Patents Examined by K. P. Hantis
  • Patent number: 5999270
    Abstract: A projection exposure apparatus includes an illumination optical system for illuminating a first object with exposure light, a projection optical system for projecting a pattern of the first object, illuminated by the exposure light from the illumination optical system, onto a second object, an alignment optical system for illuminating the second object with alignment light, having a wavelength different from the exposure light, and for detecting the alignment light from the second object through the projection optical system, and a moving device for placing the first object on the path of the alignment light when the projection optical system projects the pattern of the first object onto the second object by the exposure light, and for placing the first object out of the path of the alignment light when the alignment optical system detects the alignment light.
    Type: Grant
    Filed: April 10, 1996
    Date of Patent: December 7, 1999
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tetsuya Mori, Masao Kosugi
  • Patent number: 5995234
    Abstract: Method comprises a process for obtaining a photoelectric signal with a waveform having a pair of extremal values at respective positions corresponding to a pair of edge portions of an alignment mark by photoelectrically detecting the reflected light from the alignment mark on a substrate; a first determination process for determining the position of the alignment mark on the basis of a pair of slope portions existing inside the pair of extremal values of the photoelectric signal waveform; a second determination process for determining the position of the alignment mark on the basis of a pair of slope portions existing outside the pair of extremal values of the photoelectric signal waveform; a third determination process for determining the position of the alignment mark on the basis of both a pair of slope portions existing inside said pair of extremal values of the photoelectric signal waveform and a pair of slope portions existing outside; and a process for selecting any one of the first determination proce
    Type: Grant
    Filed: January 21, 1997
    Date of Patent: November 30, 1999
    Assignee: Nikon Corporation
    Inventor: Kenji Nishi
  • Patent number: 5995233
    Abstract: A surveying system which comprises a light source section for emitting laser beam, a rotational portion for rotating the laser beam from the light source in horizontal direction, a light source driving section for driving the light source unit, a survey instrument main unit having a light receiving unit for receiving the reflected laser beam, and a reflecting object for reflecting the laser beam irradiated from the survey instrument main unit main unit of the survey instrument.
    Type: Grant
    Filed: January 29, 1997
    Date of Patent: November 30, 1999
    Assignee: Kabushiki Kaisha TOPCON
    Inventors: Fumio Ohtomo, Hiroyuki Nishizawa, Yoshikatsu Tokuda, Ken-ichiro Yoshino, Toshikazu Adegawa
  • Patent number: 5995221
    Abstract: A modified concentric spectrograph for diffracting light with high stray light rejection without astigmatism is provided. The modified spectrograph includes a grating, a lens, and at least one entrance port and one exit port. The grating has a concave surface and a meridian plane with a first side and a second side. The lens has a substantially planar surface and a convex surface. Preferably, the convex and concave surfaces are substantially concentric. The ports are substantially located on different sides of the meridian plane near a focal plane of the spectrograph. The position of a focal plane may be modified using an optically transmissive triangular prism with a reflective surface, and an optically transmissive block. The position of a focal plane may further be modified with one or more optically transmissive plates. Methods for using the spectrograph are also provided.
    Type: Grant
    Filed: June 27, 1997
    Date of Patent: November 30, 1999
    Assignee: Instruments S.A., Inc.
    Inventors: Warren S. Slutter, Wu Jiang, Alain F. R. Thevenon, Viviane D. Millet, Jeremy J. Goldstone
  • Patent number: 5991023
    Abstract: A method for spectral measurement is disclosed. The method uses a low-resolution grating to disperse light and thereby image a spectrum thereof. The imaged spectrum is converted into a digital electrical signal and is processed in order to enhance the spectral information. The resulting spectral information is analogous to that captured using a higher resolution spectral imager with optical processing of the spectral data. The method is equally applicable to enhancing resolution of spectra captured using high resolution spectral imaging devices.
