the transfer unit and for performing a process on the workpieces in each process chamber. The vacuum processing unit simultaneously performs the process on the workpieces in each process chamber. The process chambers are arranged along a first direction. The transfer unit includes first and second common transfer devices installed along the first direction to transfer the workpieces along the first direction. The first common transfer device is connected to each process chamber at a first side in a second direction perpendicular to the first direction, the second common transfer device is connected to each process chamber at a second side in the second direction.
    Type: Grant
    Filed: March 28, 2018
    Date of Patent: January 19, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Atsushi Kawabe, Keisuke Kondoh
  • Patent number: 10894356
    Abstract: In a coating method example, a coating is formed on a part precursor by blasting the part precursor with a blast medium. The blast medium includes blasting beads and a coating agent. The part precursor is formed from a polymeric build material, and a hardness of the blasting beads is greater than a hardness of the polymeric build material.
    Type: Grant
    Filed: April 15, 2016
    Date of Patent: January 19, 2021
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Jake Wright, Ali Emamjomeh, Geoffrey Schmid
  • Patent number: 10889892
    Abstract: The invention includes apparatus and methods for instantiating and quantum printing materials, such as elemental metals, in a nanoporous carbon powder.
    Type: Grant
    Filed: February 10, 2020
    Date of Patent: January 12, 2021
    Assignee: Quantum Elements Development, Inc.
    Inventor: Christopher J. Nagel
  • Patent number: 10889498
    Abstract: A drawing apparatus, which draws carbon nanotubes from a grown form produced by growing carbon nanotubes, includes a holder for holding a part of the grown form by a holding member and a drive unit for causing a relative movement of the grown form and the holder. The holder includes a winding unit for winding a part of the grown form around the holding member.
    Type: Grant
    Filed: December 22, 2016
    Date of Patent: January 12, 2021
    Assignee: LINTEC CORPORATION
    Inventor: Kazuhisa Yamaguchi
  • Patent number: 10882215
    Abstract: The present disclosure is directed to improved poly(arylene ether ketone) powders for use in laser sintering.
    Type: Grant
    Filed: December 21, 2016
    Date of Patent: January 5, 2021
    Assignee: Arkema Inc.
    Inventors: Angelo Pedicini, Bruce Clay, Benoit Brule
  • Patent number: 10865479
    Abstract: A processing apparatus is provided. The processing apparatus includes a processing chamber having a gas outlet. The processing apparatus further includes a pump. The pump communicates with the gas outlet and is configured to exhaust gas from the processing chamber via the gas outlet. The processing apparatus also includes an intersecting module. The intersecting module includes a number of support members and a number of internal ventilating plates. The support members are arranged along a longitudinal direction, and each of the internal ventilating plates has a number of orifices. At least one of the internal ventilating plates is positioned between two of the support members positioned adjacent to each other.
    Type: Grant
    Filed: March 29, 2018
    Date of Patent: December 15, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Yung-Syuan Lan, Chia-Wei Chen
  • Patent number: 10861736
    Abstract: Apparatus and method for processing a plurality of substrates in a batch processing chamber are described. The apparatus comprises a susceptor assembly, a lift assembly and a rotation assembly. The susceptor assembly has a top surface and a bottom surface with a plurality of recesses in the top surface. Each of the recesses has a lift pocket in the recess bottom. The lift assembly including a lift plate having a top surface to contact the substrate. The lift plate is connected to a lift shaft that extends through the susceptor assembly and connects to a lift friction pad. The rotation assembly has a rotation friction pad that contacts the lift friction pad. The rotation friction pad is connected to a rotation shaft and can be vertically aligned with the lift friction pad.
    Type: Grant
    Filed: February 26, 2019
    Date of Patent: December 8, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Kaushal Gangakhedkar, Joseph Yudovsky