Abstract: Embodiments of the invention relate to a detergent composition including a poly(maleic acid/vinyl octyl ether) (PMAOVE) hydrophobically modified polymer; and a heavy duty liquid detergent. In addition, embodiments relate to a method of cleaning a substrate, including contacting a substrate with a poly(maleic acid/vinyl octyl ether) (PMAOVE) hydrophobically modified polymer solution.

Abstract: A method and device for wet treating a peripheral area of a wafer-shaped article uses rollers for driving the wafer-shaped article at its edge. First and second liquid treatment units supply liquid towards the peripheral area. Each of the liquid treatment units comprises a liquid carrier, a liquid supply nozzle for supplying liquid to the liquid carrier and a liquid discharging channel for removing liquid from the liquid carrier. The second liquid treatment unit includes a gas treatment section with a gas supply nozzle for removing most of the second liquid from the peripheral area, and with a gas discharge channel for discharging gas and removed liquid.

Abstract: A method for cleaning platinum residues from a surface of a substrate is provided. The method initiates with exposing the surface to a first solution containing a mixture of nitric acid and hydrochloric acid. Then, the surface is exposed to a second solution containing hydrochloric acid.

Abstract: A method to operate a dishwasher, comprising: (1) adding detergent to a cleaning liquid which is circulated within the dishwasher; (2) measuring the conductivity of the cleaning liquid and determining the rate of change in conductivity caused by dissolution of the detergent in the cleaning liquid; (3) comparing the rate of change in conductivity with a predetermined threshold value so as to determine the dissolution rate of the detergent that has been added in step (A) to the cleaning liquid; and (4) adjusting operating parameters based on the determination of step (C).

Abstract: A system and method for washing a gas turbine engine. The method for washing the gas turbine engine includes coupling a pressurized air supply assembly to an air supply and to a secondary air system, cranking a compressor rotor assembly of the gas turbine engine, supplying pressurized offline buffer air from the air supply to the pressurized air supply assembly, and spraying a cleaner into the compressor.

Abstract: A method and cleaning solution for cleaning electronic substrates, such as a semiconductor wafers, hard disks, photomasks or imprint molds. The method comprises the steps of contacting a surface of the substrate with a cleaning solution comprised of a polyphosphate, and then removing the cleaning solution from the surface. Additional optional steps include applying acoustic energy to the cleaning solution while the cleaning solution is in contact with the surface, and removing the cleaning solution from the surface by rinsing the surface with a rinsing solution with or without the application of acoustic energy. The cleaning solution comprises a polyphosphate, such as any of the water soluble polyphosphates. Depending on the application, the cleaning solution may also comprise a base and/or a quantity of suspended particles. Complexing agents, amines, biocides, surfactants and/or other substances, may also be added to the cleaning solution.

Abstract: A method and apparatus remove photoresist from a wafer. A process gas containing sulfur (S), oxygen (O), and hydrogen (H) is provided, and a plasma is generated from the process gas in a first chamber. A radical-rich ion-poor reaction medium is flown from the first chamber to a second chamber where the wafer is placed. The patterned photoresist layer on the wafer is removed using the reaction medium, and then the reaction medium flowing into the second chamber is stopped. Water vapor may be introduced in a solvation zone provided in a passage of the reaction medium flowing down from the plasma such that the water vapor solvates the reaction medium to form solvated clusters of species before the reaction medium reaches the wafer. The photoresist is removed using the solvated reaction medium.

Abstract: A tank cleaning system for use at a drilling location, including a first cuttings storage vessel comprising an inlet and an outlet, at least one tank cleaning machine configured to clean a tank, a disposal vessel, and a module including a pump configured to facilitate the transfer of fluids from a clean water vessel to the at least one tank cleaning machine, and a fluid connection configured to facilitate the transfer of fluids from the outlet of the first cuttings storage vessel to the disposal vessel.

Abstract: Methods for cleaning a surface of a photomask and for increasing the useable lifetime of the photomask are disclosed. One method includes, a first wafer print processing using a photomask and a pellicle disposed across the photomask, and cleaning the photomask. The cleaning the photomask includes directing a laser beam through the pellicle toward the photomask, the laser beam having a wavelength that is substantially equal to a local maximum of an absorption spectrum of the photomask, heating the photomask with the laser beam, and transferring heat from the photomask to a contaminant disposed on the photomask, thereby thermally decomposing the contaminant.

Abstract: The present invention provides methods and compositions useful for conditioning and removing solid deposits that have formed on or otherwise accumulated within one or more components including, for example, scale formed within a steam generating system. The aqueous cleaning compositions incorporate one or more quaternary ammonium hydroxides characterized by pKa values no less than about 13.5. These quaternary ammonium hydroxides may be used alone or in combination with one or more additives including, for example, chelating agents, reducing or oxidizing agents, pH adjustment agents, surfactants, corrosion inhibitors, complexing agents, dispersants and combinations thereof.

