Abstract: Systems and methods for forming nanoparticles in-situ are disclosed herein. The nanoparticles may be formed in-situ through thermocycling a solution comprising at least one of a molten salt, a surfactant, and a catalyst. The nanoparticles may form in the solution itself and/or on surfaces of a vessel in which the solution is formed. Nanofins may be formed from the agglomeration of particles in the solution and on surfaces. Microchannels may be formed by these nanofins, and in some cases microchannels on a surface may have nanofins form on the surface. In some embodiments, a previously formed solution that has nanoparticles formed in-situ may be used to generate nanofins in a vessel, on a wafer in a vessel, in the solution itself, or combinations thereof.

Abstract: A low surface tension liquid is supplied from a low surface tension liquid supplying unit to a heated substrate to replace a processing liquid by the low surface tension liquid. The heating of the substrate is weakened and the low surface tension liquid is supplied from the low surface tension liquid supplying unit to the substrate, so that a liquid film of the low surface tension liquid is formed. The liquid film on the substrate is removed by strengthening the heating of the substrate without supplying the low surface tension liquid from the low surface tension liquid supplying unit to a central region of the substrate.

Abstract: In a developing method, a developing nozzle starts discharge of developer to a position set in advance on a substrate, spinning about the center thereof, away from the center. This causes a flow of the developer at the center having a small centrifugal force immediately after the discharge is started. Accordingly, a dissolution product of a resist can be ejected outside the substrate more efficiently than the case when the discharge of the developer to the center is started. Moreover, this achieves distributed arrival positions of the developer directly discharged from the developing nozzle immediately after the discharge is started. Consequently, thin resist patterns especially at the center of the substrate are eliminated to obtain suppression in treatment variation.

Abstract: A liquid processing method includes: accommodating a substrate horizontally in each of a first processing region and a second processing region, for performing therein a process on the substrate by a processing solution from a nozzle; rotating a rotary body about a vertical axis; keeping a plurality of processing nozzles provided at the rotary body; supplying different kinds of processing solutions to the substrate from the plurality of processing nozzles; holding a processing nozzle selected from the plurality of processing nozzles by a nozzle holder provided at the rotary body; transferring the nozzle holder into selected one of the first and the second processing regions by a nozzle transfer device; and rotating the rotary body by a rotation driving unit so as to allow a front of the nozzle holder in a forward/backward direction thereof to face the selected one of the first and the second processing regions.

Abstract: A method for adjusting a chemical liquid supply device of supplying a chemical liquid through a nozzle for removing a coating film on a peripheral portion of a substrate having the coating film formed on a surface thereof and horizontally held by a holding table is provided. The method includes discharging the chemical liquid from the nozzle, performing, by an image pickup part, continuous image pickup on a region including a leading end of the nozzle and a region in which the chemical liquid discharged from the leading end forms a liquid stream in the air, acquiring area change data representing a temporal change in area of the chemical liquid in an image pickup region based on an image pickup result obtained by the image pickup part, and adjusting a supply control device installed in a chemical liquid supply path connected to the nozzle based on the area change data.

Abstract: A substrate is held and rotated in a horizontal attitude by a rotation holder. A coating liquid is supplied by a coating liquid supplier to a surface to be processed of the substrate rotated by the rotation holder. A first removal liquid is supplied by a first removal liquid supplier to a first annular region at a peripheral portion of the substrate rotated by the rotation holder before the coating liquid supplied by the coating liquid supplier loses fluidity. In this state, a supply position of the first removal liquid by the first removal liquid supplier is moved from an inner edge to an outer edge of the first annular region.

Abstract: There is provided a method of developing an exposed resist film formed on a surface of a substrate to form a resist pattern, which includes: rotating the substrate about a rotation axis that extends in a direction perpendicular to the surface of the substrate that is horizontally supported; supplying a developing solution through a discharge hole positioned above the substrate onto the resist film such that the developing solution is widely spread on a surface of the resist film; and positioning a wetted part having a surface that faces the surface of the substrate, above a preceding region in the surface of the substrate, the preceding region being a region to which the developing solution is preferentially supplied through the discharge hole.

Abstract: A developing apparatus including a horizontal substrate holder, a rotating mechanism to rotate the substrate holder, a developer nozzle to supply a developer onto a part of the substrate to form a liquid puddle, a moving mechanism to move the developer nozzle in a radial direction of the rotating substrate, a contact part that moves with the developer nozzle and has a surface opposed to the substrate, which is smaller than the surface of the substrate, and a control unit to output a control signal such that a supply position of the developer on the substrate is moved in the radial direction of the substrate so that the liquid puddle is spread out on a whole surface of the substrate while the contact part is in contact with the liquid puddle.

Abstract: The present invention regards a method for internally coating a hollow glass body comprising the steps of: (a) applying on at least one internal surface of said hollow body at least one coating composition in form of liquid dispersion comprising at least one glass frit and at least one polymeric dispersing agent; (b) subjecting said internal surface comprising said coating composition to a thermal treatment, so as to obtain a vitrified coating layer.

Abstract: A method for manufacturing a composite part of an aircraft comprising the steps of placing a prepreg preform in a molding die between at least a molding die base part and a molding die upper part, debulking the air trapped in the prepreg, displacing the molding die upper part against the molding die base part in a direction perpendicular to the plane of the prepreg preform such that the molding die upper part presses the laminated perform until it reaches a blocking arrangement defining the position of the upper part relative to the base part for giving the prepreg preform the nominal thickness of the cured part, wherein said displacement is achieved by bolting the different parts of the molding die against each other, providing an elevated temperature to the preform such that it is cured.

