Patents Examined by Mona M Sanei
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Patent number: 9715183Abstract: A device having a waveguide formed of a continuous body of material that is transparent to radiation that passes through the waveguide, wherein the body has an input surface and an output surface, and a cooler configured to cool the input surface and/or the output surface. An exposure apparatus having a programmable patterning device that comprises a plurality of radiation emitters, configured to provide a plurality of radiation beams; and a projection system, comprising a stationary part and a moving part, configured to project the plurality of radiation beams onto locations on a target that are selected based on a pattern, wherein at least one of the radiation emitters comprises a waveguide configured to output a radiation beam that comprises unpolarized and/or circularly polarized radiation.Type: GrantFiled: January 24, 2013Date of Patent: July 25, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Wouter Dick Koek, Arno Jan Bleeker, Erik Roelof Loopstra, Heine Melle Mulder, Erwin John Van Zwet, Dries Smeets, Robert Paul Ebeling
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Patent number: 9550326Abstract: Stereolithography machine (1) comprising: a container (2) for a fluid substance (14); a source (3) of predefined radiation (3a) suited to solidify the fluid substance (14); an optical unit (4) suited to direct the radiation (3a) towards a reference surface (5) in the fluid substance (14); a logic control unit (6) configured to control the optical unit (4) and/or the source (3) so as to expose a predefined portion of the reference surface (5). The optical unit (4) comprises a micro-opto-electro-mechanical system (MOEMS) (7) provided with a mirror (8) associated with actuator means (7a) for the rotation around at least two rotation axes (X, Y) incident on and independent of each other, arranged so that it can direct the radiation (3a) towards each point of the reference surface (5) through a corresponding combination of the rotations around the two axes (X, Y).Type: GrantFiled: December 24, 2012Date of Patent: January 24, 2017Inventor: Ettore Maurizio Costabeber
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Patent number: 9517044Abstract: A system and method to perform image acquisition of a subject is provided. The system includes a mobile device to move an imaging system across a floor, and a brake system that restrains movement of the mobile device. A controller includes a memory having program instructions to instruct a processor to perform the steps of: instructing movement of the mobile device in support of the imaging system to a first position for image acquisition of the subject; receiving feedback that the mobile device is located at the first position; and applying a brake force to restrain movement of the mobile device. The step of applying the brake force includes generating a vacuum in restraint of movement of the mobile device with respect to the floor.Type: GrantFiled: April 10, 2012Date of Patent: December 13, 2016Assignee: GENERAL ELECTRIC COMPANYInventor: Bernard Bouvier
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Patent number: 9507248Abstract: A two-beam interference apparatus may include a wafer stage on which a wafer may be set, a beam splitter to split first laser light into second and third laser light having a beam intensity distribution elongated in a first direction within a surface of the wafer, and an optical system to guide the second and third laser light onto the wafer. The wafer is irradiated with the second laser light from a second direction perpendicular to the first direction, and the third laser light from a third direction perpendicular to the first direction but different from the second direction, to thereby cause interference of the second and third laser light on the wafer. This apparatus increases the accuracy of the two-beam interference exposure.Type: GrantFiled: November 20, 2012Date of Patent: November 29, 2016Assignee: Gigaphoton Inc.Inventors: Shinji Okazaki, Hakaru Mizoguchi, Junichi Fujimoto, Takashi Matsunaga, Kouji Kakizaki, Osamu Wakabayashi
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Patent number: 9488920Abstract: An exposure apparatus and method exposes a substrate by projecting an image of a pattern onto the substrate through a liquid. A projection optical system projects the image of the pattern onto the substrate. A recovery port recovers the liquid supplied onto the substrate. A temperature sensor measures a temperature of the liquid recovered via the recovery port.Type: GrantFiled: March 7, 2013Date of Patent: November 8, 2016Assignee: NIKON CORPORATIONInventor: Shigeru Hirukawa
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Patent number: 9470969Abstract: A support for an object, e.g., a semiconductor substrate, includes a main body having a surface configured and arranged to have a plurality of projections. Each of the projections has an associated electrostatic actuator for displacing a free end of the associated projection relative to the main body at least in a direction in a plane parallel to a main surface of the object.Type: GrantFiled: November 27, 2012Date of Patent: October 18, 2016Assignee: ASML Netherlands B.V.Inventors: Theodorus Petrus Maria Cadee, Koen Jacobus Johannes Maria Zaal, Harmeet Singh
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Patent number: 9465303Abstract: An exposure apparatus includes an atmosphere maintaining unit which maintains an exposure chamber in an air atmosphere, a gas supply unit which supplies air or a mixed gas containing air and an inert gas to a local space, between a final surface of a projection optical system and a substrate, a detector which detects an alignment mark and a reference mark formed on the substrate stage, and a controller. The controller controls the gas supply unit not to supply the mixed gas to the local space when the detector detects the reference mark, and controls the gas supply unit to supply the mixed gas to the local space when an instruction to detect the alignment mark upon setting the local space in a mixed gas atmosphere, and expose the substrate based on the detection results of the reference mark and the alignment mark is issued from the recipe.Type: GrantFiled: December 1, 2015Date of Patent: October 11, 2016Assignee: CANON KABUSHIKI KAISHAInventors: Atsushi Takagi, Yoya Muraguchi, Tomomi Funayoshi
