Patents Examined by Peter B. Kim
  • Patent number: 11327411
    Abstract: The present invention provides a substrate processing apparatus that processes a substrate, the apparatus including a stage configured to hold and move the substrate, a conveying unit configured to hold and convey the substrate between conveying unit and the stage, an accumulation unit configured to accumulate control information concerning the stage and the conveying unit which is generated by processing the substrate, and a determination unit configured to determine a conveying procedure when conveying the substrate between the stage and the conveying unit by selecting one of a plurality of conveying procedures which can be set for the stage and the conveying unit based on control information accumulated in the accumulation unit.
    Type: Grant
    Filed: May 14, 2021
    Date of Patent: May 10, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Mitsuhide Nishimura, Kenichi Kamino, Kashu Matsumoto
  • Patent number: 11320746
    Abstract: The method for manufacturing an integrated circuit includes: obtaining measurement data according to a first group of overlay marks on a first wafer, where the first group of overlay marks are disposed in a first region on the first wafer; obtaining a first parameter set according to a first model and the measurement data; and projecting the first parameter set into a second region on a second wafer to obtain simulated compensation data, where the second region includes a second group of overlay marks whose quantity is greater than that of the first group of overlay marks.
    Type: Grant
    Filed: February 5, 2021
    Date of Patent: May 3, 2022
    Inventors: Haifeng Pu, Ningqi Zhu, Shengyuan Zhong
  • Patent number: 11320752
    Abstract: A supporting unit is provided to support a substrate. The supporting unit includes a supporting plate including a pressure reducing fluid passage formed inside the supporting plate, and a flanger provided in a groove formed in a top surface of the supporting plate. A lower area of the flanger is connected to the pressure reducing fluid passage in the groove, and the flanger moves up and down by reduced pressure applied through the pressure reducing fluid passage.
    Type: Grant
    Filed: June 26, 2020
    Date of Patent: May 3, 2022
    Assignee: Semes Co., Ltd.
    Inventor: Jaeoh Bang
  • Patent number: 11314176
    Abstract: An apparatus for containing a substrate and a method of manufacturing the apparatus are provided. The apparatus for containing a substrate includes: a base having a periphery and an upward-facing top horizontal planar surface with a plurality of contact elements, the contact elements being used for engaging the substrate to hold the substrate upon the upward-facing top horizontal planar surface, an upward-facing frame-like support surface extending from the upward-facing top horizontal planar surface and surrounding the contact elements at a position proximate to the periphery of the base; and a cover having a downward-facing frame-like support surface being in large-area contact with the upward-facing frame-like support surface to define a cavity for containing the substrate between the base and the cover. The downward-facing and upward-facing frame-like support surfaces in contact with each other are not at the same level as the upward-facing top horizontal planar surface.
    Type: Grant
    Filed: June 9, 2021
    Date of Patent: April 26, 2022
    Assignee: GUDENG PRECISION INDUSTRIAL CO., LTD
    Inventors: Chia-Ho Chuang, Hsin-Min Hsueh, Ming-Chien Chiu
  • Patent number: 11314172
    Abstract: A method for accelerating calibration of a fabrication process model, the method including performing one or more iterations of: defining one or more fabrication process model terms; receiving predetermined information related to the one or more fabrication process model terms; generating a fabrication process model based on the predetermined information, the fabrication process model configured to generate one or more predictions related to a metrology gauge; determining whether a prediction related to a dimension of a gauge is within a predetermined threshold of the gauge as measured on a post-fabrication process substrate; and responsive to the prediction not breaching the predetermined threshold, optimizing the one or more fabrication process terms such that the prediction related to the dimension of the gauge is within the predetermined threshold of the gauge as measured on the post-fabrication process substrate.
    Type: Grant
    Filed: March 7, 2019
    Date of Patent: April 26, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Hongfei Shi, Jinze Wang, Pengcheng Yang, Lei Wang, Mu Feng
  • Patent number: 11300885
    Abstract: Embodiments described herein comprise extreme ultraviolet (EUV) reticles and methods of forming EUV reticles. In an embodiment, the reticle may comprise a substrate and a mirror layer over the substrate. In an embodiment, the mirror layer comprises a plurality of alternating first mirror layers and second mirror layers. In an embodiment, a phase-shift layer is formed over the mirror layer. In an embodiment, openings for printable features and openings for non-printable features are formed into the phase-shift layer. In an embodiment, the non-printable features have a dimension that is smaller than a dimension of the printable features.
