Patents Examined by M. Nuzzolillo
  • Patent number: 6020088
    Abstract: This invention relates to methods for producing nickel-based battery electrodes which comprise, when charged, stably cyclable gamma-nickel oxyhydroxide and to electrodes and electrode materials produced by these processes which do not require the addition of expensive stabilizing materials extraneous to the traditional electrode formation process.
    Type: Grant
    Filed: November 18, 1997
    Date of Patent: February 1, 2000
    Assignee: Moltech Power Systems, Inc.
    Inventor: Deepika B. Singh
  • Patent number: 5939235
    Abstract: A positive-working light-sensitive composition comprising (a) a compound having at least two enol ether groups, represented by the following general formula (I); (b) a linear polymer having acidic groups; and (c) a compound capable of generating an acid through irradiation with actinic light rays or radiant rays, the component (a) and the component (b) being thermally crosslinked:(R.sup.2)(R.sup.1)C.dbd.C(R.sup.3)--O-- (I)wherein R.sup.1, R.sup.2 and R.sup.3 may be the same or different and each represents a hydrogen atom, an alkyl group or an aryl group, provided that each two of R.sup.1, R.sup.2 and R.sup.3 may be linked together to form a saturated or olefinically unsaturated ring. The positive-working light-sensitive composition has high light-sensitivity and permits the use of light rays extending over a wide range of wavelengths. Therefore, the positive-working light-sensitive composition of the present invention can provide clear positive images and has a wide development latitude.
    Type: Grant
    Filed: November 12, 1997
    Date of Patent: August 17, 1999
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Syunichi Kondo, Akira Umehara, Yoshimasa Aotani, Tsuguo Yamaoka
  • Patent number: 5919588
    Abstract: The invention relates to alkaline primary cells comprising a zinc gel as the anode material, an aqueous alkaline electrolyte, a separator and a cathode material containing manganese dioxide, wherein the cathode material comprises 0.1-5% by weight of alkali metal titanates and/or alkaline earth metal titanates.
    Type: Grant
    Filed: April 15, 1997
    Date of Patent: July 6, 1999
    Assignee: Varta Batterie Aktiengesellschaft
    Inventors: Horst-Udo Jose, Wolfgang Puin, Christoph Klaus
  • Patent number: 5919834
    Abstract: Disclosed are UV-cured heat transfer labels prepared from a mixture containing at least one thermoplastic resin, at least one material for solvating the thermoplastic resin, the solvating material being either a solvent or liquid monomer, and at least one photo-initiable material which initiates curing of the composition.
    Type: Grant
    Filed: September 29, 1997
    Date of Patent: July 6, 1999
    Assignee: Illinois Tool Works Inc.
    Inventors: Myron H. Downs, James D. Singelyn, Bruce W. Downs
  • Patent number: 5908712
    Abstract: An improved ware plate useful for materials feeder equipment, and the like, includes highly efficient, durable and wear and abrasion resistant sliding surface for slidably contacting elements of the feeder equipment. In particular, the ware plate has a tetragonal zirconia polycrystal ceramic sliding surface for contacting an element of the feeder equipment having a zirconia-alumina ceramic composite sliding surface. Alternatively, the sliding surface of the ware plate is zirconia-alumina ceramic composite for sliding contact with the element of the feeder equipment having a tetragonal zirconia polycrystal ceramic sliding surface.
    Type: Grant
    Filed: October 28, 1996
    Date of Patent: June 1, 1999
    Assignee: Eastman Kodak Company
    Inventors: Dilip K. Chatterjee, Theodore R. Kolb, James J. Ross, Syamal K. Ghosh
  • Patent number: 5900160
    Abstract: Improved methods of forming a patterned self-assembled monolayer on a surface and derivative articles are provided. According to one method, an elastomeric stamp is deformed during and/or prior to using the stamp to print a self-assembled molecular monolayer on a surface. According to another method, during monolayer printing the surface is contacted with a liquid that is immiscible with the molecular monolayer-forming species to effect controlled reactive spreading of the monolayer on the surface. Methods of printing self-assembled molecular monolayers on nonplanar surfaces and derivative articles are provided, as are methods of etching surfaces patterned with self-assembled monolayers, including methods of etching silicon. Optical elements including flexible diffraction gratings, mirrors, and lenses are provided, as are methods for forming optical devices and other articles using lithographic molding.
