Abstract: A method includes forming a liquid puddle of a mixed solution of the diluting liquid and the processing liquid; rotating the substrate at a first rotation speed which allows the mixed solution located at a region facing an inner side than an edge of the liquid contact surface to stay between the liquid contact surface and the surface of the substrate and allows the mixed solution located at a region facing an outer side than the edge of the liquid contact surface to be diffused toward an edge of the substrate; rotating the substrate at a second rotation speed smaller than the first rotation speed after the substrate is rotated at the first rotation speed; and moving the nozzle toward the edge of the substrate while discharging the processing liquid from the discharge hole in a state that the substrate is rotated at the second rotation speed.
Abstract: A method of making an antimicrobial textile comprising TiO2 nanoparticles is described. The TiO2 nanoparticles are immobilized by first treating a textile with a base, and then contacting with TiO2 nanoparticles in a solution of an alcohol and acid. The textile may be subsequently irradiated with UV light prior to use. The antimicrobial textile shows high effectiveness against the growth and proliferation of microorganisms transmitted within indoor environments.
Abstract: The disclosure relates to a method for producing a decorated wall panel or floor panel comprising the following method steps: a) providing a plate-shaped carrier; b) applying a decoration replicating a decorative pattern onto at least one partial region of the plate-shaped carrier; c) applying a covering layer onto the decoration, wherein the covering layer has a radiation-hardening compound; and d) hardening the covering layer. The covering layer is hardened by using a first radiator and a second radiator, wherein the first radiator emits radiation having a different wave length compared to the radiation of the second radiator, and wherein the first radiator and the second radiator are used in a common hardening step.
Abstract: Herein is described a method of printing on a textile substrate. The method may comprise: a. applying a primer comprising a cross-linkable primer resin onto a surface of the textile substrate to form a primer layer; b. electrophotographically printing onto the primer layer an electrostatic ink composition comprising a cross-linkable thermoplastic resin to form a printed layer; c. applying a cross-linking composition comprising a cross-linking agent to the printed layer, wherein i. the cross-linking agent penetrates into at least the electrostatic ink composition and the primer layer; and/or ii. the cross-linking agent is a non-isocyanate agent; and d. activating the cross-linking agent. Printed textiles are also described.
Abstract: A method for manufacturing antireflective glass substrates by ion implantation, comprising selecting a source gas of N2, or O2, ionizing the source gas so as to form a mixture of single charge and multicharge ions of N, or O, forming a beam of single charge and multicharge ions of N, or O by accelerating with an acceleration voltage A between 13 kV and 40 kV and setting the ion dosage at a value between 5.56×1014×A/kV+4.78×1016 ions/cm2 and ?2.22×1016×A/kV+1.09×1018 ions/cm2, as well as antireflective glass substrates comprising an area treated by ion implantation with a mixture of simple charge and multicharge ions according to this method.
Type:
Grant
Filed:
March 13, 2017
Date of Patent:
July 20, 2021
Assignees:
AGC GLASS EUROPE, AGC GLASS COMPANY NORTH AMERICA, AGC Inc., QUERTECH INGENIERIE
Inventors:
Benjamine Navet, Pierre Boulanger, Denis Busardo
Abstract: Disclosed herein are methods comprising illuminating a first location of a plasmonic substrate with electromagnetic radiation, wherein the electromagnetic radiation comprises a wavelength that overlaps with at least a portion of the plasmon resonance energy of the plasmonic substrate. The plasmonic substrate can be in thermal contact with a liquid sample comprising a plurality of metal particles and a surfactant, the liquid sample having a first temperature. The methods can further comprise generating a confinement region at a location in the liquid sample proximate to the first location of the plasmonic substrate, wherein at least a portion of the confinement region has a second temperature that is greater than the first temperature such that the confinement region is bound by a temperature gradient. The methods can further comprise trapping at least a portion of the plurality of metal particles within the confinement region.
Type:
Grant
Filed:
September 8, 2017
Date of Patent:
July 13, 2021
Assignee:
BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM
Abstract: Method for producing a thermal barrier system on a metal substrate (1) of a turbo engine part, such as a high-pressure turbine blade, the thermal barrier system comprising at least one columnar ceramic layer (31, . . . , 3i, . . . , 3n), characterised in that the method comprises a step of compressing at least one of said at least one columnar ceramic layer (31, . . . 3i, . . . , 3n).
