Abstract: A system for cleaning a conditioning device to improve the efficiency of the conditioning of a polishing pad using the conditioning device as part of a chemical-mechanical polishing process, the system comprising a conditioning device; a fluid dispenser arranged to dispense a fluid on the conditioning device; and an acoustic nozzle arranged to emit a megasonic or ultrasonic signal at the conditioning device while the fluid dispenser is dispensing the fluid on the conditioning device.

Abstract: A dishwashing machine configured to detect the presence of rinse aid in fluid in a washing chamber of the dishwashing machine. An electronic controller selects the drying stage of the dishwashing cycle based on whether rinse aid is present.

Abstract: A front surface of the wafer is contacted with a straight-shaped front surface cleaning brush, and a pressure is applied on the front surface cleaning brush from both ends to enlarge the diameters in both end portions of the front surface cleaning brush. The front surface cleaning brush rotates with a shaft being an axis. An inner surface of the front surface cleaning brush is directly in contact with a surface of the shaft. The front surface cleaning brush is composed of a single structure made of synthetic resin.

Abstract: A liquid processing apparatus includes a substrate holding member configured to rotate along with a substrate held thereon in a horizontal state; an annular rotary cup configured to surround the substrate held on the substrate holding member and to rotate along with the substrate; a rotation mechanism configured to integrally rotate the rotary cup and the substrate holding member; and a liquid supply mechanism configured to supply a process liquid onto the substrate. The apparatus further includes an annular drain cup configured to receive the process liquid discharged from the rotary cup, and provided with a drain port; and a circular flow generation element configured to generate a circular flow within the drain cup when the rotary cup and the substrate holding member are rotated, such that the circular flow serves to lead the process liquid within the drain cup to the drain port.

Abstract: A method of processing a substrate subjected to an exposure process includes the steps of: transporting a substrate subjected to the exposure process to a cleaning processing part and performing a cleaning process in said cleaning processing part on said substrate subjected to the exposure process. The method also includes the steps of transporting said substrate subjected to the cleaning process from said cleaning processing part to a heating processing part and performing a heating process in said heating processing part on said substrate subjected to the cleaning process. A first interprocess time interval between the instant at which the exposure process of a substrate is completed and the instant at which the heating process of the substrate is started is made approximately constant, and a second interprocess time interval between the instant at which the cleaning process of the substrate is completed and the instant at which the heating process of the substrate is started is made approximately constant.

Abstract: The present invention provides a substrate processing system in which a processing liquid is supplied to a substrate W from a processing nozzle 50a situated above the substrate W so as to process the substrate W, and which makes it possible to prevent unintended dripping of the processing liquid from the processing nozzle. A substrate processing system 20 comprises a processing nozzle 50a capable of supplying a processing liquid to a substrate to be processed, an arm 54 supporting the processing nozzle, and droplet removing nozzles 60, 62 capable of blowing a gas to the processing nozzle. The arm is movable between a processing position and a waiting position, the processing nozzle being above a substrate when the arm is in the waiting position and being outside a substrate when the arm is in the processing position. The droplet removing nozzles are so situated that they are in the vicinity of the processing nozzle when the arm is in the waiting position.

Abstract: A liquid processing apparatus is provided which can reduce the amount of liquids used and reduce the difference of the process level between objects to-be-processed. The liquid processing apparatus includes a main pipe, a liquid supply device, a main valve, a plurality of branch pipes, and a plurality of processing units. The liquid supply device includes a mixer, a first liquid supply pipe, and a second liquid source supplying a second liquid and supplies a mixed liquid prepared by mixing the first and second liquids in the mixer to one end of the main pipe. The main valve is configured to close the other end of the main pipe opposite to the liquid supply device when the object to-be-processed is processed in the processing unit.

Abstract: Disclosed is a substrate processing apparatus capable of decreasing the frequency of shutdown of the apparatus due to lack of processing liquid in a processing liquid supply unit, as well as efficiently using the processing liquid to improve a yield ratio. The substrate processing apparatus includes a plurality of liquid processing units to conduct liquid processing of substrates a substrate carrying unit to carry the substrates in and out of the liquid processing units, a processing liquid supply unit to supply the liquid processing units with processing liquid, and a level gauge to detect an amount of the processing liquid remaining in the processing liquid reservoir of the processing liquid supply unit. The carry of the substrates in the liquid processing units is suspended when the level gauge detects that the amount of the processing liquid remaining in the processing liquid reservoir is below a predetermined threshold.

Abstract: A method of cleaning a bevel edge of a semiconductor substrate is provided. A semiconductor substrate is placed on a substrate support in a reaction chamber of a plasma processing apparatus. The substrate has a dielectric layer overlying a top surface and a bevel edge of the substrate, the layer extending above and below an apex of the bevel edge. A process gas is introduced into the reaction chamber and energized into a plasma. The bevel edge is cleaned with the plasma so as to remove the layer below the apex without removing all of the layer above the apex.

