Abstract: A microlithographic projection exposure apparatus includes an illumination system and a projection lens which images a reticle onto a photosensitive layer. The projection exposure apparatus further includes an immersion arrangement for introducing an immersion liquid into an immersion interspace between a last optical element of the projection lens on the image side and the photosensitive layer. A transmission filter is designed and arranged in the projection lens in such a way that rays which enter the immersion interspace from the last optical element at an angle of incidence ? are attenuated more strongly the smaller the angle of incidence ? is. The transmission filter may be arranged e.g. in a pupil plane of the projection lens and may have a transmittance which increases with increasing distance from an optical axis of the projection lens. In this way compensation is provided for angle-dependent absorption in the immersion liquid.

Abstract: A plurality of first measurement patterns each including a protruding pattern formed of a resist film and a recessed pattern having a space with a shape corresponding to the protruding pattern are formed on a first substrate such that they have different focus values at a time of exposure, edge inclination amounts of the plurality of first measurement patterns are measured, and a focus dependence (17) of the edge inclination amounts is obtained based on correspondences (7) and (14) between the edge inclination amounts and the focus values. A second measurement pattern including the protruding pattern and the recessed pattern is formed on a second substrate so as to measure edge inclination amounts of the second measurement pattern, and a focus deviation amount deviating from a best focus at the time of exposure of the second measurement pattern is calculated from the edge inclination amounts of the second measurement pattern based on the focus dependence of the edge inclination amounts.

Abstract: A stage assembly (220) that moves a work piece (200) about a first axis and along a first axis includes a first stage (238), a second stage (240) that retains the work piece (200), a second mover assembly (244), a measurement system, and an initialization system (1081A). The second mover assembly (244) moves the second stage (240) relative to the first stage (238) about the first axis. The measurement system (22) monitors the position of the second stage (240) about the first axis when the second stage (240) is positioned within a working range about the first axis. The initialization system (1081A) facilitates movement of the second stage (240) about the first axis when the second stage (240) is rotated about the first axis outside the working range. The second mover assembly (244) can include a mover (255) and a dampener (410) that reduces the transmission of vibration from the first stage (238) to the second stage (240).

Abstract: An exposure apparatus and method in which an image is formed on a recording medium mounted on a recording stage by irradiating a light beam based on image data from a recording head while the recording head and the recording stage are relatively moved, in the exposure apparatus and method, storing in advance, in a storage section, shift-amount data of a detected displacement of an image-form position with respect to a stage surface of the recording stage in a direction intersecting a direction in which the recording stage moves, which displacement occurs accompanied by movement of the recording stage; carrying out shifting for each of pixels of an image formed by the image data based on the shift-amount data stored in the storage section; and controlling exposure for the recording medium based on image data of the shifted image, is provided to reduce distortion of the image.

Abstract: An exposure apparatus which exposes a substrate by projecting an image of a pattern, via an projection optical system and a liquid of a liquid immersion area formed on the substrate, onto the substrate, includes a liquid supply mechanism having supply ports for supplying the liquid on both sides of a projection area respectively and capable of simultaneously supplying the liquid from the supply ports, the image of the pattern being projected onto the projection area. The liquid supply mechanism supplies the liquid from only one of the supply ports disposed on the both sides when the mechanism starts to supply the liquid. The liquid may be supplied while moving an object such as a substrate placed to face the projection optical system. Accordingly, an optical path space on the image side of the projection optical system can be filled with the liquid quickly while suppressing formation of air bubbles.

Abstract: Methods and apparatus for enabling a fine stage to be moved using pneumatics such that disturbances associated with a pneumatic transfer system are not transmitted to the fine stage are disclosed. According to one aspect of the present invention, a stage apparatus includes a first stage, a second stage, and a pneumatic transfer system. The pneumatic transfer system includes at least one transfer mechanism and a transfer block. The transfer mechanism is substantially directly coupled be coupled between the first stage and the transfer block, and the first stage provides a flow through the transfer mechanism to the transfer block. The transfer block is arranged to be positioned over a surface of the second stage to provide the flow to the second stage substantially without contacting the second stage.

Abstract: A photographic printing apparatus includes a transporting section for cutting photosensitive material drawn from one of a plurality of magazines each accommodating therein an elongated photosensitive material into a print size piece by a cutter unit and then feeding this material piece into an exposing unit, an order executing unit for effecting exposure of image data at the exposing unit on the material piece transported by the transporting section and a calibration printing unit for effecting exposure of predetermined calibration data at the exposing unit on the material piece transported by the transporting section.

Abstract: A method, apparatus, and system for controlling a reticle-masking blade in a photolithography system. A reticle-masking blade is supported with a reticle-masking blade carriage assembly. The reticle-masking blade carriage assembly is levitated at a position with respect to a reference frame and at an orientation with respect to the reference frame. Preferably, the reticle-masking blade carriage assembly is electromagnetically levitated. At least one of the position and the orientation of the reticle-masking blade carriage assembly is measured. At least one of the position and the orientation of the reticle-masking blade carriage assembly is controlled. Optionally, the reticle-masking blade carriage assembly is moved within a dimension within a range defined by the reference frame. The dimension can be two dimensions. The movement of the reticle-masking blade carriage assembly can be controlled.

