Patents Examined by Peter B. Kim
  • Patent number: 11891106
    Abstract: A system for hand detection on a steering wheel. The system includes: at least one light source adapted to emit an emitted signal of light so that the emitted signal is directed from inside the steering wheel to at least one detection area of a surface of the steering wheel, the detection area being at least partially transparent for the emitted signal; at least one light sensor adapted to detect a reflected signal, which is a part of the emitted signal that is reflected from the detection area into the inside of the steering wheel; and a detection unit coupled to the at least one light sensor and adapted to detect a hand of a user on the steering wheel based on a detection of the reflected signal.
    Type: Grant
    Filed: July 16, 2019
    Date of Patent: February 6, 2024
    Inventor: Tobias Justinger
  • Patent number: 11892767
    Abstract: A stud attachment device for attaching a plurality of studs to a photomask constituting a reticle. The stud attachment device including a body; a plurality of holders extending from the body, the holders allowing the studs to be laid thereon, respectively; and a pressure regulator for independently controlling pressures of the holders when the studs are attached to the photomask.
    Type: Grant
    Filed: March 24, 2021
    Date of Patent: February 6, 2024
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Byungchul Yoo, Sunghoon Park, Mun Ja Kim
  • Patent number: 11892777
    Abstract: The present application relates to contact immersion lithography exposure units and methods of their use. An example contact exposure unit includes a container configured to contain a fluid material and a substrate disposed within the container. The substrate has a first surface and a second surface, and the substrate includes a photoresist material on at least the first surface. The contact exposure unit includes a photomask disposed within the container. The photomask is optically coupled to the photoresist material by way of a gap comprising the fluid material. The contact exposure unit also includes an inflatable balloon configured to be controllably inflated so as to apply a desired force to the second surface of the substrate to controllably adjust the gap between the photomask and the photoresist material.
    Type: Grant
    Filed: October 13, 2022
    Date of Patent: February 6, 2024
    Assignee: Waymo LLC
    Inventors: Hongqin Shi, Yeh-Jiun Tung, James Dunphy, Cesar Gensoli
  • Patent number: 11886124
    Abstract: A method to improve a lithographic process for imaging a portion of a patterning device pattern onto a substrate using a lithographic projection having an illumination system and projection optics, the method including: (1) obtaining a simulation model that models projection of radiation by the projection optics, wherein the simulation model models an effect of an obscuration in the projection optics, and configuring, based on the model, the portion of the patterning device pattern, and/or (2) obtaining a simulation model that models projection of radiation by the projection optics, wherein the simulation model models an anamorphic demagnification of radiation by the projection optics, and configuring, based on the model, the portion of the patterning device pattern taking into account an anamorphic manufacturing rule or anamorphic manufacturing rule ratio.
    Type: Grant
    Filed: October 21, 2022
    Date of Patent: January 30, 2024
    Inventor: Duan-Fu Stephen Hsu
  • Patent number: 11868050
    Abstract: The present disclosure relates to systems and methods relating to the fabrication of light guide elements. An example system includes an optical component configured to direct light emitted by a light source to illuminate a photoresist material at one or more desired angles so as to expose an angled structure in the photoresist material. The photoresist material overlays at least a portion of a first surface of a substrate. The optical component includes a container containing a light-coupling material that is selected based in part on the one or more desired angles. The system also includes a reflective surface arranged to reflect at least a first portion of the emitted light to illuminate the photoresist material at the one or more desired angles.
    Type: Grant
    Filed: November 7, 2022
    Date of Patent: January 9, 2024
    Assignee: Waymo LLC
    Inventors: James Dunphy, David Hutchison
  • Patent number: 11860555
    Abstract: An alignment mark count acquiring method includes: acquiring a first time at which an exposure machine performs exposure of a first wafer, and acquiring a second time at which the exposure machine performs alignment of a second wafer; acquiring a first buffer time between the second time and the first time when the first time is less than the second time; determining a target alignment mark count of the second wafer according to the exposure parameters of the first wafer and the corresponding relationship when the first buffer time is greater than a preset value, wherein the corresponding relationship is the relationship between the exposure parameters and the alignment mark counts, and the corresponding relationship is used to make the first buffer time to be less than or equal to the preset value; and outputting the target alignment mark count.
    Type: Grant
    Filed: January 22, 2022
    Date of Patent: January 2, 2024
    Inventor: Heng Wang
  • Patent number: 11859961
    Abstract: A focusing optical part, including a plastic body, suitable for being delivered on a tape and reel and mounted on a PCB by an automated mounting machine, the plastic body including a concave mirror including a center aperture input surface through which light enters the plastic body, a convex mirror opposite the center aperture, wherein the concave mirror and the convex mirror form a reflective objective that reflects and focuses the light inside the plastic body, and an exit surface surrounding the convex mirror, through which focused light exits the plastic body.
