Abstract: Embodiments are directed to calibrating a system. A plurality of paths may be scanned across a first object and a second object where the first object is between the second object and scanner. A first portion of trajectories that correspond to a first portion of the paths that trace across the first object may be determined. A second portion trajectories that correspond to a second portion of the paths that trace across the second object may be determined. First endpoints of the first portion of the trajectories may be determined and second endpoints of the second portion of the trajectories may be determined. Rays may be determined based on the second endpoints and the first endpoints. An origin point of the beam generator may be determined based on an intersection of the rays. Accordingly, the system may be calibrated based on the origin point of the beam generator.

Abstract: A silicon nitride substrate including a first surface, and a second surface disposed opposite the first surface. One of the first surface or the second surface is a measurement surface. On the measurement surface, a value of an average full-width-at-half-maximum (FWHM) Cave is broader than 0 cm?1 and narrower than 5.32 cm?1 as measured by using a following measurement method. The measurement method of the average full-width-at-half-maximum (FWHM) Cave: one central point and four edge portions on the measurement surface are determined as measurement points; a Raman spectrum is measured at each of the measurement points; a full-width-at-half-maximum (FWHM) C of a spectral peak having the maximum strength within a range from 850 cm?1 or greater to 875 cm?1 or less is calculated in each Raman spectrum; and an average value of thus calculated full-width-at-half-maximum (FWHM)s C is the average full-width-at-half-maximum (FWHM) Cave.

Abstract: A video measurement system for measuring a test object comprising an imaging system having an imager having an imaging pupil, the imager arranged for viewing at least a portion of a silhouette of a test object by receiving light transmitted by the test object over a first angular extent, an illumination system having an optical axis and emitting an illumination distribution of light along an optical path, the illumination system comprising a lens system and a subassembly having an illumination source, a pupil aperture, and a first polarizer, the first polarizer having a diameter that is smaller than the pupil aperture, and a second polarizer overlapping the first polarizer, the second polarizer having a diameter that is larger than the first polarizer, the second polarizer configured to rotate independent of and relative to the subassembly.

Abstract: Provided are methods and devices for assessing biological particles for use in cell immunotherapy. By utilizing a microfluidic chip device together with optical force measurement and cell imaging, the methods enable comprehensive assessment and characterization of biological particles with regard to morphology, motility, binding affinities, and susceptibility to external forces, including but not limited to, chemical, biochemical, biological, physical and temperature influences. The methods enable the selection and production of biological particles, such as engineered T-cells, for use in immunotherapy and biomanufacturing.

Abstract: Aspects of the present disclosure provide an apparatus. For example, the apparatus can include a wafer holder for holding a wafer, a light reflection device located beside a wafer edge and having a light reflection surface tilted with respect to a wafer surface, and a coherent light source for generating incident light to perform a scan on the wafer surface and the light reflection surface, which can reflect the incident light to generate reflection light, which can be detected by a light detector. The coherent light source, the light reflection device and the light detector can be arranged such that the incident light passes by the wafer edge and the reflection light generated by the light reflection surface is detected by the light detector or the reflection light generated by the light reflection surface passes by the wafer edge and is detected by the light detector.

Abstract: This application discloses a scanning electron microscope system to capture an image of an electronic device manufactured according to a layout design describing the electronic device, and a computing system to generate a predicted image of the electronic device using the layout design. The predicted image corresponds to an expected image of the electronic design system captured by the scanning electron microscope system. The computing system identifies manufacturing defects present in the electronic device based on differences between the predicted image of the electronic device and the captured image of the electronic device, and utilizes the captured image of the electronic device to classify the manufacturing defects identified based on the predicted image of the electronic device from the layout design. The computing system can generate a manufacturing defect report identifying the manufacturing defects used to perform repair of the electronic device or modification of the layout design.

Abstract: A method and an apparatus for measuring an inner surface and a transition curved surface contour of a micropore are provided. The apparatus includes three independent optical paths, a spectrometer and a processing unit. The three optical paths use a fiber-reflecting prism-dispersive metalens structure. By adjusting the position of a probe, light can be irradiated on the inner surface and the transition curved surface contour of the micropore, and each scanning point on the surface can be scanned. The spectrometer analyzes the reflection spectrum received by each optical fiber in real time, and extracts peak wavelength of the scanning point. The processing unit calculates a displacement value of each scanning point based on a wavelength-displacement mapping relationship, reconstructs position information, and obtains a contour of a surface through data fitting.

Abstract: A system, software application, and method for optical device metrology of optical device patterns formed from lithography stitching are provided. In one example, the method includes creating a stitched design file comprising images of a plurality of masks; defining target coordinates for each of the plurality of masks in the stitched design file; defining an alignment mark for the stitched design file; capturing images of an optical device pattern at each of the target coordinates; comparing the captured images of the optical device pattern at each of the target coordinates to virtual images of the stitched design file at each of the target coordinates; and determining whether the optical device pattern at each of the target coordinates meets a threshold value.

Abstract: An overlay error measurement structure includes a lower-layer pattern disposed over a substrate, and an upper-layer pattern disposed over the lower-layer pattern and at least partially overlapping with the lower-layer pattern. The lower-layer pattern includes a plurality of first sub-patterns extending in a first direction and being arranged in a second direction crossing the first direction. The upper-layer pattern includes a plurality of second sub-patterns extending in the first direction and being arranged in the second direction. At least one of a pattern pitch and a pattern width of at least one of at least a part of the first sub-patterns and at least a part of the second sub-patterns varies along the second direction.

