Abstract: The present invention enhances the laser desorption of biological molecular ions from surfaces by creating a surface localized MALDI particle matrix by ion implantation of low energy ionized clusters (gold, aluminum, etc.) or chemically derivatized clusters into the near surface region of the sample. MALDI analysis of the intact biomolecules on the surface or within a narrow subsurface region defined by the implantation range of the ions can then be performed by laser desorption into a mass spectrometer or, in a preferred embodiment, into a combined ion mobility orthogonal time of flight mass spectrometer.

Abstract: A torch for producing an inductively coupled or microwave induced plasma for use in spectrochemical analysis. The torch includes a central tube (25) for conveying a flow of a gas carrying sample aerosol to a plasma (17) produced in the torch. The tube (25) has an inlet (31) and an outlet (39) of smaller size than the inlet and is shaped to deliver a substantially laminar flow of the gas at the outlet (39). The tube (25) is tapered along at least a substantial portion of its length such that its cross-section area gradually and smoothly reduces towards its outlet (39) along at least a substantial portion of its length. It has been found that such a tapered tube is resistant to obstruction by salts deposited from samples containing high levels of dissolved solids.

Abstract: A chamber suitable for use with a scanning electron microscope. The chamber comprises at least one aperture sealed with a membrane. The membrane is adapted to withstand a vacuum, and is transparent to electrons and the interior of the chamber is isolated from said vacuum. The chamber is useful for allowing wet samples including living cells to be viewed under an electron microscope.

Abstract: A mass spectrometer having a matrix-assisted laser desorption ionization (MALDI) source which operates at ambient pressure is disclosed.

Abstract: A pressure sensing port includes an inner block airtightly attached to an inside of a port attachment opening and having a first through hole extending along the axis of the port attachment opening and an intermediate block airtightly attached adjacently to an axially outer surface of the inner block. The intermediate block has a second hole extending through axially in a position where the second through hole is not superposed on the first through hole and communicating with the first through hole through a gap formed between the inner block and the intermediate block. An outer block is airtightly attached between the inner block and intermediate block and has a third through hole extending axially in a position where the third through hole is not superposed on both the first and the second through hole and communicating with the first and the second through hole.

Abstract: An apparatus and method for inspecting a surface of a sample, particularly but not limited to a semiconductor device, using an electron beam is presented. The technique is called Secondary Electron Emission Microscopy (SEEM), and has significant advantages over both Scanning Electron Microscopy (SEM) and Low Energy Electron Microscopy (LEEM) techniques. In particular, the SEEM technique utilizes a beam of relatively high-energy primary electrons having a beam width appropriate for parallel, multi-pixel imaging. The electron energy is near a charge-stable condition to achieve faster imaging than was previously attainable with SEM, and charge neutrality unattainable with LEEM. The emitted electrons may be detected using a time delay integration detector.

Abstract: The invention relates to a method for assessing the state of organisms and natural products wherein one or more substances are determined in a gaseous mixture, determination being effected by a mass spectrometer wherein an ion beam acts on the sample of gaseous mixture in high vacuum in such a way that the test molecules are ionized with the aid of the internal energy of the ions of the ion beam, and the values obtained upon determination are evaluated for assessing the state. Further, the invention relates to a method for analyzing a gaseous mixture with one or more main components and one or more secondary components wherein at least one main component is determined in the concentration range greater than or equal to 0.1 percent by volume and one secondary component in the concentration range of less than or equal to 0.

Abstract: An apparatus for a charged particle beam has a charged particle source; a charged particle optical system for focusing and deflecting a charged particle beam emitted from the charged particle source; a detector for detecting secondary particles emitted from a sample irradiated with the charged particle beam; and a sample holder on which the sample is mounted. The apparatus has an electrode for preventing charging which is provided so as to be movable with respect to the surface of the sample holder, and a controller for the electrode for preventing charging, which controls a voltage to be applied to the electrode for preventing charging and the movement. Preventing the charging is performed by generating an induced current or a current between an area irradiated with the charged particle beam in the sample and the electrode for preventing charging.

Abstract: A particle-optical apparatus comprising a sample holder for receiving a sample, a particle source embodied to produce a primary beam of first electrically charged particles along an optical axis for the purpose of irradiating the sample, first detector embodied to detect second electrically charged particles that emanate from the sample as a result of the irradiation thereof, a detection space that at the least is formed by the sample holder and the first detector, and an immersion lens embodied to produce a magnetic field for the purpose of focusing the primary beam in the vicinity of the sample holder. The first detector are embodied to produce an electric field in the detection space, and the detection space is embodied to comprise a gas.

Abstract: Apparatus and methods are disclosed for inscribing a pattern on a reticle blank to produce a lithography reticle. As a reticle blank is inscribed using a charged particle beam (e.g., electron beam), some of the incident charged particles pass through the reticle blank and are backscattered from underlying structure (e.g., from a stage used to hold the reticle blank during inscription). These backscattered particles reduce the pattern resolution on the reticle. The present apparatus and methods reduce the number of backscattered particles re-entering the reticle blank, thereby improving pattern resolution.

Abstract: Embodiments of the invention provide a beam generator to produce an atomic beam that travels across a patterned surface of a reticle. The beam may interact with particles to prevent the particles from contaminating the reticle.