    Type: Grant
    Filed: July 9, 1996
    Date of Patent: May 4, 1999
    Assignee: President and fellows of Harvard College
    Inventors: George M. Whitesides, Younan Xia, James L. Wilbur, Rebecca J. Jackman, Enoch Kim, Mara G. Prentiss, Milan Mrksich, Amit Kumar, Christopher B. Gorman, Hans Biebuyck, Karl K. Berggren
  • Patent number: 5889077
    Abstract: Disclosed is a process which comprises reacting a polymer of the general formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units, with (i) a formaldehyde source, and (ii) an unsaturated acid in the presence of an acid catalyst, thereby forming a curable polymer with unsaturated ester groups. Also disclosed is a process for preparing an ink jet printhead with the above polymer.
    Type: Grant
    Filed: August 29, 1996
    Date of Patent: March 30, 1999
    Assignee: Xerox Corporation
    Inventors: Timothy J. Fuller, Ram S. Narang, Thomas W. Smith, David J. Luca, Raymond K. Crandall
  • Patent number: 5876872
    Abstract: The battery of the invention includes at least one electrochemical cell for use and recharging underwater, particularly seawater, at a pressure at or greater than atmospheric pressure. The battery has an anode, a cathode, an associated electrolyte in a housing, and a pressure compensation fluid which has a density greater than water, but preferably between the density of water and the density of the electrolyte. Preferably the pressure compensation fluid has a density of about 1.2 g/cm.sup.3, and is non-conductive. Apparatus to compensate for changes in volume are provided, as are components for the escape of internally generated gases.
    Type: Grant
    Filed: November 8, 1996
    Date of Patent: March 2, 1999
    Inventor: Michael D. Feezor
  • Patent number: 5874184
    Abstract: A solid polymer electrolyte comprising a composite of (a) a polymeric component which comprises (i) a polymer obtained from at least one compound represented by general formula (IA), (IIA) and/or (IIIA) as described in the specification; or (ii) a polymer obtained from at least one compound having alcoholic hydroxyl groups wherein at least one hydrogen atom of said alcoholic hydroxyl groups is replaced by a unit represented by general formula (X) or (XI) as described in the specification, and (b) at least one electrolyte salt, which has a high ionic conductivity and can be made into a thin film. The present invention is also directed to an electrode comprising the solid polymer electrolyte and an electroactive substance or polarizable material; as well as a process for manufacturing the same. In addition, the present invention is directed to a primary an secondary battery having the solid polymer electrolyte, as well as a process for manufacturing the same.
    Type: Grant
    Filed: July 11, 1997
    Date of Patent: February 23, 1999
    Assignee: Showa Denko K.K.
    Inventors: Masataka Takeuchi, Koji Tokita, Miyuki Ueda, Jun Noguchi, Hideo Yashima, Eri Tamura, Kazuhiko Ooga
  • Patent number: 5865961
    Abstract: A magnetron sputtering apparatus has a plurality of ring-shaped flat targets with different diameters disposed about one center axis. The apparatus includes magnets having the same polarity as each other and placed on both front surface side and rear surface side of each of the targets along an inner circumferential edge thereof, and magnets having the same polarity as each other and placed on both front surface side and rear surface side of each of the targets along an outer circumferential edge thereof. The magnets placed along the inner and outer circumferential edges are placed in such a way that the magnets along the inner circumferential edge and the magnets along the outer circumferential edge become opposite in polarity to each other.