Abstract: A method of warewashing is provided. A combination detergent rinse aid composition is used according to the invention. The warewashing detergent composition includes an alkaline source and a water-soluble anion. The rinse aid composition comprises an acid. The alkaline source is provided in an amount effective to provide a use composition having a pH of at least about 8. The anion is present in sufficient amount to leave a residue of anions on the surface of the wares. The acid of the rinse aid has a sufficiently low pKa to react with the anions to form an insoluble oxide on the surface of the wares. The insoluble oxide reduces the surface tension of water on the surface of the wares thus reducing water spotting. Methods for using and manufacturing a combination warewashing detergent-rinse aid composition are provided.

Abstract: A condition warning system for an apparatus such as a pot and pan washing machine, a control system and control methods for a pot and pan washing machine are provided. The condition warning system includes a control system that monitors operational, safety or compliance parameters of an apparatus, and a light that illuminates a location below (or above) an operator's direct line of sight, and which is outside of the operator's direct line of sight. The control system and control methods include a punitive wash action lockout, an extended wash cycle time, and a deep clean wash cycle.

Abstract: Improved methods and apparatus for stripping photoresist and removing ion implant related residues from a work piece surface are provided. According to various embodiments, the workpiece is exposed to a passivation plasma, allowed to cool for a period of time, and then exposed to an oxygen-based or hydrogen-based plasma to remove the photoresist and ion implant related residues. Aspects of the invention include reducing silicon loss, leaving little or no residue while maintaining an acceptable strip rate. In certain embodiments, methods and apparatus remove photoresist material after high-dose ion implantation processes.

Abstract: Embodiments of the present invention generally relate to a method and apparatus for ex-situ cleaning of a chamber component part. In one embodiment, a system for cleaning component parts in a cleaning chemistry is provided. The system comprises a wet bench set-up comprising a cleaning vessel assembly for holding one or more component parts to be cleaned during a cleaning process and a detachable cleaning cart detachably coupled with the cleaning vessel assembly for supplying one or more cleaning chemistries to the cleaning vessel assembly during the cleaning process.

Abstract: A method includes generating a solvent-containing vapor that contains a solvent. The solvent-containing vapor is conducted to a package assembly to clean the package assembly. The solvent-containing vapor condenses to form a liquid on a surface of the package assembly, and flows off from the surface of the package assembly.

Abstract: Disclosed herein is a washing machine that is capable of increasing a frictional force between an outer diameter of a rotary shaft and an inner race of a bearing to prevent the sliding between the rotary shaft and the bearing due to a gap between the outer diameter of the rotary shaft and the inner race of the bearing, thereby preventing creep noise from the rotary shaft. The washing machine includes at least one elastic member disposed between the outer diameter of the rotary shaft and the inner race of the bearing to prevent noise due to the sliding between the rotary shaft and the bearing.

Abstract: Disclosed are a substrate processing apparatus, a substrate processing method and a storage medium, capable of removing contaminant materials from a substrate by using SPM liquid (sulfuric acid and hydrogen peroxide mixture) while preventing degradation of the function of the SPM liquid for removing the contaminant materials. The SPM liquid is filled in a processing bath and the substrate is immersed in the SPM liquid. A heating unit is provided in the circulation path to heat the SPM liquid. A hydrogen peroxide supply line supplements hydrogen peroxide to the SPM liquid in the circulation path. A control unit adjusts the temperature of the SPM liquid to the predetermined temperature in the range of 135° C. to 170° C. based on a temperature detection value and outputs a control signal to supplement the sulfuric acid to compensate for the SPM liquid as the SPM liquid is evaporated by heating.

Abstract: A laundry machine includes a first laundry treatment space configured to receive laundry therein, a second laundry treatment space configured to receive laundry therein, and an air supply unit configured to supply air to the second laundry treatment space, the air supply unit comprising a fan, a heating part, a first sensor part for sensing a temperature of air supplied by the air supply unit, and a control part for controlling a temperature of the supplied air to be within a predetermined range.

Abstract: An apparatus for cleaning and conditioning the surface of a semiconductor substrate such as wafer includes a rotatable chuck, a chamber, a rotatable tray for collecting cleaning solution with one or more drain outlets, multiple receptors for collecting multiple cleaning solutions, a first motor to drive chuck, and a second motor to drive the tray. The drain outlet in the tray can be positioned directly above its designated receptor located under the drain outlet. The cleaning solution collected by the tray can be guided into designated receptor. One characteristic of the apparatus is having a robust and precisely controlled cleaning solution recycle with minimum cross contamination.

Abstract: Methods, devices, and systems for manufacturing ophthalmic lenses are described in which lens bodies are placed in cavities of lens carriers that are fluidly connected to reservoirs, flow ducts and sub-cavity base channels that provide enhanced washing and wet processing of the lenses.