Abstract: In order to adjust the optical axis of a light beam L1 in an exposure apparatus, on a support body in an XYZ three-dimensional coordinate system are mounted: a first mirror 10 having a reflective surface M1 obtained by rotating a plane parallel to the XY plane around an axis 11 parallel to the Y axis by an angle of ?; and a second mirror 20 having a reflective surface M2 obtained by rotating a plane parallel to the XZ plane around an axis 21 parallel to the X axis by an angle of ?. There are provided: position adjustment means for moving the entire support body having the two mirrors parallel to the XY plane; and angle adjustment means for adjusting the angle of the second mirror 20. The incident light L1 is reflected on the reflective surfaces M1 and M2 to be output as an outgoing light L3, where it is possible to perform an optical axis adjustment concerning position and angle by controlling the position adjustment means and the angle adjustment means.

Abstract: The present invention relates to a method for adjusting a pattern to be imaged onto a workpiece. The pattern representing an image is divided in a plurality of regions. A pattern density in said plurality of region is computed. At least one feature in at least one of said plurality of regions is adjusted based on the pattern density in at least one other region. An adjusted pattern is fed to a modulator. The image is created on said workpiece by using said corrected pattern. The invention also relates to an apparatus for imaging adjusted pattern on a workpiece, a semiconducting wafer to be imaged with an adjusted pattern and a mask or a reticle to be imaged with an adjusted pattern.

Abstract: There is disclosed a wafer flatness evaluation method includes measuring front and rear surface shapes of a wafer. The wafer front surface measured is divided into sites. Then, a flatness calculating method is selected according to a position of the site to be evaluated and flatness in the wafer surface is acquired.

Abstract: A uniformity correction module for improving the uniformity of a radiation distribution in a rectangular illumination slit having two longer sides and two shorter sides, including a plurality of movable blades arranged along each long side of the illumination slit and a chamber containing a fluid wherein said movable blades are at least partly immersed in said fluid, and wherein the difference between the refractive index of each blade and the refractive index of said fluid is sufficiently small to prevent significant reflection and refraction at the surface of each blade.

Abstract: A duplicate apparatus is disclosed that is able to reliably switch plural document feeding units without additional cost and has high accessibility. In the duplicate apparatus, an operations unit and a document reading unit are included in an operations-reading unit as one unit, and plural operations-reading units can be connected to the duplicate apparatus. A control unit enables one of the operations-reading units to operate via an image data selection unit and an operations selection unit.

Abstract: A method, apparatus, and system for controlling a reticle-masking blade in a photolithography system. A reticle-masking blade is supported with a reticle-masking blade carriage assembly. The reticle-masking blade carriage assembly is levitated at a position with respect to a reference frame and at an orientation with respect to the reference frame. Preferably, the reticle-masking blade carriage assembly is electromagnetically levitated. At least one of the position and the orientation of the reticle-masking blade carriage assembly is measured. At least one of the position and the orientation of the reticle-masking blade carriage assembly is controlled. Optionally, the reticle-masking blade carriage assembly is moved within a dimension within a range defined by the reference frame. The dimension can be two dimensions. The movement of the reticle-masking blade carriage assembly can be controlled.

Abstract: A flowcell including a plurality of separate chambers is provided on the substrate table so that a fluid can be brought into contact with exposed areas of the substrate to interact therewith. A series of exposures and chemical processes can thereby be carried out without removing the substrate from the substrate table.

Abstract: A method for adjusting the flatness of a lithographic mask includes determining an initial mask flatness of the mask, determining an applied stress for bringing the mask to a desired mask flatness, and determining a mounting temperature of a pellicle frame to be mounted to the mask, the mounting temperature corresponding to the applied stress. The actual temperature of the pellicle frame is adjusted to the determined mounting temperature.

Abstract: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.

Abstract: An exposure apparatus configured to expose a substrate to light via a reticle. The apparatus includes a projection optical system configured to project a pattern of the reticle onto the substrate, a nozzle configured to supply liquid to a region between the projection optical system and the substrate where the light passes, and a circulation system configured to circulate liquid to be supplied to the nozzle. The circulation system includes (i) a tank configured to store an externally supplied liquid, (ii) a first flow path configured to supply liquid from the tank to the nozzle, (iii) a thermoregulator configured to thermoregulate a temperature of liquid in the first flow path, and (iv) a second flow path configured to supply liquid to the tank from a branched point of the first flow path between the nozzle and the thermoregulator.

Abstract: An exposure apparatus having a projection optical system configured to project a pattern of an original to a substrate and exposing a substrate to light via the original with a gap between the substrate and the projection optical system being filled with liquid. The apparatus includes a substrate stage configured to hold the substrate and to move, a supply nozzle configured to supply the liquid to the gap between the substrate and the projection optical system, the supply nozzle entirely surrounding the projection optical system, and a recovery nozzle arranged outside the supply nozzle and configured to recover the liquid from the gap, the recovery nozzle entirely surrounding said supply nozzle.

Abstract: A positioning device with a drive unit with which an object table is displaceable over a guide which is fastened to a first frame thereof. A stationary part of the drive unit is fastened to a second frame thereof and dynamically isolated from the first frame while a reaction force of the object table arising from a driving force exerted by the drive unit on the object table is transmittable exclusively into the second frame.