    Type: Grant
    Filed: December 26, 1995
    Date of Patent: February 2, 1999
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Masahide Yokoyama, Hiroshi Hayata, Seiichiro Mori, Toshiyuki Suemitsu, Eiji Ohno
  • Patent number: 5865896
    Abstract: The invention is embodied in a plasma reactor having a vacuum chamber with a cylindrical side portion and a ceiling at a certain height above the top of the cylindrical side portion, a wafer-holding pedestal near the bottom of the vacuum chamber, gas injection ports near the cylindrical side portion and a vacuum pump, the reactor including a generally planar disk-shaped conductive ceiling electrode adjacent the ceiling, a helical coil antenna having a bottom winding near the top of the cylindrical side portion and a top winding generally corresponding to the second diameter near the planar disk-shaped conductive ceiling electrode, the helical coil antenna substantially spanning the height between the top of the cylindrical side portion and the ceiling, and a switch for individually connecting each one of the coil antenna, the ceiling electrode and the wafer pedestal to one of (a) a respective RF power source or (b) ground or (c) a floating potential (i.e., unconnected to any potential source).
    Type: Grant
    Filed: December 16, 1996
    Date of Patent: February 2, 1999
    Assignee: Applied Materials, Inc.
    Inventors: Romuald Nowak, Kevin Fairbairn, Fred C. Redeker
  • Patent number: 5863670
    Abstract: A joint of Ti--Al intermetallic compounds, comprising a plurality of base members made of a Ti--Al intermetallic compound and having Ti--Al lamellar grains, and a junction provided between the base members, made of a Ti--Al intermetallic compound and having Ti--Al lamellar grains, wherein some of the lamellar grains of the junction extend into the base members, and some of the lamellar grains of each base member may extend into the junction or pass through the junction into the other base member.
    Type: Grant
    Filed: April 18, 1996
    Date of Patent: January 26, 1999
    Assignee: NHK Spring Co., Ltd.
    Inventors: Kohei Taguchi, Michihiko Ayada
  • Patent number: 5863681
    Abstract: A shadow mask of two different metals which are cold rolled into adhesion with the shadow mask made from a first metal having a coefficient of thermal expansion on the order of glass and a second metal having a coefficient of thermal expansion substantially greater than glass with the first metal forming a framework for holding the second metal in position even though the temperature of the first and second metals is elevated.
    Type: Grant
    Filed: September 19, 1996
    Date of Patent: January 26, 1999
    Assignee: Wickeder Westgalenstahl GmbH
    Inventor: Klaus-Peter Helmetag
  • Patent number: 5861086
    Abstract: A method and apparatus for conditioning a surface of a ceramic body in a process chamber when the process chamber has a vacuum pump, an anode and a cathode. The conditioning method consists of pumping the process chamber down to a vacuum with the vacuum pump, introducing a gas into the chamber, energizing the anode and cathode with RF power to ignite the gas into a plasma, sputter etching the surface with ions from the plasma to remove contaminants therefrom. The method is accomplished either within a process chamber to condition, in situ, a ceramic chuck or within a cleaning chamber to condition any form of ceramic body or component.
    Type: Grant
    Filed: March 10, 1997
    Date of Patent: January 19, 1999
    Assignee: Applied Materials, Inc.
    Inventors: Nitin Khurana, Vince Burkhart, Steve Sansoni, Vijay Parkhe, Eugene Tzou
  • Patent number: 5858578
    Abstract: The semiconductor masking device of the invention includes a first semiconductor mask for forming an interconnection on a semiconductor substrate and a second semiconductor mask for forming a resist pattern on an insulating film. The first semiconductor mask has three masking areas and the second semiconductor mask has two masking areas. Masking area intervals, that is, the distances between the three masking areas of the first semiconductor mask and the two masking areas of the second semiconductor mask, are all equal to one another.