    Type: Grant
    Filed: July 25, 2018
    Date of Patent: April 12, 2022
    Assignee: Intel Corporation
    Inventors: Robert Bristol, Guojing Zhang, Tristan Tronic, John Magana, Chang Ju Choi, Arvind Sundaramurthy, Richard Schenker
  • Patent number: 11300889
    Abstract: Methods and apparatuses for determining in-plane distortion (IPD) across a substrate having a plurality of patterned regions. A method includes obtaining intra-region data indicative of a local stress distribution across one of the plurality of patterned regions; determining, based on the intra-region data, inter-region data indicative of a global stress distribution across the substrate; and determining, based on the inter-region data, the IPD across the substrate.
    Type: Grant
    Filed: July 3, 2019
    Date of Patent: April 12, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Leon Paul Van Dijk, Richard Johannes Franciscus Van Haren, Subodh Singh, Ilya Malakhovsky, Ronald Henricus Johannes Otten, Amandev Singh
  • Patent number: 11300883
    Abstract: A method to determine a patterning process parameter, the method comprising: for a target, calculating a first value for an intermediate parameter from data obtained by illuminating the target with radiation comprising a central wavelength; for the target, calculating a second value for the intermediate parameter from data obtained by illuminating the target with radiation comprising two different central wavelengths; and calculating a combined measurement for the patterning process parameter based on the first and second values for the intermediate parameter.
    Type: Grant
    Filed: September 19, 2018
    Date of Patent: April 12, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Martin Jacobus Johan Jak, Simon Gijsbert Josephus Mathijssen, Kaustuve Bhattacharyya, Won-Jae Jang, Jinmoo Byun
  • Patent number: 11300892
    Abstract: A sensor apparatus (300) for determining a position of a target (330) of a substrate (W) comprising, projection optics (315;321) configured to project a radiation beam (310) onto the substrate, collection optics (321) configured to collect measurement radiation (325) that has scattered from the target, a wavefront sensing system (335) configured to determine a pupil function variation of at least a portion (355) of the measurement radiation and output a signal (340) indicative thereof, and a measurement system (350) configured to receive the signal and to determine the position of the target in at least partial dependence on the collected measurement radiation and the determined pupil function variation of at least a portion of the measurement radiation.
    Type: Grant
    Filed: June 13, 2019
    Date of Patent: April 12, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Simon Reinald Huisman, Alessandro Polo
  • Patent number: 11294275
    Abstract: The present disclosure provides an apparatus for mounting a pellicle to a photomask, including a presser, a pellicle stage facing the presser, and a flexible material layer between the presser and the pellicle stage, wherein the flexible material layer includes a compartment filled with gas.
    Type: Grant
    Filed: September 12, 2020
    Date of Patent: April 5, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Tzu Han Liu, Chih-Wei Wen, Chung-Hung Lin
  • Patent number: 11294288
    Abstract: An exposure device, an exposure method and a photolithography method are provided. The exposure device includes an exposure light source and an optical-path assembly, the optical-path assembly is configured to guide light emitted by the exposure light source to an exposing position, the optical-path assembly includes a light valve array, the light emitted by the exposure light source is able to be guided to the light valve array and then guided to the exposing position after the light is transmitted or reflected by the light valve array, the light valve array includes a plurality of light valve units, and optical transmittance or reflectivity of each of the light valve units is adjustable.
    Type: Grant
    Filed: March 28, 2018
    Date of Patent: April 5, 2022
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventor: Moon Gyu Sung
  • Patent number: 11294294
    Abstract: Methods and apparatuses for determining a position of an alignment mark applied to a region of a first layer on a substrate using a lithographic process by: obtaining an expected position of the alignment mark; obtaining a geometrical deformation of the region due to a control action correcting the lithographic process; obtaining a translation of the alignment mark due to the geometrical deformation; and determining the position of the alignment mark based on the expected position and the translation.
    Type: Grant
    Filed: February 6, 2019
    Date of Patent: April 5, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Richard Johannes Franciscus Van Haren, Leon Paul Van Dijk, Orion Jonathan Pierre Mouraille, Anne Marie Pastol
  • Patent number: 11287744
    Abstract: An extreme ultraviolet light generation apparatus is an apparatus to generate extreme ultraviolet light by irradiating a target with laser light, and may include a target supply unit configured to output the target, an actuator configured to shift a trajectory of the target, a first trajectory sensor configured to detect the trajectory of the target in a first direction, a second trajectory sensor configured to detect the trajectory of the target in a second direction being different from the first direction, and a control unit configured to perform trajectory control including controlling the actuator to cause the second trajectory sensor to be capable of detecting the trajectory of the target when the trajectory of the target has been detected by the first trajectory sensor and has not been detected by the second trajectory sensor.
    Type: Grant
    Filed: July 7, 2021
    Date of Patent: March 29, 2022
    Assignee: Gigaphoton Inc.
