Abstract: The present invention relates to an apparatus designed to control the application of the previously uncontrollable reaction of a peroxide composition and an alkaline composition, and accurately maintain the desired composition ratios for removal of and destruction of microbiological and organic contamination on a surface safely and without waste of the materials. The apparatus may also be used to maintain the highest demulsifying and antimicrobial activity of an organic acid composition blended with a peroxide composition by limiting contact time and the level of degradation of the components of the organic acid composition. A method of using the apparatus is provided for removing biofilm, bacteria, fungal cells, spores, fragments, and hyphae, microbiological slime, and organic contaminants from porous and non-porous surfaces, maintaining the integrity and life expectancy of the substrates, and increasing their resistance to new biofilm formation and microbiological deposition.

Abstract: A system for cleaning a media transport device includes a cleaning substrate sized and configured to fit within at least a portion of a media travel pathway of the transport device. The cleaning substrate includes scarifying holes that scrape debris from media conveyors (belts and/or rollers) of the transport device. Cleaning the transport device may include positioning the cleaning substrate in the section while operating the transport device, or moving the substrate so that the scarifying holes contact the cleaning substrate and clean the belts and/or rollers.

Abstract: Methods and apparatuses for the production of HF in an electron-beam generated plasma. A gas containing fluorine, hydrogen, and an inert gas such as argon, e.g., Ar/SF6/H2O or Ar/SF6/NH3 flows into a plasma treatment chamber to produce a low pressure gas in the chamber. An electron beam directed into the gas forms a plasma from the gas, with energy from the electron beam dissociating the F-containing molecules, which react with H-containing gas to produce HF in the plasma. Although the concentration of the gas phase HF in the plasma is a very small fraction of the total gas in the chamber, due to its highly reactive nature, the low concentration of HF produced by the method of the present invention is enough to modify the surfaces of materials, performing the same function as aqueous HF solutions to remove oxygen from an exposed material.

Abstract: A substrate processing method includes a rinse liquid supplying step of supplying a rinse liquid containing water to a major surface of a substrate, a rotating step of rotating the substrate around a rotation axis passing through a central portion of the major surface of the substrate, and a hydrophobizing agent supplying step of supplying a hydrophobizing agent containing a first dissolving agent to the major surface of the substrate to replace a liquid held on the major surface of the substrate with the hydrophobizing agent in parallel with the rotating step after the rinse liquid supplying step is performed, and the hydrophobizing agent supplying step includes a hydrophobizing agent discharging step of discharging a continuous flow of the hydrophobizing agent from a discharge port of a nozzle toward the major surface of the substrate held by a substrate holding unit with a Reynolds number at the discharge port being not more than 1500.

Abstract: A method for cleaning and/or evaluating a food products mould drum and a combination of such a food products mould drum and a mould drum cleaning and/or evaluating device are disclosed. The mould drum cleaning and/or evaluating device includes one or more pressure housings arranged against the outside of and over one or more mould cavities and form, together with the mould drum, an outside chamber. The outside chamber includes a chamber port connectable to a pressure line of a fluid circuit, and the mould drum includes a passage port connectable to a return line of the fluid circuit. Cleaning/evaluating occurs by allowing a pressurized fluid stream to enter via the chamber port into mould cavities and then via a wall part porous structure through a passage, and exit via the passage port to the return line of the fluid circuit.

Abstract: Systems and methods for rinsing one or more pellicles during fabrication, including immersing and soaking the one or more pellicles in a rinse bath solution for a particular time period, forming a top layer above the rinse bath solution, the top layer having a lower surface tension than the rinse bath, and withdrawing the one or more pellicles through the top layer for drying.

Abstract: A method of dust processing comprises measuring (PC1) a first amount of particles of a first size (e.g. PM10), and measuring (PC2) a second amount of particles of a second size (e.g. PM2.5) smaller than the first size. In accordance with the invention, it is determined (?) whether the first amount exceeds the second amount by a predefined threshold. If so, a robotic vacuum cleaner (RVC) may be prompted to start cleaning a room.

Abstract: System for selectively contacting a cleaning composition with a surface of a turbine engine component is presented. The system includes a cleaning apparatus and a manifold assembly. The cleaning apparatus includes an upper portion and a lower portion defining a cleaning chamber configured to allow selective contact between the cleaning composition and a surface of the first portion of the turbine engine component. The upper portion includes a plurality of fill holes in fluid communication with the cleaning chamber, and the lower portion includes a plurality of drain holes in fluid communication with the cleaning chamber. The manifold assembly is configured to selectively circulate the cleaning composition from a reservoir to the cleaning chamber via the plurality of fill holes, and recirculate the cleaning composition from the cleaning chamber to the reservoir via the plurality of drain holes. Methods for selectively cleaning a turbine engine component is also presented.

Abstract: Disclosed are a standby port and a substrate processing apparatus having the same. The standby port exhausts fumes generated when a processing liquid is discharged into the standby port before the supply of the processing liquid onto a substrate, thereby preventing pollution of a chamber atmosphere.

Abstract: A method and a cleaning device for cleaning tubes of tube bundles, wherein at least one rotating cleaning lance is used. During the insertion of the cleaning lance, the insertion depth E of the cleaning lance is measured and is stored and documented in a storage and documentation device. The cleaning device has an XY displacement device, on which a support rail is arranged, which supports a cleaning apparatus.

