Abstract: The present application discloses a cleaning method and a cleaning device. The cleaning method includes the following steps: dividing a cleaning device into at least two regions to control for the same cleaning mode; detecting a width of an object to be cleaned; and turning on the cleaning device of corresponding region according to the width of the object to be cleaned. The cleaning device includes a detection structure, a conveying structure, a washing structure, an air knife structure, and a control structure, where the washing structure is divided into at least two regions, and the air knife structure is also divided into at least two regions.

Abstract: A system for cleaning a gas turbine engine may generally include a wash stand having a base frame and a plurality of fluid injection nozzles configured to be supported by the base frame relative to the gas turbine engine. The nozzles may be configured to inject a cleaning fluid through an inlet of the fan casing of the engine as the fan blades are being rotated in a rotational direction such that the cleaning fluid is directed past the rotating fan blades and into a compressor inlet of the engine. Additionally, each nozzle may be oriented at a positive tangential angle defined relative to the rotational direction of the plurality of fan blades. The system may also include a fluid source in flow communication with the wash stand for supplying the cleaning fluid to the plurality of fluid injection nozzles.

Abstract: A sleeve apparatus for protecting a robotic kitchen arm from contamination. The sleeve includes a proximal end, a distal end, a passageway extending from the proximal end to the distal end, and an exterior surface. The passageway has an effective diameter less than the effective diameter of the robotic kitchen arm such that the exterior surface of the sleeve apparatus is substantially fold-free when the robotic arm is in the extended configuration. Methods of cleaning a robotic kitchen arm are also described.

Abstract: A system for automatically cleaning and washing an ice cream machines includes a liquid container for storing raw materials; a freezing cylinder connected with the liquid container through a cleaning pathway; a water tank for storing rinse water to rinse the freezing cylinder and the cleaning pathway; a detergent tank for storing detergents to clean and wash the freezing cylinder and the cleaning pathway; a pump arranged on the cleaning pathway to selectively pump the raw material, the rinse water or the detergent; and a control panel adapted to control an on/off and cleaning.

Abstract: The present invention relates to the carbon deposit buildup in the internal combustion engine, or more specifically the removal of such carbon from the induction system, combustion chamber, and the exhaust system. The method is one in which a high volumetric flow rate of chemical/chemical mixes are used to remove a greater amount of carbon from the engine. These preferred chemical/chemical mix flow rates are 6 to 9 Gallons per hour, which is approximately 9 times the volumetric flow rate of the industry standard of 1 gallon per hour.

Abstract: Methods for treating substrates are described. The methods comprise the steps of flowing an aqueous liquid medium through a flow channel and at least one outlet slit onto a substrate to be treated and exposing the aqueous liquid medium to UV-radiation of a specific wavelength at least in a portion of the flow channel immediately adjacent the at least one outlet slit and after the aqueous liquid medium has flown through the outlet opening towards the substrate and thus prior to and while applying the aqueous liquid medium to the surface of the substrate to be treated. In one method, the electrical conductance of the aqueous liquid medium is adjusted to be in the range of 20 to 2000 ?S, by the addition of an additive to the aqueous liquid medium, the aqueous liquid medium prior to the addition of the additive having an electrical conductivity below 20 ?S, prior to or while exposing the same to the UV-radiation.

Abstract: A method for stripping a coating off of a blade includes discharging liquid nitrogen through a nozzle onto the blade at a coating to cause lifting of the coating from a substrate of the blade and traversing the nozzle along the blade to cause peeling of the coating off of the substrate of the blade as the nozzle traverses the blade.

Abstract: A self-contained system is provided for cleaning a food flow path in a food processor. The system can be operably engaged without requiring disassembly and reassembly of the food processor or can be operably engaged after a partial disassembly of the food processor. The system includes a control assembly for directing passage of a solution through the food processor without requiring constant operator oversight. The system can employ available positive pressure water supply, such as public utility water pressure to selectively and automatically push solutions, including rinses, backwards or forwards through a food flow path in the food processor, though typically countercurrent to the normal processing food flow. A manifold assembly includes an intake manifold and a distribution manifold, with an induction port and/or access port in the distribution manifold for introducing additives or agents into a controlled motive stream passing through the manifold assembly.

Abstract: Method and apparatus for identifying a contaminant on a substrate. Identification of a contaminant removed from a substrate can be useful in identifying and eliminating or reducing the source of the contamination and tailoring the removal method to minimize the potential for substrate damage. The methods and apparatus for identification of the contaminant provide liberation of molecules of the contaminant from the surface of the substrate, accounting for different geometries and substrate materials, sample preparation, and chemical analysis of the contaminant.

Abstract: There is provided a gas cluster processing device for performing a predetermined process on a workpiece by irradiating the workpiece with a gas cluster, including: a processing container in which the workpiece is disposed; a gas supply part configured to supply a gas for generating the gas cluster; a flow rate controller configured to control a flow rate of the gas supplied from the gas supply part; a cluster nozzle configured to receive the gas for generating the gas cluster at a predetermined supply pressure, spray the gas into the processing container maintained in a vacuum state, and convert the gas into the gas cluster through an adiabatic expansion; and a pressure control part provided in a pipe between the flow rate controller and the cluster nozzle and including a back pressure controller configured to control a supply pressure of the gas for generating the gas cluster.

