Patents Examined by M. Nuzzolillo
  • Patent number: 5855745
    Abstract: Plasma processing apparatus may comprise a process chamber having a process gas supply for providing a process gas to the process chamber and a vacuum pump for maintaining the process chamber within a predetermined pressure range. A cathode/target assembly positioned within the process chamber is connected to a first terminal of an external power supply. An anode/ion source assembly is also positioned within the process chamber and may include an electrode member having a central aperture therein that defines an active surface on the electrode member. The electrode member is connected to a second terminal of the external power supply. A magnet positioned adjacent the electrode member produces an electron-confining magnetic tunnel adjacent the active surface of the electrode member. The electron-confining magnetic tunnel momentarily traps electrons adjacent the active surface, some of which ionize some of the process gas.
    Type: Grant
    Filed: April 23, 1997
    Date of Patent: January 5, 1999
    Assignee: Sierra Applied Sciences, Inc.
    Inventor: Barry W. Manley
  • Patent number: 5853959
    Abstract: A method of fabricating a contoured surface feature to multiple depths on a surface of a hydrodynamic bearing slider with a single mask includes applying a lithographic resist layer to the slider surface and forming the single mask with a mask pattern which includes a masked area, an unmasked area and an intermediate area between the masked area and the unmasked area. The lithographic resist layer is then exposed through the single mask and removed as a function of exposure to form a patterned resist layer and to thereby uncover portions of the slider surface within the patterned resist layer. The uncovered portions of the slider surface and the patterned resist layer are etched, with the uncovered portions being etched to a first depth below the slider surface.
    Type: Grant
    Filed: August 9, 1996
    Date of Patent: December 29, 1998
    Assignee: Seagate Technology, Inc.
    Inventors: John L. Brand, Daniel P. Burbank
  • Patent number: 5851413
    Abstract: Apparatus and method of an improved gas delivery system for delivering reactant material to a workpiece, such as a substrate, being operated on by a particle beam employs a shroud-type concentrator having an interior axial passage. Fluid reactant material is supplied to the axial passage for delivery to the workpiece. A particle beam can traverse the axial passage for impingement on the workpiece surface, concurrently if desired with the reactant delivery.
    Type: Grant
    Filed: June 19, 1996
    Date of Patent: December 22, 1998
    Assignee: Micrion Corporation
    Inventors: Robert A. Casella, Charles J. Libby, Gary P. Rathmell
  • Patent number: 5851732
    Abstract: The present invention is directed to a PDP device fabricated by using photosensitive thick film conductor compositions wherein a black electrode is present between the substrate and a conductor arrangement electrode. Also, the invention is directed to methods for fabricating the PDP device.
    Type: Grant
    Filed: March 6, 1997
    Date of Patent: December 22, 1998
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Hiroshi Kanda, Jerome David Smith, Terry R. Suess
  • Patent number: 5851695
    Abstract: A lead-acid cell includes a case, positive and negative plates within the case, microporous separator material between adjacent plates and electrolyte in a starved amount, with the case having jar and covers joined by a weldment along overlapping cover and jars. The positive plates include a grid frame with an intermediate member extending between spaced apart generally peripheral portions of the frame, with pasted active material on the grid frame separated substantially into two portions by the intermediate member. Compressive force is adjustably continuously applied to the positive and negative plates within the case. The plates are suspended within the case at positions removed from the wall of the case, while plate growth is permitted in a manner that plate shorting is avoided.
    Type: Grant
    Filed: February 10, 1992
    Date of Patent: December 22, 1998
    Assignee: C & D Technologies, Inc.
    Inventors: Sudhan S. Misra, Franz Wagner
  • Patent number: 5851725
    Abstract: A lithography process which utilizes metastable atoms for resist exposure is disclosed. Metastable rare gas atoms, instead of photons, electrons or ions, are directed at the surface of a lithographic resist. On impact, the metastable atoms release up to 20 eV of energy per atom in the form of secondary electrons. These secondary electrons alter chemical bonds in the resist, causing it to become either soluble or insoluble in an appropriate developer solution. The metastable rare gas atoms can further be manipulated with the new techniques of atom optics to focus them, improve their collimation and intensity, or modulate them.
    Type: Grant
    Filed: January 26, 1993
    Date of Patent: December 22, 1998
    Assignee: The United States of America as represented by the Secretary of Commerce
    Inventor: Jabez McClelland
  • Patent number: 5849426
    Abstract: A hybrid energy storage system 10 including a first energy storage device 12, such as a secondary or rechargeable battery, and a second energy storage device 14, such as an electrochemical capacitor. The electrochemical capacitor provides intermittent energy bursts to satisfy the power requires of, for example, pulsed power communication devices. Such devices typically require power pulses in excess of those which conventional battery cells can easily provide for numerous cycles. The first and second energy storage devices may be coupled to output electronics to condition the output of the devices prior to delivering it to the application device.
    Type: Grant
    Filed: September 20, 1996
    Date of Patent: December 15, 1998
    Assignee: Motorola, Inc.
