Patents Examined by Mary Lee
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Patent number: 11942425Abstract: The present disclosure provides a semiconductor structure. The semiconductor structure includes a semiconductor substrate, a contact structure, a first conductive element, and a first dielectric spacer structure. The semiconductor substrate includes an active region and an isolation structure. The contact structure is on the active region of the semiconductor substrate. The first conductive element is on the isolation structure of the semiconductor substrate. The first dielectric spacer structure is between the contact structure and the first to conductive element. The first dielectric spacer structure has a first concave surface facing the first conductive element.Type: GrantFiled: April 19, 2022Date of Patent: March 26, 2024Assignee: NANYA TECHNOLOGY CORPORATIONInventors: Chih-Ying Tsai, Jui-Seng Wang, Yi-Yi Chen
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Patent number: 11937420Abstract: The present application provides a memory device having a word line with an improved adhesion between a work function member and a conductive layer. The memory device includes a semiconductor substrate defined with an active area and including a recess extending into the semiconductor substrate, and a word line disposed within the recess, wherein the word line includes a first insulating layer disposed within and conformal to the recess, a conductive layer surrounded by the first insulating layer, a conductive member enclosed by the conductive layer, and a second insulating layer disposed over the conductive layer and conformal to the first insulating layer. A method of manufacturing the memory device is also disclosed.Type: GrantFiled: January 19, 2022Date of Patent: March 19, 2024Assignee: NANYA TECHNOLOGY CORPORATIONInventors: Yueh Hsu, Wei-Tong Chen
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Patent number: 11917813Abstract: The present disclosure provides a dynamic random access memory (DRAM) array. The memory array includes a semiconductor substrate, an isolation structure and contact enhancement sidewall spacers. The semiconductor substrate has a trench defining laterally separate active areas formed of surface regions of the semiconductor substrate. Top surfaces of a first group of the active areas are recessed with respect to top surfaces of a second group of the active areas. The isolation structure is filled in the trench and in lateral contact with bottom portions of the active areas. The contact enhancement sidewall spacers laterally surround top portions of the active areas, respectively.Type: GrantFiled: November 17, 2021Date of Patent: February 27, 2024Assignee: NANYA TECHNOLOGY CORPORATIONInventor: Ping Hsu
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Patent number: 11915968Abstract: The present disclosure relates to a semiconductor structure and a method for manufacturing the same. The method includes: providing a base, at least one shallow trench isolating structure being formed in the base and several active regions arranged at an interval being isolated by the shallow trench isolating structure in the base; forming a first trench in the base, a part of the active regions being exposed in the first trench; forming a first conducting structure in the first trench; forming a first dielectric layer on the base; forming a second trench in the first dielectric layer, the first conducting structure being exposed in the second trench and a width of a top of the second trench being greater than a width of a top of the first trench; and forming a second conducting structure in the second trench.Type: GrantFiled: February 15, 2022Date of Patent: February 27, 2024Assignee: CHANGXIN MEMORY TECHNOLOGIES, INC.Inventor: Wenli Chen
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Patent number: 11915967Abstract: The present disclosure discloses a semiconductor device manufacturing method and a semiconductor device, relating to the technical field of semiconductors. The method includes: providing a semiconductor substrate, the semiconductor substrate comprising a shallow trench and active areas isolated from the shallow trench; forming an oxygen-containing layer on exposed outer surfaces of the shallow trench and the active areas; filling a first sacrificial layer of a set height in the shallow trench comprising the oxygen-containing layer on its surface; forming an etch stop layer on an upper surface of the first sacrificial layer; removing the first sacrificial layer below the etch stop layer to form an air gap; filling an isolation layer on the etch stop layer in the shallow trench to form a shallow trench isolation(STI) structure containing the air gap; and etching the active areas and the (STI) structure to form wordline trenches.Type: GrantFiled: May 18, 2021Date of Patent: February 27, 2024Assignee: CHANGXIN MEMORY TECHNOLOGIES, INC.Inventors: Kui Zhang, Zhan Ying
