Abstract: A substrate processing method comprises: a liquid film forming step of forming a liquid film of a rinsing liquid on a pattern forming surface of a substrate formed with a pattern; a liquid pool forming step of forming a liquid pool of an organic solvent by supplying the organic solvent to the liquid film near a center of rotation of the substrate; a replacement step of replacing the rinsing liquid constituting the liquid film with the organic solvent by supplying the organic solvent to the liquid pool while rotating the substrate at a rotational speed higher than in the liquid pool forming step; an application step of applying a filler solution to the pattern forming surface coated with the organic solvent; and a filling step of causing a filler contained in the filler solution and applied to the pattern forming surface to sink and filling concave portions of the pattern with the filler.
Abstract: An injection device having at least one flexible diaphragm. The injection device for forming a preform into a container and filling the container, and further including a main housing having an inlet, an outlet and an injection chamber, a closing body movable relative to the outlet between a closed position and an opened position, a closing diaphragm attached at least to the closing body, the injection chamber being delimited at least by an inner surface of the closing diaphragm, the closing diaphragm having an outer surface defining an outside area, a bearing surface against which a supported portion of the outer surface of the closing diaphragm is applied. The closing diaphragm further includes a free portion forming with the supported portion the whole outer surface of the closing diaphragm. The bearing surface is arranged such that the surface of the free portion decreases when the closing body moves from the closed position to the opened position.
Abstract: A thermoplastic prepreg includes a mat, web, or fabric of fibers and hollow glass microspheres that are positioned atop the mat, web, or fabric of fibers or dispersed therein. The thermoplastic prepreg also includes a thermoplastic polymer that is fully impregnated through the mat, web, or fabric of fibers and the hollow glass microspheres so that the thermoplastic prepreg has a void content of less than 3% by volume of the thermoplastic prepreg. The thermoplastic material is polymerized monomers and oligomers in which greater than 90% by weight of the monomers or oligomers react to form the thermoplastic material.
Abstract: Disclosed is a substrate treating method including a solvent supplying step of supplying a solvent to a center part of a substrate while increasing a rotation speed of the substrate. In the solvent supplying step, the solvent is successively supplied to the substrate until the solvent reaches a periphery edge of the substrate. With such a substrate treating method, the solvent is able to cover a substrate surface entirely with effective suppression of particles. In other words, a process of supplying the solvent to the substrate is performable with effectively improved quality.
Abstract: Embodiments describe a method of depositing an MOF, including depositing a metal solution onto a substrate, spinning the substrate sufficient to spread the metal solution, depositing an organic ligand solution onto the substrate and spinning the substrate sufficient to spread the organic ligand solution and form a MOF layer.
September 10, 2015
Date of Patent:
June 9, 2020
KING ABDULLAH UNIVERSITY OF SCIENCE AND TECHNOLOGY
Abstract: The present invention is directed to a process for the production of exhaust catalysts. In particular, the process describes a way of coating a substrate in a manner which finally leads to reduced coating times.
Abstract: A substrate processing apparatus comprises: a first solidifier and a second solidifier. The first solidifier solidifies a liquid to be solidified adhering to a front surface of a substrate by supplying a liquid refrigerant to a back surface of the substrate at a first position. The second solidifier solidifies the liquid to be solidified by at least one of a first cooling mechanism and a second cooling mechanism. The first cooling mechanism cools the liquid to be solidified by supplying a gas refrigerant toward the substrate at a second position more distant from a center of rotation of the substrate in a radial direction than the first position. The second cooling mechanism cools the liquid to be solidified by bringing a processing surface into contact with the liquid to be solidified at the second position.
December 29, 2016
Date of Patent:
April 14, 2020
SCREEN Holdings Co., Ltd.
