Abstract: Disclosed are a liquid processing apparatus and a liquid processing method. The liquid processing apparatus includes an ejection port ejecting a first liquid to a wafer, a first liquid supply mechanism supplying sulphuric acid to the ejection port, and a second liquid supply mechanism supplying hydrogen peroxide solution to the ejection port. The first liquid supply mechanism includes a first temperature adjustment mechanism maintaining the first liquid heated to a first temperature, a second temperature adjustment mechanism connected to the first temperature adjustment mechanism, and an ejection line connecting the second temperature adjustment mechanism with the ejection port. The second temperature adjustment mechanism includes a second circulation line and a second heater. The ejection line connects the second circulation line through a switching valve at a location further downstream than the second heater.

Abstract: A cleaning apparatus and method for cleaning generally upright surfaces, walls and windows of a building has a frame rotatably supporting one or more brushes adapted to engage the upright surface of a building. A davit supported on top of the building is connected to a cable pendently supporting the frame and brushes. A winch driven with a motor mounted on the frame operably connected to the cable operates to move the frame and brushes relative to the upright surface. A counterforce generator mounted on the frame establishes a force on the frame and brushes that maintains the brushes in effective continuous engagement with the upright surface during cleaning thereof.

Abstract: A method and apparatus for cleaning a stack of secure instruments such as banknotes is disclosed. Each secure instrument or banknote includes a substrate, visual data and a security feature. The apparatus includes a chamber configured to contain a supercritical fluid at a temperature and a pressure and for a duration sufficient to disinfect or decontaminate the banknotes and not compromise the security feature and the visual data of the banknotes, a structure for holding the stack of banknotes in the chamber so that the supercritical fluid circulates through and around the banknotes to remove one or more substances into the supercritical fluid, and a strapping machine configured to secure a securing mechanism to the stack of banknotes.

Abstract: Methods are disclosed for performing operations such as cleaning, inspection or data acquisition on an external surface of a hollow cylindrical tubular. Preferred embodiments include providing a fluid dispenser and an abrasion assembly on a buggy that travels up and down the length of the tubular as the tubular rotates. The fluid dispenser includes nozzles that dispense cleaning fluids onto the tubular's external surface. The abrasion assembly includes a swivel brush and a brush train providing different styles of abrasion cleaning of the tubular's external surface. Preferred embodiments of the buggy also carry a range finding laser generating samples of the distance from the laser to a sampled point on the tubular's external surface. The laser samples are processed in real time into surface contour data. Cleaning and inspection variables such as tubular rotational speed, or buggy speed, may be adjusted responsive to measured surface contour data.

Abstract: A cleaning method involves: disposing in a cleaning liquid held in a cleaning tank an object to be cleaned; and ultrasonically vibrating the cleaning liquid via an intermediate medium in contact with the cleaning tank to clean said object, the ultrasonically vibrating involving: ultrasonically vibrating the cleaning liquid with the cleaning liquid and the intermediate medium allowing sonic velocities, respectively, having a first difference; and ultrasonically vibrating the cleaning liquid with the cleaning liquid and the intermediate medium allowing sonic velocities, respectively, having a second difference different from the first difference.

Abstract: In an embodiment, the present invention discloses a EUV cleaner system and process for cleaning a EUV carrier. The euv cleaner system comprises separate dirty and cleaned environments, separate cleaning chambers for different components of the double container carrier, gripper arms for picking and placing different components using a same robot handler, gripper arms for holding different components at different locations, horizontal spin cleaning and drying for outer container, hot water and hot air (70 C) cleaning process, vertical nozzles and rasterizing megasonic nozzles for cleaning inner container with hot air nozzles for drying, separate vacuum decontamination chambers for outgassing different components, for example, one for inner and one for outer container with high vacuum (e.g., <10?6 Torr) with purge gas, heaters and RGA sensors inside the vacuum chamber, purge gas assembling station, and purge gas loading and unloading station.

Abstract: Embodiments of mechanisms for performing a chemical mechanical polishing (CMP) process are provided. A method for performing a CMP process includes polishing a wafer by using a polishing pad. The method also includes applying a cleaning liquid jet on the polishing pad to condition the polishing pad. A CMP system is also provided.

Abstract: A dish cleaning pad has a pair of sidewalls defining a pocket therebetween. The sidewalls are formed with a pair of mutually aligned windows. A planar insert is disposed in the pocket, the insert having an aperture aligned with the windows in the pad sidewalls. The aperture in the insert is formed with a multiplicity of parallel tines each connected at opposite ends to edges of the planar insert on opposite sides of the aperture.

Abstract: A method and system for cleaning a secure instrument, such as a banknote, including a substrate, visual data and a security feature, including exposing the secure instrument to a supercritical fluid at a temperature and a pressure and for a duration sufficient to clean the substrate and not compromise the security feature and the visual data, wherein to clean the substrate includes to remove one or more substances from the substrate into the supercritical fluid. The substances removed from the substrate may include contaminants, dirt, sebum and pathogens.

Abstract: Provided herein are methods and apparatus of hydrogen-based photoresist strip operations that reduce dislocations in a silicon wafer or other substrate. According to various embodiments, the hydrogen-based photoresist strip methods can employ one or more of the following techniques: 1) minimization of hydrogen budget by using short processes with minimal overstrip duration, 2) providing dilute hydrogen, e.g., 2%-16% hydrogen concentration, 3) minimization of material loss by controlling process conditions and chemistry, 4) using a low temperature resist strip, 5) controlling implant conditions and concentrations, and 6) performing one or more post-strip venting processes. Apparatus suitable to perform the photoresist strip methods are also provided.