Abstract: A system and method are provided for determining total laser power with photodiode sensors used to measure irradiance from the beam strike of the laser to identify linear offset Gaussian slices. The Gaussian for the slices is then solved to obtain a Gaussian profile, wherein solving to obtain the Gaussian profile includes: measuring an angle of incidence of a central axis of the laser beam relative to a normal axis of a plane containing the photodiode sensors; measuring a positional offset of the plane of the photodiode sensors relative to a plane perpendicular to the central axis of the laser beam; creating a projection of the plane of the photodiode sensors onto the plane perpendicular to a propagation of the beam to provide centered linear slices; and constructing the Gaussian profile from the centered linear slices. The total laser power is then determined from the Gaussian profile.

Abstract: A circular nozzle assembly is disclosed. A cuvette nozzle subsystem (assembly) for flow cytometry systems is disclosed including a cuvette assembly and a circular nozzle assembly selectively engaged with the cuvette assembly. The cuvette assembly includes a cuvette having a pocket and a flow channel, and a receptacle coupled within the pocket to the cuvette. The receptacle has a through-hole with a tapered conical portion and a circular cylindrical portion. The circular nozzle assembly includes an o-ring gasket coupled to a nozzle body with a flow channel. A tapered conical portion of the nozzle body engages the tapered conical portion of the through-hole to align the respective flow channels of the cuvette and the nozzle body together.

Abstract: A method and an apparatus for detecting a defect based on a phased pass/fail determination are disclosed. According to at least one aspect of the present disclosure, a method comprising: a process of acquiring a product image which is an image of the product; a first determination process of inputting the product image into a first determination model to perform a pass/fail determination for the product; and a second determination process of inputting the product image into a second determination model to perform a pass/fail determination for the product when the product is determined to be undeterminable as a result of the pass/fail determination of the first determination process.

Abstract: The present disclosure provides a particle size statistical method of granular minerals of shale, comprising: collecting shale samples; cutting the collected samples into the size of 1 cm×1 cm×1 cm; performing argon ion polishing; magnifying the samples by the field emission scanning electron microscopy, collecting 500-1000 images; using Adobe Photoshop to seamlessly splice the collected images; using ImageJ in combination with EDS energy spectrum to determine types of mineral particles, performing background subtraction, and setting a reasonable grayscale threshold to classify the particle minerals; performing binary processing on the images of selected mineral particle types; identifying edges of granular minerals, and using a Analyze Particles command to statistically analyze and measure particle sizes, and drawing a particle size distribution histogram.

Abstract: An optical inspection device designed for testing an optical component such as a protective glass, an optical transmission system of a welding laser beam having a laser wavelength, comprising: a light source designed to emit a test light, receiving means designed to receive at least a portion of the test light and to quantify at least one quantity of the received light, means for holding the optical component designed to position the optical component between the light source and the receiving means, characterized in that: the portion of the test light received by the receiving means has a wavelength at ±20% of the laser wavelength.

Abstract: An inspection system and related methods are provided. The inspection system includes an inspection camera, a plurality of light sources collocated with the inspection camera, and a post processing system. The plurality of light sources output directional light that have different respective ranges of light wavelengths. The inspection camera is configured to capture image data while a surface of interest is being illuminated with the directional light. Further, the post processing system is configured to receive the image data, process portions of the image data into a plurality of images that include distinct images corresponding to the different respective ranges of light wavelengths. The plurality of images can be reviewed to identify an abnormal region of the surface of interest.

Abstract: A shape-data acquisition apparatus obtains shape data of a work surface and includes an illuminator, a transmissive optical element, and an imager. The illuminator has a luminance distribution of a first cycle to irradiate the work surface. The transmissive optical element faces specular reflected light reflected by the work surface and has a transmittance distribution of a second cycle. The imager receives the specular reflected light to capture the work surface. The cyclic directions of the first cycle and the second cycle folded at a mirror image position on the work surface are parallel to each other. A relation of b=a×f2/f1 is satisfied when a is a distance between the illuminator and the work surface, b is a distance between the work surface and the transmissive optical element, f1 is the first cycle, and f2 is the second cycle.

Abstract: A mask characterization method comprises measuring an interference signal of a reflection or transmission mask for use in lithography; and determining a quality metric for the reflection or transmission mask based on the interference signal. A mask characterization apparatus comprises a light source arranged to illuminate a reflective or transmissive mask with light whereby mask-reflected or mask-transmitted light is generated; an optical grating arranged to convert the mask-reflected or mask-transmitted light into an interference pattern; and an optical detector array arranged to generate an interference signal by measuring the interference pattern.

Abstract: A capturing device for optically capturing an object to be checked includes a radiation source having a wall which encompasses a recording chamber. The radiation source is configured to emit at least infrared radiation when in a heated state. The wall has at least one insertion opening for inserting the object to be checked into the recording chamber and at least one image-recording opening for recording images of the object to be checked. The capturing device also includes an image-capturing apparatus configured to record images of the object to be checked through the at least one image-recording opening.

Abstract: An image detection obtains first images with defects. Each of the first images is corrected and divided to obtain first sub-region images. The first sub-region images are processed to obtain processed first sub-region images. The processed first sub-region images are used to train a neural network to obtain a target mode. Second images are obtained. Each of the second images is corrected and divided to obtain second sub-region images. The second sub-region images are processed to obtain processed second sub-region images. The target model is applied to detect each of the processed second sub-region images to obtain a detection result. The method can detect defects in images accurately and efficiently.

Abstract: Fluid management systems for flow type particle analyzers are provided. Aspects of the fluid management systems include a flow cell comprising an input and output; a cuvette comprising an input coupled to the output of the flow cell and further comprising an output; a sample input line for fluidically coupling a sample fluid source to the input of the flow cell; and a fluid supply subsystem configured to alternatively fluidically couple: (a) a primary fluid source; or (b) one or more secondary fluid sources, to the input of the flow cell. Also provided are methods of using flow type particle analyzers having the subject fluid management systems.