Hiroaki Kitagawa, Dai Ueda, Katsuhiko Miya
Abstract: Method for coating a substrate with a coating material is described, in particular with a coating or photoresist, wherein said substrate is provided in said method. Said coating material is applied to said upper side of said substrate. A gas flow is generated, said gas flow being directed from said underside of said substrate to said upper side of said substrate, wherein said gas flow prevents a bead of said coating material forming on said edge of said upper side of said substrate or a previously existing bead is removed by means of said gas flow. In addition, a coating system is described.
Abstract: In a coating apparatus, a nozzle moving mechanism selectively grips any one of a plurality of coating solution nozzles, moves the gripped coating solution nozzle and a solvent nozzle together, and moves at least the solvent nozzle to a solvent suction unit. The moved solvent nozzle is caused to dispense a solvent to the solvent suction unit, and the gripped coating solution nozzle is caused to suck the solvent retained in the same solvent suction unit to which the solvent has been dispensed. Thus, since dispensation and suction of the solvent are done in the same solvent suction unit, the quantity of the solvent used can be held down. Further, a supply line for supplying the solvent does not need to be provided for the suction unit. The construction of the suction unit can therefore be made simple, and its cost can be held down.
Abstract: A substrate is rotated with a holding rotator to form a coating liquid film on the substrate, and at least a part of an excess of the coating liquid is pushed out toward a periphery edge of the substrate by a centrifugal force caused by the rotation of the substrate to build up the excess of the coating liquid along the periphery edge of the substrate. Moreover, gas is blown to the periphery edge of the substrate through a gas nozzle to exhaust the excess of the coating liquid building up at the periphery edge. Blowing the gas toward the periphery edge of the substrate through the gas nozzle makes the coating liquid unbalanced that builds up without being exhausted outside the substrate due to its surface tension. Accordingly, the rotation achieves the coating liquid film having a uniform thickness while the coating liquid film is formed to be thick.
Abstract: In one embodiment, a spin coating apparatus includes a coating liquid feeding module to drop a coating liquid onto a substrate, and a motor to rotate the substrate. The module drops a first drop amount of the coating liquid onto the substrate at a first discharge rate, while the motor rotates the substrate at a first number of rotations. The module drops a second drop amount of the coating liquid onto the substrate at a second discharge rate larger than the first discharge rate, while the motor rotates the substrate at a second number of rotations smaller than the first number of rotations, after the first drop amount of the coating liquid is dropped. The module discharges the coating liquid onto the substrate at a third discharge rate smaller than the second discharge rate, after the coating liquid is discharged onto the substrate at the second discharge rate.
Abstract: A method of treating, tuning, assembling, and/or overhauling a twin rotor device (200, 1200) includes applying a coating material (102) on an internal set of working surfaces (218, 222, 224, 226, 228, 1218, 1222, 1224, 1226, 1228) of the twin rotor device when at least partially assembled. The coating may be factory or field applied to a new or used twin rotor device. The working surfaces may be uncoated or previously coated and may be built-up as the coating material forms a coating (206, 1206) on at least some of the working surfaces. Manufacturing variations of a pair of rotors (220, 1220) and a housing (210, 1210) may be compensated by the coating. One or more performance characteristics of the twin rotor device may be improved by the coating, and variation between a series of twin rotor device may be reduced or substantially eliminated. The coating may reduce internal leakage and increase volumetric efficiency of the twin rotor device.
July 1, 2015
Date of Patent:
January 21, 2020
Eaton Intelligent Power Limited
Matthew Gareld Swartzlander, Michael John Froehlich, Timothy Michael Kish
Abstract: A device and method for dispensing liquid spin-on glass (SOG) onto semiconductor wafers. The method includes dispensing liquid SOG through a dispenser nozzle, detecting liquid SOG outside of the dispenser nozzle, indicating the presence of liquid SOG in an abnormal length relative to the dispenser nozzle and adjusting a suck back (SB) valve to withdraw liquid SOG from the abnormal length.
