Patents Examined by Kirsten Jolley
  • Patent number: 10439375
    Abstract: Assemblies and methods of use are disclosed for repairing the coating of a coated wellbore line. A wellbore line can be cleaned and then coated with a repair material before being pulled through a die to shape the coating and then being pulled through setting section to set the repair material. The repair material can be a thermoplastic material that is set by cooling, or a thermoset material that is set by heating. The wellbore line can be repaired upon exiting a wellbore or being unspooled from a reel.
    Type: Grant
    Filed: April 14, 2014
    Date of Patent: October 8, 2019
    Assignee: Halliburton Energy Services, Inc.
    Inventor: Sean Gregory Thomas
  • Patent number: 10421867
    Abstract: A coating technique and a priming material are provided. In an exemplary embodiment, the coating technique includes receiving a substrate and identifying a material of the substrate upon which a layer is to be formed. A priming material is dispensed on the material of the substrate, and a film-forming material is applied to the priming material. The priming material includes a molecule containing a first group based on an attribute of the substrate material and a second group based on an attribute of the film-forming material. Suitable attributes of the substrate material and the film-forming material include water affinity and degree of polarity and the first and second groups may be selected to have a water affinity or degree of polarity that corresponds to that of the substrate material and the film-forming material, respectively.
    Type: Grant
    Filed: July 6, 2015
    Date of Patent: September 24, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chen-Yu Liu, Ching-Yu Chang
  • Patent number: 10385446
    Abstract: A group of inventions is related to process equipment to process surfaces in mass production, particularly, vacuum process equipment to apply thin film coatings with set optical, electrical and other parameters. The technical result is to ensure a capability of processing flexible large substrates, as well as small substrates with a high degree of coating uniformity, with an ability to utilize a wide range of technologies and process devices, as well as to have a highly effective useful operation of applied materials. The proposed technical result is obtained by a method of applying thin film coatings on substrates, which are placed on rotating drums, which consequently move along the processing zones with the same constant linear and angular speeds. Furthermore, a ratio between the linear and angular speeds of the drum is selected so that each surface point of the drum will complete at least two full revolutions while passing through the processing zone.
    Type: Grant
    Filed: January 14, 2014
    Date of Patent: August 20, 2019
    Assignee: THE BATTERIES SP. Z.O.O.
    Inventor: Ayrat Khamitovich Khisamov
  • Patent number: 10384978
    Abstract: The present invention is directed to repair compositions for thermal barrier coatings and methods of use thereof. The repair compositions include a ceramic composition, a colloidal solution, an aqueous binder, an aqueous dispersant, and an aqueous ammonia solution. The ceramic composition includes a first population of yttria-stabilized zirconia particles having a mean diameter from about 250 nm to about 1000 nm, a second population of yttria-stabilized zirconia particles having a mean diameter from about 2 ?m to about 10 ?m, and a third population of yttria-stabilized zirconia particles having a mean diameter from about 20 ?m to about 250 ?m. One method includes depositing the repair layer onto the damaged region, the repair layer including the repair composition, and heat treating the repair layer.
    Type: Grant
    Filed: August 22, 2016
    Date of Patent: August 20, 2019
    Assignee: GENERAL ELECTRIC COMPANY
    Inventors: Kevin Paul McEvoy, James Ruud, Lawrence E. Szala, Susan Corah, Atanu Saha, Hrishikesh Keshavan
  • Patent number: 10385233
    Abstract: The present disclosure relates to a primer composition. The primer composition comprises: a tert butyl acetate solvent; an organometallic reagent selected from organotitanates, organozirconates, aluminum organometallic compounds, and any combination thereof; an organotin compound; a silane with at least 3 hydrolyzable groups; and a polyorganosiloxane resin. Optionally, the primer composition further comprises a second solvent different from the tert butyl acetate solvent.