Abstract: Solutions of carbon nanotubes and methods for purifying the solutions are provided. The methods include mixing, for example, at least one complexing agents, at least one ionic species, and/or at least one buffer oxide etch (BOE) with a liquid medium containing carbon nanotubes and different types of contaminants, such as metal impurities, amorphous carbon, and/or silica particles, and performing a filtration process to the liquid medium so as to remove or reduce the contaminants in the liquid medium. As a result, carbon nanotube solutions of low contaminants are produced. In some embodiments, the solutions of this disclosure include a high concentration of carbon nanotubes and are substantially free from metal, amorphous carbon, and/or silica impurities.

Abstract: Antimicrobial materials and methods for making antimicrobial materials are described herein. Antimicrobial materials and antimicrobial material precursors are formed from hexahydrotriazine and/or a hemiaminal material and a non-fouling material and adhesive material may be incorporated into the antimicrobial materials and antimicrobial material precursors. The hexahydrotriazine and/or hemiaminal material may be made from a diamine and an aldehyde. Metal ions are also incorporated into the antimicrobial material precursors to form an antimicrobial material.

Abstract: According to one embodiment, a system for manufacturing a fully impregnated thermoplastic prepreg includes a mechanism for moving a fabric or mat and a drying mechanism that removes residual moisture from at least one surface of the fabric or mat. The system also includes a resin application mechanism that applies a reactive resin to the fabric or mat and a press mechanism that presses the coated fabric or mat to ensure that the resin fully saturates the fabric or mat. The system further includes a curing oven through which the coated fabric or mat is moved to polymerize the resin and thereby form a thermoplastic polymer so that upon exiting the oven, the fabric or mat is fully impregnated with the thermoplastic polymer. During at least a portion of the process, humidity in the vicinity of the coated fabric or mat is maintained at substantially zero.

Abstract: A method for shaping a coating on a razor blade is provided. The method includes the steps of: a) providing a razor blade having a tip end defined by at least one tip surface; b) applying a surface coating having a first thickness on at least one tip surface; and c) shaping the applied surface coating on the at least one tip surface to have a second thickness using a centrifuge, which second thickness is less than the first thickness.

Abstract: A method for coating metallic surfaces with an aqueous composition, which contains an aqueous solution of a zinc salt, by flooding, spraying and/or immersion, wherein, for spraying or immersion, the initial temperature of the substrate lies in the range from 5 to 400° C., in that, for flooding, the initial temperature of the substrate lies in the range from 100 to 400° C. and in that an anticorrosive nanocrystalline zinc oxide layer is formed on the metallic surface. Corresponding aqueous composition, the nanocrystalline zinc oxide layer and the use of the coated substrates are also disclosed.

Abstract: According to one embodiment, a system for manufacturing a fully impregnated thermoplastic prepreg includes a mechanism for moving a fabric or mat and a drying mechanism that removes residual moisture from at least one surface of the fabric or mat. The system also includes a resin application mechanism that applies a reactive resin to the fabric or mat and a press mechanism that presses the coated fabric or mat to ensure that the resin fully saturates the fabric or mat. The system further includes a curing oven through which the coated fabric or mat is moved to polymerize the resin and thereby form a thermoplastic polymer so that upon exiting the oven, the fabric or mat is fully impregnated with the thermoplastic polymer. During at least a portion of the process, humidity in the vicinity of the coated fabric or mat is maintained at substantially zero.

Abstract: A developing method for forming a resist film having a high uniformity of CD distribution. After exposure of a resist film on a substrate surface to form a resist pattern, the method includes sequential steps of: (A) supplying a developer to the rotating substrate; (B) reacting the resist film with the developer; and (C) removing the developer from the surface of the resist film to terminate the reaction of the resist film with the developer. In step (A), a liquid-contact nozzle, having an ejection orifice for the developer and a lower surface extending laterally from the ejection orifice and disposed opposite the resist film, is used. In step (C), the boundary between a reaction-terminated area of the surface of the resist film, and an in-progress reaction area of the surface of the resist film, is moved from the center toward the periphery of the resist film.

Abstract: A coating treatment apparatus supplying a coating solution to a front surface of a rotated substrate and diffusing the supplied coating solution to an outer periphery side of the substrate to thereby apply the coating solution on the front surface of the substrate includes: a substrate holding part holding a substrate; a rotation part rotating the substrate held on the substrate holding part; a supply part supplying a coating solution to a front surface of the substrate held on the substrate holding part; and an airflow control plate provided at a predetermined position above the substrate held on the substrate holding part for locally changing an airflow above the substrate rotated by the rotation part at an arbitrary position.

Abstract: A method of lining an interior wall of a pipe is provided. Casting equipment such as a spin caster is used to centrifugally cast material onto the interior wall while the pipe is partially filled with liquid so as to form a coating on the wall above the liquid. In some embodiments the method further comprises diverting liquid from the pipe after the casting step, and then lining the wall of the pipe below the coating with material to form a continuous lining on the wall.

Abstract: A Plating method includes a first plating process S21 of supplying a first plating liquid to a substrate 2 having a recess 12 and forming a first plating layer 13; and a second plating process of supplying a second plating liquid to the substrate 2 and forming a second plating layer 14 on the first plating layer 13 after the first plating process S21. Here, a concentration of an additive contained in the first plating liquid is different from that in the second plating liquid. The first plating process S21 includes a process of forming the first plating layer of a discontinuous film or a particle shape on the substrate 2 by rotating the substrate 2 at a first speed and a process of rotating the substrate 2 at a second speed and at a third speed repeatedly.