    Type: Grant
    Filed: May 19, 1998
    Date of Patent: November 23, 1999
    Assignee: Measurement Microsystems A-Z Inc.
    Inventors: Roman Z. Morawski, Andrzej Barwicz, Mohamed B. Slima, Andrzej Miekina
  • Patent number: 5991048
    Abstract: The present invention provides SPR sensors in which the sensing element is a planar lightpipe. The sensors of this invention include configurations which employ multiwavelength light incident on the SPR sensing area at a single angle or at a range of angles. Sensors of this invention also include configurations that employ monochromatic light at a range of angles. Many of the configurations of the SPR lightpipe sensors of this invention involve imaging of input light through the lightpipe. In one embodiment, the invention provides a first order SPR sensor system in which the sensing element is a planar lightpipe. Light coupled into the lightpipe reflects off an SPR sensing area positioned on an external surface planar surface of the lightpipe.
    Type: Grant
    Filed: October 25, 1996
    Date of Patent: November 23, 1999
    Assignee: University of Washington
    Inventors: Scott Karlson, Sinclair S. Yee, Kyle Johnston, Ralph Jorgenson
  • Patent number: 5991025
    Abstract: An apparatus and method for combining NIR spectography with an implement including a combine or a chopper for measuring major constituents of harvested products in real time includes a monochromator or other sensor having no moving optical parts. The monochromator includes a fixed diffraction grating and a photodiode collector comprised of a plurality of photodiodes. A radiation source irradiates a product sample and the reflected radiation is transmitted to the diffraction grating. By analyzing the intensities and wavelengths of the reflected radiation at the photodiode collector, the presence and amount of major constituents of the harvested product can be determined. The present invention may be used on or with a research combine or chopper along with the conventional instrumentation which measures the weight, moisture, and volume of products harvested in a test plot.
    Type: Grant
    Filed: May 11, 1998
    Date of Patent: November 23, 1999
    Assignee: Pioneer Hi-Bred International, Inc.
    Inventors: Steven L. Wright, David L. Johnson, Roland Welle
  • Patent number: 5986769
    Abstract: The present invention relates to a hand-held instrument for reflection measuring on printed sheets and test charts, which includes a housing with a base plate, a measuring head, a display field, a plurality of operating keys, and a measuring and evaluating electronic unit. According to the invention, a parallel guide plate is provided on a mounting side of the measuring head, at a bottom longitudinal edge of the housing, the guide plate in the area of the measuring head is provided with a view recess for a measuring hole thereof.
    Type: Grant
    Filed: April 16, 1998
    Date of Patent: November 16, 1999
    Inventor: Ulrich Krzyminski
  • Patent number: 5982496
    Abstract: A method and system for measuring the thickness of a patterned film. In one embodiment, a first patterned film is impinged with electromagnetic radiation having a wavelength which varies within a given wavelength range. The electromagnetic radiation reflected from the first patterned film is measured. The thickness of the first patterned film is then measured using thickness measuring equipment. The determined thickness of the first patterned film is then correlated with the measured reflectance of the electromagnetic radiation from the first patterned film. A second patterned film is then impinged with electromagnetic radiation having a wavelength which varies within the given wavelength range. The electromagnetic radiation reflected from the second patterned film is measured. The present invention uses the previously determined correlation to determine the thickness of the second patterned film.
    Type: Grant
    Filed: March 11, 1996
    Date of Patent: November 9, 1999
    Assignee: VLSI Technology, Inc.
    Inventor: David H. Ziger
  • Patent number: 5973778
    Abstract: A method for monitoring a thin film of polyimide material on the surface of a liquid crystal display uses nonlinear second-order surface spectroscopy to monitor the condition of a surface. Electromagnetic radiation is directed towards the surface and the second harmonic or other second-order frequency responses are monitored to detect the state of the surface. Preferably, a laser, input optics and output optics are utilized to create the second-order frequency response that is detected.
