Abstract: A method includes etching a substrate to form an opening, depositing a first dielectric liner extending into the opening, and depositing a second dielectric liner over the first dielectric liner. The second dielectric liner extends into the opening. A conductive material is filled into the opening. The method further includes performing a first planarization process to planarize the conductive material so that a portion of the conductive material in the opening forms a through-via, performing a backside grinding process on the substrate until the through-via is revealed from a backside of the substrate, and forming a conductive feature on the backside of the substrate. The conductive feature is electrically connected to the through-via.

Abstract: A dual omnidirectional microphone array noise suppression is described. Compared to conventional arrays and algorithms, which seek to reduce noise by nulling out noise sources, the array of an embodiment is used to form two distinct virtual directional microphones which are configured to have very similar noise responses and very dissimilar speech responses. The only null formed is one used to remove the speech of the user from V2. The two virtual microphones may be paired with an adaptive filter algorithm and VAD algorithm to significantly reduce the noise without distorting the speech, significantly improving the SNR of the desired speech over conventional noise suppression systems.

Abstract: Disclosed is a semiconductor package including: a redistribution substrate; at least one passive device in the redistribution substrate, the passive device including a first terminal and a second terminal; and a semiconductor chip on a top surface of the redistribution substrate, the semiconductor chip vertically overlapping at least a portion of the passive device, wherein the redistribution substrate includes: a dielectric layer in contact with a first lateral surface, a second lateral surface opposite to the first lateral surface, and a bottom surface of the passive device; a lower conductive pattern on the first terminal; a lower seed pattern provided between the first terminal and the conductive pattern, and directly connected to the first terminal; a first upper conductive pattern on the second terminal and a first upper seed pattern provided between the second terminal and the first upper conductive pattern, and directly connected to the second terminal.

Abstract: A semiconductor structure includes a semiconductor substrate and a gate structure embedded in the semiconductor substrate. The gate structure includes a gate electrode layer, a barrier layer disposed over the gate electrode layer, and a semiconductor layer disposed over the barrier layer. The semiconductor structure also includes an air gap in the semiconductor substrate and exposing the barrier layer and the semiconductor layer.

Abstract: A copper pillar bump structure on a copper pillar on a metal pad of a semiconductor device and a method of fabricating thereof are disclosed. The copper pillar bump structure includes: a metal barrier layer formed on the copper pillar. The metal barrier layer has a U-shaped cross section, a central portion of the metal barrier layer covers the top surface of the copper pillar, an opening of the U-shaped cross section faces away from the copper pillar. The copper pillar bump structure further includes a solder layer on the copper pillar and filling the U-shaped cross section. The copper pillar bump structure provides a metal barrier layer having a U-shaped cross section and fills a solder layer in the U-shaped cross section, the metal barrier layer wraps sides of the solder layer, which can improve the non-wetting problem caused by insufficient tin, or the solder bridging problem caused by excessive solder, during a flip die soldering process.

Abstract: A semiconductor package includes: a first semiconductor device including a first pad and a first metal bump structure on the first pad; and a second semiconductor device on the first semiconductor device, and including a third pad and a second metal bump structure on the third pad, wherein the first and second metal bump structures are bonded to each other to electrically connect the first and second semiconductor devices to each other. Each of the first and second metal bumps structures includes first to third metal patterns. The first to third metal patterns of the first metal bump structure are on the first pad. The first to third metal patterns of the second metal bump structure are on the third pad. The first and third metal patterns include a first metal having a first coefficient of thermal expansion less than that of a second metal of the second metal pattern.

Abstract: Disclosed is a semiconductor package comprising a redistribution substrate, and a semiconductor chip on a top surface of the redistribution substrate. The redistribution substrate includes an under-bump pattern, a lower dielectric layer that covers a sidewall of the under-bump pattern, and a first redistribution pattern on the lower dielectric layer. The first redistribution pattern includes a first line part. A width at a top surface of the under-bump pattern is greater than a width at a bottom surface of the under-bump pattern. A thickness of the under-bump pattern is greater than a thickness of the first line part.

Abstract: A semiconductor package comprises a substrate; an interposer on the substrate; a first underfill between the substrate and the interposer; at least one logic chip and at least one memory stack on the interposer; and a molding material on the interposer while surrounding a side surface of the at least one logic chip and a side surface of the at least one memory stack. The molding material includes areas having different heights. The first underfill covers a portion of the molding material.

Abstract: Disclosed herein are microelectronic structures including bridges, as well as related assemblies and methods. In some embodiments, a microelectronic structure may include a substrate and a bridge.

Abstract: A manufacturing method of semiconductor device is provided. In the manufacturing method, a tunneling dielectric layer, floating gates on the tunneling dielectric layer, an ONO layer on the floating gates, and control gates on the ONO layer are formed. During the formation of the floating gates and the control gates, reactive-ion etching (R.I.E.) is not used at all, and thus damage to the floating and control gates from high-density plasma is prevented, such as charge trap in the floating gates may be significantly reduced to improve the reliability of data storage.

