Abstract: An installation for coating a longitudinally-running, strip-shaped metal product includes a tank containing a coating in liquid form, into which the metal product is dipped, a wiping system disposed at a vertical outlet of the product from the tank and intended to wipe each face of the strip-shaped product, at least one ancillary device disposed at an outlet of the product from the wiping system in a manner facing one of the faces of the product, and a holding device holding the wiping system and the ancillary device. The holding device includes a securing unit forming a common lateral support for the wiping system and each ancillary device by using multiple securing points.

Abstract: An apparatus for surface treatment of a workpiece in a production line comprises a positioning frame (1) for the workpiece to be treated. The positioning frame has a coupling (3) for a positioning drive (4). In order to achieve an increase in the production cadence irrespective of the type of surface treatment without having to accept losses with regard to the surface quality of the coating, a hermetically sealable capsule (2) is supported against the positioning frame (1), which capsule (2) has connection lines (5) for the exchange of operating media with different operating medium supply units (6) arranged along the production line.

Abstract: A deposition apparatus includes: a decompressable process container; a showerhead configured to supply a gas in the process container, the showerhead including a lower member having a plurality of gas holes and an upper member that forms, between the upper member and the lower member, a diffusion space that diffuses the gas; a mounting table arranged to face the showerhead and to form a process space between the mounting table and the showerhead; a lifting and lowering mechanism configured to lift and lower the mounting table; a cylindrical section that penetrates the showerhead and communicates with the process space; and a pressure sensor that is airtightly provided in the cylindrical section and configured to measure a pressure in the process space.

Abstract: An apparatus for processing a substrate includes a first processing unit configured to have a first processing container having a first inner space and a first support unit supporting and rotating the substrate in the first inner space; a second processing unit configured to have a second processing container having a second inner space and a second support unit supporting and rotating the substrate in the second inner space; an exhaust unit configured to exhaust the first and the second inner space; a first exhaust pipe configured to have a first exhaust port for introducing atmosphere of the first inner space and exhaust the atmosphere introduced through the first exhaust port to the integrated duct; and a second exhaust pipe configured to have a second exhaust port for introducing atmosphere of the second inner space and exhaust the atmosphere introduced through the second exhaust port to the integrated duct.

Abstract: A method of galvanizing a workpiece. The method is performed using a trough. The trough includes connected walls configured to hold a molten galvanization material within the trough. The trough also includes a first end including a first gate system. The trough also includes a second end, opposing the first end, including a second gate system. The trough also includes a roller connected, inside the trough, to opposing inside walls of the connected walls. The trough also includes a sump disposed within the trough. The method also includes pumping the molten galvanization material into the sump until the molten galvanization material submerges the roller. The method also includes driving the workpiece through the first gate system, over the roller and through the molten galvanization material, and through the second gate system.

Abstract: A substrate liquid processing apparatus configured to supply a plating liquid to a substrate includes a substrate holder configured to hold the substrate; a plating liquid sending device configured to send the plating liquid to a first flow path; a temperature controller connected to the plating liquid sending device via the first flow path and configured to control a temperature of a fluid supplied through the first flow path; a fluid sending device configured to send a fluid different from the plating liquid to the first flow path; and a discharge device connected to the temperature controller and configured to discharge a fluid supplied from the temperature controller.

Abstract: A dummy bar is used to align a laser diode bar during deposition of an insulating film on a front end face (32) and a rear end face (34) of a laser diode bar (30), the dummy bar including a body part (12) having a plate shape, and including a pair of side surfaces (14), an upper surface (16), and a lower surface (18), the body part having a longitudinal length equal to a longitudinal length of the laser diode bar (30), the pair of side surfaces (14) being orthogonal to a longitudinal direction and opposite each other, the upper surface (16) and the lower surface (18) being orthogonal to the pair of side surfaces, parallel to a thickness direction of the plate shape, and opposite each other and a handle part (20) provided at a position separated from the lower surface (18) on each of the pair of side surfaces (14).

Abstract: A deposition mask includes a first area defining a clamping portion at ends of the deposition mask and to which a force is applied to extend the deposition mask in a length direction thereof, a recess area adjacent to the first area and defining a recess at the ends; and a pattern portion including a plurality of pattern holes through which a deposition material passes. Along the length direction, a plurality of first pattern portions are arranged in the first area and a plurality of second pattern portions arranged in the recess area. When the force is applied to the clamping portion, the deposition mask is extended in the length direction thereof and defines non-extended positions of the pattern portions, and for the non-extended positions of the first and second pattern portions, a first distance between adjacent first pattern portions is less than a second distance between adjacent second pattern portions.

Abstract: An application nozzle for applying a viscous material to workpieces includes a nozzle body and an application duct for the viscous material, the duct extending inside the nozzle body from a material inlet opening to a material outlet opening. At least one filler element is located in the application duct, which filler element constricts the cross-section of the application duct and extends from a first end remote from the material inlet opening to a second end at the material outlet opening.

Abstract: A cleaning arrangement (200) for a coating apparatus (100). The coating apparatus has a base (123) for carrying loose material. The base is rotatable to coat the loose material. The cleaning arrangement includes a base-scraping arrangement (127) and further includes a mounting arrangement (131) by which the base-scraping arrangement is mounted to be reversibly lowered, from a coating position, to a scraping position at which the base-scraping arrangement is positioned to scrape buildup from the base.