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Patent number: 5403812Abstract: Unsaturated cyclohexenone oxime ethers I ##STR1## (Q=H, alkylcarbonyl, benzoyl, alkali metal or alkaline earth metal ion, substituted or unsubstituted ammonium ion, phosphonium ion, sulfonium ion, sulfoxonium ion, an equivalent of a transition metal cation;W=--C.ident.C-- or --CH=CH--;R.sup.1 =substituted or unsubstituted cycloalkyl, cycloalkenyl or 6-membered heterocyclic group which has 1-2 oxygen and/or sulfur atoms and can be saturated or partially unsaturated; substituted or unsubstituted 5-membered saturated heterocycle with 1-2 oxygen and/or sulfur atoms; substituted or unsubstituted 5-membered heteroaromatic group with 1-2 nitrogen atoms and/or 1 oxygen or sulfur atom; substituted or unsubstituted phenyl, pyridyl or R.sup.9 -X-substituted alkyl with X=O, S, --SO--, --SO.sub.2 -- andR.sup.9 =alkyl, phenyl, 5/6-membered hetaryl with 1-3 hetero atoms;R.sup.2 =alkyl;R.sup.3 =H, alkyl;R.sup.4 =H, halogen, alkyl;R.sup.5 =H, alkyl;or R.sup.3 +R.sup.4, R.sup.3 +R.sup.5 or R.sup.4 +R.sup.5 together form C.sub.Type: GrantFiled: October 5, 1993Date of Patent: April 4, 1995Assignee: BASF AktiengesellschaftInventors: Juergen Kast, Norbert Meyer, Ulf Misslitz, Albrecht Harreus, Harald Rang, Matthias Gerber, Helmut Walter, Karl-Otto Westphalen
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Patent number: 5264580Abstract: A process for preparing isoxazole-3,4-dicarboxylic acid derivatives of the formula I ##STR1## where R.sup.1 is hydrogen, alkyl, cycloalkyl or phenyl, or a 5- to 6-membered heterocyclic radical, and the organic radicals can have substituents which are inert under the reaction conditions;R.sup.2 is hydrogen, alkyl, cycloalkyl, benzyl or C.sub.3 -C.sub.6 -alkenyl;A is NR.sup.3 R.sup.4 where R.sup.3 is hydrogen or an aliphatic or cycloaliphatic radical and R.sup.4 is an aliphatic or cycloaliphatic radical or unsubstituted or substituted phenyl, or R.sup.3 forms together with R.sup.4 a 4- to 7-membered alkylene chain which can be interrupted by oxygen, sulfur or N-methyl, or is OR.sup.5 where R.sup.5 is alkyl, cycloalkyl, benzyl or alkenyl;by deprotonation of a CH-acid compound of the formula II ##STR2## using a base and reacting with hydroximyl chlorides of the formula III ##STR3## wherein a magnesium alcoholate of the formula IVMg(OR.sup.6 ).sub.2 IVwhere R.sup.Type: GrantFiled: March 23, 1993Date of Patent: November 23, 1993Assignee: BASF AktiengesellschaftInventors: Volker Maywald, Thomas Kuekenhoehner, Peter Muenster, Stefan Stahl
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Patent number: 5236935Abstract: The present invention relates to novel benzopyran derivatives of formula (I) which have superior selectivity in the treatment of hypertension by lowering blood pressure with a relaxation activity on vascular smooth muscle. The present invention also relates to processes for preparing such compounds; and to a pharmaceutical compositions containing such compounds as an active ingredient. ##STR1## wherein: R.sub.1 is --CN, --NO.sub.2, --OCX.sub.1 X.sub.2 X.sub.3, --NH.sub.2, --NHSO.sub.2 R.sup.A, ##STR2## --SO.sub.2 R.sup.C or --SO.sub.2 NR.sup.C R.sup.D wherein X.sub.1, X.sub.2 and X.sub.3 are, each independently, a fluorine, chlorine or hydrogen atom; R.sup.A and R.sup.B are, each independently, an amino, C.sub.1-6 alkoxy, C.sub.1-6 alkyl group or an optionally substituted phenyl group; and R.sup.C and R.sup.D are a hydrogen atom, or a C.sub.1-6 alkyl group or an optionally substituted phenyl group with a halogen atom, or a straight or branched C.sub.1-3 alkyl group;R.sub.2 is ##STR3## wherein R.sup.Type: GrantFiled: May 21, 1992Date of Patent: August 17, 1993Assignee: Korea Research Institute of Chemical TechnologyInventors: Sung-Eun Yoo, Kyu Y. Yi, Nak C. Jeong, Jee H. Suh, Seon-Ju Kim, Hwa-Sup Shin, Byung H. Lee, Kyu S. Jung
