Abstract: The present disclosure is directed to a showerhead for distributing plasma. The showerhead includes a perforated tile coupled to a support structure. A dielectric window is disposed over the perforated tile. An electrode is coupled to the dielectric window. An inductive coupler is disposed over the dielectric window. At least a portion of the inductive coupler is angled relative to at least a portion of the electrode.

Abstract: Methods and systems for forming a forming a nitrogen-containing carbon film and structures formed using the methods or systems are disclosed. Exemplary methods include providing a precursor with carbon-terminated carbon-nitrogen bonds. The methods can further include providing a reactant to the reaction chamber.

Abstract: The electrode production method disclosed herein has the steps of: preparing an electrode mix paste that contains at least an active material and a solvent; applying the electrode mix paste onto the surface of a collector; and drying a coating film made up of the electrode mix paste applied on the collector. The step of drying includes a residual heat period, a constant rate drying period, and a falling rate drying period. The coating film is pressed at least one time in the falling rate drying period, and the pressing is carried out under conditions such that film thickness of the coating film is not lower than 80% relative to 100% as the film thickness prior to the pressing.

Abstract: Methods and apparatus for selectively depositing a layer atop a substrate having a metal surface and a dielectric surface is disclosed, including: (a) contacting the metal surface with one or more metal halides such as metal chlorides or metal fluorides to form an exposed metal surface; (b) growing an organosilane based self-assembled monolayer atop the dielectric surface; and (c) selectively depositing a layer atop the exposed metal surface of the substrate, wherein the organosilane based self-assembled monolayer inhibits deposition of the layer atop the dielectric surface.

Abstract: The present invention relates to a method of deposition of thin metal layers on different substrates by electroless chemical method. In the method of the invention, the potential of the plating solution, i.e. a solution from which the metal deposition is carried out, is controlled with a redox buffer. The appropriate plating solution is also disclosed.

Abstract: An object is to provide an electroless plating process which can thin a film thickness of a nickel film and can obtain a film having excellent mounting characteristics, when the nickel film and a gold film are sequentially formed on a surface of a copper material. In order to solve the above-mentioned problems, provided is an electroless plating process which sequentially forms a nickel film and a gold film on a surface of a copper material by an electroless plating method and includes: a step of forming the nickel film on the surface of the copper material by an electroless strike plating method; and a step of forming the gold film by a reduction-type electroless plating method.

Abstract: A method of manufacturing a detection sensor is disclosed. The method includes forming a biometric information sensing layer including a transistor on a base layer, forming an initial optical pattern layer on the biometric information sensing layer, patterning the initial optical pattern layer to form a plurality of transmissive portions spaced apart from each other and having a first zeta potential, coating a light blocking material to form an initial light blocking portion that covers a side surface and an upper surface of the transmissive portions and has a second zeta potential different from the first zeta potential, and polishing the initial light blocking portion such that the upper surface of the transmissive portions is exposed to form a light blocking portion. The initial light blocking portion is polished by the abrasive, which has the first zeta potential, using a pad.

Abstract: Provided is a method of producing multiple particulates, the method comprising: (a) dispersing multiple primary particles of an anode active material, having a particle size from 2 nm to 20 ?m, and particles of a polymer foam material, having a particle size from 50 nm to 20 ?m, and an optional adhesive or binder in a liquid medium to form a slurry; and (b) shaping the slurry and removing the liquid medium to form the multiple particulates having a diameter from 100 nm to 50 ?m; wherein at least one of the multiple particulates comprises a polymer foam material having pores and a single or a plurality of the primary particles embedded in or in contact with the polymer foam material, wherein the primary particles have a total solid volume Va, and the pores have a total pore volume Vp, and the volume ratio Vp/Va is from 0.1/1.0 to 10/1.

Abstract: A method of controlling deposition of material from at least one plasma transferred wire arc (PTWA) torch within at least one bore includes: directing a fluid through a duct; and directing the fluid through a number of cannons N disposed adjacent and downstream from the duct. The fluid is directed through the duct and N cannons and past the PTWA torch while the PTWA torch is spraying downstream from N?1 cannons.

Abstract: The instant disclosure provides a method for manufacturing an electroless plating substrate and a method for forming a metal layer on a surface of a substrate. The method for preparing the electroless plating substrate includes: providing a substrate; attaching a self-adsorbed catalyst composition to a surface of the substrate; and performing an electroless metal deposition for forming an electroless metal layer on the surface of the substrate. The self-adsorbed catalyst composition includes a colloidal nanoparticle and a silane compound. The colloidal nanoparticle includes a palladium nanoparticle and a capping agent enclosing the palladium nanoparticle. The silane compound has at least one amino group to interact with the colloidal nanoparticle. A covalent bond between the silane compound and the surface of the substrate is formed through the at least one silane group of the silane compound. The colloid nanoparticle has a particle size ranging from 5 to 10 nanometers.

Abstract: A method includes: 1) performing an atomic layer deposition cycle including (a) introducing precursors into a deposition chamber housing a substrate to deposit a material on the substrate; and (b) introducing a passivation gas into the deposition chamber to passivate a surface of the material; and 2) repeating 1) a plurality of times to form a film of the material.