Abstract: A method for cleaning a substrate includes supplying to a substrate a film-forming processing liquid which includes a volatile component and forms a film on the substrate, vaporizing the volatile component in the film-forming processing liquid such that the film-forming processing liquid solidifies or cures on the substrate and forms a processing film on the substrate, supplying to the substrate having the processing film a strip-processing liquid which strips the processing film from the substrate, and supplying to the processing film formed on the substrate a dissolving-processing liquid which dissolves the processing film after the supplying of the strip-processing liquid.

Abstract: The invention relates to a cleaning system (14) for a windscreen (34) of a motor vehicle (32), comprising at least one drive arm (2) and at least one wiper blade (1, 1a, 1b), the wiper blade (1, 1a, 1b) being connected to the drive arm (2), the cleaning system (14) having at least one projection device (13) able to project a liquid onto the windscreen (34), characterized in that the cleaning system (14) comprises a determination element (16) for a zone (23) of the windscreen (34) and an activation means (15) of the determination element (16), an activation of the drive arm (2) and of the projection device (13) being subject to image information (18) as to a position of the zone (23) on the windscreen (34) transmitted by the determination element (16).

Abstract: A method for cleaning and/or disinfecting a milk-carrying system of a coffee machine for producing coffee mix drinks, and a coffee machine for carrying out the method has the aim of allowing the entire milk-carrying system to be cleaned, completely and in a way that can be easily automated. The milk delivery line is separated from the milk container, for carrying out the cleaning Process, and is connected to a first container, and a second container is arranged under a milk outlet of a milk preparation device of the milk-carrying system. Fluid is then delivered to fluid inlet in order to convey the active cleaning and/or disinfecting substance through the milk delivery line and a milk outlet into the second container. Thereafter, water is conveyed to the air inlet and the fluid inlet is closed, in order thereby to flush the milk-carrying system.

Abstract: A liquid dispensing and effluent shielding container assembly includes a flexible container having a container interior and a splash guard including a splash guard shield carried by the container. The splash guard shield may have a shield opening disposed in fluid communication with the container interior of the container. An injection nozzle is carried by the splash guard shield. The injection nozzle has a injection nozzle bore disposed in fluid communication with the shield opening of the splash guard shield and at least one injection opening in the injection nozzle, the at least one injection opening disposed in fluid communication with the injection nozzle bore. A method of eliminating microbes in an overflow space in a sink is also disclosed.

Abstract: A method and apparatus for cleaning and treating HVAC systems with a deployed agent preferably includes an aerosol generating device, a plurality of vent sealing devices, an outlet connection conduit and an inlet connection conduit. The HVAC system includes at least one supply duct and at least one return duct. The aerosol generating device includes an inlet and an outlet. The outlet is connected to a return vent of the at least one return duct with the outlet connection conduit. A supply vent of the at least one supply duct may be connected to the inlet with the inlet connection conduit. However, the inlet does not have to be connected to the supply vent if the aerosol generating device is retained in an enclosure. A booster chamber may be used to increase the flow rate of the deployed agent from the aerosol generating device.

Abstract: A substrate processing method includes a substrate holding step of holding a substrate by means of a substrate holder which holds the substrate horizontally with an interval upward from an upper surface of a base, a first processing liquid supplying step of supplying a first processing liquid to an upper surface of the substrate held by the substrate holder, a cleaning liquid supplying step of supplying a cleaning liquid so as to wash away the first processing liquid attached to the upper surface of the base, to the upper surface of the base such that the cleaning liquid on the base does not contact a lower surface of the substrate held by the substrate holder, and a removing step of removing the cleaning liquid from the upper surface of the base.

Abstract: Provided herein is a method performed by an appliance for washing and rinsing goods of detecting process water added to a sump of the appliance during interruption of operation of the appliance, upon recommence of appliance operation, and an appliance performing the method. The method may include detecting process water added to a sump of the appliance during interruption of operation of the appliance, upon recommence of appliance operation. The method may include increasing operating speed of a circulation pump of the appliance to a target speed, measuring an indication of circulation pump pressure or process water flow rate through the circulation pump, and determining that process water has been added to the sump of the appliance during the interruption in case the measured pressure or flow rate is maintained at a sufficient level after the speed of the circulation pump has reached the target speed.

Abstract: An apparatus and method for cleaning containers using water within the container and a submersible pump exhibiting a nozzle. Air may be injected into the pumped water to increase its pressure as it exists the nozzle.

Abstract: A system includes a dome, a wiper assembly, a position sensor and a control device. The wiper assembly includes a wiper blade configured to rotate around the dome. The position sensor may be configured to send a signal to a control device when a wiper blade passes the position sensor. The control device may include one or more processors configured to receive the signal from the position sensor and determine a location of the wiper blade relative to the dome based on the received signal.

Abstract: A substrate drying method for drying a front surface of a substrate having a pattern includes a sublimation-agent-liquid-film placing step of placing a liquid film of a liquid sublimation-agent on the front surface of the substrate, a high vapor-pressure liquid placing step of placing a liquid film of a high vapor-pressure liquid that has vapor pressure higher than the sublimation agent and that does not include water on the liquid film of the sublimation-agent placed on the front surface of the substrate, a vaporizing/cooling step of losing vaporization heat in response to vaporization of the high vapor-pressure liquid, and, cooling the sublimation-agent, and, as a result, solidifying the liquid film of the sublimation-agent, and, forming a sublimation-agent film on the front surface of the substrate, and a sublimating step of sublimating the sublimation-agent film.