    Type: Grant
    Filed: October 11, 2013
    Date of Patent: August 20, 2019
    Assignees: Dow Silicones Corporation, Dow Toray Co., Ltd.
    Inventors: Hiroshi Adachi, Brent D. Dull, Thomas W. Galbraith, Kenji Ota
  • Patent number: 10381221
    Abstract: A processing method in one embodiment includes: a step that takes an image of the end face of a reference substrate, whose warp amount is known, over the whole periphery thereof using a camera to obtain shape data of the end face of the reference substrate over the whole periphery of the reference substrate; a step that takes an image of the end face of a substrate over the whole periphery thereof using a camera to obtain shape data of the end face of the substrate over the whole periphery of the substrate; a step that calculates warp amount of the substrate based on the obtained shape data; a step that forms a resist film on a surface of the substrate; a step that determines the supply position from which an organic solvent is to be supplied to a peripheral portion of the resist film and dissolves the peripheral portion by the solvent supplied from the supply position to remove the same from the substrate.
    Type: Grant
    Filed: February 21, 2017
    Date of Patent: August 13, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Yasuaki Noda, Tadashi Nishiyama
  • Patent number: 10354858
    Abstract: Use of a non-solvent for the edge bead removal of spin-coated PZT or PLZT thinfilms, eliminates swelling of the exposed edges of the PZT or PLZT thinfilms and eliminates delamination and formation of particle defects in subsequent bake and anneal steps.
    Type: Grant
    Filed: August 25, 2014
    Date of Patent: July 16, 2019
    Assignee: TEXAS INSTRUMENTS INCORPORATED
    Inventors: Asad Mahmood Haider, John Britton Robbins
  • Patent number: 10354915
    Abstract: An adhesion layer formed of a thin film can be formed on a surface of a substrate. An adhesion layer forming method of forming the adhesion layer on the substrate includes supplying a coupling agent onto the substrate 2 while rotating the substrate 2. The substrate 2 is rotated at a low speed equal to or less than 300 rpm and the coupling agent diluted with IPA is supplied onto the substrate 2.
    Type: Grant
    Filed: March 23, 2016
    Date of Patent: July 16, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Tomohisa Hoshino, Masato Hamada, Takashi Tanaka, Yuichiro Inatomi, Yusuke Saito
  • Patent number: 10350624
    Abstract: According to one embodiment, provided is a coating apparatus. The coating apparatus includes a first discharger, a second discharger, and a third discharger. The first discharger discharges a first liquid on a top surface of a substrate. In addition, the second discharger discharges a second liquid of which surface tension is higher than surface tension of the first liquid on the top surface of the substrate. In addition, the third discharger is disposed in a side outer than the first discharger in the substrate and discharges a gas on the top surface of the substrate.
    Type: Grant
    Filed: February 26, 2016
    Date of Patent: July 16, 2019
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventor: Tomoyuki Takeishi
  • Patent number: 10329447
    Abstract: A polymer based coating for application to rolled stock, such as aluminum is provided. A device for applying the polymer based coatings is also provided. Polymer based coatings applied to rolled stock, such as aluminum, are advantageous compared to anodized coatings since the polymers are self-leveling and may be applied to lower grades of aluminum, while still providing a smooth and durable surface finish.
    Type: Grant
    Filed: April 14, 2015
    Date of Patent: June 25, 2019
    Assignee: DIELECTRIC COATING INDUSTRIES
    Inventor: Helmuth Treichel
  • Patent number: 10315369
    Abstract: An adhesive-distributing device for use in repairing or reconditioning a hollow profile includes an adapter body, in which is arranged at least one channel system made up of at least two channels connected to one another. At least one channel is connected to an injection opening for injecting adhesive into the channel system. Each channel is designed with at least one exit opening.
