Abstract: A method of removing an obstruction of coke built up in a riser of a fluid catalytic converter and of cleaning the riser involves using a suspended centralizer and narrowly angled nozzles for first hydroblasting a drainage orifice in the obstruction, adjusting guide arms and manipulating the suspended apparatus to allow enlargement of the orifice, further adjusting the guide arms and enlarging the angles of the nozzles to work the remaining coke built up.

Abstract: A portable cleaning device comprising a generally cylindrical container for receiving a fluid to a predetermined level and defining a container axis and having a bottom wall and a top opening at opposing axial ends along said container axis; a basket for supporting items to be cleaned and dimensioned to be removably receivable within said container, said basket defining a basket axis that is substantially coextensive with said container axis when said basket is received within said container and being configured to be rotatably supported for rotation on said bottom wall about said axes when received within said container; and spinning means for spinning said basket on said bottom wall about said axes when said basket is received within said container, whereby spinning said basket within said container on said bottom wall when immersed in fluid below said predetermined level creates turbulence and agitates the fluid in contact with the items to be cleaned to dislodge soil particles and contaminants from the it

Abstract: Cleaning compositions and methods of use thereof for cleaning fryers and other hard surfaces soiled by grease, shortening, oils and other soils commonly encountered in the food service industry are disclosed. Cleaning compositions and methods of use which beneficially remove soils from vertical and/or inverted surfaces, reduce the cleaning time required for removing such difficult to remove and baked on soils, reduce exposure to hot surfaces by allowing cleaning at or near room temperature, reduce exposure to caustic chemicals, and/or eliminate the need for personal protective equipment (PPE) for use of the cleaning compositions are disclosed.

Abstract: A substrate treating method and a substrate treating apparatus which can reduce the collapse of a pattern on a substrate. The substrate treating method includes a supply step of supplying a process liquid including a sublimable substance in a molten state to a pattern-formed surface of a substrate; a solidification step of solidifying the process liquid on the pattern-formed surface so as to form a solidified body; a sublimation step of subliming the solidified body so as to remove the solidified body from the pattern-formed surface; and an organic substance removal step of removing, when the solidified body is sublimed, an organic substance precipitated on a sublimation interface, and the organic substance removal step is performed so as to overlap at least part of the sublimation step.

Abstract: An amine-free composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The compositions achieve highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device without compromising the low-k dielectric material, copper interconnect material, or cobalt-containing materials.

Abstract: A component for a vehicle wash system includes a rotatable stem portion and a backing member in communication with the rotatable stem portion. The backing member is configured to rotate with the stem portion about an axis of rotation defined by the centerline of the stem portion. A plurality of media elements are secured to the backing member with the plurality of media elements being constructed of a generally self-supporting, non-marring material and wherein the plurality of media elements are oriented generally perpendicular to the backing member. The plurality of media elements configured to rotate in a working plane defined by the backing member and the working plane is oriented generally perpendicularly to the axis of rotation. Additionally, the plurality of media elements are configured during a wash process to contact at least an exterior painted surface of a vehicle to effectuate cleaning thereof.

Abstract: An aqueous composition for reducing corrosive removal of material in pickling of metallic surfaces comprising bare and/or galvanized steel. The composition includes a mixture of a compound of the formula R1O—(CH2)x—C?C—(CH2)y—OR2 in which R1 and R2 are both H, and a compound of the formula R1O—(CH2)x—C?C—(CH2)y—OR2 in which R1 and R2 are each, independently of one another, an HO—(CH2)w— group with w?2. X and y are each, independently of one another, from 1 to 4 in each of the two compounds of the formula R1O—(CH2)x—C?C—(CH2)y—OR2. A process for pickling a metallic surface with reduced corrosive removal of material is disclosed.

Abstract: Peroxyformic acid compositions for removal of biofilm growth and mineral deposits on membranes are disclosed. In particular, peroxyformic acid compositions are generated in situ or on site generation for the reduction and prevention, of biofilms and the mitigation of mineral buildup on the membranes. The compositions according to the invention are compatible with the membranes under application of use conditions.

Abstract: A substrate cleaning method includes: sequentially loading each of a plurality of substrates, one substrate substantially immediately after a preceding substrate, into an input unit, in which adjacent substrates of the plurality of substrates are spaced apart from each other by a predetermined first interval; sequentially transferring each of the plurality of substrates in which adjacent substrates of the plurality of substrates are separated by a predetermined second interval that is greater than the predetermined first interval; cleaning each of the plurality of substrates in a cleaning unit; and aligning, in an output unit, adjacent substrates to be separated by the predetermined first interval.

Abstract: Methods and apparatus for removing a photoresist layer from a photomask substrate are provided. In one example, a method for removing a photoresist layer from a substrate in a chamber includes generating a first plasma including first radicals from a first gas mixture in a processing chamber, exposing a portion of a photoresist layer on a substrate to the first radicals to remove the portion of the photoresist layer from the substrate, generating a second plasma including second radicals from a second gas mixture, wherein the second radicals have a different composition than the first radicals, and exposing another portion of photoresist layer to the second radicals to remove the second portion of the photoresist layer.