    Type: Grant
    Filed: January 23, 2019
    Date of Patent: January 2, 2024
    Assignee: Neonode Inc.
    Inventors: Björn Alexander Jubner, Lars Bertil Sparf, Robert Sven Pettersson, Hans Anders Jansson
  • Patent number: 11852981
    Abstract: An overlay error measurement method includes disposing a lower-layer pattern over a substrate that includes disposing a first pattern having a first plurality of first sub-patterns extending in a first interval along a first direction and being arranged with a first pitch in a second direction crossing the first direction. The method includes disposing a second pattern having a second plurality of second sub-patterns extending in a second interval along the first direction and being arranged with a second pitch, smaller than the first pitch, in the second direction crossing the first direction. The second sub-patterns are disposed interleaved between the first sub-patterns. The method includes disposing an upper-layer pattern including a third pattern having the first pitch and at least partially overlapping with the lower-layer pattern over the lower-layer pattern and determining an overlay error between the lower-layer pattern and the upper-layer pattern.
    Type: Grant
    Filed: December 23, 2020
    Date of Patent: December 26, 2023
    Inventors: Hung-Chih Hsieh, Ming-Hsiao Weng
  • Patent number: 11852980
    Abstract: Some implementations described herein provide an exposure tool. The exposure tool includes a reticle deformation detector and one or more processors configured to obtain, via the reticle deformation detector, reticle deformation information associated with a reticle during a scanning process for scanning multiple fields of a wafer. The one or more processors determine, based on the reticle deformation information, a deformation of the reticle at multiple times during the scanning process, and perform, based on the deformation of the reticle at the multiple times, one or more adjustments of one or more components of the exposure tool during the scanning process.
    Type: Grant
    Filed: October 29, 2021
    Date of Patent: December 26, 2023
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Min-Cheng Wu, Ching-Ju Huang
  • Patent number: 11841628
    Abstract: An apparatus for and method of sensing multiple alignment marks in which the optical axis of a detector is divided into multiple axes each of which can essentially simultaneously detect a separate alignment mark to generate a signal which can then be multiplexed and presented to a single detector or multiple detectors thus permitting more rapid detection of multiple marks.
    Type: Grant
    Filed: January 21, 2021
    Date of Patent: December 12, 2023
    Assignee: ASML Holding N.V.
    Inventors: Krishanu Shome, Justin Lloyd Kreuzer
  • Patent number: 11829078
    Abstract: The present application provides an overlay measuring apparatus, adapted to determine relative positions of two or more successive patterned layers of a device. The overlay measuring apparatus includes a stage and an imaging assembly. The device is placed on the stage. The imaging assembly includes a plurality of optical heads and a plurality of overlay marks assembled on the optical heads. The relative positions of the two or more successive patterned layers of the device are determined using light reflected from the device and passing through the overlay mark mounted on the respective optical head.
    Type: Grant
    Filed: February 25, 2022
    Date of Patent: November 28, 2023
    Inventor: Chien-Hsien Liu
  • Patent number: 11829076
    Abstract: A method of treating a surface of a reticle includes retrieving a reticle from a reticle library and transferring the reticle to a treatment device. The surface of the reticle is treated in the treatment device by irradiating the surface of the reticle UV radiation while ozone fluid is over the surface of the reticle for a predetermined irradiation time. After the treatment, the reticle is transferred to an exposure device for lithography operation to generate a photo resist pattern on a wafer. A surface of the wafer is imaged to generate an image of the photo resist pattern on the wafer. The generated image of the photo resist pattern is analyzed to determine critical dimension uniformity (CDU) of the photo resist pattern. The predetermined irradiation time is increased if the CDU does not satisfy a threshold CDU.
    Type: Grant
    Filed: November 28, 2022
    Date of Patent: November 28, 2023
    Inventors: Yi-Chen Su, Tzu-Yi Wang, Ta-Cheng Lien
  • Patent number: 11815823
    Abstract: A method for aligning a substrate for fabrication of an optical device is disclosed that includes receiving a substrate having a first side and a second side opposite the first side, the first side of the substrate being oriented towards a scanner, the substrate having an alignment mark formed on the first side of the substrate, scanning the alignment mark with the scanner, and fabricating a first pattern for a first optical device on the first side of the substrate. The method includes positioning the substrate such that the second side is oriented toward the scanner, scanning the alignment mark on the first side with the scanner, through the second side, and fabricating a second pattern for a fourth optical device on the second side of the substrate.
