Abstract: The object of the application is a cleaning system of a drum conveyor of a filter segment feeding apparatus in the tobacco industry wherein a transport drum (3) comprises a plurality of discs (4) on the circumferential surface of which concavities (5) are formed whereas the concavities of the individual discs are positioned relative to one another so that together they form channels (6) receiving filter rods (1), where in the said channels (6) the filter rods (1) are transported during cutting, whereas the borders of adjacent discs (4) do not contact one another and in this way they form circumferential grooves (9). The discs (4) have passages (12) discharging the dirt, the circumferential grooves (9) have a connection with the passages (12) discharging the dirt, and the system comprises a vacuum channel (15) receiving the dirt having a connection with the passages (12) discharging the dirt in the discs (4).

Abstract: A wash fluid and debris containment system includes a wash pad, a collecting trough, and a conveyor. The wash pad includes a support base and a top surface that rests on the support base. The top surface is configured to direct flow of wash fluid and debris to an edge of the top surface. The collecting trough extends along the edge to receive the wash fluid and debris from the top surface. The conveyor is positioned in at least a portion of the collecting trough and operable to remove the debris from an opposite end of the collecting trough from where the wash fluid is removed.

Abstract: A multi step cleaning system, for cleaning a cleaning surface using a first cleaning solution containing alkyl dimethyl benzyl ammonium chloride and a second cleaning solution containing acetic acid. The first cleaning solution is impregnated in a first wipe, and the second cleaning solution is impregnated in a second wipe. The wipes are sealed and provided to the user in a double chambered packet, having a first chamber and a second chamber that are isolated from each other. In use, after the packet is opened, the first wipe is used to wipe the cleaning surface, the cleaning surface is fully dried, and the second wipe is used to wipe the cleaning surface. The cleaning surface is left with an extraordinary shine that is long lasting and repels dirt, dust, and grime.

Abstract: A substrate cleaning system has a first processing apparatus including a first holding device for holding a substrate, and a treatment solution supply device for supplying onto the entire portion of the front surface of the substrate a treatment solution which includes a volatile component and solidifies or is cured to form a treatment film, and a second processing apparatus including a second holding device for holding the substrate, and a removal-solution supply device for supplying onto the substrate a removal solution which removes the treatment film formed on the front surface of the substrate after the treatment solution supplied by the treatment solution supply device solidifies or is cured.

Abstract: Embodiments of a process for treating a fluid are provided. The process for treating a fluid includes supplying a first fluid to a circulating chamber and introducing a first gas to the first fluid. A portion of the first gas is dissolved in the first fluid and a portion of the first gas is held in a head space portion of the circulating chamber. The process further includes mixing a portion of the first fluid drawn out from the circulating chamber and a portion of the first gas drawn out from the head space portion to form a mixture. The process further includes spraying the mixture back into the circulating chamber by a two-fluid nozzle. In addition, the first gas is further dissolved into the first fluid to form a high conductivity fluid. The process further includes draining the high conductivity fluid from the circulating chamber.

Abstract: A method and a device (50) for removing fragments and/or particles from containers, such as in particular glass tubes (5), provides means for adjusting the electrostatic force (40) in the tubes (5) and means for removing (60) of the fragments. The means for removing (60) can comprise a jet of fluid, of measured speed, put in the containers (5) by a nozzle (2), whereas the means for adjusting the electrostatic force (40) can comprise an element (1) for putting an electrically conducting fluid (8) with a measured resistivity in the containers (5). This way, the fluid (8), for example ionized air, acts in order to reduce and/or eliminate the electrostatic charge, and therefore the electrostatic force, between the fragments (30) and the surface of the containers, assisting the removal by means of jets of fluid or by suction means.

Abstract: The present invention relates to the field of semiconductor manufacturing technology, more particularly to a swing spray device of a cleaning apparatus and a cleaning method. The swing spray device comprises a spray arm, a spray head and a driving unit. The spray head is connected with the spray arm, and is controlled to swim by the driving unit. The spray head is hinged with the spray arm to form a first hinge joint. The driving unit is an air cylinder; the piston rod of the air cylinder is connected with the spray head. The piston rod is hinged with the spray head to form a second hinge joint. Therefore, the better cleaning effects can be achieved both in the center and the edge of the wafer.

Abstract: A method of cleaning and a system and method of determining the effectiveness of a cleaning process for an HVAC system including a heat exchanger having a coil matrix. The coil matrix includes a plurality of rows of heat exchanging coils in which each adjacent row of coils is offset. The plurality of rows define channels extending through the coil matrix between an upstream side and a downstream side. The heat exchanger cleaning method includes applying a cleaning solution and a wet steam mixture directed into the channels. The effectiveness of the cleaning method is determine by a system and method which measures various operating parameters at the inlet side and outlet side of the heat exchanger both before and after the cleaning process. The system and method calculate a SEER rating using the total amount of heat removed by the HVAC system and the total power usage of the HVAC system.

Abstract: The present disclosure provides a cleaning method which enables a cup and a member around the cup to be cleaned thoroughly. In this cleaning method, a cleaning liquid is supplied to a cleaning jig from the upper side of the cleaning jig while rotating the cleaning jig held by a substrate holding unit. The cleaning liquid supplied to the cleaning jig is scattered obliquely upward along an inclined surface of an inclined portion which is provided around the entire circumference of the cleaning jig in the vicinity of the outer circumferential edge of the cleaning jig, thereby cleaning cups.