    Type: Grant
    Filed: October 17, 1996
    Date of Patent: October 26, 1999
    Assignee: Boeing North American, Inc.
    Inventor: Jeffrey H. Hunt
  • Patent number: 5969824
    Abstract: Described herein is a method and apparatus for illuminating film containing emissive interlayers wherein dichroic filters are used both to determine the excitation bandwidth for the interlayers and to prevent excitation light entering a conventional color scanner.
    Type: Grant
    Filed: March 26, 1997
    Date of Patent: October 19, 1999
    Assignee: Eastman Kodak Company
    Inventor: Richard A. Sharman
  • Patent number: 5969812
    Abstract: A spectrophotometer measures optical absorption of light by a sample received in a sample cell. An array of optical elements disperses the light over a spectral pattern, and a fiber optic beam splitter splits light at a selected spectral band into a reference component and a test component. Detectors measure the intensity of the reference component and the test component after the test component passes through the sample. The fiber optic beam splitter includes a plurality of strands arranged with first ends terminating in a common circular area. Opposite ends of peripheral strands are collected into a first set that transmits the test component while the remaining strands for a second set that transmits the reference component. Preferably, there is a single, central, large strand surrounded by smaller strands. Two emitters are provided for light of two different types, such as visible and UV. The optical array forms a collimated beam having an inner core of one type of light and an outer shell of the other.
    Type: Grant
    Filed: October 18, 1995
    Date of Patent: October 19, 1999
    Inventor: David R. Carver
  • Patent number: 5969825
    Abstract: An improvement to a dual-modulation line-locking device for wavelength modulation spectroscopy employing a lowpass filter to generate a nonnormalized error signal and a bandpass filter and RMS-to-DC converter to generate a centering signal. When the error signal is approximately zero and the centering signal is large, the wavelength is coincident with the center of the absorption feature of the sample.
    Type: Grant
    Filed: April 30, 1997
    Date of Patent: October 19, 1999
    Assignee: Southwest Sciences Incorporated
    Inventors: David S. Bomse, Joel A. Silver
  • Patent number: 5966216
    Abstract: An on-axis through the lens optical alignment system for use in semiconductor manufacturing using step and scan photolithographic techniques. An optical alignment system uses a partially common path with the projection optics (16) optical axis (38) in order to detect alignment targets on a wafer (10) and a mask (20). The relative position of the mask (20) and wafer (10) is detected during a single simultaneous scan, and the mask (20) and wafer (10) are resultantly aligned. This provides advantages over prior art multiple channel off-axis through the lens alignment systems and single channel non-through the lens alignment systems. A detailed optical apparatus (60) is disclosed.
    Type: Grant
    Filed: February 14, 1997
    Date of Patent: October 12, 1999
    Assignee: SVG Lithography Systems, Inc.
    Inventors: Daniel N. Galburt, David M. Williamson
  • Patent number: 5956148
    Abstract: A semiconductor surface measurement system (100) is disclosed. In this system, a plurality of wafers (106), each having an exposed surface, are held by a wafer positioning system (104), which sequentially moves the wafers into a measurement zone. A wafer position detection system (124) detects the position of a selected wafer, and generates an output signal indicating the position of the selected wafer. A surface measurement apparatus (114 through 121, 130 through 142) measures a property of the exposed surface of the selected wafer (106) in response to the output signal of the wafer position detection system (124) when the selected wafer is in the measurement zone. The disclosed surface measurement system (100)may be used to gather real-time data concerning surface properties such as composition, roughness and epilayer thickness during multi-wafer semiconductor processing.
    Type: Grant
    Filed: December 12, 1997
    Date of Patent: September 21, 1999
    Assignee: Texas Instruments Incorporated
    Inventor: Francis G. Celii
  • Patent number: 5956150
    Abstract: The invention provides a simple, accurate, low-cost, and repeatable method for using an illumination device (110) to facilitate the alignment of two components (120, 160) during an assembly process. A laser mount positioning device (LMPD) (130) provides an apparatus for holding an illumination device (110) and positioning that illumination device such that the light beam (180) from the illumination device is passed through a guide pin hole (136). The light beam illuminates a guide pin (150) on another component when the two components are aligned properly. The LMPD (130) is installed in the guide pin hole in a preferred embodiment.