    Type: Grant
    Filed: September 19, 2022
    Date of Patent: November 14, 2023
    Inventors: Yongan Xu, Ludovic Godet
  • Patent number: 11815822
    Abstract: A component with a reflective substrate, a photoresist layer disposed on the reflective substrate, and a light diffusing layer sandwiched between the reflective substrate and the photoresist layer is provided. The light diffusing layer includes an outer metal oxide layer with an outer rough surface configured to diffuse laser light during laser interference lithography of the photoresist layer. The outer metal oxide is also configured to be reduced to a conductive metallic layer during electroplating of the substrate. The outer metal oxide layer includes a plurality of elongated light diffusing elements extending in an outward direction from the substrate such that the outer rough surface diffuses at least 90% of laser light during the laser interference lithography of the photoresist layer.
    Type: Grant
    Filed: March 25, 2022
    Date of Patent: November 14, 2023
    Assignees: Toyota Motor Engineering & Manufacturing North America, Inc., The Board of Trustees of the University of Illinois
    Inventors: Shailesh N. Joshi, Gaurav Singhal, Paul Vannest Braun, Kai-Wei Lan, Nenad Miljkovic
  • Patent number: 11808714
    Abstract: An inspection device includes: an illumination device that irradiates an object with near-infrared light; a spectroscope that disperses reflected light from the object irradiated with the near-infrared light; an imaging device that takes a spectroscopic image of the reflected light dispersed by the spectroscope; and a processor. The processor obtains spectral data at a plurality of points on the object based on the spectroscopic image obtained by the imaging device, selects, from among the spectral data at the plurality of points, a group having a highest density of luminance values of a predetermined wavelength component as a dense spectral data group, and performs a predetermined analysis for the object based on the dense spectral data group and detects a different type of object.
    Type: Grant
    Filed: March 15, 2021
    Date of Patent: November 7, 2023
    Inventor: Yukihiro Taguchi
  • Patent number: 11803130
    Abstract: An alignment apparatus includes an illumination system configured to direct one or more illumination beams towards an alignment target and receive the diffracted beams from the alignment target. The alignment apparatus also includes a self-referencing Interferometer configured to generate two diffraction sub-beams, wherein the two diffraction sub-beams are orthogonally polarized, rotated 180 degrees with respect to each other around an alignment axis, and spatially overlapped. The alignment apparatus further includes a beam analyzer configured to generate interference between the overlapped components of the diffraction sub-beams and produce two orthogonally polarized optical branches, and a detection system configured to determine a position of the alignment target based on light intensity measurement of the optical branches, wherein the measured light intensity is temporally modulated by a phase modulator.
    Type: Grant
    Filed: August 5, 2020
    Date of Patent: October 31, 2023
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Franciscus Godefridus Casper Bijnen, Muhsin Eralp, Simon Reinald Huisman, Arie Jeffrey Den Boef
  • Patent number: 11796927
    Abstract: A method and device for enhancing alignment performance of a lithographic device can provide an optimal alignment light source type to perform alignment according to product features. Overlay performance of the product can be improved, wafer reject can be reduced, and production efficiency can be enhanced.
    Type: Grant
    Filed: January 12, 2022
    Date of Patent: October 24, 2023
    Inventor: Zhao Cheng
  • Patent number: 11774870
    Abstract: A method for removing particles from a mask system for a projection exposure apparatus, including the following method steps: detecting the particle in the mask system, providing laser radiation, and removing the particle by irradiating the particle with laser radiation. The wavelength of the laser radiation corresponds to that of used radiation used by the projection exposure apparatus.
    Type: Grant
    Filed: August 8, 2022
    Date of Patent: October 3, 2023
    Assignees: Carl Zeiss SMT GmbH, Carl Zeiss SMS Ltd.
    Inventors: Sergey Oshemkov, Shao-Chi Wei, Joerg Frederik Blumrich, Martin Voelcker, Thomas Franz Karl Scheruebl
  • Patent number: 11768440
    Abstract: A method including: obtaining data based an optical proximity correction for a spatially shifted version of a training design pattern; and training a machine learning model configured to predict optical proximity corrections for design patterns using data regarding the training design pattern and the data based on the optical proximity correction for the spatially shifted version of the training design pattern.
    Type: Grant
    Filed: December 27, 2022
    Date of Patent: September 26, 2023
    Inventors: Jing Su, Yen-Wen Lu, Ya Luo
  • Patent number: 11768445
    Abstract: A formable material in contact with a template is irradiated to form a reference film using a predefined registration pattern associated with a spatial light modulator (SLM). The reference film is inspected to generate positional information of elements of the SLM relative to an imprint field edge. Positional offset of the elements of the SLM with respect to a holder of the template based on the positional information is determined. Control parameters for the SLM are determined based on the positional offset.
    Type: Grant
    Filed: August 20, 2021
    Date of Patent: September 26, 2023
    Inventors: James W. Irving, Mehul N. Patel