Abstract: The apparatus for coating systems comprises: a first feeding unit provided with first loading and unloading means of a first coating powder; a second feeding unit provided with second loading and unloading means of a second coating powder; a pump assembly associated with a spraying system for sending the first powder and the second powder into a coating booth; connecting means of the pump assembly to the first feeding unit and to the second feeding unit, variable between: a first configuration, in which the pump assembly is operatively connected to the first feeding unit for sending the first powder into the booth; and a second configuration, in which the pump assembly is operatively connected to the second feeding unit for sending the second powder into said booth.

Abstract: A method and a system for coating products are provided. The method includes the steps of applying a coating liquid to a product and removing excess coating liquid from the product. It is desirable to provide a method and system for efficiently and reliably coating delicate or easily deformable products, such as products molded from a pulp fiber slurry. The method includes fixing the product to a receiving portion of a product carrier that is configured in the same shape as the product, such that an exterior surface of the product abuts the interior concave surface of the receiving portion of the device. A coating liquid is applied to the product in the product carrier. The product carrier is affixed to a centrifuging device and the coating liquid is dispersed over the surface of the product using centripetal force.

Abstract: A sliding device configured to perform a sliding process on a surface of an object to be slid includes a sliding part including sliding bodies each having a flat working surface; a first driving mechanism configured to regularly move the sliding bodies in parallel with the working surfaces of the sliding bodies; and a second driving mechanism configured to regularly move the sliding part in parallel with the working surfaces in a direction different from a moving direction by the first driving mechanism while the first driving mechanism moves the sliding bodies. This enables uniform supply of the sliding process material onto the surface of the object to be slid or clean the surface of the object to be slid.

Abstract: A substrate treating apparatus for treating substrates includes a plurality of substrate treatment lines arranged vertically for carrying out plural types of treatment on the substrates while transporting the substrates substantially horizontally, and a controller for changing processes of treatment carried out on the substrates for each of the substrate treatment lines. By changing the processes of treatment carried out for the substrates for each substrate treatment line, the processes of treatment carried out for the substrates can be changed for each substrate conveniently. Thus, a plurality of different processes of treatment corresponding to the number of substrate treatment lines can be carried out in parallel for the respective substrates.

Abstract: A sputtering device includes a reaction chamber, a pin mechanism, and a microwave heating mechanism. The reaction chamber includes a base configured to carry a workpiece. The pin mechanism is arranged in the reaction chamber. The pin mechanism generates a relative ascending and descending motion with the base and lifts the workpiece from the base. The microwave heating mechanism is arranged in the reaction chamber and includes a microwave transmitter and a mobile device. The mobile device is connected to the microwave transmitter and configured to move the microwave transmitter to a position under the workpiece in response to the workpiece being carried by the pin mechanism to cause the microwave transmitter to emit microwaves to the workpiece to heat the workpiece.

Abstract: In a coating system, two rollers are arranged adjacent to one another. A donor foil with rheological material dispensed thereon is advanced through a gap between the two rollers. Such gap spreads the dispensed material over the donor foil, coating the donor foil with a layer of the material with a uniform thickness associated with the gap width. Each roller is supported on a holder. Adjustment of the gap width may be effected by keeping the position of one of the holders fixed, while horizontally translating the position of the other holder. The position of the translatable holder may be adjusted by pistons and linear actuators. The pistons may bias the moveable holder towards the stationary holder. The linear actuators mounted on the moveable holder may extend respective arms against the stationary holder, thereby countering the biasing of the pistons and pushing the moveable holder away from the stationary holder.

Abstract: A robot system includes a paint supply source, a sending-out device, a painting robot, a channel connecting the paint supply source to the painting robot through the sending-out device, and disposed so that a part thereof is located in a non-explosion-proof area, and a noncontact flowmeter disposed in the channel and configured to detect a flow rate of paint flowing through the channel. The painting robot and the sending-out device are disposed in an explosion-proof area, and the paint supply source and the noncontact flowmeter are disposed in the non-explosion-proof area.

Abstract: A coating system including a coating robot and a movable opener robot. The coating robot has a fixed base fixedly mounted to a coating booth, and a first arm rotatably coupled to the fixed base about a first axis substantially parallel to a conveyance direction of a workpiece that includes a body and a first movable member. The body has a body inner surface and the first movable member has a first movable member inner surface. The movable opener robot has a movable base mounted such that the movable opener robot is movable in the coating booth in the conveyance direction. The movable base is mounted below the fixed base. The movable opener robot can open the first movable member of the workpiece. The coating robot can coat the body inner surface and the first movable member inner surface when the first movable member has been opened.

Abstract: A device for coating a metal strip with a liquid coating material comprises a coating container filled with, for example, liquid zinc. After the metal strip exits the coating container, liquid coating material adheres to the metal strip. Excess coating material is blown away from the surface of the metal strip by a blowing device. Thereafter, the metal strip runs through an electromagnetic stabilization device which is supported on the blowing device. Disturbing influences may cause the metal strip to no longer run centrally through a slot of the blowing device. A displacement or re-alignment of the blowing device is then required to guide the metal strip back to the set middle position. A first displacing device displaces the electromagnetic stabilization device relative to the blowing device in the plane transverse to the direction of transport of the metal strip to avoid an undesirable displacement of the electromagnetic stabilization device.

Abstract: A mask sheet for evaporation on a substrate is provided, and the mask sheet includes: a plurality of first ribs extending in a first direction; and a plurality of second ribs extending in a second direction intersecting the first direction, the mask sheet includes a first region for an evaporation of a first exposure region of the substrate and a second region for an evaporation of a second exposure region of the substrate, a third rib is provided at a boundary of the first region and the second region so as to shield an overlapping exposure region between the first exposure region and the second exposure region, the third rib includes a first sub-rib, a second sub-rib, and a spacer for separating the first sub-rib and the second sub-rib, and the third rib has a width greater than that of the first rib.