Patents Examined by Peter B. Kim
  • Patent number: 12007334
    Abstract: Methods and apparatus of inspection tools for inspecting impurities in vials are provided herein. In some embodiments, an inspection tool for inspecting impurities in vials includes: a table for inspecting a plurality of vials; one or more carts configured to move about the table to place the one or more carts in an inspection position, wherein each of the one or more carts includes a vial holder configured to hold a plurality of vials, and wherein each vial holder is configured to spin the plurality of vials on their own respective axes; and a camera configured to take images of the plurality of vials when the plurality of vials are disposed in the inspection position.
    Type: Grant
    Filed: October 25, 2021
    Date of Patent: June 11, 2024
    Assignee: APPLIED MATERIALS, INC.
    Inventor: Asaf Schlezinger
  • Patent number: 12007698
    Abstract: An information processing apparatus includes an acquisition unit configured to acquire process information about a substrate process, the process information including process data and a process condition, and a display control unit configured to control a display on a display apparatus based on the process information acquired by the acquisition unit, wherein the display control unit selectively displays, on the display apparatus, a first screen that displays the process data of a lot including a plurality of substrates on a lot-by-lot basis and a second screen that displays the process data of a first lot on a substrate-by-substrate basis, the first lot being a lot designated by a user from the lot displayed on the first screen.
    Type: Grant
    Filed: January 11, 2023
    Date of Patent: June 11, 2024
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Takahiro Takiguchi, Kenta Kita
  • Patent number: 11982631
    Abstract: A defect detection device including an illumination optical system, an image capturing optical system configured to capture an image of scattered light generated by the illumination optical system irradiating the wafer, and an image processing unit configured to process a picture of the image of the scattered light to extract a defect on the wafer. The image capturing optical system includes an objective lens, a filter unit configured to shield a part of light transmitted through the objective lens, and an imaging lens configured to form an image of light transmitted through the filter unit. The filter unit includes a first microlens array configured to condense parallel light transmitted through the objective lens, a shutter array including a light transmission unit at a focus position of the first microlens array, and a second microlens array disposed opposite to the first microlens array with respect to the shutter array.
    Type: Grant
    Filed: March 12, 2019
    Date of Patent: May 14, 2024
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Yuko Otani, Kazuo Aoki, Shunichi Matsumoto, Yuta Urano
  • Patent number: 11982947
    Abstract: A contamination trap for use in a debris mitigation system of a radiation source, the contamination trap comprising a plurality of vanes configured to trap fuel debris emitted from a plasma formation region of the radiation source; wherein at least one vane or each vane of the plurality of vanes comprises a material comprising a thermal conductivity above 30 W m?1 K?1.
    Type: Grant
    Filed: November 28, 2022
    Date of Patent: May 14, 2024
    Assignee: ASML NETHERLAND B.V.
    Inventors: Sander Catharina Reinier Derks, Daniel Jozef Maria Direcks, Maurice Wilhelmus Leonardus Hendricus Feijts, Pieter Gerardus Mathijs Hoeijmakers, Katja Cornelia Joanna Clasina Moors, Violeta Navarro Paredes, William Peter Van Drent, Jan Steven Christiaan Westerlaken
  • Patent number: 11978196
    Abstract: Embodiments of the present disclosure relate to optical devices for augmented, virtual, and/or mixed reality applications. In one or more embodiments, an optical device metrology system is configured to measure a plurality of see-through metrics for optical devices.
    Type: Grant
    Filed: October 4, 2021
    Date of Patent: May 7, 2024
    Inventors: Yangyang Sun, Jinxin Fu, Kazuya Daito, Ludovic Godet
  • Patent number: 11978290
    Abstract: A system for temporarily mounting an observable target on a vehicle service system during a vehicle service or inspection process. The system includes at least one target backing plate affixed at a known or determinable position on the vehicle service system facing a vehicle undergoing service or inspection. The target backing plate provides a forward facing planar surface receiving a removable optical target, with at least one target guide element to provide a fixed reference for indexed alignment of the removable optical target on the target backing plate.
    Type: Grant
    Filed: September 13, 2021
    Date of Patent: May 7, 2024
    Assignee: HUNTER ENGINEERING COMPANY
    Inventors: James T. Dieckhaus, Mark E. Stirnemann
  • Patent number: 11966171
    Abstract: A method of processing a wafer is provided. The method includes providing a reference pattern for patterning a wafer. The reference pattern is independent of a working surface of the wafer. A placement of a first pattern on the working surface of the wafer is determined by identifying the reference pattern to align the first pattern. The first pattern is formed on the working surface of the wafer based on the placement.