Abstract: A disclosed substrate cleaning apparatus for cleaning a back surface of a substrate includes a first substrate supporting portion configured to support the substrate at a first area of a back surface of the substrate, the back surface facing down; a second substrate supporting portion configured to support the substrate at a second area of the back surface of the substrate, the second area being separated from the first area; a cleaning liquid supplying portion configured to supply cleaning liquid to the back surface of the substrate; a drying portion configured to dry the second area of the back surface of the substrate; and a cleaning portion configured to clean a third area of the back surface of the substrate when the substrate is supported by the first substrate supporting portion, the third area including the second area, and a fourth area of the back surface of the substrate when the substrate is supported by the second substrate supporting portion, the fourth area excluding the second area of the back

Abstract: An apparatus for cleaning wafers includes a chamber, a rotatable substrate holder inside the chamber, a nozzle above the rotatable substrate holder, a cover facing downward and fluidly coupled with the nozzle. The rotatable substrate holder is configured to mount one or more semiconductor wafers on the rotatable substrate holder. The nozzle is configured to spray a cleaning medium onto the one or more semiconductor wafers. The cover is of a shape having a top edge with a top cross-sectional area and a bottom edge with a bottom cross-sectional area.

Abstract: A method and an associated apparatus for washing rock samples, which is particularly suited to the washing and preparation of rock samples obtained from oil and gas wells. In one embodiment there is provided a method of washing rock samples involving a plurality of discrete rock samples; providing a plurality of sequentially arranged discrete washers each of which is spaced from a respective washing position and configured to direct a washing flow of water towards said washing position; and automatically conveying said samples relative to said washers so that each sample moves in succession through said washing positions for sequential washing by each said washer.

Abstract: A method and device for controlling a domestic appliance connected to an electric grid so as to allow smart metering, wherein electric power consumed according to different consumption tariffs is measured and the domestic appliance receives information about the availability of a currently applicable consumption tariff or a switch-off condition for preventing peak loads in the grid. The domestic appliance is operated as follows: a) when an inexpensive consumption tariff is available, the appliance is put into operation as intended, and the history of the cleaning process is continuously recorded; b) when an inexpensive consumption tariff is not available or the switch-off condition is met, the appliance is not put into operation or a previously started operation is interrupted; and c) when information about an inexpensive consumption tariff is available, the domestic appliance resumes operation, and a component of a detergent is added based on the recorded history.

Abstract: A method of operating a dishwasher by controlling the use of hot liquids to dissolve fatty soils.

Abstract: The invention contemplates automatic cleaning of an entire toilet bowel using an electrically powered motor that simultaneously spins flexible, but rigid, circular brushes that are substantially the same length as the height of the bowl in both vertical and horizontal directions, not only around the bowl, but also along the height of the bowl, with special attention to the two parts of the bowl that collect the most rust and debris: at the “water line” and “under the rim”. The longer one waits to clean a toilet bowl, the more likely an anti-rust chemical will be required to soak the water line and under the rim for a few minutes prior to brushing; and before administering chemicals, the toilet should be flushed. Automatically flushing, releasing chemicals, and soaking before cleaning (and then repeating until all debris is removed) requires a programmable microprocessor and debris sensor(s) to truly operate automatically.

Abstract: Debris-collecting systems and bagging apparatus for debris-collecting systems are provided. One bagging apparatus includes a primary bag and a dust skirt configured to wrap around the primary bag. At least an inner face of the dust skirt has an electrical charge. One debris-collecting apparatus includes an input portion, a bagging portion, and a draft inducer for drawing the air and debris through the input portion and to the bagging portion. The bagging portion has a hood, a primary bag removably positioned lowerly adjacent the hood, a dust skirt configured to wrap around the primary bag, and a bagging passage for directing air and debris to the hood from the input portion. The hood has a helical configuration extending from the bagging passage toward the primary bag. At least an inner face of the dust skirt is electrically charged. A frame having at least one wheel facilitates transportation.

Abstract: A substrate processing apparatus includes a transferring unit disposed in a connecting part of a washing processing cell and an indexer cell. The transferring unit includes an inverting support portion for supporting a substrate in a horizontal posture, a feed supporting portion disposed at an interval in a vertical direction from the inverting support portion for supporting the substrate in the horizontal posture, and an interposing and inverting mechanism for inverting the substrate to be supported by the inverting support portion and bringing the inverted substrate to be supported by the inverting support portion again. A part of the substrate to be supported by a feed supporting portion is disposed in an inversion region for the substrate to be inverted by the interposing and inverting mechanism.

Abstract: A drum type washing machine is provided. The washing machine includes a tub, a drum rotatably installed in the tub, and a shaft that penetrates the tub and is connected to the drum so as to transmit a drive force of a motor to the drum. A stator is fixed to a rear wall of the tub, and an outer rotor, including at least one magnet, an annular back yoke, and a rotor frame, is rotatably disposed at the outside of the stator. The rotor frame may be made of an aluminum material, and includes a side wall portion and a rear wall portion integrally formed with the side wall portion.

Abstract: A method and an apparatus for detaching limescale deposits within a water heater of a beverage dispensing machine, by powering an ultrasonic generator discontinuously to scan frequencies within a range of 20 kHz to 100 kHz so as to induce ultrasonic vibrations. Advantageously the step of inducing ultrasonic vibrations is implemented discontinuously at high energy levels.

Abstract: Debris-collecting apparatus and methods of use are provided. One hood is provided for use with a mobile debris-collecting apparatus that has an input portion, a draft inducer, and a bag. The hood has an inlet for receiving air and debris drawn through the input portion by the draft inducer, and the hood includes a helical passage extending downwardly from the inlet at least two hundred and seventy degrees about an imaginary vertical axis to direct the air and debris from the inlet to the bag in a helical direction. An opening may be formed inside the helical passage, and the hood may include a filter removably positioned to restrict the debris from exiting through the opening. The filter may extend downwardly inside the helical passage and/or the bag, whereby further causing helical movement of the debris by providing an inner boundary around which the debris must pass.