    Type: Grant
    Filed: June 18, 1996
    Date of Patent: January 12, 1999
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Takaaki Ukeda, Tatsuya Yamada, Yoshiaki Kato, Akio Miyajima
  • Patent number: 5857611
    Abstract: A method of forming a sputter target/backing plate assembly comprises the steps of: providing a target fabricated from a first material having a coefficient of thermal expansion; providing a backing plate fabricated from a second material having a coefficient of thermal expansion; providing a block fabricated from a third material having a coefficient of thermal expansion; positioning the block on one side of the backing plate; positioning the target on the other side of the backing plate; and subjecting the target, backing plate and block to elevated temperature and pressure to bond the target, backing plate and block together. The third material is selected so as to have a coefficient of thermal expansion which counteracts the effects of the coefficients of thermal expansion of the first and second materials. The third material may be selected so as to have a coefficient of thermal expansion which is approximately the same as the coefficient of thermal expansion of the first material.
    Type: Grant
    Filed: August 16, 1995
    Date of Patent: January 12, 1999
    Assignees: Sony Corporation, Materials Research Corporation
    Inventors: Paul S. Gilman, Thomas J. Hunt, Suresh Annavarapu
  • Patent number: 5856052
    Abstract: A focus/exposure matrix comprises a series of patterns disposed on a wafer. The patterns are arranged in rows and columns. The patterns in a row are characterized by having been formed with substantially the same exposure time and an effective focus that increments between successive row patterns by an amount substantially corresponding to half the focus resolution of the photostepper. The patterns in a column are characterized by having been formed with substantially the same effective focus and an exposure time that increments between successive column patterns by a finite amount.
    Type: Grant
    Filed: April 28, 1997
    Date of Patent: January 5, 1999
    Assignee: VLSI Technology, Inc.
    Inventor: Pierre Leroux
  • Patent number: 5856056
    Abstract: In the present process for producing a toner, previous to the melt-kneading process, the binder resin particles and colorant particles are mixed and treated to application of shear, compression and impact forces to fasten, or fix, the colorant particles to the binder resin particles.
    Type: Grant
    Filed: December 3, 1992
    Date of Patent: January 5, 1999
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kazuhiko Omata, Yasuhide Goseki, Hitoshi Kanda, Satoshi Mitsumura
  • Patent number: 5855727
    Abstract: An apparatus and method for selectively etching an encapsulant forming a package of resinous material around an electronic device includes a source of etchant solution and an etching assembly including an etch plate and a bell jar or cover, the etch plate and bell jar forming an etching chamber. Optionally, an etch cup or fixture is supported by the etch head or the electronic device package is mountable in the chamber directly on the etch head. A source of pressurized gas such as nitrogen provides a positive pressure about 2 PSI to the bell jar and to flow the etchant solution through the etch head and onto an exterior surface of the electronic device package so that the encapsulant is etched and when break out occurs on a side wall of the package, the pressure in the bell jar is vented to a waste reservoir and the pressure at the etchant solution source is reduced so that etchant solution flow is instantly stopped to prevent any damage to the electronic device by excessive etching.
    Type: Grant
    Filed: July 12, 1996
    Date of Patent: January 5, 1999
    Assignee: Nisene Technology Group
    Inventors: Kirk A. Martin, Richard A. Kanishak
  • Patent number: 5855745
    Abstract: Plasma processing apparatus may comprise a process chamber having a process gas supply for providing a process gas to the process chamber and a vacuum pump for maintaining the process chamber within a predetermined pressure range. A cathode/target assembly positioned within the process chamber is connected to a first terminal of an external power supply. An anode/ion source assembly is also positioned within the process chamber and may include an electrode member having a central aperture therein that defines an active surface on the electrode member. The electrode member is connected to a second terminal of the external power supply. A magnet positioned adjacent the electrode member produces an electron-confining magnetic tunnel adjacent the active surface of the electrode member. The electron-confining magnetic tunnel momentarily traps electrons adjacent the active surface, some of which ionize some of the process gas.
    Type: Grant
    Filed: April 23, 1997
    Date of Patent: January 5, 1999
    Assignee: Sierra Applied Sciences, Inc.
    Inventor: Barry W. Manley