Type:
Grant
Filed:
August 25, 2017
Date of Patent:
July 13, 2021
Assignee:
SAFRAN
Inventors:
Nihad Ben Salah, Jawad Badreddine, Aurélian Joulia
Abstract: Disclosed are polymer-coated surfaces encapsulating task specific ionic liquids (ILs), IL complexes, or oils. Also disclosed are polymer-coated surfaces, wherein the polymer comprises ILs or neutral ethylene diamine compounds. Also disclosed are methods of antimicrobial treatment, metal remediation, and gas absorption using polymer coatings encapsulating ILs, IL complexes, and oils or polymer coatings comprising ILs and neutral ethylene diamine compounds.
Type:
Grant
Filed:
February 5, 2018
Date of Patent:
June 29, 2021
Assignee:
Massachusetts Institute of Technology
Inventors:
Sahag Voskian, Cesar de la Fuente Nunez, T. Alan Hatton, Ryan Alex Shaw, Paul Brown
Abstract: Introduced here is a plasma polymerization apparatus and process. Example embodiments include a vacuum chamber in a substantially symmetrical shape to a central axis. A rotation rack may be operable to rotate about the central axis of the vacuum chamber. Additionally, reactive species discharge mechanisms positioned around a perimeter of the vacuum chamber in a substantially symmetrical manner from the outer perimeter of the vacuum chamber may be configured to disperse reactive species into the vacuum chamber. The reactive species may form a polymeric multi-layer coating on surfaces of the one or more devices. Each layer may have a different composition of atoms to enhance the water resistance, corrosion resistance, and fiction resistance of the polymeric multi-layer coating.
Abstract: Methods and apparatus for removing deposits in self-assembled monolayer (SAM) based selective deposition process schemes using cryogenic gas streams are described. Some methods include removing deposits in self-assembled monolayer (SAM) based selective depositions by exposing the substrate to cryogenic aerosols to remove undesired deposition on SAM protected surfaces. Processing chambers for cryogenic gas assisted selective deposition are also described.
Type:
Grant
Filed:
January 8, 2019
Date of Patent:
June 15, 2021
Assignee:
APPLIED MATERIALS, INC.
Inventors:
Chang Ke, Song-Moon Suh, Liqi Wu, Michael S. Jackson, Lei Zhou, Biao Liu, Cheng Pan, Paul F. Ma, Mei Chang
Abstract: An aluminum member exhibits improved alkali resistance with respect to an anodic oxide coating. The highly alkali-resistant aluminum member includes a material that includes aluminum or an aluminum alloy, an anodic oxide coating that is formed on the surface of the material, and a coating layer that is formed on the anodic oxide coating, and includes a siloxane glass component in a ratio of 90 mass % or more, wherein the coating layer has a thickness of 0.5 to 5.0 ?m and a coating mass of 0.4 to 5.0 g/m2.
Type:
Grant
Filed:
October 12, 2018
Date of Patent:
June 15, 2021
Inventors:
Jin Shinmura, Yohei Kanatani, Ryota Kakizawa
Abstract: Disclosed is a method for forming a multilayer coating film, including applying a first and second aqueous base coat, and a clear coat to an object, and thereafter simultaneously heating and curing the three-layer coating film. The first aqueous base coat includes a water-soluble or water-dispersible polyurethane resin having a glass transition temperature of ?20° C. or below and a weight average molecular weight of 30,000 to 500,000, and a crosslinkable resin having a weight average molecular weight of 600 or more. The first aqueous base coat-coated film has a breaking strength of 2050 N/cm2 or more and a loss tangent (tan ?) at ?20° C. of 0.075 or more. The migration amount of a melamine resin from the second aqueous base coat-coated film layer to the first aqueous base coat-coated film layer is within 3% by mass of a total resin solid content of the first aqueous base coat.
Type:
Grant
Filed:
April 3, 2018
Date of Patent:
May 25, 2021
Assignees:
BASF Coatings GmbH, Honda Motor Co. Ltd.
Abstract: The present invention relates to an information storage medium and a method for long-term storage of information comprising the steps of: providing a ceramic substrate; coating the ceramic substrate with a layer of a second material different from the material of the ceramic substrate, the layer having a thickness no greater than 10 ?m; tempering the coated ceramic substrate to form a writable plate or disc; encoding information on the writable plate or disc by using a laser and/or a focused particle beam to manipulate localized areas of the writable plate or disc.