Abstract: Implementations of a hair extension washboard are provided. In some implementations, the hair extension washboard comprises a hair extensions board, a hair clip assembly, and a board support. In some implementations, the hair extension washboard further comprises a hair drying enclosure. In some implementations, the hair extension washboard also comprises surface connectors. In some implementations, a method of using the hair extension washboard comprises positioning the hair extension washboard in a sink or other suitable location, holding hair extensions with the hair extension washboard, and washing, coloring, drying, etc. the hair extensions while held by the hair extension washboard.

Abstract: A method for providing to a consumer a visualization of the effectiveness of coloured stain removal of a cleaning composition on a substrate comprising the steps of: providing a first substrate having a first coloured stain, treating the first coloured stain with a first cleaning composition formulated to generate a foam, allowing the generated foam to act on the first coloured stain, and allowing the consumer to visually assess effectiveness of coloured stain removal of the first cleaning composition.

Abstract: The present invention relates to the carbon deposit buildup in the internal combustion engine, or more specifically the removal of such carbon from the induction system, combustion chamber, and the exhaust system. The method is one in which a high volumetric flow rate of chemical/chemical mixes are used to remove a greater amount of carbon from the engine. These preferred chemical/chemical mix flow rates are 6 to 9 Gallons per hour, which is approximately 9 times the volumetric flow rate of the industry standard of 1 gallon per hour.

Abstract: An ultrasonic system for treating a submerged surface of a target structure, the system including: an ultrasonic generator for generating electrical energy to drive first and second ultrasonic transducers, the electrical energy including at least two different frequencies including a first and second operation frequency; first ultrasonic transducers configured to be mounted as a first array to the target structure, and connectable to the ultrasonic generator and operable to generate a first ultrasound signal from the first operation frequency; and second ultrasonic transducers configured to be mounted as a second array to the target structure, and connectable to the ultrasonic generator and operable to generate a second ultrasound signal from the second operation frequency, wherein the first and second ultrasonic transducers are spaceable from one another to produce guided ultrasonic waveforms through the target structure including heterodyned frequencies from the first ultrasound signal and the second ultras

Abstract: A razor blade cleaning device (10), for cleaning the or each blade of a safety razor or cartridge, comprises an open cleaning chamber, suitably dimensioned for receiving a razor head or cartridge, wherein the device is configured such that a fluid is feedable through the cleaning chamber to contact the blades of a razor head or cartridge disposed therein.

Abstract: A method for cleaning a semiconductor substrate is provided. The method includes the steps of: applying a first agent onto a top surface of the semiconductor substrate while the semiconductor substrate is rotated at a first rotational frequency; immersing the semiconductor substrate in a second agent while rotating the semiconductor substrate at a second rotational frequency; and rotating the semiconductor substrate at a third rotational frequency while a third agent is introduced onto the top surface of the semiconductor substrate. The first rotational frequency may be greater than the third rotational frequency and the third rotational frequency is greater than the second rotational frequency. In some embodiments, the second rotational frequency is zero and the semiconductor substrate is held stationary during the immersing step.

Abstract: A system for automatically cleaning and washing an ice cream machines includes a liquid container for storing raw materials; a freezing cylinder connected with the liquid container through a cleaning pathway; a water tank for storing rinse water to rinse the freezing cylinder and the cleaning pathway; a detergent tank for storing detergents to clean and wash the freezing cylinder and the cleaning pathway; a pump arranged on the cleaning pathway to selectively pump the raw material, the rinse water or the detergent; and a control panel adapted to control an on/off and cleaning.

Abstract: An apparatus for raising and lowering a cutting tool within a decoking drum, a decoking system and a method of raising and lowering a decoking system cutting tool. Instead of using metallic ropes, chains, or a self-propelled gear-based approach, non-metallic belts are secured at respective ends to a crosshead and one or more counterweights to enable vertical movement of the crosshead that in turn permits vertical movement of the cutting tool throughout the height of the drum. A motorized pulley system controls the movement of the belt, and preferably avoids having the motor be carried by the crosshead. The belts on each pulley are preferably arranged as cooperative sets so that within each set, both primary load belts and secondary load belts are present.

Abstract: Embodiments of the present disclosure generally relate to a method of cleaning a substrate. More specifically, embodiments of the present disclosure relate to a method of cleaning a substrate in a manner that reduces or eliminates the negative effects of line stiction between semiconductor device features. In an embodiment, a method of cleaning a substrate includes exposing a substrate having high aspect ratio features formed thereon to a first solvent to remove an amount of a residual cleaning solution disposed on a surface of the substrate, exposing the surface of the substrate to a second solvent to remove the first solvent disposed on the surface of the substrate, exposing the surface of the substrate to a supercritical fluid to remove the second solvent disposed on the surface of the substrate, and exposing the surface of the substrate to electromagnetic energy.

Abstract: The present invention provides a high temperature chemical solution supply system for cleaning substrates. The system includes a solution tank, a buffer tank, a first pump and a second pump. The solution tank contains high temperature chemical solution. The buffer tank has a tank body, a vent line and a needle valve. The tank body contains the high temperature chemical solution. An end of the vent line connects to the tank body, and the other end of the vent line connects to the solution tank. The needle valve is mounted on the vent line, wherein the needle valve is adjusted to reach a flow rate to vent gas bubbles inside of the high temperature chemical solution out of the buffer tank through the vent line. An inlet of the first pump connects to the solution tank, and an outlet of the first pump connects to the buffer tank. An inlet of the second pump connects to the buffer tank, and an outlet of the second pump connects to a cleaning chamber in which a substrate is cleaned.