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Patent number: 9448493Abstract: An exposure apparatus and method exposes a substrate by projecting an image of a pattern onto the substrate through a liquid. A projection optical system projects the image of the pattern onto the substrate. A recovery port recovers the liquid supplied onto the substrate. A temperature sensor measures a temperature of the liquid recovered via the recovery port.Type: GrantFiled: March 7, 2013Date of Patent: September 20, 2016Assignee: NIKON CORPORATIONInventor: Shigeru Hirukawa
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Patent number: 9429852Abstract: A microlens exposure system includes a microlenses array and a mask fixed in place a predetermined space apart, wherein the gap between the microlens array and an exposure substrate can easily be adjusted with high precision to an aligned focal point position of the microlenses. Laser light for exposure is irradiated onto a resist film by microlenses of a microlens array. Light from a microscope passes through a hole in a Cr film of a mask, and the light is transmitted through a microlens and radiated onto the resist film. Whether or not the light transmitted through the microlens has an aligned focal point on the resist film is observed through the microscope, whereby the aligned focal point of exposure light made to converge by the microlenses on the resist film can be distinguished.Type: GrantFiled: July 15, 2011Date of Patent: August 30, 2016Assignee: V TECHNOLOGY CO., LTD.Inventor: Michinobu Mizumura
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Patent number: 9411248Abstract: A liquid immersion exposure apparatus includes a projection system having a last optical element, a first member having a liquid supply port, a second member having a liquid recovery port, and a driving system which electromagnetically moves the first member, the second member, or both of the first and second members. A substrate is moved below and relative to the last optical element, the first member and the second member. A liquid supply from the liquid supply port and a liquid recovery from the liquid recovery port are performed to form a liquid immersion area on a portion of an upper surface of the substrate. The substrate is exposed with a beam through liquid in the liquid immersion area.Type: GrantFiled: April 29, 2015Date of Patent: August 9, 2016Assignee: NIKON CORPORATIONInventor: Hideaki Hara
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Patent number: 9377677Abstract: The present invention provides a method of generating, by a computer, data on patterns of a plurality of originals for use in multiple exposure, in which a single-layer pattern is formed on a substrate by exposing the substrate a plurality of times, in an exposure apparatus including an illumination optical system which illuminates an original with light from a light source, and a projection optical system which projects a pattern of the original onto a substrate.Type: GrantFiled: August 5, 2010Date of Patent: June 28, 2016Assignee: CANON KABUSHIKI KAISHAInventor: Miyoko Kawashima
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Patent number: 9372399Abstract: An imprint lithography method is disclosed for reducing a difference between an intended topography and an actual topography arising from a part of a patterned layer of fixed imprintable medium. The method involves imprinting an imprint lithography template into a layer of flowable imprintable medium to form a patterned layer in the imprintable medium, and fixing the imprintable medium to form a patterned layer of fixed imprintable medium. Local excitation is applied to the part of the patterned layer to adjust a chemical reaction in the part of the patterned layer to reduce the difference between the intended topography and the actual topography arising from the part of the fixed patterned layer of imprintable medium when this is subsequently used as a resist for patterning the substrate. An imprint medium suitable for imprint lithography with the method is also disclosed.Type: GrantFiled: July 21, 2011Date of Patent: June 21, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Martinus Bernardus Van Der Mark, Vadim Yevgenyevich Banine, Andre Bernardus Jeunink, Johan Frederik Dijksman, Sander Frederik Wuister, Emiel Andreas Godefridus Peeters, Johan Hendrik Klootwijk, Roelof Koole, Christianus Martinus Van Heesch, Ruediger Guenter Mauczok, Jacobus Bernardus Giesbers
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Patent number: 9354525Abstract: A liquid immersion exposure apparatus in which a substrate is exposed with an exposure beam, includes a projection optical system by which the substrate is exposed to the exposure beam, a first inlet disposed at a first position, which is capable of supplying a first liquid to a space adjacent to a bottom surface of the projection optical system, and a second inlet disposed at a second position which is different from the first position, the second inlet being capable of supplying a second liquid that is different from the first liquid to the space.Type: GrantFiled: May 20, 2013Date of Patent: May 31, 2016Assignee: NIKON CORPORATIONInventor: Hiroyuki Nagasaka
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Patent number: 9354506Abstract: A system for holding and aligning a radiation sensing device is described. The system includes a radiation sensing device having a sensor engagement member. The system also includes a holder having a retention member including first and second retention guides connected with opposing ends of a back plate. The first retention guide also includes a complementary holder engagement member configured to mate with the sensor engagement member at a preset position.Type: GrantFiled: February 15, 2012Date of Patent: May 31, 2016Inventors: Harold K. Schmulenson, Tom Gillen