Abstract: Drum type washing machine including a tub having a wall for mounting a driving unit, a drum installed within the tub, a shaft passed through the tub and coupled to the drum, for transmission of driving force from a motor to the drum, at least one bearing for supporting the shaft, a bearing housing secured to a wall of the tub, a stator; and a rotor around the stator which forms the motor, wherein the stator includes an annular helical type core having multiple layers, an insulator enclosing the helical type core, and fastening portions formed integrally with the insulator which has a fastening hole at a center for fastening the stator to the wall of the tub, thereby providing a drum type washing machine of a direct coupling type of a new structure having employed a motor for reducing factors of noise, faults, energy waste, and improving washing performance.

Abstract: A method of surface cleaning wherein recovering a soiled cleaning fluid from a surface to be cleaned is subsequent to the application of fluid to the surface as a module moves along different and opposite directions.

Abstract: A tub (100) for a washing machine, and a washing machine comprising the same are disclosed. The tub (100) is formed through injection molding with a bearing housing (200) inserted therein, and a washing machine comprises the same. Here, the bearing housing (200) comprises a bearing support (201) to receive bearings, and a flange (210) extended radially from the bearing support (201) and having radial ribs (230).

Abstract: Methods and apparatus for cleaning a substrate (e.g., wafer) in the fabrication of semiconductor devices utilizing electrorheological (ER) and magnetorheological (MR) fluids to remove contaminant residual particles from the substrate surface are provided.

Abstract: Disclosed is a washing machine having ball balancers, which adjust a relation between a gap, between the inner wall of a racer of each of the ball balancers and balls, and viscous oil, so as to reduce the vibration and noise of the washing machine. Each of the ball balancers of the washing machine includes balls and viscous oil accommodated in a racer, and the viscosity of the viscous oil is varied in proportion to a gap between the racer and the balls. When the viscosity of the viscous oil is 1˜100 cSt, the gap is set to 0.5˜1.0 mm, when the viscosity of the viscous oil is 100˜380 cSt, the gap is set to 1.0˜2.0 mm, and when the viscosity of the viscous oil is 380˜1,000 cSt, the gap is set to 2.0˜3.0 mm. Thereby, the relation between the gap and the viscous oil is optimized, and the ball balancers effectively exhibit a balancing function and thus minimize the vibration and noise of the washing machine.

Abstract: A washing machine having a ball balancer coupled to the drum to compensate for a dynamic imbalance during rotation of the drum, the ball balancer including a ring-shaped racer having a closed internal space in which a plurality of balls and viscous oil are accommodated, the ring-shaped racer including a first injection molded member and a second injection molded member joined to each other to form the closed internal space, the first injection molded member including a first side wall, a second side wall and a connecting wall between the first side wall and the second side wall, the first injection molded member having an open side opposite to the connecting wall, and the second injection molded member is adapted to cover the open side of the first injection molded member.

Abstract: A cleaning apparatus for cleaning measuring probes (18) of a gas turbine engine (1). The invention further relates to a method for cleaning measuring probes (18) of an gas turbine engine (1). The apparatus comprises distribution means (30) comprising a plurality of supply means (31, 32, 33), each comprising connection means (33) arranged for connection to a probe (18), and each supply means (31, 32, 33) being arranged to, when connected to a probe (18), distribute pressurized cleaning liquid to said measuring probe (18), wherein a substantially simultaneous cleaning of probes connected to said distribution means (30) via said supply means (31, 32, 33) can be obtained.

Abstract: A system for endoscope data management of an endoscopic image of a body acquired by an endoscope is provided. An image filing apparatus retrieves the image from the endoscope, and records data of the image and scope ID assigned to the endoscope in association with one another. A washer washes the endoscope. A memory is incorporated in the washer, for storing log information of washing of the endoscope. A data manager retrieves the log information on line with the washer, to record the scope ID and the log information in association with one another. A server device records the data of the image, the scope ID and the log information on line with the image filing apparatus and the data manager. Furthermore, the data manager includes an editor for editing the log information of the washer.

Abstract: The present invention relates to a method and an apparatus for liquefying natural gas.

Abstract: The invention relates to a method and apparatus relate for the liquefaction of natural gas. In another aspect, the present invention concerns the deriming the interior surfaces of a cryogenic heat exchanger employed in the liquefaction of natural gas. In another aspect, the present invention concerns the utilization of a pump to derim the interior surfaces of a cryogenic heat exchanger.

Abstract: A method for accurately controlling the directional and turning movement of a self-propelled robotic pool cleaner while cleaning a pool includes the steps of propelling the pool cleaner in a first direction along a generally straight path from a first sidewall toward an opposing sidewall of the pool, wherein said pool cleaner is propelled to a position in the pool corresponding to a distance greater than the midpoint between the first sidewall and the opposing sidewall and before contacting the opposing sidewall of the pool; stopping the pool cleaner at the position and pivoting the pool cleaner to a predetermined angular change in direction; and reversing direction and resuming propulsion of the pool cleaner, wherein the pool cleaner moves in a second direction along a generally straight path that is angularly displaced from the first direction.