    Inventors: George Thomas, Georgina More
  • Patent number: 5849451
    Abstract: An electrophotographic dry toner comprising toner particles having externally added thereto fine particles of an inorganic compound having been surface treated with an amphoteric surface active agent. The toner is excellent in fluidity, anti-caking properties, charging properties, and environmental stability and provides excellent images free from defects such as black spots.
    Type: Grant
    Filed: July 17, 1997
    Date of Patent: December 15, 1998
    Assignee: Fuji Xerox Co., Ltd.
    Inventors: Yuka Ishihara, Chiaki Suzuki, Tetsu Torigoe, Atuhiko Eguchi, Takayoshi Aoki
  • Patent number: 5849431
    Abstract: A spirally coiled electrode assembly has positive and negative electrodes each including a web-like collector coated with an active material on opposite surfaces thereof, and separators disposed between the positive and negative electrodes. A plurality of rectangular leads extend from opposite sides of the web-like collectors in directions perpendicular to a direction in which the positive and negative electrodes and the separators are wound. Positive and negative terminals are connected to the rectangular leads extending from the respective opposite sides of the web-like collectors. The spirally coiled electrode assembly, the rectangular leads, and the positive and negative terminals are housed in a cylindrical casing whose opposite ends are closed by respective caps. The positive and negative terminals are fixed to the caps, respectively.
    Type: Grant
    Filed: September 25, 1996
    Date of Patent: December 15, 1998
    Assignee: Sony Corporation
    Inventors: Yosuke Kita, Tatuo Shimizu, Satoshi Iwatsu, Hideya Takahashi, Kiyoshi Katayama
  • Patent number: 5846443
    Abstract: A method in a plasma processing chamber, for etching through a selected portion of an aluminum-containing layer and a titanium-containing layer. The titanium-containing layer is disposed above the aluminum-containing layer. The method includes a first etching step that etches at least partially through the titanium-containing layer using a first source gas composition. The first source gas composition consists essentially of the Cl.sub.2 etchant and a first mixture. The first mixture consists essentially of HCl and CHF.sub.3. The first source gas composition has a first flow ratio of the Cl.sub.2 etchant to the first mixture. There is further included a second etching step that etches at least partially through the aluminum-containing layer using a second source gas composition. The second source gas composition consists essentially of a Cl.sub.2 etchant and a second mixture. The second mixture consists essentially of HCl and CHF.sub.3. The second source gas composition has a second flow ratio of the Cl.sub.
    Type: Grant
    Filed: July 9, 1996
    Date of Patent: December 8, 1998
    Assignee: Lam Research Corporation
    Inventor: Susan C. Abraham
  • Patent number: 5846681
    Abstract: An imaging member has a substrate of a polymer insoluble in solvent for the charge transport layer, a Tg of at least 90.degree. C. and a linear thermal contraction coefficient substantially identical to the linear thermal contraction coefficient of a charge transport layer.
    Type: Grant
    Filed: September 30, 1992
    Date of Patent: December 8, 1998
    Assignee: Xerox Corporation
    Inventors: Robert C. U. Yu, Richard L. Post
  • Patent number: 5843596
    Abstract: A method of forming a button-type battery includes: a) positioning first and second terminal housing members in facing juxtaposition to one another, and providing an anode, a cathode and an electrolyte intermediate the first and second terminal housing member central portions; b) providing a peripheral insulative sealing gasket intermediate the first and second terminal housing members, the insulative sealing gasket being in the shape of an annulus and having a radial extent which extends radially outward beyond the surrounding peripheral portions of the first and second terminal housing members; c) moving at least one of the juxtaposed first and second terminal housing members in the direction of the other to push the first terminal housing member container wall against the first gasket face and to simultaneously force the second terminal housing member peripheral portion against the second gasket face, and continuing such moving to bend the insulative gasket about the container wall and force it to be recei
    Type: Grant
    Filed: October 11, 1996
    Date of Patent: December 1, 1998
    Assignee: Micron Communications, Inc.
    Inventor: Mark E. Tuttle
  • Patent number: 5843372
    Abstract: A hydrogen-absorbing alloy for battery according to the present invention comprises an alloy having the composition represented by a general formula A Ni.sub.a Mn.sub.b M.sub.c ?where, A is at least one kind of element selected from rare earth elements including Y (yttrium), M is a metal mainly composed of at least one kind of element selected from Co, Al, Fe, Si, Cr, Cu, Ti, Zr, Zn, Hf, V, Nb, Ta, Mo, W, Ag, Pd, B, Ga, In, Ge and Sn, 3.5.ltoreq.a.ltoreq.5, 0.1.ltoreq.b.ltoreq.1, 0.ltoreq.c.ltoreq.1, 4.5.ltoreq.a+b+c.ltoreq.6!, wherein the alloy has columnar structures in which the area ratio of the columnar structures having the ratio of a minor diameter to a major diameter (aspect ratio) of 1:2 or higher is 50% or more. Further, an average minor diameter of the columnar structures is set to 30 microns or less.
