Abstract: In the first step of an exposure method of the present invention, an alignment optical system is arranged to oppose one of a first mask mark on a photomask and a first substrate mark on a photosensitive substrate, thereby detecting a first deviation amount between the position of the first mask mark and that of the first substrate mark. In the second step, the alignment optical system is arranged to oppose one of a second mask mark on the photomask and a second substrate mark on the photosensitive substrate, thereby detecting a second deviation mark between the position of the second mask mark and that of the second substrate mark. In the third step, correction values for minimizing the first and second deviation amounts are calculated. In the fourth step, the relative positional relationship between the image of an original pattern on the photomask and a shot area on the photosensitive substrate is adjusted on the basis of a correction value.

Abstract: A holder for samples to be analyzed in a spectrometer is made of a polymer to avoid introducing metal contaminates into the test from the usual metal holder. The preferred polymer is polyvinylidenefluoride (PDVF). The holder uses less expensive polymers for components that do not require the properties of PDVF, and it is constructed to permit replacing parts made of PDVF that have become damaged.