Abstract: A semiconductor module includes a substrate having a central region, an outer region that surrounds the central region, and a middle region disposed between the central and the outer region, a first semiconductor package mounted on the central region of the substrate, a plurality of second semiconductor packages mounted on the middle region of the substrate, and a heat radiation structure disposed on the first semiconductor package and second semiconductor packages. The heat radiation structure includes a first part that is disposed on top surfaces of the first and second semiconductor packages, a second part that surrounds the middle region, a third part that is spaced apart from the second part and surrounds the first semiconductor package, and a fourth part that connects the second part to the third part.

Abstract: Disclosed is a method for designing an integrated circuit, wherein the integrated circuit is to be structured in cells, wherein the cells are to comprise functional cells and spare cells. The method comprises: a) designing at least one functional cell; and b) placing a plurality of functional cells on associated pattern positions of an, in particular regular, pattern matrix designed for the functional cells. The method further comprises c) placing, on at least one of the remaining pattern positions of the pattern matrix and instead of at least one spare cell conceivable for the at least one of the remaining pattern positions of the pattern matrix, a gate-based decoupling cell, and alternatively or in addition, d) placing, in at least one gap between pattern positions of the matrix pattern and instead of at least one filler cell conceivable for the at least one gap between pattern positions of the pattern matrix, a gate-based decoupling cell.

Abstract: A field effect transistor construction includes a semiconductive channel core. A source/drain region is at opposite ends of the channel core. A gate is proximate a periphery of the channel core. A gate insulator is between the gate and the channel core. The gate insulator has local regions radially there-through that have different capacitance at different circumferential locations relative to the channel core periphery. Additional constructions, and methods, are disclosed.

Abstract: A glass core device with a wiring pattern on a first surface of a glass core and a wiring pattern on a second surface thereof being electrically connected via a wiring pattern embedded in TGVs formed in the glass core. In a state of being cut out by dicing, each glass core has a second surface and side faces which are continuously covered with an outer protective layer.

Abstract: An apparatus that includes a plurality of OLEDs provided on a first substrate is disclosed. Each OLED includes a first electrode, a second electrode disposed over the first electrode, and an organic electroluminescent material disposed between the first and the second electrodes. The apparatus also includes a first capping layer that is disposed over the second electrode of at least a first portion of the plurality of OLEDs such that the first capping layer is optically coupled to at least the first portion of the plurality of OLEDs, and a second capping layer. The second capping layer is disposed over the second electrode of at least a second portion of the plurality of OLEDs such that the second capping layer is optically coupled to the second portion of the plurality of OLEDs but not the first portion of the plurality of OLEDs, and the second portion of the plurality of OLEDs is different from the first portion of the plurality of OLEDs.

Abstract: A system and method for applying an underfill is provided. An embodiment comprises applying an underfill to a substrate and patterning the underfill. Once patterned other semiconductor devices, such as semiconductor dies or semiconductor packages may then be attached to the substrate through the underfill, with electrical connections from the other semiconductor devices extending into the pattern of the underfill.

Abstract: A semiconductor device includes a semiconductor substrate and a field effect transistor disposed on the semiconductor substrate. The field effect transistor includes a vertical fin defining a longitudinal length along a first axis, a width along a second axis and a vertical height along a third axis. The vertical fin includes source and drain regions separated by a gate region and a gate structure over the gate region. The gate structure includes a dipole layer and a gate electrode layer over the dipole layer. A first longitudinal section of the gate structure includes the dipole layer and a second longitudinal section of the gate structure is devoid of the dipole layer.

Abstract: A method for fabricating semiconductor device includes the steps of: forming a gate structure on a substrate; forming a spacer around the gate structure; forming a first contact etch stop layer (CESL) around the spacer; forming a mask layer on the first CESL; removing part of the mask layer; removing part of the first CESL; forming a second CESL on the mask layer and the gate structure; and removing part of the second CESL.

Abstract: A semiconductor device and a method of manufacturing a semiconductor device, the device including a substrate; a lower structure including pad patterns on the substrate, upper surfaces of the pad patterns being at an outer side of the lower structure; a plurality of lower electrodes contacting the upper surfaces of the pad patterns; a dielectric layer and an upper electrode sequentially stacked on a surface of each of the lower electrodes; and a hydrogen supply layer including hydrogen, the hydrogen supply layer being between the lower electrodes and closer to the substrate than the dielectric layer is to the substrate.

Abstract: A circuit module including an integrated circuit (IC) and a method for forming an IC are disclosed. An embodiment of the circuit module includes a trench having a conductive trench liner formed in a semiconductor substrate, and further includes semiconductor device circuitry formed in the substrate, where a conductor within a metallization layer of the semiconductor device circuitry electrically connects to the conductive trench liner. The embodiment also includes an insulating structure arranged over the conductive trench liner, where the insulating structure extends to an upper contact formed within an upper metallization layer of the semiconductor device circuitry. An isolation capacitor operable between the upper contact and the conductive trench liner has one or more electrical properties dependent on both a depth of the trench and a number of metallization layers below the upper metal layer in the semiconductor device circuitry.