    Type: Grant
    Filed: February 2, 1998
    Date of Patent: September 21, 1999
    Assignee: Motorola, Inc.
    Inventor: Mark M. Kanne
  • Patent number: 5953119
    Abstract: A shutter assembly for a trace element detector includes a shutter wheel having at least one window, and a drive mechanism coupled to the shutter wheel, wherein the drive mechanism rotates the shutter wheel to move the window between at least an outlet port of the shutter assembly and a cleaning station of the shutter assembly. The cleaning station includes at least one cleaning jet positioned to apply a cleaning solution to the window when the window is located at the cleaning station. In the preferred embodiment, the shutter assembly further includes a drying station, and the drive mechanism rotates the shutter wheel to move the window to the drying station after the window has passed the cleaning station. The drying station includes at least one gas jet positioned to apply a gas stream to the window when the window is located at the drying station.
    Type: Grant
    Filed: April 13, 1998
    Date of Patent: September 14, 1999
    Assignee: APTI Inc.
    Inventors: Arie Zigler, Jim Galambos, Lorrin Redden, Michael Nelson
  • Patent number: 5953116
    Abstract: A tilt detecting device of the present invention comprises a bubble tube 21, a light emitting element 22 for emitting detection light and photodetector elements 23 and 24 arranged opposite to each other with the bubble tube therebetween, and at least a light shading plate 35 disposed on an optical path of the detection light 26 and for partially blocking off light components entering the photodetector elements from the light emitting element, whereby a part of the detection light entering the photodetector elements is blocked off and it increase difference and ratio of light amounts between the case where the detection light passes through the air bubble of the bubble tube and the case where it passes through only the liquid portion of the bubble tube, and tilt detection accuracy is improved.
    Type: Grant
    Filed: February 5, 1998
    Date of Patent: September 14, 1999
    Assignee: Kabushiki Kaisha TOPCON
    Inventors: Fumio Ohtomo, Hiroshi Koizumi, Jun-ichi Kodaira
  • Patent number: 5953118
    Abstract: A multiplexed spectrophotometry apparatus, including a rotary multiplexer fitted with a plurality of fiber terminals, a spectrophotometer mounted to the multiplexer and rotatable therewith, and a programmable on-board computer. The spectrophotometer includes precision optics, a charge coupled device (CCD) detector, electronics, and a cooling system, all contained in a compact, streamlined housing that is shaped to promote the radiation of heat from the spectrophotometer and thereby prevent excessive heating during operation of the apparatus. The spectrophotometer is mounted directly to the multiplexer so that any selected terminal can readily be brought into precise, reproducible alignment with the spectrophotometer input. All components of the apparatus are contained in a compact housing adapted for either rack-mounted or bench-top use.
    Type: Grant
    Filed: March 13, 1998
    Date of Patent: September 14, 1999
    Assignee: Equitech Int'l Corporation
    Inventors: Patrick E. O'Rourke, William R. Toole, Jr.
  • Patent number: 5953129
    Abstract: A method for the continuous colorimetry of plastics molding compounds, which involves light being introduced, via transmitter light pipes and a sensor head, into the melt of the molding compound and the light reflected there being passed, via receiver light pipes, to a spectrometer or multirange photometer, conjugate transmitter and receiver light pipes in each case being spaced equidistantly.
    Type: Grant
    Filed: June 26, 1997
    Date of Patent: September 14, 1999
    Assignee: BASF Aktiengesellschaft
    Inventors: Rainer Anderlik, Jurgen Ettmuller, Matthias Radle, Paulus Schmaus, Norbert Modersheim