    Type: Grant
    Filed: August 17, 2021
    Date of Patent: April 23, 2024
    Assignee: Tokyo Electron Limited
    Inventor: Anton J. Devilliers
  • Patent number: 11966043
    Abstract: An imaging optical system comprises adjusters for adjusting a shape of each of at least two reflecting surfaces by applying a force to a rear surface of each of the reflecting surfaces. Points obtained by projecting force acting points of the adjusters in an optical axis direction defined with respect to the reflecting surface are defined as correction points, the acting points are set such that, when first and second rays in a light flux emitted from one point on the object plane are reflected by first and second reflecting surfaces, the first ray strikes the correction point of the first reflecting surface but does not strike the correction point of the second reflecting surface, and the second ray does not strike the correction point of the first reflecting surface but strikes the correction point of the second reflecting surface.
    Type: Grant
    Filed: July 8, 2021
    Date of Patent: April 23, 2024
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Michio Kono
  • Patent number: 11960216
    Abstract: A pre-alignment system includes a common object lens group configured to collect diffracted beams from a patterning device, wherein the common object lens group is further configured to produce telecentricity in an object space of the pre-alignment system. The pre-alignment system also includes a multipath sensory array having at least one image lens system, wherein the at least one image lens system includes a telecentric converter lens configured to produce telecentricity in an image space of the pre-alignment system.
    Type: Grant
    Filed: August 25, 2020
    Date of Patent: April 16, 2024
    Assignee: ASML Holding N.V.
    Inventors: Lev Ryzhikov, Yuli Vladimirsky
  • Patent number: 11953839
    Abstract: In a method of cleaning a lithography system, during idle mode, a stream of air is directed, through a first opening, into a chamber of a wafer table of an EUV lithography system. One or more particles is extracted by the directed stream of air from surfaces of one or more wafer chucks in the chamber of the wafer table. The stream of air and the extracted one or more particle are drawn, through a second opening, out of the chamber of the wafer table.
    Type: Grant
    Filed: December 5, 2022
    Date of Patent: April 9, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Shih-Yu Tu, Shao-Hua Wang, Yen-Hao Liu, Chueh-Chi Kuo, Li-Jui Chen, Heng-Hsin Liu
  • Patent number: 11953307
    Abstract: A measuring apparatus for measuring a planar relative motion between a tool attacher and a work attacher of a machine tool includes at least one image capturing element capable of performing image capturing at a first position, a second position, and a third position, which are not located on the same line. The image capturing elements at the first position, the second position, and the third position are caused to capture a first point, a second point, and a third point, respectively, arranged on at least one plane of an XY-plane, an XZ-plane, and a YZ-plane. The image capturing element at the second position and the image capturing element at the third position are caused to capture the first point, the image capturing element at the first position and the image capturing element at the third position are caused to capture the second point, and the image capturing element at the first position and the image capturing element at the second position are caused to capture the third point.
    Type: Grant
    Filed: July 10, 2020
    Date of Patent: April 9, 2024
    Assignee: DMG MORI CO., LTD.
    Inventors: Naruhiro Irino, Masahiro Shimoike
  • Patent number: 11940264
    Abstract: A method for calibrating a mirror of an interferometer system configured to measure a position of an object using two interferometers of the interferometer system that are arranged at opposite sides of the object and configured to measure the position of the object in the same X-direction, wherein two sets of measurements are obtained for different rotational orientations about an axis perpendicular to the X-direction to determine a shape of the mirror. There is also provided a position measuring method in which the obtained shape of the mirror is used to adjust measurements in the X-direction, a lithographic apparatus and a device manufacturing method making use of such a lithographic apparatus.
    Type: Grant
    Filed: June 5, 2020
    Date of Patent: March 26, 2024
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Johannes Mathias Theodorus Antonius Adriaens, Carolus Johannes Catharina Schoormans, Luuk Johannes Helena Seelen
  • Patent number: 11920912
    Abstract: The present disclosure provides an automatic berthing image ranging system for vessels and operation method thereof, the method comprising: obtaining a reference image around a position in which a vessel is located, the reference image comprises a first pattern and at least two second patterns; the reference image is projected to a reference plane to generate projection coordinates corresponding to the first pattern and the at least two patterns; determining a positional relationship between the vessel and a port by a predetermined distance, and the positional relationship is represented by an angle value.
    Type: Grant
    Filed: December 14, 2021
    Date of Patent: March 5, 2024
    Assignee: SHIP AND OCEAN INDUSTRIES R&DCENTER
    Inventor: Ming-Hsiang Hsu
  • Patent number: 11914306
    Abstract: A calibrated lithographic model may be used to generate a lithographic model output based on an integrated circuit (IC) design layout. Next, at least a chemical parameter may be extracted from the lithographic model output. A calibrated defect rate model may then be used to predict a defect rate for the IC design layout based on the chemical parameter.
    Type: Grant
    Filed: October 16, 2020
    Date of Patent: February 27, 2024
    Assignee: Synopsys, Inc.