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Patent number: 5221318Abstract: Herbicidal N-aryl-substituted nitrogen-containing heterocycles of the formula ##STR1## in which Het represents a heterocycle of the formula ##STR2## R.sup.1 represents hydrogen or halogen and R.sup.2 represents halogen, hydroxyl or represents a radical --Z.sup.2 --R.sup.8,whereX.sup.1 represents oxygen, represents a --CH.sub.2 -- group, represents a ##STR3## group or represents a ##STR4## group, X.sup.2 represents nitrogen or a CH group,Z.sup.1 represents oxygen or sulphur,Z.sup.2 represents oxygen or sulphur,R.sup.3 and R.sup.4 independently of one another in each case represent hydrogen or alkyl,R.sup.5 and R.sup.6 either independently of one another in each case represent hydrogen or alkyl or together represent a double-linked alkanediyl radicalR.sup.7 represents hydrogen, alkyl or represents optionally substituted aryl andR.sup.8 represents in each case optionally substituted alkyl, alkenyl, alkinyl or cycloalkyl.Type: GrantFiled: August 19, 1991Date of Patent: June 22, 1993Assignee: Bayer AktiengesellschaftInventors: Reiner Fischer, Uta Jensen-Korte, Franz Kunisch, Albrecht Marhold, Pieter Ooms, Otto Schallner, Hans-Joachim Santel, Robert R. Schmidt, Harry Strang
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Patent number: 5216018Abstract: There are provided nitrogen-containing bicyclic compounds which are useful in the treatment of physiological or drug induced psychosis or dyskinesia in a mammal. These novel compounds are selective sigma receptor antagonists and have a low potential for movement disorder side effects associated with typical antipsychotic agents.Type: GrantFiled: February 14, 1992Date of Patent: June 1, 1993Assignee: Du Pont Merck Pharmaceutical CompanyInventor: Engelbert Ciganek
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Patent number: 5189169Abstract: Herbicides having the formula ##STR1## in which X is oxygen or sulfur; and if X is sulfur, R.sub.1 is C.sub.1 -C.sub.6 alkyl, C.sub.5 -C.sub.6 cycloalkyl, allyl, phenyl, tolyl, chlorophenyl, 3,4-dichlorophenyl, or phen-(C.sub.1 -C.sub.2)alkyl; R.sub.2 is C.sub.1 -C.sub.4 alkyl, C.sub.2 -C.sub.4 alkoxyalkyl, or allyl; R.sub.3 is C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxyalkyl, pyridyl, phenyl or substituted phenyl in which the substituents are halogen, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy, C.sub.1 -C.sub.4 haloalkoxy, nitro and/or cyano; or R.sub.2 and R.sub.3 taken together form an alkylene chain having from 2 to 6 carbon atoms optionally substituted by up to two C.sub.1 -C.sub.4 alkyl groups; if R.sub.3 is alkyl or alkoxyalkyl, then R.sub.4 and R.sub.5 are each C.sub.2 -C.sub.4 alkyl; if R.sub.3 is phenyl, substituted phenyl or pyridyl, then R.sub.4 and R.sub.5 are C.sub.2 -C.sub. 6 alkyl, phenyl or substituted phenyl; or R.sub.3 and R.sub.Type: GrantFiled: November 12, 1991Date of Patent: February 23, 1993Assignee: Imperial Chemical Industries PLCInventor: David B. Kanne
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Patent number: 5153323Abstract: Radiation-sensitive organo-halogen compounds having a photo-labile halomethyl-1,2,5-triazine moiety and at least one photoinitator moiety within one molecule. The compounds of this invention are good photoinitiators, and compositions containing them can be used in printing, duplicating, copying, and other imaging systems. The compounds of this invention eliminate the need for a combination of photoinitiators in a photocurable or photopolymerizable composition.Type: GrantFiled: March 28, 1991Date of Patent: October 6, 1992Assignee: Minnesota Mining and Manufacturing CompanyInventors: Mitchell A. Rossman, James A. Bonham
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Patent number: 5124319Abstract: The compounds of the formula ##STR1## wherein R is hydrogen, lower alkyl, benzyl or pivaloyloxymethyl;R.sup.1 and R.sup.2 are, independently, hydrogen, lower alkyl, lower alkoxy, trifluoromethyl, trifluoromethoxy, methanesulfonylamino, acetylamino, or halo, or when taken together R.sup.1 and R.sup.2 represent a methylenedioxy grouping;and the pharmacologically acceptable salts thereof are NMDA antagonists useful in the treatment and prevention of central nervous system related pathological conditions resulting from overstimulation by excitatory amino acids.Type: GrantFiled: October 11, 1991Date of Patent: June 23, 1992Assignee: American Home Products CorporationInventors: Reinhardt B. Baudy, Horace Fletcher, III, John P. Yardley
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Patent number: 5104993Abstract: The present invention discloses 1,3-dialkylimidazole-2-thiones catalysts for epoxy/anhydride reactions (and other reactions) and a method of making these catalysts. Epoxy/anhydride coatings containing these improved catalysts offer the following advantages: improved appearance (especially since even weeks after application the coatings still have a "wet" look); better pot-life; improved resistance to alkaline substances which will improve durability; improved solubility; and coatings which have a reduced volatile organic content (VOC).Type: GrantFiled: January 31, 1991Date of Patent: April 14, 1992Assignee: E. I. Du Pont de Nemours and CompanyInventor: Anthony J. Arduengo III