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Patent number: 9348240Abstract: An alignment method includes dividing a wafer into a plurality of regions including a first region and a second region, and each region contains a plurality chip areas. The method also includes obtaining alignment offset values for the first region, and determining a first alignment compensation equation for the first region. The method also includes obtaining alignment offset values for the second region, and determining a second alignment compensation equation for the second region. Further, the method includes determining whether a chip area to be exposed is in the first region or the second region, when the chip area is in the first region, using the first alignment compensation equation to adjust alignment of the wafer and, when the chip area is in the second region, using the second alignment compensation equation to adjust the alignment of the wafer.Type: GrantFiled: November 27, 2012Date of Patent: May 24, 2016Assignee: SEMICONDUCTOR MANUFACTURING INTERNATIONAL CORP.Inventors: Yibin Huang, Winnie Liu
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Patent number: 9310322Abstract: The present specification discloses an X-ray security inspection machine that has a machine housing defining an X-ray tunnel for receiving an article to be inspected, a conveyor belt for conveying the article, two rollers for receiving and moving the conveyor belt, and a conveyor belt tracking device positioned along the path between the two rollers. The conveyor belt tracking device has a mounting bracket for mounting the conveyor belt tracking device to the inspection machine and a guide frame with an upper portion and a lower portion, where the upper portion and lower portion are spaced apart from each other and the conveyor belt passes through the space between the upper portion and lower portion.Type: GrantFiled: June 5, 2012Date of Patent: April 12, 2016Assignee: Rapiscan Systems, Inc.Inventors: Baljinder Singh Panesar, Douglas R. Gillard-Hickman
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Patent number: 9310698Abstract: A lithographic exposure process is performed on a substrate using a scanner. The scanner comprises several subsystems. There are errors in the overlay arising from the subsystems during the exposure. The overlay errors are measured using a scatterometer to obtain overlay measurements. Modeling is performed to separately determine from the overlay measurements different subsets of estimated model parameters, for example field distortion model parameters, scan/step direction model parameters and position/deformation model parameters. Each subset is related to overlay errors arising from a corresponding specific subsystem of the lithographic apparatus. Finally, the exposure is controlled in the scanner by controlling a specific subsystem of the scanner using its corresponding subset of estimated model parameters. This results in a product wafer being exposed with a well controlled overlay.Type: GrantFiled: January 24, 2011Date of Patent: April 12, 2016Assignee: ASML Netherlands B.V.Inventors: Boris Menchtchikov, Alexander Viktorovych Padiy
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Patent number: 9312159Abstract: A substrate is transported between a first space and a second space, which are separated by a partition wall, through an opening portion formed in the partition wall. A transport apparatus includes a support device having a support portion which supports the substrate, the support device being provided so as to block the opening portion while a clearance between the partition wall and the support device is formed, the support device moving the support portion from a state where the support portion faces the first space to a state where the support portion faces the second space; and an adjustment device which adjusts an amount of the clearance, thereby suppressing the movement of fluid from the first space to the second space.Type: GrantFiled: June 8, 2010Date of Patent: April 12, 2016Assignee: NIKON CORPORATIONInventor: Kazuya Ono
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Patent number: 9291794Abstract: The invention provides a temperature balancing device for a projection objective of a lithography machine. The device comprises at least one temperature sensor, at least one heat-absorbing light-transmitting layer and an objective temperature balancing control unit, wherein the temperature sensor is disposed adjacent to the projection objective for sensing the temperature difference of the projection objective in different areas; the heat-absorbing light-transmitting layer is positioned below the projection objective for absorbing radiation energy in the laser beams transmitted from the lithography machine and transmitting the laser beams; and the objective temperature balancing control unit is used for controlling the absorption degree and light transmission degree of the heat-absorbing light-transmitting layer according to the temperature difference sensed by the temperature sensor. The invention also discloses a method for balancing temperature of a projection objective of a lithography machine.Type: GrantFiled: November 20, 2012Date of Patent: March 22, 2016Assignee: SHANGHAI HUALI MICROELECTRONICS CORPORATIONInventors: Jun Zhu, Lijun Chen
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Patent number: 9285684Abstract: A liquid immersion exposure apparatus in which a substrate is exposed with an exposure beam, includes a projection optical system by which the substrate is exposed to the exposure beam, a first inlet disposed at a first position, which is capable of supplying a first liquid to a space adjacent to a bottom surface of the projection optical system, and a second inlet disposed at a second position which is different from the first position, the second inlet being capable of supplying a second liquid that is different from the first liquid to the space.Type: GrantFiled: May 20, 2013Date of Patent: March 15, 2016Assignee: NIKON CORPORATIONInventor: Hiroyuki Nagasaka