Abstract: A method for producing an electrode sheet includes a first feeding process, a roll press process, and a second feeding process, which are performed in this order. At least one of a first tension per unit area obtained by dividing a tension applied to the electrode sheet in a longitudinal direction in the first feeding process by a cross-sectional area of the electrode sheet being fed in the first feeding process and a second tension per unit area obtained by dividing a tension applied to the electrode sheet in a longitudinal direction in the second feeding process by a cross-sectional area of the electrode sheet being fed in the second feeding process is 5.0 MPa or less.

Abstract: A foamed, opacifying element useful as a light-blocking article is prepared with a dry opacifying layer on a substrate. The dry opacifying layer is densified, followed by application of a functional composition formulation to form a functional composition upon drying and curing at a coverage of 0.5-15 g/m2. The functional composition comprises at least: (i) glass particles such as hollow glass particles at a coverage of 0.1-2.2 g/cm2, and can also include any or combination of a (iv) water-soluble or water-dispersible organic polymeric binder that may be crosslinked, thickeners, coating aids having an HLB of at least 5, (ii) lubricants, (iii) tinting materials, and (v) crosslinking agents. Among other properties, the presence of the glass particles provides additional heat absorption for the foamed, opacifying elements that can be formed into light-blocking materials.

Abstract: A method of forming a carbon hard mask includes generating a radio frequency plasma including carbon-based ions by supplying continuous wave radio frequency power to a plasma processing chamber. The carbon-based ions have a first average ion energy. The method further includes adjusting the first average ion energy of the carbon-based ions to a second average ion energy by supplying continuous wave direct current power to the plasma processing chamber concurrently with the continuous wave radio frequency power and forming a carbon hard mask at a substrate within the plasma processing chamber by delivering the carbon-based ions having the second average ion energy to the substrate.

Abstract: A hot dip coating device to provide a metal coating on a moving metal sheet, containing a liquid bath of metal coating material in use. The metal coating material on the moving metal sheet in use, including a container for the liquid bath, a guide or sink roll in the container below liquid bath surface level in use to guide the moving metal sheet through the bath, and a gas knife, above the liquid bath in use, having an outlet to project wiping gas on the metal coating on the metal sheet. At least one supporting roll with the guide or sink roll in use influence metal sheet shape in its width direction at the gas knife location. The one supporting roll is above liquid bath surface level to operate on the metal sheet before the metal sheet enters the bath. A method for use of the device.

Abstract: The present invention relates to a method for monitoring the total amount of sulphur containing compounds in a metal or metal alloy plating bath, wherein the sulphur containing compounds contain at least one sulphur atom having an oxidation state below +6, the method comprising the steps (a), (b), optionally (c), and (d). Said method is a means of providing control over a metal plating process. Thus, the present invention relates furthermore to a controlled process for plating a metal on a substrate utilizing the method of the present invention for monitoring the total amount of said sulphur containing compounds.

Abstract: There is provided a technique that includes forming a film on at least one substrate by performing a cycle a predetermined number of times, the cycle including non-simultaneously performing: (a) performing a first set a number of times, the first set including non-simultaneously performing: supplying a precursor to the at least one substrate from at least one first ejecting hole of a first nozzle arranged along a substrate arrangement direction of a substrate arrangement region where the at least one substrate is arranged; and supplying a reactant to the at least one substrate; and (b) performing a second set a number of times, the second set including non-simultaneously performing: supplying the precursor to the at least one substrate from at least one second ejecting hole of a second nozzle arranged along the substrate arrangement direction of the substrate arrangement region; and supplying the reactant to the at least one substrate.

Abstract: Provided is a method of preparing a nanocomposite material plated with a network-type metal layer through silica self-cracks and a wearable electronics carbon fiber prepared therefrom. The present disclosure provides a nanocomposite material having excellent electrical conductivity and bending resistance by plating a network-type metal layer on a substrate having a flat surface and/or a curved surface through a method of preparing the nanocomposite material in which the network-type metal layer is plated on silica self-cracks by applying a silica coating solution on the substrate having a flat or curved surface, performing drying after the applying of the silica coating solution to form the silica self-cracks having random crack directions and sizes, and performing electroless metal plating on the surface of the substrate. Further, the present disclosure provides a wearable electronics carbon fiber having excellent electrical conductivity and bending resistance.

Abstract: A method for processing an electrode sheet, wherein the electrode sheet has a carrier layer and an electrode material that is applied to the carrier layer only in a material region of the electrode sheet, so that a free region, which is free of electrode material, remains for the formation of diverters, wherein the electrode sheet is guided in a conveying direction by a processing device, so that the material region and the free region (run side by side, wherein the processing device has a calender through which the electrode sheet is guided and with which the material region is calendered, wherein the processing device additionally has at least one roller that is designed in such a way that it exerts a transverse tensile stress on the electrode sheet. A corresponding processing device is also specified.

Abstract: A method for forming a nickel plated graphene hollow sphere is based on self assembly of graphene under the actions of a rotation force and the van der Waals force, and an electroless nickel plating process performed on the exposed surface of the graphene by means of a hydrothermal method. The method is simple to implement at low cost, and the nickel plated graphene hollow sphere product can be produced with good reproducibility and a high yield. The nickel plated graphene hollow sphere formed by the present method can exhibit good electromagnetic wave absorbing performances of both nickel and graphene, and may have a lower overall density.