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Patent number: 5102994Abstract: Water-insoluble dyestuffs of the formula I ##STR1## wherein K denotes the radical of a coupling component of the aniline series,X denotes Cl, Br, Cn or COOZ,Y denotes H, Cl, Br or CN andZ denotes C.sub.1 -C.sub.4 -alkyl,are outstandingly suitable for dyeing polyester fibres, on which they produce brilliant dyeings with good general fastness properties.Type: GrantFiled: October 2, 1990Date of Patent: April 7, 1992Assignee: Bayer AktiengesellschaftInventors: Klaus Leverenz, Manfred Hoppe
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Patent number: 5101021Abstract: Compounds of the formula ##STR1## and mixtures of such compounds, wherein each R.sub.1 is independently halo,R.sub.3 is hydrogen or methyl, with the proviso that when R.sub.5 is ethoxy, R.sub.3 must be methyl,R.sub.4 is hydrogen or methyl, andR.sub.5 is hydrogen: C.sub.1-2 alkyl; C.sub.1-2 alkyl monosubstituted by halo; phenoxymethyl; vinyl; C.sub.1-4 alkoxy; C.sub.2-5 alkoxy monosubstituted by C.sub.1-2 alkoxy or halo; allyloxy; phenoxy or benzyloxy,useful as disperse dyes for the dyeing of substrates such as polyester by, for example, the rapid dyeing method and substrates dyed therewith.Type: GrantFiled: May 25, 1990Date of Patent: March 31, 1992Assignee: Sandoz Ltd.Inventor: Ruedi Altermatt
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Patent number: 4958036Abstract: A process is provided for preparing a 7-oxabicycloheptane amino alcohol intermediate of the general structure ##STR1## (wherein the above structures represents (D) or (L) isomers)which is useful in preparing thromboxane A.sub.2 receptor antagonists. This intermediate is prepared by reacting mesanhydride with an aryl amine ##STR2## wherein R is alkyl, CH.sub.2 OH, CO.sub.2 H or CO.sub.2 alkyl, to form the acid ##STR3## which is reduced by treatment with lithium aluminum hydride or diisobutylaluminum hydride or Red-Al to form the alcohol ##STR4## wherein R.sup.1 is CH.sub.2 OH when R is CO.sub.2 H, CO.sub.2 alkyl or CH.sub.2 OH, and R.sup.1 is alkyl when R is alkyl; where in the above alcohol R.sup.1 is CH.sub.2 OH, such alcohol compound is treated with an alkyl chloroformate in the presence of base such as an alkali metal alkoxide to form the alcohol ##STR5## which undergoes cleavage by treatment with alkali metal, ammonia and acid to form the amino alcohol intermediate.Where in the above alcohol R.sup.Type: GrantFiled: April 17, 1989Date of Patent: September 18, 1990Assignee: E. R. Squibb & Sons, Inc.Inventor: John K. Thottathil
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Patent number: 4958026Abstract: The disclosure relates to novel dopamine derivatives of general Formula I ##STR1## wherein A is a substituted phenyl residue of the structure ##STR2## wherein R.sup.1 and R.sup.2, being identical or different, mean hydrogen, C.sub.1-15 -alkyl and allyl,D is ##STR3## R.sub.4 is hydrogen, C.sub.1 -C.sub.4 -alkyl, CF.sub.3, NH.sub.2 E is ##STR4## X is OH, NH.sub.2, ##STR5## and NH--SO.sub.2 --CF.sub.3, if Y=OH, Y is OH, NH.sub.2, ##STR6## NH--SO.sub.2 --CF.sub.3 and NH--SO.sub.2 --CH.sub.3, if X=OH, but wherein X and Y do not simultaneously mean OH, with R.sup.3 being C.sub.1-4 -alkyl, andZ is H or OH, and, if Z means the hydroxy group, the residue A can also be present in the tautomeric basic form,and their acid addition salts, their preparation, and use as medicinal agents having antihypertensive activity.Type: GrantFiled: May 30, 1986Date of Patent: September 18, 1990Assignee: Schering AktiengesllschaftInventors: Klaus Schoellkopf, Rudolf Albrecht, Manfred Lehmann, Gertrud Schroeder
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Patent number: 4946857Abstract: Novel terpene amino alcohols having an antiallergic activity or an activity of improving cerebral function are provided. Also provided are medicinal uses of the alcohols.Type: GrantFiled: July 21, 1986Date of Patent: August 7, 1990Assignee: Kuraray Co., Ltd.Inventors: Koichi Kanehira, Katsushi Eziri, Manzo Shiono, Yoshiji Fujita, Johji Yamahara
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Patent number: 4863935Abstract: Mitomycin derivatives having potent anti-tumor activity against solid sarcoma 180 tumors and lymphocytic leukemia P-388 tumors.Type: GrantFiled: December 11, 1987Date of Patent: September 5, 1989Assignee: Kyowa Hakko Kogyo K.K.Inventors: Yasushi Shida, Tokuyuki Kuroda, Ikuo Matsukuma, Makoto Morimoto, Tadashi Ashizawa