    Type: Grant
    Filed: December 17, 1996
    Date of Patent: December 1, 1998
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Hiroyuki Hasebe, Shusuke Inada, Yoshiyuki Isozaki, Takamichi Inaba, Takao Sawa, Hiromichi Horie, Noriaki Yagi, Hiromi Shizu, Yoshiko Kanazawa
  • Patent number: 5840205
    Abstract: A method of fabricating a specimen for analyzing defects of a semiconductor device is disclosed. The method includes the steps of: cutting a wafer to be adjacent to a defective portion that exists in a patterned layer formed on a substrate; molding the first specimen with a resin; grinding the substrate of the first specimen with a predetermined slope; and etching the ground face to expose the defective layer, wherein the wafer includes a semiconductor substrate and patterned layers where memory devices are formed on the semiconductor substrate.
    Type: Grant
    Filed: July 19, 1996
    Date of Patent: November 24, 1998
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventors: Jeong-Hoi Koo, Doo-Jin Park
  • Patent number: 5841568
    Abstract: An optical modulator includes a substrate having an electrooptic effect, an optical waveguide formed on a surface of the substrate, and a control electrode formed on the substrate, and a control electrode formed on the substrate to oppose the optical waveguide. In this optical modulator, the control electrode is formed by stacking a plurality of layers in a direction perpendicular to the substrate surface.
    Type: Grant
    Filed: March 28, 1996
    Date of Patent: November 24, 1998
    Assignee: NEC Corporation
    Inventor: Tosiya Miyakawa
  • Patent number: 5837425
    Abstract: Provided are a developer suitable for both positive working and negative working photosensitive lithographic printing plates for lithography and a replenisher thereof which comprise as a development stabilizer at least one compound selected from the group consisting of sugars, oximes, phenols and fluorinated alcohols in a proportion of at least 0.01 mole/l and have their pH values in the range of 11.0 to 13.5 by containing an alkali agent and a developer for photosensitive lithographic printing plates which comprises (1) a compound represented by formula (A) or (B) described in the present specification, (2) at least one compound selected from the group consisting of phenols, sugars, oximes and fluorinated alcohols which have buffering effect in the pH range of 11.5 to 13.5 and (3) a specific alkali agent, and has a pH of 11.5 to 13.5.
    Type: Grant
    Filed: November 19, 1997
    Date of Patent: November 17, 1998
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Haruo Nakanishi, Tadao Toyama, Hiroshi Matsumoto
  • Patent number: 5837397
    Abstract: In one embodiment, the present invention provides a lithium-ion battery and a method of preparing a lithium-ion battery containing a slurry anode including a carbonaceous material, a first electrolyte salt and a first organic solvent; and a slurry cathode including a conductor, a second electrolyte salt, a second organic solvent and a lithium transition metal oxide, with the proviso that neither the slurry anode nor the slurry cathode contain a binder.
    Type: Grant
    Filed: November 8, 1996
    Date of Patent: November 17, 1998
    Assignee: Gould Electronics Inc.
    Inventor: Xuekun Xing
  • Patent number: 5837420
    Abstract: A positive working photosensitive composition is disclosed, which comprises (a) a resin having groups capable of increasing solubility of the resin in an alkali developer through their decomposition due to the action of an acid and (b) a compound represented by formula (I) or (II) generating sulfonic acid by irradiation with active rays or radiant rays: ##STR1##
    Type: Grant
    Filed: March 6, 1997
    Date of Patent: November 17, 1998
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Toshiaki Aoai, Kunihiko Kodama, Kazuya Uenishi, Tsukasa Yamanaka
  • Patent number: 5834136
    Abstract: A method of fabricating polymeric matrices suitable for use in non-aqueous electrochemical cells is provided. The method includes forming an organic emulsion comprising an organic solvent and having a polar phase comprising polar polymer precursors and a non-polar phase comprising non-polar polymer precursors wherein the polar phase is substantially immiscible in the non-polar phase, said emulsion further including an effective amount of surfactant to maintain said emulsion; and initiating polymerization of said polar polymer precursors to form first polymers and of said non-polar polymer precursors to form second polymers wherein said first polymers are crosslinked by said second polymers to form a polymeric matrix. The polymeric matrix will have superior physical strength and puncture resistance.
    Type: Grant
    Filed: June 17, 1996
    Date of Patent: November 10, 1998
    Assignee: Valence Technology, Inc.
    Inventors: Feng Gao, Porter H. Mitchell
  • Patent number: 5833786
    Abstract: A method for fabricating composite parts having improved pulloff strengths between portions of the composite part. In one embodiment, a sine wave spar is formed from two U-shaped channels having opposing flanges and a central web. The U-shaped channels are joined along the webs. The triangular gaps between the edges of the joined U-shaped channels are filled using a titanium radius filler that is configured to fit within the gaps. After the titanium radius filler is placed within the gaps, additional layers of composite material are placed over the titanium radius filler and the flanges of the U-shaped channels to form the caps of the I-beam. The resulting composite workpiece is then placed within appropriate tooling and cured within an autoclave. In other embodiments, the method of the invention is used to form spars, ribs, stringers, or bulkheads from composite materials.
    Type: Grant
    Filed: May 16, 1996
    Date of Patent: November 10, 1998
    Assignee: The Boeing Company
    Inventors: Douglas A. McCarville, John S. Howitt, Jr., Mark L. Younie