    Type: Grant
    Filed: November 21, 2016
    Date of Patent: June 11, 2019
    Assignee: Bayerische Motoren Werke Aktiengesellschaft
    Inventor: Nathanael Sutter
  • Patent number: 10307724
    Abstract: The present disclosure provides methods, device, and system for wafer processing. The wafer processing apparatus uses lid dispenser to disperse at least one reagent to the surface of the wafer. Further, the wafer is positioned on top of a rotatable vacuum chuck configured to spread at least one reagent over the surface of the wafer via a centrifugal force or surface tension, thereby permitting the at least one reagent to react with an additional reagent. Further, when dispensing the at least one reagent, a separation gap between the lid dispenser and the wafer is at a predetermined distance, for example, from 50 ?m to 2 mm.
    Type: Grant
    Filed: July 1, 2016
    Date of Patent: June 4, 2019
    Assignee: CENTRILLION TECHNOLOGY HOLDINGS CORPORATION
    Inventors: Filip Crnogorac, Glenn McGall, Bolan Li
  • Patent number: 10289004
    Abstract: A developing apparatus includes: a substrate holder that hold a substrate horizontally; a developer nozzle that supplies a developer onto the substrate to form a liquid puddle; a turning flow generation mechanism including a rotary member that rotates about an axis perpendicular to the substrate while the rotary member is being in contact with the liquid puddle thereby to generate a turning flow in the liquid puddle of the developer formed on the substrate; and a moving mechanism for moving the turning flow generation mechanism along a surface of the substrate. The line-width uniformity of a pattern can be improved by forming turning flows in a desired region of the substrate and stirring the developer.
    Type: Grant
    Filed: October 31, 2016
    Date of Patent: May 14, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Kousuke Yoshihara, Hideharu Kyouda, Koshi Muta, Taro Yamamoto, Yasushi Takiguchi
  • Patent number: 10266702
    Abstract: A method of forming a self-cleaning coating on a substrate comprises the step of selecting a substrate, cleaning the substrate, and/or roughening the substrate using an abrasive. In an embodiment, roughening of the substrate create microscopic tortuous grooves. Another embodiment of the method comprises coating the roughened surface with at least one hydrophobic chemical agent. In an exemplary embodiment, the hydrophobic chemical agent covalently binds with the substrate creating nanoscopic grooves. Another embodiment of the present disclosure pertains to an apparatus for depositing a self-cleaning coating on a flat substrate. A further embodiment of the present disclosure pertains to a self-cleaning coating on a substrate comprising a hydrophobic chemical agent covalently bonded to at least one roughened surface of the substrate.
    Type: Grant
    Filed: June 10, 2013
    Date of Patent: April 23, 2019
    Assignee: UNIVERSITY OF HOUSTON SYSTEM
    Inventors: Seamus Curran, Kang-Shyang Liao, Killian Barton
  • Patent number: 10253414
    Abstract: A processing system and method for depositing a film on a substrate by liquid phase ALD is disclosed in various embodiments. The method includes providing the substrate in a process chamber, spinning on the substrate a first reactant in a first liquid to form a self-limiting layer of the first reactant on the substrate, spinning on the substrate a second reactant in a second liquid, where the second reactant reacts with the self-limiting layer of the first reactant on the substrate to form a film on the substrate, and repeating the spinning steps at least once until the film has a desired thickness. Other embodiments of the invention further include rinsing the substrate to remove excess first and second reactants from the substrate, and heat-treating the substrate during and/or following the film deposition.
    Type: Grant
    Filed: September 30, 2015
    Date of Patent: April 9, 2019
    Assignee: Tokyo Electron Limited
    Inventor: Robert D. Clark
  • Patent number: 10224198
    Abstract: A low surface tension liquid is supplied from a low surface tension liquid supplying unit to a heated substrate to replace a processing liquid by the low surface tension liquid. The heating of the substrate is weakened and the low surface tension liquid is supplied from the low surface tension liquid supplying unit to the substrate, so that a liquid film of the low surface tension liquid is formed. The liquid film on the substrate is removed by strengthening the heating of the substrate without supplying the low surface tension liquid from the low surface tension liquid supplying unit to a central region of the substrate.