    Inventor: Toru Abe
  • Patent number: 11289362
    Abstract: In a carrier system, a chuck unit is used to hold a placed wafer from above, and vertical-motion pins use suction to hold the wafer from below. Then, the chuck unit and the vertical-motion pins are subsequently lowered until a bottom surface of the wafer comes into contact with a wafer table. During the lowering, the holding force exerted by the chuck unit and the arrangement of chuck members are optimally adjusted such that, as a result of the restraint of the wafer by the chuck unit and the vertical-motion pins, localized surplus-restraint is imparted to the wafer, and warping does not occur.
    Type: Grant
    Filed: February 3, 2020
    Date of Patent: March 29, 2022
    Assignee: NIKON CORPORATION
    Inventors: Go Ichinose, Taisuke Ibe
  • Patent number: 11281116
    Abstract: The present invention provides a substrate stage and a substrate processing apparatus that appropriately control a temperature of a staging surface on which a substrate is placed. The substrate stage includes a stage base including a cooling surface therein, and a supply flow path forming member formed of a material having a lower thermal conductivity than that of the stage base and including cooling nozzles configured to spray a coolant toward the cooling surface.
    Type: Grant
    Filed: March 17, 2021
    Date of Patent: March 22, 2022
    Assignee: Tokyo Electron Limited
    Inventors: Einosuke Tsuda, Daisuke Toriya, Satoshi Yonekura, Satoshi Takeda, Motoshi Fukudome, Kyoko Ikeda
  • Patent number: 11282738
    Abstract: A lift pin module includes a lift pin which includes a head portion disposed at a first end of the lift pin, and a connecting portion disposed at a second end of the lift pin opposite to the first end, the head portion connected to a stage disposed inside a semiconductor process chamber, and the head portion extending in a first direction; an upper weight which includes a side surface with an opening extending in the first direction, the opening configured to receive the lift pin therein, and the upper weight surrounding the connecting portion of the lift pin; and a lower weight screwed to the upper weight, the lower weight disposed below the upper weight.
    Type: Grant
    Filed: June 26, 2020
    Date of Patent: March 22, 2022
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Seung-Nam Kim, Sung-Keun Cho, Seong Eon Park, Jung-Sub Shin, Joon-Sung Lee, Hyun Ik Joe, Hyeon Cheol Jin
  • Patent number: 11269259
    Abstract: A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.
    Type: Grant
    Filed: November 19, 2020
    Date of Patent: March 8, 2022
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Thomas Poiesz, Bert Dirk Scholten, Dirk Willem Harberts, Lucas Henricus Johannes Stevens, Laura Maria Fernandez Diaz, Johannes Adrianus Cornelis Maria Pijnenburg, Abraham Alexander Soethoudt, Wilhelmus Jacobus Johannes Welters, Jimmy Matheus Wilhelmus Van De Winkel
  • Patent number: 11256175
    Abstract: In corner sections of first to fourth quadrants whose origin point is a center of an upper surface of a stage, three each of two-dimensional heads are provided. The three each of two-dimensional heads include one first head and two second heads. The stage is driven, while measuring a position of the stage using three first heads that face a two-dimensional grating of a scale plate provided above the stage from the four first heads, and during the driving, difference data of measurement values of the two second heads with respect to the first head in a measurement direction are taken in for head groups to which the three first heads belong, respectively, and using the difference data, grid errors are calibrated.
    Type: Grant
    Filed: October 28, 2020
    Date of Patent: February 22, 2022
    Assignee: NIKON CORPORATION
    Inventor: Yuichi Shibazaki
  • Patent number: 11256172
    Abstract: A light irradiating device includes a processing chamber in which a substrate is accommodated; a beam source chamber in which a beam source of an energy beam is accommodated; a partition wall configured to partition the processing chamber and the beam source chamber; multiple window members provided at the partition wall to transmit the energy beam outputted from the beam source toward the substrate within the processing chamber; and multiple gas discharge units respectively disposed around the multiple window members within the processing chamber, and configured to discharge an inert gas along surfaces of the multiple window members.
    Type: Grant
    Filed: June 24, 2020
    Date of Patent: February 22, 2022
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Takaya Kikai, Norihisa Koga, Masaru Tomono
  • Patent number: 11256180
    Abstract: A method includes transferring a wafer into a first processing chamber by using a robot arm mechanism, and applying a photoresist on the wafer in a first processing chamber. The wafer is transferred from the first processing chamber into a second processing chamber by using the robot arm mechanism, and the photoresist is exposed to a pattern of light in the second processing chamber. The method includes transferring the wafer from the second processing chamber into a third processing chamber by using the robot arm mechanism, and developing the exposed wafer in the third processing chamber. The method includes cleaning the robot arm mechanism in a dummy chamber.
    Type: Grant
    Filed: April 29, 2019
    Date of Patent: February 22, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Fu-Chun Hsieh, Pei-Yi Su, Chih-Che Lin