Abstract: A plumbing clog removal apparatus that includes a vacuum chamber having an inlet, an outlet, and a compressor port. The clog removal apparatus also includes an inlet seal disposed at the vacuum chamber inlet. The vacuum chamber inlet seal is movably coupled to the vacuum chamber inlet and is movable between an open position and a closed position. The plumbing clog removal apparatus also includes, an outlet seal disposed at the vacuum chamber outlet. The outlet seal is movably coupled to the vacuum chamber outlet and is movable between an open position and a closed position. The vacuum chamber also includes an air compressor fluidically connected to the vacuum chamber compressor port. The compressor is configured to remove air from the compressor chamber and form a low pressure condition inside the vacuum chamber.

Abstract: A system for controlling dust during hydraulic fracturing operations includes a manifold having a plurality of ports for capturing dust when negative air pressure is applied to the manifold. A support frame positions the manifold above a piece of hydraulic fracturing equipment receiving sand from a sand source.

Abstract: According to one embodiment of the present disclosure, a dishwashing machine includes a tub accommodating tableware, a nozzle assembly spraying washing water, a vane assembly changing a traveling direction of the washing water sprayed from the nozzle assembly to move linearly inside the tub, a user interface for receiving a divided washing zone selected by a user, and a control unit controlling movement of the vane assembly to wash the selected divided zone by the washing water including the changed traveling direction.

Abstract: To facilitate removal of foreign matters from a preform. The preform in an inverted position with a mouth portion thereof facing down is being continuously transferred, filtered air is blasted into the preform through the mouth portion of the preform, and at the same time, air is sucked from the side of the mouth portion of the preform. Foreign matters can be more easily discharged from the preform because of the flow of air and the weight of the foreign matters.

Abstract: The present invention refers to a system and method of manual surface cleaning comprising: a) applying a first use solution of a first detergent composition to a cleaning textile; b) wet wiping a surface with cleaning textiles wetted with a first use solution of the first detergent composition; c) washing the cleaning textiles soiled in the previous step by washing in a second use solution of the first detergent composition; and d) wet wiping a surface with cleaning textiles obtained in the previous step. The present invention further refers to the use of the detergent composition for manual surface cleaning involving the use of cleaning textiles and for washing said cleaning textiles soiled by said manual surface cleaning.

Abstract: A substrate processing method includes a first processing liquid supplying step of supplying a first processing liquid to an upper surface of the substrate, a holding layer forming step of solidifying or curing the first processing liquid to form a particle holding layer on the upper surface of the substrate, a holding layer removing step of peeling and removing the particle holding layer from the upper surface of the substrate, a liquid film forming step of forming, after removing the particle holding layer from the substrate, a liquid film of the second processing liquid, a solidifying step of cooling the liquid film to a temperature not more than a melting point of the sublimable substance to make the liquid film solidify on the substrate and form a solid film, and a sublimating step of sublimating and thereby removing the solid film from the substrate.

Abstract: A cup wash disk for cleaning a photoresist process tool is provided. An upper plate is arranged over a lower plate to define a cavity between the upper and lower plates. The lower plate comprises peripheral openings in fluid communication with the cavity and arranged along a periphery of the lower plate. A plurality of shims is arranged between the upper and lower plates to space the upper and lower plates and to define slits between the upper and lower plates. The slits are in fluid communication with the cavity. A method for cleaning the photoresist process tool using the cup wash disk is also provided.

Abstract: Provided are a cleaning device and a method for driving the cleaning device which cleans a wafer after chemical mechanical polishing. The cleaning device includes a cleaning modules and a running beam, the running beam including a first blade and a second blade to insert or remove the wafer with respect to one of the cleaning modules in a second direction, the first blade and the second blade being fixed to the running beam and movable in the second direction, and the cleaning modules including an input module, a megasonic module, a first brush module, a second brush module and a drying module. The driving method includes performing an operation of inserting or removing the wafer in the second direction using the first blade in a first area; and performing an operation of inserting or removing the wafer in the second direction using the second blade in a second area.

Abstract: A device for the integrated production and filling of containers and a method for cleaning and/or disinfecting at least the mold of at least one molding and filling station of the device. During a cleaning and/or disinfecting operation of the device, at least the inside of the mold is cleaned and/or disinfected with at least one cleaning and/or disinfecting agent by at least one cleaning element. During the cleaning and/or disinfecting operation, the at least one mold is opened and closed at least once, preferably many times and/or the plunger is moved at least once, preferably many times, between its initial position and end position.

Abstract: A method for obtaining information about a load of articles to be cleaned in a dishwasher is provided. The method may include stopping a pump from pumping liquid through a spraying system of the dishwasher at a point of time; recording a pressure signal in a sump of the dishwasher from the point of time the pump was stopped; measuring a time period, said time period being measured from the point of time the pump stopped until the pressure signal is essentially stable; and comparing the time period with reference values for obtaining information about the load in the dishwasher. A corresponding dishwasher, computer program, and computer program product may be provided.