    Type: Grant
    Filed: December 22, 2016
    Date of Patent: March 5, 2019
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Tetsuya Emoto, Atsuro Eitoku, Tomomi Iwata
  • Patent number: 10220410
    Abstract: Systems and methods for forming nanoparticles in-situ are disclosed herein. The nanoparticles may be formed in-situ through thermocycling a solution comprising at least one of a molten salt, a surfactant, and a catalyst. The nanoparticles may form in the solution itself and/or on surfaces of a vessel in which the solution is formed. Nanofins may be formed from the agglomeration of particles in the solution and on surfaces. Microchannels may be formed by these nanofins, and in some cases microchannels on a surface may have nanofins form on the surface. In some embodiments, a previously formed solution that has nanoparticles formed in-situ may be used to generate nanofins in a vessel, on a wafer in a vessel, in the solution itself, or combinations thereof.
    Type: Grant
    Filed: December 15, 2014
    Date of Patent: March 5, 2019
    Assignee: THE TEXAS A&M UNIVERSITY SYSTEM
    Inventors: Debjyoti Banerjee, Byeongnam Jo, Jiwon Yu, Seunghwan Jung, Donghyun Shin, Saeil Jeon, Seokwon Kang
  • Patent number: 10185219
    Abstract: In a developing method, a developing nozzle starts discharge of developer to a position set in advance on a substrate, spinning about the center thereof, away from the center. This causes a flow of the developer at the center having a small centrifugal force immediately after the discharge is started. Accordingly, a dissolution product of a resist can be ejected outside the substrate more efficiently than the case when the discharge of the developer to the center is started. Moreover, this achieves distributed arrival positions of the developer directly discharged from the developing nozzle immediately after the discharge is started. Consequently, thin resist patterns especially at the center of the substrate are eliminated to obtain suppression in treatment variation.
    Type: Grant
    Filed: December 28, 2015
    Date of Patent: January 22, 2019
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Yuji Tanaka, Tadashi Miyagi, Masahiko Harumoto, Koji Kaneyama
  • Patent number: 10168618
    Abstract: A liquid processing method includes: accommodating a substrate horizontally in each of a first processing region and a second processing region, for performing therein a process on the substrate by a processing solution from a nozzle; rotating a rotary body about a vertical axis; keeping a plurality of processing nozzles provided at the rotary body; supplying different kinds of processing solutions to the substrate from the plurality of processing nozzles; holding a processing nozzle selected from the plurality of processing nozzles by a nozzle holder provided at the rotary body; transferring the nozzle holder into selected one of the first and the second processing regions by a nozzle transfer device; and rotating the rotary body by a rotation driving unit so as to allow a front of the nozzle holder in a forward/backward direction thereof to face the selected one of the first and the second processing regions.
    Type: Grant
    Filed: October 22, 2015
    Date of Patent: January 1, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Norihiko Sasagawa, Hiroichi Inada, Yasushi Takiguchi
  • Patent number: 10155246
    Abstract: A method for adjusting a chemical liquid supply device of supplying a chemical liquid through a nozzle for removing a coating film on a peripheral portion of a substrate having the coating film formed on a surface thereof and horizontally held by a holding table is provided. The method includes discharging the chemical liquid from the nozzle, performing, by an image pickup part, continuous image pickup on a region including a leading end of the nozzle and a region in which the chemical liquid discharged from the leading end forms a liquid stream in the air, acquiring area change data representing a temporal change in area of the chemical liquid in an image pickup region based on an image pickup result obtained by the image pickup part, and adjusting a supply control device installed in a chemical liquid supply path connected to the nozzle based on the area change data.
    Type: Grant
    Filed: March 9, 2016
    Date of Patent: December 18, 2018
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Hiroshi Tomita, Shinichi Mizushino