Abstract: The present invention relates to a method creating highly concentrated quantum entangled particles which can be embedded into substrates such that the particles, and therefore substrates they are embedded upon are remotely controllable. The invention includes streaming a beam of particles through a beam splitter and then applying a selected correlation system, such as NMR or supercooling, to the particles in order to align the particle spins. The particles are then released from the correlation system resulting in an unnaturally high saturation of concentrated quantum entangled particles on a macro scale. The particles and substrates are then in a salve-x relationship configuration and are therefore remotely controllable. Through stimulation and detection, changes in state may be observable in order to determine the level of concentration and remote control.
Abstract: The present invention is to provide a method for manufacturing synthetic leather in which, after obtaining a thickened liquid by adding a thickening agent (B) with an oxyethylene group content of 2×10?2 mol/g or less to an aqueous urethane resin composition containing an aqueous urethane resin (A) having an acid value of 0.01 mgKOH/g or higher in a range of 0.01 to 30 parts by mass relative to 100 parts by mass of the aqueous urethane resin (A), the thickened liquid is coated on a base and coagulated with a coagulating agent (C) containing a metal salt (c-1). As the thickening agent, it is preferable to use one or more kinds of thickening agent that is selected from the group consisting of a cellulose thickening agent, an acryl thickening agent, and a urethane thickening agent. Furthermore, as the metal salt (c-1), calcium nitrate is preferable.
Abstract: Introduced here is a plasma polymerization apparatus and process. Example embodiments include a vacuum chamber in a substantially symmetrical shape to a central axis. A rotation rack may be operable to rotate about the central axis of the vacuum chamber. Additionally, reactive species discharge mechanisms positioned around a perimeter of the vacuum chamber in a substantially symmetrical manner from the outer perimeter of the vacuum chamber may be configured to disperse reactive species into the vacuum chamber. The reactive species may form a polymeric multi-layer coating on surfaces of the one or more devices. Each layer may have a different composition of atoms to enhance the water resistance, corrosion resistance, and fiction resistance of the polymeric multi-layer coating.
Abstract: Introduced here is a plasma polymerization apparatus and process. Example embodiments include a vacuum chamber in a substantially symmetrical shape to a central axis. A rotation rack may be operable to rotate about the central axis of the vacuum chamber. Additionally, reactive species discharge mechanisms positioned around a perimeter of the vacuum chamber in a substantially symmetrical manner from the outer perimeter of the vacuum chamber may be configured to disperse reactive species into the vacuum chamber. The reactive species may form a polymeric multi-layer coating on surfaces of the one or more devices. Each layer may have a different composition of atoms to enhance the water resistance, corrosion resistance, and fiction resistance of the polymeric multi-layer coating.
Abstract: A system that reduces the amount of water that enters a process chamber via a movable shaft is disclosed. The surface of the shaft is made hydrophobic. Any water droplets that are collected on the hydrophobic shaft are disposed at a high contact angle, making it more likely that these water droplets fall from the shaft. Further, any water that enters the process chamber is more readily removed from the shaft due to the lower energy of liberation. Reducing the amount of water in a process chamber may improve the lifetime of the components in the process chamber and may improve the yield of the workpieces being processed. This may be especially relevant when process gasses that contain halogens are employed.
Type:
Grant
Filed:
January 8, 2020
Date of Patent:
April 13, 2021
Assignee:
Varian Semiconductor Equipment Associates, Inc.
Inventors:
Ernest E. Allen, Jr., Jonathan David Fischer, Jeffrey E. Krampert
Abstract: A method of forming a near field transducer (NFT), the method including the steps of depositing a primary material; and implanting a secondary element, wherein both the primary material and the secondary element are chosen such that the primary material is densified via implantation of the secondary element.
Abstract: There is provided a substrate processing apparatus, including: a film forming part configured to form a metal-containing film on a front surface of a substrate; a film cleaning part configured to clean the metal-containing film formed on a peripheral edge portion of the substrate; and a controller. The controller is configured to control the film forming part so as to form the metal-containing film on the front surface of the substrate, and control the film cleaning part so as to supply a first chemical liquid and a second chemical liquid.