Abstract: Assemblies and methods of use are disclosed for repairing the coating of a coated wellbore line. A wellbore line can be cleaned and then coated with a repair material before being pulled through a die to shape the coating and then being pulled through setting section to set the repair material. The repair material can be a thermoplastic material that is set by cooling, or a thermoset material that is set by heating. The wellbore line can be repaired upon exiting a wellbore or being unspooled from a reel.
Abstract: A coating technique and a priming material are provided. In an exemplary embodiment, the coating technique includes receiving a substrate and identifying a material of the substrate upon which a layer is to be formed. A priming material is dispensed on the material of the substrate, and a film-forming material is applied to the priming material. The priming material includes a molecule containing a first group based on an attribute of the substrate material and a second group based on an attribute of the film-forming material. Suitable attributes of the substrate material and the film-forming material include water affinity and degree of polarity and the first and second groups may be selected to have a water affinity or degree of polarity that corresponds to that of the substrate material and the film-forming material, respectively.
Abstract: The present disclosure relates to a primer composition. The primer composition comprises: a tert butyl acetate solvent; an organometallic reagent selected from organotitanates, organozirconates, aluminum organometallic compounds, and any combination thereof; an organotin compound; a silane with at least 3 hydrolyzable groups; and a polyorganosiloxane resin. Optionally, the primer composition further comprises a second solvent different from the tert butyl acetate solvent.
Abstract: The present invention is directed to repair compositions for thermal barrier coatings and methods of use thereof. The repair compositions include a ceramic composition, a colloidal solution, an aqueous binder, an aqueous dispersant, and an aqueous ammonia solution. The ceramic composition includes a first population of yttria-stabilized zirconia particles having a mean diameter from about 250 nm to about 1000 nm, a second population of yttria-stabilized zirconia particles having a mean diameter from about 2 ?m to about 10 ?m, and a third population of yttria-stabilized zirconia particles having a mean diameter from about 20 ?m to about 250 ?m. One method includes depositing the repair layer onto the damaged region, the repair layer including the repair composition, and heat treating the repair layer.
August 22, 2016
Date of Patent:
August 20, 2019
GENERAL ELECTRIC COMPANY
Kevin Paul McEvoy, James Ruud, Lawrence E. Szala, Susan Corah, Atanu Saha, Hrishikesh Keshavan
Abstract: A group of inventions is related to process equipment to process surfaces in mass production, particularly, vacuum process equipment to apply thin film coatings with set optical, electrical and other parameters. The technical result is to ensure a capability of processing flexible large substrates, as well as small substrates with a high degree of coating uniformity, with an ability to utilize a wide range of technologies and process devices, as well as to have a highly effective useful operation of applied materials. The proposed technical result is obtained by a method of applying thin film coatings on substrates, which are placed on rotating drums, which consequently move along the processing zones with the same constant linear and angular speeds. Furthermore, a ratio between the linear and angular speeds of the drum is selected so that each surface point of the drum will complete at least two full revolutions while passing through the processing zone.
Abstract: A processing method in one embodiment includes: a step that takes an image of the end face of a reference substrate, whose warp amount is known, over the whole periphery thereof using a camera to obtain shape data of the end face of the reference substrate over the whole periphery of the reference substrate; a step that takes an image of the end face of a substrate over the whole periphery thereof using a camera to obtain shape data of the end face of the substrate over the whole periphery of the substrate; a step that calculates warp amount of the substrate based on the obtained shape data; a step that forms a resist film on a surface of the substrate; a step that determines the supply position from which an organic solvent is to be supplied to a peripheral portion of the resist film and dissolves the peripheral portion by the solvent supplied from the supply position to remove the same from the substrate.
Abstract: An adhesion layer formed of a thin film can be formed on a surface of a substrate. An adhesion layer forming method of forming the adhesion layer on the substrate includes supplying a coupling agent onto the substrate 2 while rotating the substrate 2. The substrate 2 is rotated at a low speed equal to or less than 300 rpm and the coupling agent diluted with IPA is supplied onto the substrate 2.