Abstract: Pyrophoric material such as iron sulfide is frequently found in refinery equipment. When the equipment is opened to the atmosphere for maintenance, an exothermic reaction can take place that may cause injury to personnel and catastrophic damage to equipment. A process used to treat pyrophoric material uses sodium nitrite injected into a gaseous carrier stream to oxidize iron sulfides to elemental sulfur and iron oxides. The sodium nitrite solution may be buffered to a pH of about 9 with disodium phosphate or monosodium phosphate. A chemical additive that provides a quantitative measure of reaction completion may be added to the treatment solution.

Abstract: A photomask includes at least one feature disposed thereon. The at least one feature has an associated design location, where a distance between a location of the at least one feature and the associated design location defines a positional error of the at least one feature. A method for improving a performance characteristic of the photomask includes directing electromagnetic radiation toward the photomask, the electromagnetic radiation having a wavelength that substantially coincides with a high absorption coefficient of the photomask; generating a thermal energy increase in the photomask through incidence of the electromagnetic radiation thereon; and decreasing the positional error as a result of the generating the thermal energy increase in the photomask.

Abstract: A golf club cleaner includes a container and a cleaning unit with a free end spaced from a base of the container for a club face to be positioned and cleaned.

Abstract: A machine is presented for the cleaning of jewelry. The machine allows the manual or automatic cleaning of jewelry. Under both modes of operation, the jewelry is secured by a user to a support bracket inside a transparent, water-tight cylindrical wash chamber. When in manual mode, the user can direct the spray of wash fluid onto the jewelry by rotating the jewelry using a trackball. When used in automatic mode, the machine washes the jewelry during a preset washing cycle. For both modes, the washing cycle is followed by the drying cycle where a blower directs air onto the jewelry for a set time period to blow off excess moisture. The drying cycle concludes with a blower venting the cylindrical wash chamber to remove residual moisture from the wash chamber and the jewelry. After the cleaning, the user removes the jewelry from the machine.

Abstract: A compact and portable bowling ball cleaner apparatus has a controlled heated temperature/timed steam process that properly and effective removes oil and dirt from the pores and surface of reactive bowling balls and gives restored life and performance to the ball without changing the coverstock or mechanics. The cleaner apparatus is not only cost effective, but a must have product for any avid/league/pro bowler that uses reactive bowling balls. The cleaner apparatus provides an effective, safe, affordable, user friendly, compact and attractive solution for removing oil and dirt from bowling balls.

Abstract: A dishwasher includes a controller controlling a cleaning cycle, a screen system for filtering a wash fluid, a circulation chamber and a collection chamber in fluid communication with the circulation chamber via a screen arrangement, a circulation pump for circulating the wash fluid and a drain pump for pumping out the wash fluid. During the cleaning cycle, to detect blockage in the screen arrangement, a degree of transmission in the circulation chamber filled with wash fluid is determined with an optical turbidity sensor in a first measuring step. The wash fluid is then pumped out of the collection chamber and the degree of transmission in the circulation chamber is again determined in a second measuring step. The change in the degree of transmission from the first measuring step to the second measuring step is then evaluated.

Abstract: The present invention discloses a system and method for self-cleaning filters without having to open the filter housing. Wash nozzles are integrated with the filter housings such that when the filters are clogged, both back-wash and regular washing can be performed with practically no down time. Moreover, without opening the filter housing, the hazardous components of the fluid to be filtered can be contained and dealt with before they escape the filter housing, thereby significantly reduces the environmental impact and harm to the working crew.

Abstract: A self-contained system is provided for cleaning a food flow path in a food processor. The system can be operably engaged without requiring disassembly and reassembly of the food processor or can be operably engaged after a partial disassembly of the food processor. The system includes a control assembly for directing passage of a solution through the food processor without requiring constant operator oversight. The system can employ available positive pressure water supply, such as public utility water pressure to selectively and automatically push solutions, including rinses, backwards or forwards through a food flow path in the food processor, though typically countercurrent to the normal processing food flow. A manifold assembly includes an intake manifold and a distribution manifold, with an induction port and/or access port in the distribution manifold for introducing additives or agents into a controlled motive stream passing through the manifold assembly.

Abstract: An aquiferous domestic appliance has a treatment compartment and articles to be washed disposed therein are illuminated by means of a light source in such a manner that the user is not blinded by the light source and is able to judge the cleaning result even under bad lighting conditions inside the room.

Abstract: Disclosed is a method of cleaning components of a substrate processing apparatus The components of the substrate processing apparatus are cleaned by using a first cleaning jig including a disk-shaped lower member, and a disk-shaped upper member connected to the lower member and forming a gap between the upper member and the lower member. The lower member of the first cleaning jig is held by the substrate holding unit to rotate the first cleaning jig. The cleaning liquid is ejected toward the first cleaning jig from a bottom side of the first cleaning jig while the first cleaning jig is rotated. The cleaning liquid flows out toward outside of the first cleaning jig via the gap between the upper member and the lower member by a centrifugal force, and the components of the substrate processing apparatus are cleaned by the cleaning liquid that has flowed out.