Abstract: In a device (100) for continuously varying the extinction ratio, ER, a laser diode (102) is connected to a first end of a PZ fiber (108). At a second end, the PZ fiber is connected to a connector (110). At the other end of the connector a PM fiber (106) is connected. The two fibers meet in the connector, which means that opposite end facets of the fibers are located at a very close distance of each other. A rotation is produced by a rotator (104), mechanically coupled to the connector. The device can be used for: selecting a desired ER of the PM fiber; achieving high accuracy of angular alignment between the principal axes of two PM fibers (106, 506); evaluating the quality of angular alignment of a splice between two PM fibers made by a splicer; and setting the adjustment/calibration of a PM fiber.

Abstract: Materials and methods of manufacturing radiation shielded enclosures is presented that may replace the use of lead, granite and other undesirable materials and manufacturing methods. The present invention provides a high-density radiation shielding enclosure manufactured using a fiberglass lay-up or pressure spaying process and tungsten powder. The method of manufacture may include applying a tungsten powder in an epoxy, caulking, sealant, adhesive or elastomeric compound to the radiation shielding enclosure in order to seal any cracks, holes, joints or other radiation leaks.

Abstract: A UV light source in which Xenon (Xe) gas is mixed with a substance which, in the temperature range in which 10-valent Xe ions (Xe10+) occur, emits a number of free electrons from a molecule or an atom that at least half the number of electrons which are released from a Xe atom, and which at room temperature is molecular or atomic (for example Ar, Kr, Ne, N2 and NH3). A high voltage is applied in a pulse-like manner to the electrode on the ground side and the electrode on the high voltage side to produce a plasma with a high temperature and from which extreme UV light with a wavelength of 13.5 nm is formed and emitted. The invention can also be used an extreme UV light source of the capillary, plasma focus, and Z pinch types for example.

Abstract: A beam generating and shaping device, for use in a free-space optical communication system provides increased uniformity in the distribution of optical radiation power, both at the output of the device and the aperture of the receiving terminal. A source provides optical radiation bearing communication information, and an optical coupler introduces radiation from the source into a multimode optical fiber, for example at an inclined angle, so as to launch a number of modes within the fiber. A mode mixer engages a portion of the multimode optical fiber. An exemplary mode mixer consists essentially of a single clamp, providing micro-bending of the fiber. An optical antenna is coupled to the cross-section formed by the distal end of the multimode optical fiber, for example, via an auxiliary lens to provide increase in output radiation beam divergence. The telescope transmits radiation emitted from the distal end of the multimode optical fiber over a free-space optical link towards the receive aperture.

Abstract: Numerous embodiments of a debris mitigation device are disclosed. One embodiment of the claimed subject matter may comprise a debris mitigation device for use in photolithography processes. In one embodiment, the debris mitigation device comprises a foil trap device. The foil trap device, in this embodiment, comprises a plurality of electrically conductive elements and one or more mounting devices, where the plurality of electrically conductive elements are coupled to the one or more mounting devices in such as way as to provide a space between one or more adjacent elements. In this embodiment, the elements are foil elements, and adjacent foil elements carry alternating potentials.

Abstract: The invention makes possible to increase the degree of radiation focusing by the lens, to use particles of higher energies, and to increase the coefficients, depending on these factors, of the devices, the lens is used in. Thus the sublens 18 of the least degree of integration represents a package of the channels 5, which is growing out of joint drawing and forming the capillaries, which are laid in a bundle. The sublens of each higher degree of integration represents a package of sublenses of the previous degree of integration, which is growing out of their joint drawing and forming. The sublenses are growing out of performing the said operations at the pressure of the gaseous medium inside the channels being higher than the pressure in the space between the sublenses of the previous degree of integration and at the temperature of their material softening and splicing the walls.

Abstract: The performance of a scanning electron microscope (SEM) (10) is determined by scanning, with this SEM, porous silicon surface areas (PSF, PSC) each having a different average pore size, calculating the Fourier transform spectra (Fc) of the images of the surface areas and extrapolating the resolution (R) at a zero signal-to-noise ratio (SNR) from the width (W(1/e)), the signal amplitude (Sa) and the noise offset (NL) of the spectra. A test sample provided with the different surface areas is obtained by anodizing a silicon substrate (Su) at a constant electric current, while continuously decreasing the substrate area exposed to the etching electrolyte (El).

Abstract: An optical module is provided for performing a prescribed function such as dispersion compensation, for example. The optical module is to be integrated between stages of a multi-stage rare-earth doped optical amplifier. The module includes an input port for receiving optical energy from one stage of the rare-earth doped optical amplifier and a rare-earth doped planar waveguide coupled to the input port. An optically lossy, passive element is provided for performing the prescribed function. The optically lossy, passive element is coupled to the planar waveguide for receiving optical energy therefrom. An output port is coupled to the optically lossy, passive element for providing optical energy to another stage of the rare-earth doped optical amplifier.

Abstract: A probe driving method and a probe apparatus for bringing a probe into contact with the surface of a sample in a safe and efficient manner by monitoring the probe height. Information about the height of the probe from the sample surface is obtained by detecting a probe shadow appearing immediately before the probe contacts the sample, or based on a change in relative positions of a probe image and a sample image that are formed as an ion beam is irradiated diagonally.