    Inventors: Erik A. Verduijn, Ulrich Karl Klostermann, Ulrich Welling, Jiuzhou Tang, Hans-J├╝rgen Stock
  • Patent number: 11906888
    Abstract: A light source apparatus includes a first light source that emits first light belonging to a first wavelength band, a second light source that emits second light belonging to a second wavelength band, a wavelength converter that contains a phosphor and converts the first light into third light belonging to a third wavelength band different from the first, a first heat dissipation member that includes a plurality of first fins and dissipates heat generated by the first light source, a second heat dissipation member that includes a plurality of second fins and dissipates heat generated by the second light source, and a first direction wherein first channels, specified by the gaps between the first fins and along which a refrigerant is supplied, extend coincides with a second direction wherein second channels, specified by the gaps between the second fins and along which the refrigerant is supplied, extend.
    Type: Grant
    Filed: March 25, 2021
    Date of Patent: February 20, 2024
    Assignee: SEIKO EPSON CORPORATION
    Inventors: Shigekazu Aoki, Shingo Komiyama, Junichi Suzuki
  • Patent number: 11899376
    Abstract: A method for forming alignment marks leverages pad density and critical dimensions (CDs). In some embodiments, the method includes forming first and second alignment marks on a first substrate and a second substrate where the alignment marks have a width within 5% of the associated CD of copper pads on the respective substrates and forming a first and second dummy patterns around the first and second alignment marks. The first and second dummy patterns have dummy pattern densities within 5% of the respective copper pad density of the first and second substrates and CDs within 5% of the respective copper pad CDs. In some embodiments, alignment marks with physical dielectric material protrusions and recesses on opposite substrate surfaces may further enhance bonding.
    Type: Grant
    Filed: August 31, 2022
    Date of Patent: February 13, 2024
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Prayudi Lianto, Liu Jiang, Marvin Louis Bernt, El Mehdi Bazizi, Guan Huei See
  • Patent number: 11892767
    Abstract: A stud attachment device for attaching a plurality of studs to a photomask constituting a reticle. The stud attachment device including a body; a plurality of holders extending from the body, the holders allowing the studs to be laid thereon, respectively; and a pressure regulator for independently controlling pressures of the holders when the studs are attached to the photomask.
    Type: Grant
    Filed: March 24, 2021
    Date of Patent: February 6, 2024
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Byungchul Yoo, Sunghoon Park, Mun Ja Kim
  • Patent number: 11892777
    Abstract: The present application relates to contact immersion lithography exposure units and methods of their use. An example contact exposure unit includes a container configured to contain a fluid material and a substrate disposed within the container. The substrate has a first surface and a second surface, and the substrate includes a photoresist material on at least the first surface. The contact exposure unit includes a photomask disposed within the container. The photomask is optically coupled to the photoresist material by way of a gap comprising the fluid material. The contact exposure unit also includes an inflatable balloon configured to be controllably inflated so as to apply a desired force to the second surface of the substrate to controllably adjust the gap between the photomask and the photoresist material.
    Type: Grant
    Filed: October 13, 2022
    Date of Patent: February 6, 2024
    Assignee: Waymo LLC
    Inventors: Hongqin Shi, Yeh-Jiun Tung, James Dunphy, Cesar Gensoli
  • Patent number: 11891106
    Abstract: A system for hand detection on a steering wheel. The system includes: at least one light source adapted to emit an emitted signal of light so that the emitted signal is directed from inside the steering wheel to at least one detection area of a surface of the steering wheel, the detection area being at least partially transparent for the emitted signal; at least one light sensor adapted to detect a reflected signal, which is a part of the emitted signal that is reflected from the detection area into the inside of the steering wheel; and a detection unit coupled to the at least one light sensor and adapted to detect a hand of a user on the steering wheel based on a detection of the reflected signal.
    Type: Grant
    Filed: July 16, 2019
    Date of Patent: February 6, 2024
    Assignee: IEE INTERNATIONAL ELECTRONICS & ENGINEERING S.A.
    Inventor: Tobias Justinger
  • Patent number: 11886124
    Abstract: A method to improve a lithographic process for imaging a portion of a patterning device pattern onto a substrate using a lithographic projection having an illumination system and projection optics, the method including: (1) obtaining a simulation model that models projection of radiation by the projection optics, wherein the simulation model models an effect of an obscuration in the projection optics, and configuring, based on the model, the portion of the patterning device pattern, and/or (2) obtaining a simulation model that models projection of radiation by the projection optics, wherein the simulation model models an anamorphic demagnification of radiation by the projection optics, and configuring, based on the model, the portion of the patterning device pattern taking into account an anamorphic manufacturing rule or anamorphic manufacturing rule ratio.
    Type: Grant
    Filed: October 21, 2022
    Date of Patent: January 30, 2024
    Assignee: ASML NETHERLANDS B.V.
    Inventor: Duan-Fu Stephen Hsu